• 제목/요약/키워드: Laser Patterning

검색결과 187건 처리시간 0.035초

레이저빔 가공 인자에 따른 구리도금 미세 패터닝 특성 연구 (Study on Characteristics of Micro Patterned Copper Electrodeposition according to Parameters in Laser Beam Machining)

  • 신홍식
    • 융복합기술연구소 논문집
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    • 제5권2호
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    • pp.21-25
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    • 2015
  • This paper proposes a fabrication process of deposited layer with micro patterns that uses a combination of a pulsed laser beam machining and an electrodeposition. This process consists of the electrodeposition and the laser beam machining. The deposited layer on metal can be selectively eliminated by laser ablation. As a result, the deposited layer with micro patterns can be fabricated without a mask. The characteristics of the deposited layer on stainless steel were investigated according to the average power and marking speed in the pulsed laser beam machining. The optimal laser beam conditions for precise micro patterning of the deposited layer were determined. Finally, the deposited copper layer with micro text was successfully fabricated by the pulsed laser beam machining.

레이저를 이용한 미세에칭에 관한 연구 (A Study on the Argon Laser Assisted Thermochemical Micro Etching)

  • 박준민;정해도
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2001년도 춘계학술대회 논문집
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    • pp.844-847
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    • 2001
  • The application of laser direct etching has been discussed, and believed that the process is a very powerful method for micro machining. This study is focused on the micro patterning technology using laser direct etching process with no chemical damage of the material surface. A new introduced concept of energy synergy effect for surface micro machining is the combination of chemically ion reaction and laser thermal process. The etchant can't etch the material in room temperature, and used Ar laser has not power enough to machine. But, the machining is occurred in local area of the material by the combined energy. Using this process, the material is especially prevented from chemical damage for electric property. We have tested this new concept, and achieved a line with $1{mu}m$ width. The Ar laser with 488nm wavelength was used. The material was Si(100) wafer, and etchant is KOH solution. The application and flexibility of this process is in great hopes for MEMS structures and fabrication of the micro electric device parts.

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펨토초 레이저에 의한 폴리이마이드 가공 특성 (Micromachined Properties of a polyimide by a femtosecond laser)

  • 민철기;이만섭
    • 한국레이저가공학회지
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    • 제11권2호
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    • pp.20-25
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    • 2008
  • Polyimide is one of the useful materials in industry. The surface treatment of polyimide by a femtosecond laser can help accurate and fine fabrication of microstructure. And it can change the transmittance and reflectance of polyimide, too. We put femtosecond laser pulses on polyimide for rectangular or square type surface treaments and observe the change of transmittance and reflectance. Pulsewidth is 172 fs, laser power changes for fabrication are from 5 mW to 20 mW, and transmittance and reflectance are measured under 20m W, 300m W, and 920 mW. Pulse patterning is stable and almost no unwanted surface damage is shown. As power increases, working depth increases but working line width does not increase significantly. As speed changes, they also have same results. It shows the efficiency of a femtosecond laser is good and thermal damage is small for polyimide.

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광조형을 이용한 마스크리스 패턴형성에 관한 연구 (A Study of Mastless Pattern Fabrication using Stereolithography)

  • 정영대;조인호;손재혁;임용관;정해도
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2002년도 춘계학술대회 논문집
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    • pp.503-507
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    • 2002
  • Mask manufacturing is a high COC and COO process in developing of semiconductor devices, because of the mass production tool with high resolution. Direct writing has been thought to be one of the patterning method to cope with development or small-lot production of the device. This study focused on the development of the direct, mastless patterning process using stereolithography tool for the easy and convenient application to micro and miso scale products. Experiments are utilized by three dimensional CAD/CAM as a mask and photo-curable resin as a photo-resist in a conventional stereo-lithography apparatus. Results show that the resolution of the pattern was achieved about 300 micron because of complexity of SLA apparatus settings, inspite of 100 micro of inherent resolution. This paper concludes that photo resist and laser spot diameter should be adjusted to get finer patterns and the proposed method is significantly feasible to mastless and low cost patterning with micro and miso scale.

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스캐너를 이용한 고속 펨토초 레이저 가공 기술 (High-Speed Femtosecond Laser Micromachining with a Scanner)

  • 손익부;최성철;노영철;고도경;이종민
    • 한국레이저가공학회지
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    • 제9권2호
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    • pp.11-15
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    • 2006
  • We report experimental results on the high-speed micromachining using a femtosecond laser (800 nm, 130 fs, 1kHz) and galvanometer scanner system (Raylase, Germany). Periodic hole drilling of silicon and glass with the scan speed of 1-20 mm/s is demonstrated. Finally, we demonstrate the utility of the femtosecond laser application to ITO patterning by using a high-speed femtosecond laser scanner system.

