• 제목/요약/키워드: Laser crystallization

검색결과 165건 처리시간 0.035초

Research of liquid-solid two phase flow in centrifugal pump with crystallization phenomenon

  • Liu, Dong;Wang, Ya-Yun;Wang, Ying-Ze;Wang, Chun-Lin;Yang, Min-Guan
    • International Journal of Fluid Machinery and Systems
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    • 제7권2호
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    • pp.54-59
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    • 2014
  • Particle Image Velocimetry combined with developed image processing method is adopted to study the liquid-solid two phase flow in the centrifugal pump impeller with crystallization phenomenon. The tracer particle is used to follow the liquid phase, which has the diameter between 8 to $12{\mu}m$. The crystal particle precipitates from the sodium sulfate solution does change the wavelength of the laser, and which has great laser scattering characteristics. The diameter of the crystal particle is larger than $20{\mu}m$. Through calculating the diameter of the particles in the image, the tracer particle and the crystal particle can be distinguished. By analyzing the experimental result, the following conclusion has been obtained. During the delay period, there is not any crystal particle and the pump performance has not been changed. As the crystallization process begins, the crystal nuclei appears from the supersaturation solution and grows larger with temperature decreasing, which has the tendency of moving towards the pressure side. The characteristics of liquid-solid two phase flow with crystallization phenomenon in the pump are obtained according to analysis of experimental results, and some guiding advices are presented to mitigate the crystallization phenomenon in pump impeller.

Phase change properties of BN doped GeSbTe films

  • 장문형;박성진;박승종;정광식;조만호
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.226-226
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    • 2010
  • Boron Nitride (BN) doped GeSbTe films were grown by the ion beam sputtering deposition (IBSD). The in-situ sheet resistance data and the x-ray diffraction patterns showed the crystallization is suppressed due to the BN incorporation. The phase change speed in BN doped GeSbTe films were investigated using the static tester equipped with nanosecond pulsed laser. The phase change speed for BN doped GST films become faster than the corresponding values for an undoped GST film. The Johnson-Mehl-Avrami(JMA) plot and Avrami coefficient for laser crystallization showed that the change in growth mode during the laser crystallization is a most important factor for the phase change speed in the BN doped GST films. The JMA results and the atomic force microscopy (AFM) images indicate that the origin of the change in the crystalline growth mode is due to an increase in the number of initial nucleation sites which is produced by the incorporated BN. In addition, the retension properties for the laser writing/erasing are remarkably improved in BN doped GeSbTe films owing to the stability of the incorporated BN.

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Channel Orientation Dependent Electrical Characteristics of Low Temperature Poly-Si Thin-film Transistor Using Sequential Lateral Solidification Laser Crystallization

  • Lai, Benjamin Chih-ming;Yeh, Yung-Hui;Liu, Bo-Lin
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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    • pp.1263-1265
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    • 2007
  • The electrical characteristics of low temperature poly-Si (LTPS) thin-film transistors (TFT) with channel parallel and perpendicular to the direction of lateral growth were studied. The poly-Si film was crystallized using sequential lateral solidification (SLS) laser crystallization technique. The channel orientation dependent turn-on characteristics were investigated by using gated-diodes and capacitance-voltage measurements

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Excimer-Laser Crystallization for Low-Temperature Polycrystalline Si TFTs

  • Kim, Hyun-Jae
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.151-152
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    • 2000
  • For excimer laser crystallization (ELC), energy density, number of pulses, beam uniformity, and condition of initial amorphous Si (a-Si) films are significant factors contributing the final microstructure and the performance of low-temperature polycrystalline Si TFTs. The process and equipment have been achieved a significant improvement, but still, environmental factors associated with initial amorphous Si (a-Si) films and process conditions need to be optimized.

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Recent advances in excimer-laser-based crystallization for active-matrix displays

  • Turk, Brandon A.;Herbst, Ludolf;Simon, Frank;Paetzel, Rainer
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.12-15
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    • 2007
  • Excimer-laser-based crystallization is ideallysuited for forming crystalline Si films on glass substrates for use in active-matrix displays. In this paper, we will report on recent and significant technical advances in light sources and beam delivery systems targeted at enabling ultra-uniform mura-free low-temperature polycrystalline silicon active-matrix backplanes while simultaneously lowering production costs and increasing throughput.

