• 제목/요약/키워드: Langmuir films

검색결과 367건 처리시간 0.032초

지방산과 폴리아미드산 혼합물의 광이성질화 현상에 관한 연구 (A Study on the Photoisomerization of Fatty Acid and Polyamic Acid Mixture)

  • 박근호;박태곤
    • 한국전기전자재료학회논문지
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    • 제15권8호
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    • pp.695-701
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    • 2002
  • Maxwell displacement current (MDC) measuring technique has been applied on the study of monolayers of fatty acid and polyamic acid mixture. The displacement current was generated from monolayers on the water surface by monolayer compression and expansion. Displacement current was generated when the area per molecule was about 132 $^2$and 115 $^2$just before the initial rise of the surface pressure during the 1st and 2nd mixed monolayer compressions cycle, respectively. Maxwell displacement currents were investigated in connection with mixed monolayer compression cycles. It was found that the maximum of MDC appeared at the molecular area just before the initial rise of surface pressure in compression cycles. Ultra thin film of fatty acid and polyamic acid mixture was prepared on the hydrophilic quartz plate by Langmuir-Blodgett (LB) method. The precursor LB film was heated in a vacuum dry oven at 12$0^{\circ}C$ in order to convert it into the LB film of polyimide. The absorption spectra of LB films were also induced photoisomerization by UV and visible light irradiation.

플렉서블 디스플레이 적용을 위한 저온 실리콘 질화막의 N2 플라즈마 처리 영향 (Influence of Nitrogen Plasma Treatment on Low Temperature Deposited Silicon Nitride Thin Film for Flexible Display)

  • 김성종;김문근;권광호;김종관
    • 한국전기전자재료학회논문지
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    • 제27권1호
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    • pp.39-44
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    • 2014
  • Silicon nitride thin film deposited with Plasma Enhanced Chemical Vapor Deposition was treated by a nitrogen plasma generated by Inductively Coupled Plasma at room temperature. The treatment was investigated by Fourier Transform Infrared Spectroscopy and Atomic Force Microscopy on the surface at various RF source powers at two RF bias powers. The amount of hydrogen was reduced and the surface roughness of the films was decreased remarkably after the plasma treatment. In order to understand the causes, we analyzed the plasma diagnostics by Optical Emission Spectroscopy and Double Langmuir Probe. Based on these analysis results, we show that the nitrogen plasma treatment was effective in the improving of the properties silicon nitride thin film for flexible display.

Observation of Carrier Multiplication via Internal Quantum Efficiency Exceeding 100% in PbS QDs Monolayer Solar Cells

  • Park, So Yeon;Chung, Hyun Suk;Han, Gill Sang;Su, Jang Ji;Jung, Hyun Suk
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.467.1-467.1
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    • 2014
  • Quantum dots (QD) solar cells has received considerable attention due to their potential of improving the overall conversion efficiency by harvesting excess energy via multiple excitons generation (MEG). Although there have been many reports which show MEG phenomena by using optical measurement of quantum dots themselves, carrier multiplication in real QD photovoltaic devices has been sparsely reported due to difficulty in dissociation of excitons and charge collection. In this reports, heterojunction QD solar cells composed of PbS QD monolayer on highly crystalline $TiO_2$ thin films were fabricated by using Langmuir-Blodgett deposition technique to significantly reduce charge recombination at the interfaces between each QD. The PbS CQDs monolayer was characterized by using UV-vis, transmission electron microscopy (TEM) and atomic force microscopy (AFM). The internal quantum efficiency (IQE) for the monolayer QD solar cells was obtained by measurement of external quantum efficiency and determining light absorption efficiency of active layer. Carrier multiplication was observed by measuring IQE greater than 100% over threshold photon energy. Our findings demonstrate that monolayer QD solar cell structure is potentially capable of realizing highly efficient solar cells based on carrier multiplication.

