• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2009년도 춘계학술대회 논문집
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• pp.115-116
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• 2009

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2011년도 춘계학술대회 논문집
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• pp.247-248
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• 2011

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2001년도 추계학술대회 논문집
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• pp.186-189
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• 2001

The main method in micro-etching process, used in manufacturing semiconductors, electronic components, circuits, is Photo Masking method that exposes and develops on the photo-sensitivity solutions or films. This method enables one to process highly precisely, $\pm$0.03 mm in end line location area. But this has limits in a high speed / wide width process, difficulties in endless masking, and the problem of high price. We have developed the direct masking method to make use of Gravure printing, widely used in grocery packing sheet printing. We made cylinder tools to influence the masking quality by laser stream process. We have confirmed that the end line location accuracy in the line width of the product is improved from 0.12 mm to $\pm$0.07 mm level, after etching process.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.203-203
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• 2012

The SWCNTs network are formed on various plastic substrates such as poly(ethylene terephthalate) (PET), polyimide (PI) and soda lime glass using roll-to-roll printing and spray process. Selective patterning of carbon nanotubes film on transparent substrates was performed using a femtosecond laser. This process has many advantages because it is performed without chemicals and is easily applied to large-area patterning. It could also control the transparency and conductivity of CNT film by selective removal of CNTs. Furthermore, selective cutting of carbon nanotube using a femtosecond laser does not cause any phase change in the CNTs, as usually shown in focused ion beam irradiation of the CNTs. The patterned SWCNT films on transparent substrate can be used electrode layer for touch panels of flexible or flat panel display instead indium tin oxide (ITO) film.

• 대한금속재료학회지
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• 제48권2호
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• pp.163-168
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• 2010

We here describe the laser-direct patterning of nanostructured metal thin films. This method involves light-matter interaction in which a pulsed laser beam impinging on the film generates a thermoelastic force that plays a role to detach the film from the substrate or underlying layers. A moderate cohesion of the nanostructured film enables localized desorption of the material upon irradiation by a spatiallymodulated laser beam, giving good fidelity with the transfered pattern. This photoresist-free process provides a simple high-resolution scheme for patterning metal thin films.

• 한국레이저가공학회지
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• 제10권1호
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• pp.29-34
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• 2007

We propose a novel application of laser engraving to patterning of light guide panel (LGP) for backlight. The feasibility of three-dimensional engraved pattern in the LGP was verified by measuring brightness and uniformity. To improve the overall uniformity, we have modified proposed patterns and found improved design for patterns. The tailoring of pattern by using laser engraving method could endow the controllability of uniformity. The proposed LGPs are more efficient in both average brightness and uniformity of illumination than the conventional LGPs which have surface pattern on the panel.

• 한국레이저가공학회지
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• 제15권3호
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• pp.7-10
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• 2012

Dimensions (line/space) of circuits in IC substrates for high-end chips (e.g. CPU, etc.) are anticipated to decrease as small as $10{\mu}m/10{\mu}m$ in 2014. Since current etch-based circuit-patterning processes are not able to address the urgent requirement from industry, laser-based circuit patterning processes are under active research in which UV laser is used to engrave embedded circuits patterns into IC substrates. In this paper, we used a nanosecond UV laser to directly fabricate embedded circuit patterns into IC substrates with/without ceramic powders. In experiments, we engraved embedded circuit patterns with dimensions (width/depth) of abut $10{\mu}m/10{\mu}m$ and $6{\mu}m/6{\mu}m$ into the IC substrates. Due to the recoil pressure occurring during ablation, the circuit patterning of the IC substrates with ceramic powders showed the higher ablation rate.

• 한국표면공학회지
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• 제49권1호
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• pp.20-25
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• 2016

Femtosecond laser ablation of ultrathin polymer films on quartz glass using laser pulses of 100 fs and centered at ${\lambda}=400nm$ wavelength has been investigated for nanometer precision thin film patterning. Single-shot ablation craters on films of various thicknesses have been examined by atomic force microscopy, and beam spot diameters and ablation threshold fluences have been determined by square diameter-regression technique. The ablation thresholds of polymer film are about 1.5 times smaller than that of quartz substrate, which results in patterning crater arrays without damaging the substrate. In particular, at a $1/e^2$ laser spot diameter of $0.86{\mu}m$, the smallest craters of 150-nm diameter are fabricated on 15-nm thick film. The ablation thresholds are not influenced by the film thickness, but diameters of the ablated crater are bigger on thicker films than on thinner films. The ablation efficiency is also influenced by the laser beam spot size, following a $w_{0q}{^{-0.45}}$ dependence.

• 한국자기학회지
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• 제13권3호
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• pp.115-120
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• 2003

스퍼터링 방법으로 FM/M/FM의 다층박막을 증착한 다음 초소형 박막 인덕터를 제작하기 위하여 반도체 공정을 대체할 수 있는 레이저 미세가공 기술을 개발하였다. TE $M_{00}$ 모드로 발진하는 CW Nd:YAG 레이저를 active Q-switching 하여 펄스폭이 200 ns인 극 초단 레이저 펄스를 얻었다. 레이저 미세가공 조건을 반복율 5 kHz, 펄스 당 에너지 5 mJ/pulse로 최적화 하여 분해능이 20 $\mu\textrm{m}$인 line patterning을 얻었다.

• 한국광학회지
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• 제17권2호
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• pp.203-206
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• 2006

펨토초 레이저 펄스를 이용하여 Slide glass 위에 코팅된 Al 박막표면에 나노패턴 구조를 생성하였다. 생성된 나노패턴 구조의 공간적 주기는 레이저 강도와 펄스 수에 의존함을 확인하였고, 레이저 강도와 펄스 수를 미세하게 조절함으로써 Al 샘플 표면에 균일한 나노패턴을 형성 시킬 수 있다. 이와 같은 현상은 레이저 입사빔과 샘플 표면에서 산란되는 빛의 광학적 간섭에서 야기 된다. 또한, Al 박막표면 위에 형성된 산화막이 짧은 주기의 나노패턴을 형성하는데 중요한 역할을 수행하는 것을 확인하였다.