• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.11
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• pp.901-907
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• 2000

As the minimum feature size for making ULSI approaches the wavelength of light source in optical lithography, the aerial image is so hardly distorted because of the optical proximity effect that the accurate mask image reconstruction on wafer surface is almost impossible. We applied the Optical Proximity Correction(OPC) on isolated patterns assuming Attenuated Phase Shift Mask(APSM) as well as binary mask, to correct the widening of isolated patterns. In this study, we found that applying OPC to APSM shows much better improvement not only in enhancing the resolution and fidelity of t도 images but also in enhancing the process margin than applying OPC to the binary mask. Also, we propose the OPC method of APSM for isolated patterns, the size of which is less than the wavelength of the ArF excimer laser. Finally, we predicted the resolution limit of optical lithography through the aerial image simulation.

• (The) Research of the performance art and culture
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• no.40
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• pp.163-192
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• 2020

Sinjungsin Mask Play, one of Ttangseolbeop, is related to Seongjusin's life story. Sinjungsin Mask Play is a reconstruction of the story of the folk gods Seongjusin met while returning home. Seongjusin's life story proceeds in the form of Mask Play, and the monk who leads the sermon plays narration and main roles. Many believers play various roles and musicians. Sinjungsin Mask Play introduces many folk beliefs, sounds for intrigue, and talks. Sinjungsin Mask Play uses the same method of enumeration and repetition as the existing Mask Play. The repetition of a sentence or phrase plays a role in foreseeing the meaning of the context or foretelling the development of the plot to the audience. This repetition is intended to emphasize the situation of the scene and to create rhythm. Since Mask Play was exclusively for the common people, Mask Play actors use the repeating method commonly used in folk songs to form lines. This gives the audience a familiarity, effectively communicating the lines and responding to their tastes. Sinjungsin Mask Play borrowed people's way of playing for the public's mission. It inherits the dramatic forms of traditional traditional plays such as repetition of words or sentences or phrases, codification of words or sentences, borrowing of existing songs, and formal expression units. In addition, through repeated performances, believers can easily and easily learn and understand. This is the dramatic form and characteristics of Sinjungsin Mask Play. Sinjungsin Mask Play was handed down from Faith Communities and was used as a means of folk cultivation to spread illegality. Buddhism externalizes the process of accepting folk beliefs through Mask Play, and in the case of Shinto who participated directly or indirectly, they naturally acquire the belief system of Hwaeom Kyung through play. Sinjungsin Mask Play, one of Ttangseolbeop, can be said to have great value as an ICH, as well as popularization and mission.

• Archives of Plastic Surgery
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• v.33 no.2
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• pp.168-174
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• 2006

For over two thousand years, many artists and scientists have tried to understand or quantify the form of the perfect, ideal, or the most beautiful face both in art and in vivo(life). However, this mathematical relationship has been consistently and repeatedly reported to be present in beautiful things. This particular relationship is referred to as the golden ratio. It is a mathematical ratio of 1.618 : 1 that seems to appear recurrently in beautiful things in nature as well as in other things that are seen as beautiful. Dr. Marquardt made the facial golden mask that contains and includes all of the 1-dimensional and 2-dimensional geometric golden element formed from the golden ratio. The purpose of this study is to evaluate the usefulness of the golden facial mask. In our cases(n=40), the authors applied the facial golden mask to the preoperative and postoperative photographs, and scored each photograph. Compared with the average scores of the facial mask applied photographs and none applied photographs using non-parametric test, statistical significance was not checked (p > 0.05). It means that the facial golden mask can be used for facial analysis. The facial golden mask is easy to apply, cheap and relatively objective. So, the authors introduce the one of useful facial analyses.

• Applied Science and Convergence Technology
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• v.27 no.4
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• pp.70-74
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• 2018

We fabricated an anode-type ion source driven by a charge repulsion mechanism and investigated its beam shape controlled by a Whenelt mask integrated at the front face of the source. The ion beam shape was observed to vary by changing the geometry of the Whenelt mask. As the angle of inclination of the Whenelt mask was varied from $40^{\circ}$ to $60^{\circ}$, the etched area at a thin film was reduced from 20 mm to 7.5 mm at the working distance of 286 mm, and the light transmittance through the etched surface was increased from 78% to 80%, respectively. In addition, for the step height difference, ${\Delta}$ between the inner mask and the outer mask of ${\Delta}=0$, -1 mm, and +1 mm, we observed the ion beam shape was formed to be collimated, diverged, and focused, respectively. The focal length of the focused beam was 269 mm. We approved experimentally a simple way of controlling the electric field of the ion beam by changing the geometry of the Whenelt mask such that the initial direction of the ion beam in the plasma region was manipulated effectively.

• Journal of Fashion Business
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• v.19 no.5
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• pp.63-76
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• 2015

The purpose of this study was to design a training program for utilization of 3D special makeup mask program. This study was conducted with a 3D computer graphics software program, for special makeup mask using a variety of creative educational models and case study with comparative analysis. The makeup program applied to the majors and liberal arts classes for program design. Inthis study, the selected major courses included ' stage make up ', make up application', and illustrations and color '. Students were required to take a class targeted to questionnaire completion and analysis. The research method included literature search, and Internet navigation, of experimental research. The research targeted select college students attending a 4-year university located in Dae-jeon, Korea. ETRI's "3D mask special makeup simulation program" was used in support. A survey of the study conducted from September 1, 2013, to August 30, 2014, showed a total of 94 additional statistical analyses. First, grade 3 44.6% was attained by 91.7% of the first year student majoring in liberal arts classes, Second, students' in the 3D special dress up mask program Interestingly, attained high recognition in its mastering, usability, and creativity. Furthermore, the major student satisfaction was higher for the '3D special makeup mask program. Third, students '3D special dress up was one of the biggest advantages of the program', the mask ' that models 3D ' faces. In addition, the student's delicate dress called for critical technology skills. It is thought to be suitable for practical training and improving the efficiency and performance if applied to universities and beauty schools, such as the regular high school curriculum through research.