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ICP를 이용한 Ar/$Cl_2/BCl_3$ 플라즈마에서 PZT 식각 특성 (The etching characteristics of PZT thin films in Ar/$Cl_2/BCl_3$ plasma using ICP)

  • 안태현;김경태;이영희;서용진;김창일;장의구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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    • pp.848-850
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    • 1999
  • In this study, PZT etching was performed using planar inductively coupled Ar(20)/$Cl_2/BCl_3$ plasma, The etch rate of PZT film was 2450 $\AA/min$ at Ar(20)/$BCl_3$(80) gas mixing ratio and substrate temperature of $80^{\circ}C$. X-ray photoelectron spectroscopy (XPS) analysis for film composition was utilized. The chemical bond of PbO is broken by ion bombardment, and the peak of metal Pb in a Pb 4f peak begins to appear upon etching, decreasing Pb content faster than Zr and Ti. As increase content of additive $BCl_3$, the relative content of oxygen decreases rapidly. We thought that abundant Band BCl radicals made volatile oxy-compound such as $B_{x}O_{y}$ and/or $BClO_x$ bond. To understand etching mechanism, Langmuir probe and optical emission spectroscopy (OES) analysis were utilized for plasma diagnostic.

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IMI-O 고분자 LB막의 제작 및 전기적 특성 (Fabrication and Electrical Properties of IMI-O Polymer LB Films)

  • 정상범;유승엽;박재철;권영수
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제49권2호
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    • pp.87-91
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    • 2000
  • Metal ion complex of poly(N-(2,4-imidazoly)ethyl)maleimide-alt-l-octadecene (IMO-O) polymer used to confirm the possibility of molecular device made by Langmuir-Blodgett(LB) method. Electrical properties of the metal ion complex LB film were investigated using Metal/Insulator/Metal(MIM) structure. In the surface pressure-area($\pi$-A) isotherm of IMI-O polymer, the surface pressure at collapse point has a difference due to the interaction between polymer and metal ions. And the complex between polymer and metal ions could be verified through the investigation by Raman spectroscopy. In the current-voltage(I-V) property, the conductivity change of IMO-O polymer complexes due to the kinds of metal of metal ions couldn't be observed. However, the limiting area of molecules was changed by the concentration of the metal ions and the conductivity was increased with the occupied molecular area.

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Modulated Sputtering System (MSS)의 특성 분석 및 박막 증착

  • 김대철;김태환;김용현;한승희;김영우
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.488-488
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    • 2013
  • 일반적으로 sputtering 방식을 이용한 박막 증착 방법은 장치가 간단하고 고품질의 박막이나 균일한 박막을 만들 수 있는 장점이 있어 널리 사용된다. 본 연구에서는 기존의 sputtering 방식에 Modulation technology를 적용하고자 한다. Modulation technology를 이용하여 전원의 pulse on 시에는 일반적인 sputter 방식으로 기판에 박막을 증착하고 pulse off 시에는 양의 전압을 인가하여 이온빔을 발생시킨 후 기판에 입사시키는 방식을 적용하여 박막 형성의 특성을 향상시키고자한다. 이는 고온의 heater 및 이온빔이나 레이저, 플라즈마 소스 등의 추가적인 에너지원의 장치가 필요 없이 고품질의 박막의 특성을 향상시키는 기대 효과가 있다. Modulated Sputtering System (MSS)에 인가되는 전압과 전류의 특성을 관찰하였으며 MSS에 인가하는 전압과 frequency, 그리고 duty cycle 변화에 따른 이온 에너지 분포를 에너지 분석기를 통해 측정하였다. 또한 Langmuir probe를 이용한 afterglow plasma 상태에서의 이온전류를 측정하였다. 그리고, MSS 이용하여 Ti 박막을 증착하였으며 박막의 특성을 분석하기 위하여 a-step, SEM, XRD, AFM을 이용하여 두께, 결정성장면, 표면 거칠기를 측정하였다. 측정 결과 기판에 입사되는 양이온의 에너지가 증가함에 따라 (002) 결정면 방향에서 (100) 결정면 방향으로 증착되고 표면 거칠기가 낮아짐을 측정하였다. 또한 Graphite 타겟을 이용한 carbon 박막을 증착하였으며 박막의 특성을 분석하기 위하여 Raman을 이용한 분석 결과 양이온의 에너지가 증가함에 따라 박막내의 sp3 함유량이 변화함을 측정하였다.

