Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1999.11d
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- Pages.848-850
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- 1999
The etching characteristics of PZT thin films in Ar/$Cl_2/BCl_3$ plasma using ICP
ICP를 이용한 Ar/$Cl_2/BCl_3$ 플라즈마에서 PZT 식각 특성
- An, Tae-Hyun (Dept. of Electrical Eng., Chungang Univ.) ;
- Kim, Kyoung-Tae (Dept. of Electronic Materials Eng., Kwangwoon Univ.) ;
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Lee, Young-Hie
(Dept. of Electronic Materials Eng., Kwangwoon Univ.) ;
- Seo, Yong-Jin (School of Electrical and Electronic Eng., Daebul Univ.) ;
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Kim, Chang-Il
(Dept. of Electrical Eng., Chungang Univ.) ;
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Chang, Eui-Goo
(Dept. of Electrical Eng., Chungang Univ.)
- 안태현 (중앙대학교 전기공학과) ;
- 김경태 (광운대학교 전자재료공학과) ;
-
이영희
(광운대학교 전자재료공학과) ;
- 서용진 (대불대학교 전기전자공학부) ;
-
김창일
(중앙대학교 전기공학과) ;
-
장의구
(중앙대학교 전기공학과)
- Published : 1999.11.20
Abstract
In this study, PZT etching was performed using planar inductively coupled Ar(20)/
Keywords