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Characteristics of Laser Direct Patterned Indium Tin Oxide Layer by Overlapping Rates of Laser Beam

  • Li, Zhao-Hui;Ahn, Min-Hyung;Choi, Kyung-Min;Im, Seung-Hyeok;Jung, Kyung-Seo;Cho, Eou-Sik;Kwon, Sang-Jik
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1496-1499
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    • 2009
  • A diode-pumped Nd:$YVO_4$ laser was used to obtain indium tin oxide (ITO) patterns on glass substrate with various overlapping rates. The results showed that the overlapping rate of laser beam influences on the edge structure of ITO pattern and the surface roughness of ablated groove bottom. At a laser repetition rate of 40 kHz, the optimized condition of overlapping rate was 75 %.

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식각액에 따른 용융실리카의 레이저 습식 식각 특성 비교 연구 (A Comparative Study on the Influence of Etchant upon the Etching Rate and Quality in Laser Induced Wet Etching of Fused Silica)

  • 이종호;이종길;전병희
    • 소성∙가공
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    • 제13권3호
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    • pp.268-272
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    • 2004
  • Transparent materials such as fused silica are widely utilized in optical and optoelectronics field because of its outstanding properties, such as transparency in a wide wavelength range, strong damage resistance for laser irradiation, and high thermal and chemical stability. In this study, we made a few micro patterns on the surface of fused silica plate using laser induced wet etching. KrF excimer laser was used as a light source. There were no burrs and micro cracks on the etched surface of fused silica and the flatness of the etched surface was fairly good. We investigated the influence of etchant upon the etch rate and quality in laser induced wet etching. Pyrene-acetone solution and toluene were used as etchant. In the side of etch rate, toluene solution was better than pyrene-acetone solution. But we made in wider range of energy density using pyrene-acetone solution. But pyrene-acetone solution gave us wider window of energy density for successful micro patterning.

레이저 직접 묘화법에 의한 알루미나 기판위의 미세 전도성 패턴 제작 (The fabrication of micro- size conductor lines on alumina patterned by laser ablation)

  • 김혜원;이제훈;신동식;강성군
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.1889-1892
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    • 2003
  • The fabrication of micro-size patterning on alumina substrate is generated by laser direct writing, which has high precision and selectivity of various laser beam energies. The depth and width of patterns is affected by laser parameter such as laser power, scan rate. Through the chemical and mechanical polishing Pd seeds was effectively got rid of alumina substrate for selectivity electroless Ni plating. Thermal treatment is good method for changing electrical property of conductor line, because the treatment can control of the grain size.

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전자소자용 Zn 코팅된 프린팅 롤 레이저 미세 패터닝 (Laser micro-patterning of Zn-plated printing roll for electronic devices)

  • 손현기;서정
    • 한국레이저가공학회지
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    • 제13권2호
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    • pp.6-9
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    • 2010
  • In printed electronics, printing rolls are used to transfer electronic ink onto a flexible substrate. Generally printing rolls are being made by the indirect laser method which is based on the etch process, thus not environment-friendly and not suitable for making a large printing roll. For the pursuit of making a large printing roll for mass printing of electronic devices, we have directly engraved micro-patterns into a Zn plated printing roll using a 30W pulse-modulated fiber laser. We have successfully engraved line patterns ranging from about 15-30${\mu}m$ in width.

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플라즈마 디스플레이 패널을 위한 레이저 직접 패터닝 (Laser-Direct Patterning for Plasma Display Panel)

  • 안민영;이경철;이홍규;이천
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.99-102
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    • 1999
  • A mixture which was made from organic gel, glass powder and ceramic powder was masklessly etched for fabrication of barrier rib of PDP(Plasma Display Panel) by focused Ar$^{+}$ laser( λ =514 nm) and Nd:YAG(λ =532, 266 nm) laser irradiation at the atmosphere. The depth of the etched grooves increases with increasing a laser fluence and decreasing a scan speed. Using second harmonic of Nd:YAG laser, the threshold laser fluence was 6.5 mJ/$\textrm{cm}^2$ for the sample of PDP barrier rib softened at 12$0^{\circ}C$. The thickness of 130 ${\mu}{\textrm}{m}$ of the sample on the glass was clearly removed without any damage on the glass substrate by fluence of 19.5 J/$\textrm{cm}^2$....

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