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$BCl_3$/He 플라즈마를 이용한 $Al_2O_3$ 박막 식각특성 연구 (Etching Characteristics of $Al_2O_3$ film Using $BCl_3$/He Plasma)

  • 이현우;윤선진;김만수;권광호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.188-189
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    • 2007
  • The etching characteristics of $Al_2O_3$ films using the inductively coupled plasma (ICP) was investigated. The etch gas was the mixture of $BCl_3$ and He. The effect of ICP source and bias powers on etch rate and etch selectivity to polycrystalline Si was investigated in the etch process of $Al_2O_3$. The etch rate of $Al_2O_3$ film was 23nm/min when the source power and bias power were 600W and 60W, respectively. The results also indicated that the etch selectivity to polycrystalline Si could not be enhanced to be higher than 1.0 by changing the ICP source power and bias power, under the experimental conditions used in the present work. Based on plasma parameters extracted from Langmuir probe data, the etching mechanism of $Al_2O_3$ film was discussed in detail.

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고분자 LB막의 누적 특성 평가 (Evaluation of the characteristics of polymer LB multi-layer)

  • 김기영;김철홍;신훈규;장상목;권영수;이범종
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1993년도 하계학술대회 논문집 B
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    • pp.1203-1205
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    • 1993
  • The use of preformed polymers and their cross-linking have been attempted in order to improve the intrinsic fragility of monolayers and Langmuir-Blodgett(LB) films. The evaluation of the characteristics of LB multi-layer by using AT-cut quartz crystal have been also attempted. From this study, it reveals that the polyether pendants of 2C18VE3 lie at the air-water interface at low surface pressures and are forced down into the subphase when the monolayers are compressed. This caracteristic behavoir of the pendant polyethers is much clear on aqueous PAA and also observed on saturated aqueous NaCl. And the characteristics of LB multi-layers could be evaluated by using AT-cut quartz crystal in situ.

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$Poly-\gamma-Benzyl\;_L-Glutamate$ 유기초박막의 정전용량특성 (Capacitance Properties of $Poly-\gamma-Benzyl\;_L-Glutamate$ in Organic Ultra Thin Films)

  • 김병근;김창복;김영근;최영일;이경섭
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2002년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.147-149
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    • 2002
  • Recently, the study on development of electrical and electronic device is done to set miniature, high degrees of integration and efficiency by using inorganic materials the study of Langmuir-Boldgett(LB) method that uses organic materials because of the limitation for the ultrasmall size. The structure of MIM(Metal-Insulator-Metal) device is Cr-Au/PBLG/ Al. the number of accumulated layers are 1, 3, 5, 7, 9. The I-V characteristic of the device is measured from 0[V] to 2[V] and the characteristic of current-time of the devices. We have investigated the capacitance because PBLG system have a accumulated layers the maximum value of measured current is increased as the number of accumulated layers are decreased. The capacitor properties of a thin film is better as the distance between electrodes is smaller. The results have shown the insulating materials and could control the conductivity by accumulated layers.

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ECR-PECVD 장치의 제작과 특성 (Manufacturing and characterization of ECR-PECVD system)

  • 손영호;정우철;정재인;박노길;황도원;김인수;배인호
    • 한국진공학회지
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    • 제9권1호
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    • pp.7-15
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    • 2000
  • An ECR-PECVD system with the characteristics of high ionization rat다 ability of plasma processing in a wide pressure range and deposition at low temperature was manufactured and characterized for the deposition of thin films. The system consists of a vacuum chamber, sample stage, vacuum gauge, vacuum pump, gas injection part, vacuum sealing valve, ECR source and a control part. The control of system is carried out by the microprocessor and the ROM program. We have investigated the vacuum characteristics of ECR-PECVD system, and also have diagnosed the characteristics of ECR microwave plasma by using the Langmuir probe. From the data of system and plasma characterization, we could confirmed the stability of pressure in the vacuum chamber according to the variation of gas flow rate and the effect of ion bombardment by the negative DC self bias voltage. The plasma density was increased with the increase of gas flow rate and ECR power. On the other hand, it was decreased with the increase of horizontal radius and distance between ECR source and probe. The calculated plasma densities were in the range of 49.7\times10^{11}\sim3.7\times10^{12}\textrm{cm}^{-3}$. It is also expected that we can estimate the thickness uniformity of film fabricated by the ECR-PECVD system from the distribution of the plasma density.

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