• Title/Summary/Keyword: Laser Direct Patterning

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Auto-focusing laser direct writing system using confocal geometry (공초점 정렬을 이용한 자동초점보정 레이저 직접묘화 시스템)

  • Kim, Yong-Woo;Lee, Jin-Seok;Kim, Kyoung-Sik;Hahn, Jae-Won
    • Proceedings of the Korean Society of Laser Processing Conference
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    • 2006.06a
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    • pp.123-128
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    • 2006
  • We constructed a micro-patterning system that build patterns on a photoresist coated wafer using laser direct writing system. Confocal microscope system was adapted for real-time auto-focusing of the laser writing lens to generate lines of uniform width.

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Laser-Direct Patterning of Nanostructured Metal Thin Films (나노구조 금속 박막의 레이저 직접 패터닝에 관한 연구)

  • Shin, Hyunkwon;Lee, Hyeongjae;Yoo, Hyeonggeun;Lim, Ki-Soo;Lee, Myeongkyu
    • Korean Journal of Metals and Materials
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    • v.48 no.2
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    • pp.163-168
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    • 2010
  • We here describe the laser-direct patterning of nanostructured metal thin films. This method involves light-matter interaction in which a pulsed laser beam impinging on the film generates a thermoelastic force that plays a role to detach the film from the substrate or underlying layers. A moderate cohesion of the nanostructured film enables localized desorption of the material upon irradiation by a spatiallymodulated laser beam, giving good fidelity with the transfered pattern. This photoresist-free process provides a simple high-resolution scheme for patterning metal thin films.

Selective Ablation of Emissive Polymer Using Nanosecond-pulsed Laser (나노초 펄스 레이저를 이용한 발광폴리머 패터닝)

  • Ko, J.S.;Oh, B.K.;Kim, D.Y.;Lee, J.Y.;Lee, S.K.;Jung, S.H.;Hong, S.K.
    • Laser Solutions
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    • v.14 no.3
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    • pp.7-11
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    • 2011
  • As an active emission display using emissive polymer has had much attention recently, needs for a selective patterning of emissive layer for those displays have been increased abruptly. Therefore, the various laser sources in terms of its wavelength has been used for laser direct patterning. In this work, the feasibility of those processes is examined using numerical analysis and the experimental investigation. A sample has multi-layered structure, emissive polymer on aluminum which is deposited on a glass substrate. Key factors for optimizing the laser patterning of the emissive polymer are considered into the control of ablation products, large-sized particle, and the choice of the appropriate wavelength for minimizing the heat affected zone and the remnant layer.

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Laser Microfabrications for Next-Generation Flat Panel Display (레이저를 이용한 차세대 평판 디스플레이 공정)

  • Kim, Kwang-Ryul
    • Korean Journal of Materials Research
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    • v.17 no.7
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    • pp.352-357
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    • 2007
  • Since a pattern defects "repair" system using a diode pumped solid state laser for Flat Panel Display (FPD) was suggested, a lot of laser systems have been explored and developed for mass-production microfabrication process. A maskless lithography system using 405 nm violet laser and Digital Micromirror Device (DMD) has been developed for PDP and Liquid Crystal Display (LCD) Thin Film Transistor (TFT) photolithography process. In addition, a "Laser Direct Patterning" system for Indium Tin Oxide (ITO) for Plasma Display Panel(PDP) has been evaluated one of the best successful examples for laser application system which is applied for mass-production lines. The "heat" and "solvent" free laser microfabrications process will be widely used because the next-generation flat panel displays, Flexible Display and Organic Light Emitting Diode (OLED) should use plastic substrates and organic materials which are very difficult to process using traditional fabrication methods.

Thin Film Micromachining Using Femtosecond Laser Photo Patterning of Organic Self-assembled Monolayers

  • Chang Won-Seok;Choi Moo-Jin;Kim Jae-Gu;Cho Sung-Hak;Whang Kyung-Hyun
    • International Journal of Precision Engineering and Manufacturing
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    • v.7 no.1
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    • pp.13-17
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    • 2006
  • Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.

Micromachining Thin Film Using Femtosecond Laser Photo Patterning Of Organic Self-Assembled Monolayers. (유기 자기조립 단분자막의 레이저 포토 패터닝을 이용한 박막 미세 형상 가공 기술)

  • Choi Moojin;Chang Wonseok;Kim Jaegu;Cho Sunghak;Whang Kyunghyun
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.12
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    • pp.160-166
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    • 2004
  • Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated fer applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecule and bio molecule. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAMs structure formation.

Micromachining Thin Metal Film Using Laser Photo Patterning Of Organic Self-Assembled Monolayers (유기 자기조립 단분자막의 레이저 포토 패터닝을 이용한 금속 박막의 미세 형상 가공 기술)

  • 최무진;장원석;신보성;김재구
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.219-222
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    • 2003
  • Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecular and bio molecular. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance in selective etching of thin metal film of Self- Assembled Monolayers. In this report, we present the micromachining thin metal film by Mask-Less laser patterning of alknanethiolate Self-Assembled Monolayers.

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Numerical Analysis of UV Laser Patterning of Polymeric Thin-Film (자외선 레이저를 이용한 폴리머 박막 가공의 수치해석)

  • Oh, B.K.;Lee, S.K.;Song, M.K.;Kim, J.W.;Hong, S.K.
    • Laser Solutions
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    • v.12 no.4
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    • pp.1-5
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    • 2009
  • Conventional patterning based on wet-process for multi-layered film is a relatively complex and costly process though it is a necessary step for fabrication of TFT-LCD module. Recently, a direct pattering by laser has been studied because it is low cost and simple process compared to the wet process. In this work, the selective removal process of multi-layered film (polyimide/indium tin oxide/glass) is studied by modeling the thermal and mechanical behavior for multi-layered structure. Especially, the effects of thickness of polyimide layer are examined.

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Gravure Halftone Dots by Laser Direct Patterning (레이저 직접 패터닝에 의한 그라비아 망점 형성)

  • Suh, Jeong;Han, You-Hie;Kang, Lae-Heuck
    • Journal of the Korean Society for Precision Engineering
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    • v.17 no.11
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    • pp.191-198
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    • 2000
  • Laser direct patterning of the coated photoresist (PMER-NSG31B) layer was studied to make halftone dots on gravure printing roll. The selective laser hardening of photoresist by Ar-ion laser(wavelength: 333.6~363.8nm) was controlled by the A/O modulator. The coating thickness in the range of 5~11$\mu m$ could be obtained by using the up-down directional moving device along the vertically located roll. The width, thickness and hardness of the hardened lines formed under the laser power of 200~260㎽ and irradiation time of 4.4~6.6 $\mu$sec/point were investigated after developing. The hardened width increased as the coating thickness increased. Though the hardened thickness was changed due to the effect of the developing solution, the hardened layer showed good resistance to the scratching of 2H pencil. Also, the hardened minimum line widths of 10$\mu m$ could be obtained. The change of line width was also found after etching, and the minimum line widths of 6$\mu m$ could be obtained. The hardened lines showed the good resistance to the etching solution. Finally, the experimental data could be applied to make gravure halftone dots using the developed imaging process, successfully.

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