• Title/Summary/Keyword: KrF lithography

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Fabrication optimization of Fiber Bragg gratings (광섬유 브래그 격자(Fiber Bragg grating) 제작과 제작 조건에 따른 특성 향상)

  • Choi, Bo-Hun
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.14 no.7
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    • pp.1680-1686
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    • 2010
  • Optical fiber Bragg grating to have the lowest transmitivity at 1549.9nm wavelength was fabricated using a Gaussian distributed KrF Eximer laser of 248nm lasing wavelength and a phase mask of 1.072um period. The proper alignment of an optic setup to fabricate fiber gratings was investigated and the reproductivity of the grating fabrication was examined using the obtained optimum fabrication condition in this experiment.

The excimer laser ablation of PET for nickel electroforming (니켈 전주도금을 위한 PET의 엑시머 레이저 어블레이션)

  • Shin, Dong-Sik;Lee, Je-Hoon;Seo, Jung;Kim, Do-Hoon
    • Laser Solutions
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    • v.6 no.2
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    • pp.35-41
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    • 2003
  • In this study, manufacturing of polymer master and mold insert for micro injection molding was investigated. Ablation by excimer laser radiation could be used successfully to make 3-D microstructure of PET. The mechanism for ablative decomposition of PET with KrF excimer laser(λ: 248nm, pulse duration: 5ns) was explained by photochemical process. And this process showed PET to be adopted in polymer master for nickel mold insert. Nickel electroforming by using laser ablated PET master was preferable for replication method. Finally, it was shown that excimer laser ablation can substitute for X-ray lithography of LIGA process in microstructuring.

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Fabrication of Two-dimensional Photonic Crystal by Roll-to-Roll Nanoreplication (롤투롤 나노 복제 공정을 이용한 이차원 광결정 소자의 제작)

  • Kim, Young-Kyu;Byeon, Euihyeon;Jang, Ho-Young;Kim, Seok-Min
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.12 no.5
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    • pp.16-22
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    • 2013
  • A two-dimensional photonic crystal structure was investigated using a roll-to-roll nanoreplication and physical vapor deposition processes for the inexpensive enhanced fluorescence substrate which is not sensitive to the polarization directions of excitation light source. An 8 inch silicon master having nano dot array with a diameter of 200 nm, a height of 100 nm and a pitch of 400 nm was prepared by KrF laser scanning lithography and reactive ion etching processes. A flexible polymer mold was fabricated by flat type UV replication process and a deposition of 10 nm nickel layer as an anti-adhesion layer. A roll mold was prepared by warping the flexible polymer mold on an aluminum roll base and a roll-to-roll UV replication process was carried out using the roll mold. After the deposition of ~ 100 nm $TiO_2$ layer on the replicated nano dot array, a 2 dimensional photonic crystal structure was realized with a resonance wavelength of 635 nm for both p- and s-polarized light sources.

Deep UV 마이크로 리소그라피를 위한 새로운 4-반사경 광학계에 관한 수차해석

  • 김종태;이상수
    • Korean Journal of Optics and Photonics
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    • v.4 no.1
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    • pp.1-8
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    • 1993
  • A design of four-mirror optical system with reduction magnification 5X for deep UV ($\lambda$=248 nm of KrF excimer laser) submicron lithography is presented. Initially by using the paraxial quantities, the domain of solution for $t=d_1+d_2+d_3$<0 (d;: distance between the mirror $c_i$ and $c_{i+1}$ is found for the system which is free from the four off-axial Seidel first order aberrations that are coma, astigmatism, field curvature, and distortion. The solution with $d_5$=2.95 (normalized with respect to $c_i$= -1) is choosen and the aspherization is carried out to the spherical mirror surfaces ($c_3$ and $c_4$ in order to reduce the axial and residual off-axial higher order aberrations. The numerical aperture of the final system is as large as 0.4, which gives Rayleigh resolution of 0.38 $\mu\textrm{m}$.

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