• Particle and aerosol research
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• v.15 no.4
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• pp.191-202
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• 2019

In this study, performance (particle removal efficiency and breathing resistance) of several commercially available face masks (electrostatic filter masks (KF80 certified), a nanofiber filter mask (KF80 certified), and an uncertified mask) with their filter structure and composition were evaluated. Also, effects of relative humidity (RH) of incoming air, water and alcohol exposure, and reusability on performance of face masks were examined. Monodisperse and polydisperse sodium chloride particles were used as test aerosols. Except the uncertified mask filter, PM_2.5 removal efficiency was found to be higher than 90%, and the nanofiber filter mask had the highest quality factor due to the low pressure drop and high removal efficiency (nanofibers were arranged in a densely packed pore structure and contained a significant amount of fluorine in addition to carbon and oxygen). In the case of the KF80 certified mask, the removal efficiency was little affected when the RH of incoming air increased. When the mask filters were soaked in water, the removal efficiency of mask filters was degraded. In particular, the uncertified mask filter showed the highest removal efficiency degradation (26%). When the mask was soaked in alcohol, the removal efficiency also decreased with the greater degree than the water soaking case. The nanofiber mask filter showed the strongest resistance to alcohol exposure among tested mask filters. During evaluation of reusability of masks in real life, the removal efficiency of certified mask filter was less than 4% for 5 consecutive days (2 hours per day), while the removal efficiency of uncertified mask filter significantly decreased by 30% after 5 days.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.26 no.11
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• pp.2297-2304
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• 2002

Two-dimensional and three-dimensional finite element methods have been used to analyze the deformation behavior of a shadow mask due to thermal and tension load. The shadow mask inside the Braun tube of a TV set has numerous slits through which the electron beams are guided to land on the designed phosphor of red, green or blue. Its thermal deformation therefore causes landing shift of the electron beam and results in decolorization of a screen. For the realistic finite element analysis, the effective thermal conductivity and the effective elastic modulus arc calculated, and then the shadow mask is modeled as shell without slits. Next a transient thermal analysis of the shadow mask is performed, wherein thermal radiation is a major heat transfer mechanism. Analysis of the resulting thermal deformation is followed, from which the landing shift of the electron beam is obtained. The present finite element scheme may be efficiently used to reduce thermal deformation of a shadow mask and in developing prototypes of a large screen flat TV.

• Journal of the Korean Society of Costume
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• v.58 no.4
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• pp.13-25
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• 2008

This study is on the various style and characteristics of mask, and was performed empirically by reviewing the related materials such as the literature, precedent studies, fashion works, and home and foreign fashion magazines. As a result of the study, the style of mask in the modern fashion is roughly categorized by full-covered style, half-covered style, and over-half-covered style which is covered over 50% of a face. And, mask is utilized on a hat or a dress all over, or is produced by a elaborate makeup. Mask with lots of variation has three big characteristics, which are sense of disguise, sense of ornamentation, sense of grotesquery. First, sense of disguise means deviation or tool of affectation instead of cultural standard norm through transforming or masquerading as an imagery person or animal in ancient myths, famous artistes, etc. It could be developed to express a designer's identity. Second, mask decorated with various styles and materials has sense of ornamentation, which means natural human desire of expression for beauty, and at the same time human mind longing for experience a fantastic and ideal inner world being deviated from the present world even indirectly. Third, ignoring the original format of eyes, nose, and mouth, using extraordinarily various techniques such as distortion, extreme, exaggeration, concealment, or combining with animal images, mask has sense of grotesquery inducing humor and horror simultaneously.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.10
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• pp.945-949
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• 2005

We have grown GaN layers with in-situ SiN mask by metal organic chemical vapor deposition (MOCVD) and study the physical properties of the GaN layer. We have also fabricate PN junction light emitting diode (LED) to investigate the effect of the SiN mask on its optical property By inserting a SiN mask, (102) the full width at half maximum (FWHM) decreased from 480 arcsec to 409 arcsec and threading dislocation (TD) density decreased from $3.21{\times}10^9\;cm^{-2}$ to $9.7{\times}10^8\;cm^{-2}$. The output power of the LED with a SiN mask increased from 198 mcd to 392 mcd at 20 mA. We have thus shown that the SiN mask improved significantly the physical and optical properties of the GaN layer.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.23 no.5
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• pp.353-357
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• 2010

Recently, silicon etching have received much attention for display industry, nano imprint technology, silicon photonics, and MEMS application. After the etching process, removing of etch mask and residue of sidewall is very important. The investigation of the etched mask removing was carried out by using the ashing, HF dipping and acid cleaning process. Experiment shows that oxygen component of reactive gas and photoresist react with silicon and converting them into the mask fence. It is very difficult to remove by using ashing or acid cleaning process because mask fence consisted of Si and O compounds. However, dilute HF dipping is very effective process for SiOx layer removing. Finally, we found optimized condition for etched mask removing.