• Title/Summary/Keyword: Junction device

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A Study on the Channeling Effect of Ultra Low Energy B, P and As Ion Implant to Form Ultra-Shallow Junction of Semiconductor Device (초미세 접합형성을 위한 극 저 에너지 B, P 및 As 이온주입시 채널링 현상에 관한연구)

  • 강정원;황호정
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.3
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    • pp.27-33
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    • 1999
  • We have investigated the ultra-low energy B, P, and As ion implantation using upgraded MDRANGE code to study formation of nanometer junction depths. Even at the ultra-low energies simulated in this paper, it was revealed that ion channeling should be carefully considered. It was estimated that ion channelings have much effect on dopant profiles when B ion implant energies were more than 500 eV, P more than 2 keV and As approximately more than 4 keV. When we compared 2-dimensional dopant profiles of 1 keV B with that of tilted one, 2 keV P with tilt, and 5 keV As with tilt, we could find that most channeling cases occurred not lateral directions but depth directions.

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Development of low cost and high efficiency silicon thin-film and a-Si:H/c-Si hetero-junction solar cells using low temperature silicon thin-films (고품질 실리콘 박막을 이용한 저가 고효율 실리콘 박막 및 a-Si:H/c-Si 이종접합 태양전지 개발)

  • Lee, Jeong-Chul;Lim, Chung-Hyun;Ahn, Sae-Jin;Yun, Jae-Ho;Kim, Seok-Ki;Kim, Dong-Seop;Yang, Sumi;Kang, Hee-Bok;Lee, Bo-young;Yi, Junsij;Son, Jinsoo;Yoon, Kyung-Hoon
    • 한국신재생에너지학회:학술대회논문집
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    • 2005.06a
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    • pp.113-116
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    • 2005
  • In this paper, silicon thin-film solar cells(Si- TFSC) and a-Si/c-Si heterojunction solar cells(HJ-cell) are investigated. The Si-TFSC was prepared on glass substrate by depositing $1-3{\mu}m$ thin-film silicons by glow discharge method. The $a-Si:H/{\mu}c-Si:H$ tandem solar cells on textured ZnO:A1 TCO (transparent conducting oxide) showed improved Jsc in top and bottom cells than that on $SnO_2:F$ TCO. This enhancement of jsc resulted from improved light trapping effect by front textured ZnO:A1. The a-Si/c-Si HJ-cells with simple structure without high efficiency features are suffering from low Voc and Jsc. The improvement of front nip and back interface properties by adopting high quality silicon-films at low temperature should be done both for increasing device performances and production cost.

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Degradation of the SiGe hetero-junction bipolar transistor in SiGe BiCMOS process (실리콘-게르마늄 바이시모스 공정에서의 실리콘-게르마늄 이종접합 바이폴라 트랜지스터 열화 현상)

  • Kim Sang-Hoon;Lee Seung-Yun;Park Chan-Woo;Kang Jin-Young
    • Journal of the Korean Vacuum Society
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    • v.14 no.1
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    • pp.29-34
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    • 2005
  • The degradation of the SiGe hetero-junction bipolar transistor(HBT) properties in SiGe BiCMOS process was investigated in this paper. The SiGe HBT prepaired by SiGe BiCMOS process, unlike the conventional one, showed the degraded DC characteristics such as the decreased Early voltage, the decreased collector-emitter breakdown voltage, and the highly increased base leakage current. Also, the cutoff frequency(f/sub T/) and the maximum oscillation frequency(f/sub max/) representing the AC characteristics are reduced to below 50%. These deteriorations are originated from the change of the locations of emitter-base and collector-base junctions, which is induced by the variation of the doping profile of boron in the SiGe base due to the high-temperature source-drain annealing. In the result, the junctions pushed out of SiGe region caused the parastic barrier formation and the current gain decrease on the SiGe HBT device.

The Design and Implementation of SSPA(Solid State Power Amplifier) using chip device (Chip소자를 이용한 SSPA 설계 및 제작에 관한 연구)

  • Kim Yong-Hwan;Min Jun-ki;Kim HyunJin;Yoo Hyeong-soo;Lee Hyeong-kyu;Hong Ui-seok
    • The Journal of The Korea Institute of Intelligent Transport Systems
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    • v.2 no.2 s.3
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    • pp.65-72
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    • 2003
  • In this work a 6-stage hybrid power amplifier which can be used for the wireless communication systems for MMC(hficrowave Micro Cell) and ITS wireless communication system is designed and fabricated. Ihe power amplifier's each stages was fabricated Hetero-junction Power FET of bare chip type and an alumina substrate with $\varepsilon_{r}$=9.9 and 15-mil thickness. The measured results of power amplifier module showed 33.2$\~$36.5 dB small signal gain, 33.0$\~$34.0 dBm output power at forward frequency (17.6 GHa $\~$ 17.9 CHz) and 36.0$\~$37.0 dB small signal gain, 33.0$\~$34.5 dBm output power at reverse frequency (19.0 GHz $\~$19.2GHz).