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Crystallization of Amorphous Silicon Films Using Joule Heating

  • Ro, Jae-Sang
    • 한국표면공학회지
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    • 제47권1호
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    • pp.20-24
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    • 2014
  • Joule heat is generated by applying an electric filed to a conductive layer located beneath or above the amorphous silicon film, and is used to raise the temperature of the silicon film to crystallization temperature. An electric field was applied to an indium tin oxide (ITO) conductive layer to induce Joule heating in order to carry out the crystallization of amorphous silicon. Polycrystalline silicon was produced within the range of a millisecond. To investigate the kinetics of Joule-heating induced crystallization (JIC) solid phase crystallization was conducted using amorphous silicon films deposited by plasma enhanced chemical vapor deposition and using tube furnace in nitrogen ambient. Microscopic and macroscopic uniformity of crystallinity of JIC poly-Si was measured to have better uniformity compared to that of poly-Si produced by other methods such as metal induced crystallization and Excimer laser crystallization.

특허맵과 AHP를 활용한 최적의 LCD 저온폴리실리콘 결정화 기술 선정 (Determining an Optimal Low Temperature Polycrystalline Silicon Crystallization Technology of LCD using Patent Map and AHP)

  • 김관열;이장희
    • 지식경영연구
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    • 제12권1호
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    • pp.39-52
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    • 2011
  • Many LCD manufacturers continue to develop the technologies of LCD manufacturing processes for the reduction of production cost, power consumption and high-resolution. The LTPS (Low Temperature Polycrystalline Silicon) crystallization technology is important for rearranging the internal structure of liquid crystal grain by adding certain energy to amorphous silicon and turning it into poly-silicon in order to manufacture LCD with better performance. We consider 14 existing technologies of LTPS crystallization in the LCD manufacturing and present an intelligent analysis methodology using patent map and AHP (Analytic Hierarchy Process) analysis for determining an optimal LTPS crystallization technology. By using patent map analysis, we easily understand the development process and mega-trend of LTPS crystallization technologies and their relationship. By using AHP analysis, we evaluate 14 LTPS technologies. Through the use of proposed methodology, we determine the Continuous Wave Laser Lateral Crystallization technology as an optimal one.

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$Cu_{54}Ni_{6}Zr_{22}Ti_{18}$ 벌크비정질 합금의 Nd:YAG 레이저 점용접 특성 (Characteristics of the Nd:YAG laser Spot Welding in $Cu_{54}Ni_{6}Zr_{22}Ti_{18}$ Bulk Metallic Glass Alloy)

  • 김종현;이제훈;신승용;배정찬;이창희
    • 한국레이저가공학회지
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    • 제8권2호
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    • pp.13-20
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    • 2005
  • Weldability is largely dependent on the phase evolution and the microstructure of the weld. For the weldability of the $Cu_{54}Ni_6Zr_{22}Ti_{18}$ bulk metallic glass, the crystallization affects the sensitivity of the weld to the brittle failure. In order to suppress the irreversible crystallization, Nd:YAG laser welding was chosen. The pulsed Nd:YAG laser was irradiated onto the BMG plate and the effects of the pulse shape [peak power intensity and pulse duration time] on the crystallinity were evaluated.

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Ge-Se의 스위칭 특성 향상을 위한 Sb-doping에 관한 연구 (Electrolyte Mechanizm Study of Amorphous Ge-Se Materials for Memory Application)

  • 남기현;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.69-69
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    • 2009
  • In other to progress better crystallization transition and long phase-transformation data of phase-change memory (PRAM), we investigated about the effect of Sb doping and Ag ions percolating into Ge-Se-Te phase-change material. Doped Sb concentrations was determined each of 10 wt%, 20 wt% and 30 wt%. As the Sb-doping concentration was increased, the resistivity decreased and the crystallization temperature increased. Ionization of Ag was progressed by DPSS laser (532 nm) for 1 hour. The resistivity was more decreased and the crystallization temperature was more increased in case of adding Ag layer under Sh-(Ge-Se-Te) thin film. At the every condition of thin films included Ag layer more stable states were indicated compare with just Sh-doped Ge-Se-Te thin films.

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