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The Influence of $O_2$ Gas on the Etch Characteristics of FePt Thin Films in $CH_4/O_2/Ar$ gas

  • Lee, Il-Hoon;Lee, Tea-Young;Chung, Chee-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.408-408
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    • 2012
  • It is well known that magnetic random access memory (MRAM) is nonvolatile memory devices using ferromagnetic materials. MRAM has the merits such as fast access time, unlimited read/write endurance and nonvolatility. Although DRAM has many advantages containing high storage density, fast access time and low power consumption, it becomes volatile when the power is turned off. Owing to the attractive advantages of MRAM, MRAM is being spotlighted as an alternative device in the future. MRAM consists of magnetic tunnel junction (MTJ) stack and complementary metal- oxide semiconductor (CMOS). MTJ stacks are composed of various magnetic materials. FePt thin films are used as a pinned layer of MTJ stack. Up to date, an inductively coupled plasma reactive ion etching (ICPRIE) method of MTJ stacks showed better results in terms of etch rate and etch profile than any other methods such as ion milling, chemical assisted ion etching (CAIE), reactive ion etching (RIE). In order to improve etch profiles without redepositon, a better etching process of MTJ stack needs to be developed by using different etch gases and etch parameters. In this research, influences of $O_2$ gas on the etching characteristics of FePt thin films were investigated. FePt thin films were etched using ICPRIE in $CH_4/O_2/Ar$ gas mix. The etch rate and the etch selectivity were investigated in various $O_2$ concentrations. The etch profiles were studied in varying etch parameters such as coil rf power, dc-bias voltage, and gas pressure. TiN was employed as a hard mask. For observation etch profiles, field emission scanning electron microscopy (FESEM) was used.

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Thermal Analysis and Design of AlGaInP-based Light Emitting Diode Arrays

  • Ban, Zhang;Liang, Zhongzhu;Liang, Jingqiu;Wang, Weibiao;JinguangLv, JinguangLv;Qin, Yuxin
    • Current Optics and Photonics
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    • v.1 no.2
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    • pp.143-149
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    • 2017
  • LED arrays with pixel numbers of $3{\times}3$, $4{\times}4$, and $5{\times}5$ have been studied in this paper in order to enhance the optical output power and decrease heat dissipation of an AlGaInP-based light emitting diode display device (pixel size of $280{\times}280{\mu}m$) fabricated by micro-opto-electro-mechanical systems. Simulation results showed that the thermal resistances of the $3{\times}3$, $4{\times}4$, $5{\times}5$ arrays were $52^{\circ}C/W$, $69.7^{\circ}C/W$, and $84.3^{\circ}C/W$. The junction temperature was calculated by the peak wavelength shift method, which showed that the maximum value appears at the center pixel due to thermal crosstalk from neighboring pixels. The central temperature would be minimized with $40{\mu}m$ pixel pitch and $150{\mu}m$ substrate thickness as calculated by thermal modeling using finite element analysis. The modeling can be used to optimize parameters of highly integrated AlGaInP-based LED arrays fabricated by micro-opto-electro-mechanical systems technology.

Fabrication and Characteristic of C-doped Base AlGaAs/GaAs HBT using Carbontetrachloride $CCI_4$ ($CCI_4$ 를 사용하여 베이스를 탄소도핑한 AlGaAs/GaAs HBT의 제작 및 특성)

  • 손정환;김동욱;홍성철;권영세
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.30A no.12
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    • pp.51-59
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    • 1993
  • A 4${\times}10^{19}cm^{3}$ carbon-doped base AlGaAs/GaAs HBY was grown using carbontetracholoride(CCl$_4$) by atmospheric pressure MOCVD. Abruptness of emitter-base junction was characterized by SIMS(secondary ion mass spectorscopy) and the doping concentration of base layer was confirmed by DXRD(double crystal X-ray diffractometry). Mesa-type HBTs were fabricated using wet etching and lift-off technique. The base sheet resistance of R$_{sheet}$=550${\Omega}$/square was measured using TLM(transmission line model) method. The fabricated transistor achieved a collector-base junction breakdown voltage of BV$_{CBO}$=25V and a critical collector current density of J$_{O}$=40kA/cm$^2$ at V$_{CE}$=2V. The 50$\times$100$\mu$$^2$ emitter transistor showed a common emitter DC current gain of h$_{FE}$=30 at a collector current density of JS1CT=5kA/cm$^2$ and a base current ideality factor of ηS1EBT=1.4. The high frequency characterization of 5$\times$50$\mu$m$^2$ emitter transistor was carried out by on-wafer S-parameter measurement at 0.1~18.1GHz. Current gain cutoff frequency of f$_{T}$=27GHz and maximum oscillation frequency of f$_{max}$=16GHz were obtained from the measured Sparameter and device parameters of small-signal lumped-element equivalent network were extracted using Libra software. The fabricated HBT was proved to be useful to high speed and power spplications.

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Comparison of Efficiency for Voltage Source and Current Source Based Converters in 5MW PMSG Wind Turbine Systems (전압형 및 전류형 컨버터를 적용한 5MW PMSG 풍력발전시스템의 효율 비교)

  • Kang, Tahyun;Kang, Taewon;Chae, Beomseok;Lee, Kihyun;Suh, Yongsug
    • The Transactions of the Korean Institute of Power Electronics
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    • v.20 no.5
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    • pp.410-420
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    • 2015
  • This paper provides a comparison of power converter loss and thermal description for voltage source and current source type 5 MW-class medium-voltage topologies of wind turbines. Neutral-point clamped three-level converter is adopted for a voltage source type topology, whereas a two-level converter is employed for current source type topology, considering the popularity in the industry. To match the required voltage level of 4160 V with the same switching device of IGCT as in the voltage source converter, two active switches are connected in series for the case of current source converter. Transient thermal modeling of a four-layer Foster network for heat transfer is done to better estimate the transient junction and case temperature of power semiconductors during various operating conditions in wind turbines. The loss analysis is confirmed through PLECS simulations. Comparison result shows that the VSC-based wind turbine system has higher efficiency than the CSC under the rated operating conditions.

Low Oxygen Pressure Growth and its Effects on Physical Properties of La0.7Ca0.3MnO3 Thin Films and Characteristics of P-N Junction in Heterostructure (La0.7Ca0.3MnO3 박막의 저산소압 증착과 물리적 특성의 영향 및 이종접합구조에서의 P-N 접합 특성)

  • Song, J.H.
    • Journal of the Korean Magnetics Society
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    • v.19 no.3
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    • pp.94-99
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    • 2009
  • We have studied the effects of oxygen partial pressure change on the physical properties of the $La_{0.7}Ca_{0.3}MnO_3$ thin films grown by Pulsed laser Deposition. Contrary to the previous reports, thin films of high curie temperature were successfully synthesized at very low oxygen partial pressure ($1.0{\times}10^{-5}$, $1.0{\times}10^{-6}Torr$). These observations indicate that the shape of plasma plume and the kinetic energy of the ablated species in it play an important role in determining the quality of samples. We also fabricated p-n heterojunction of $La_{0.7}Ca_{0.3}MnO_3$ and Nb-doped $SrTiO_3$. The current-voltage curves show rectifying behavior and, furthermore, the current responses to the applied magnetic field, indicating a potential possibility of device applications.

Reliability Analysis in PtSi-nSi Devices with Concentration Variations of Junction Parts (접합 부분의 농도 변화를 갖는 PtSi-nSi 소자에서 신뢰성 분석)

  • 이용재
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.3 no.1
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    • pp.229-234
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    • 1999
  • We analyzed the reliability characteristics in platinum schottky diodes with variations of n-type silicon substrates concentrations and temperature variations of measurements. The parameters of reliability measurement analysis are saturation current. turn-on voltage and ideality factor in the forward bias, the breakdown voltage in the reverse bias with device shapes. The shape of devices are square type and long rectangular type for edge effect. As a result, we analyzed that the forward turn-on voltage, barrier height, dynamic resistance and reverse breakdown voltage were decreased but ideality factor and saturation current were increased by increased concentration in platinum and n-silicon junction parts. In measurement temperature(RT, $50^{\circ}C$, $75^{\circ}C$), the extracted electrical parameter values of reliability characteristics were increased at the higher temperature under the forward and reverse bias. The long rectangular type devices were more decreased than the square type in reverse breakdown voltage by tunneling effects of edge part.

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