• Title/Summary/Keyword: Ion mixing

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Single Crystal Growth of Synthetic Emerald by Reflux Method of Temperature Gradient used Natural Beryl (천연베릴을 이용한 온도구배 환류법에 의한 합성 Emerald 단결정 육성)

  • 최의석;김무경;이종민;안영필;서청교;안찬준
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1996.06a
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    • pp.519-521
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    • 1996
  • Emerald (3BeO.Al2O3.6SiO2 : Cr3+) single crystals were crystals were grown by reflux method of temperature gradient in the flux solution of Li2O-MoO3-V2O5 system. The composition of flux materials were 3 mole ratio of MoO3-V2O5/Li2O, subtituted 0.2 mole% of K2O, Na2O, Nb2O5 etc to Li2O content, solved 10-15% of beryl to flux quantity and doped 1% of Cr2O3 to emerald amount. Those of mixing were melted at 110$0^{\circ}C$ in Pt containers of the 3 zone furnace of melt-growth-return to circulate continniously, specially it has been grown large emerald single crystal when thermal fluctuation was treated for 2hrs of once time a day at 1050-95$0^{\circ}C$ in growth zone, substitutional solid solution effect of Cr+3 ion for Al+3 to the growth of emerald single crystal was good. Emerald single crystals were c(0001) hexagonal crystal face of preferencial growth direction and m(1010) post side. When it had been durated for 5 months emerald single crystals of the firet size of 0.6mm thickness of seed crystal were grown 32$\times$65mm(c x m) of maximum size and 6.2mm thickness.

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Hot Petroleum Drying Method to the Preparation of Multicomponent Oxide Ceramic Material (다성분계 산화물의 요업재료 제조를 위한 석유 증발 건조 방법)

  • 변수일
    • Journal of the Korean Ceramic Society
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    • v.14 no.3
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    • pp.163-168
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    • 1977
  • As a wet chemical drying process "hot petroleum drying method" was applied and developed for preparing uniformly fine oxide powder with high purity and sinterreactivity. Using this method solution of sulfates was dried in hot petroleum bath (~17$0^{\circ}C$) to sulfate powder from which corresponding mullite doped by Fe3+ ion was formed. Particle size, shape, decomposition by heat, and phase identification of sulfate andoxide powders determined by DTA, TGA, X-ray diffraction, analysis and electron microscopy: sulfate powder prepared by this drying method is an intimate mixture of the amorphous form of uniformly and finely distributed spherical particles (0.05-0.1$\mu$). Mullitization with the sulfate powder occurs at 110$0^{\circ}C$ in air. The morphology of mullite particle made by firing the sulfate powder at 135$0^{\circ}C$ in oxygen atmosphere is granular of 0.1-0.3$\mu$ in size. This drying process proved to be a very effective method for preparing fine, homogeneous, and highly sinterreactive multicomponent oxide powder without conventional ceramic process of mixing, milling, and granulating. This process can be also applied for preparing electronic ceramic materials which are requisite for high purity and homogeneity.mogeneity.

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Effect of Fe2+/Fe3+ Molar Ratio on the Synthesized Magnetic Black Pigment by Hydrothermal Method (수열합성법으로 제조한 흑색 자성안료의 Fe2+/Fe3+ 몰비에 따른 특성)

  • Jung, Myung-Ho;Jang, Gun-Eik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.12
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    • pp.812-816
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    • 2017
  • $Fe_3O_4$ was prepared on the $TiO_2-coated$ natural mica substrate. The natural mica has an average particle size of $22{\mu}m$. The substrate was coated on $TiO_2$ thin films using hydrothermal synthesis at pH 1.5-2.5 at $75^{\circ}C$. The Fe precursor solution was prepared by mixing $FeSO_4$ (for $Fe^{2+}$ ion) and $FeCl_3$ (for $Fe^{3+}$ ions) with different molar ratios such as 1/2, 1/1, 2/1, 3/0, and $Fe_3O_4$ only. X-ray diffraction analysis shows that the crystal structure depends on the $FeCl_3-to-FeSO_4$ molar ratio. $Fe_3O_4$ crystal phase could be obtained at higher $FeSO_4$ contents.

A Study on the Etching Characateristics of TiW Films using BCl$_3$/SF6/ gas chemistries (BCl$_3$/SF6 gas chemistries에 의한 TiW막의 식각특성 연구)

  • 권광호;김창일;윤선진;김상기;백규하;남기수
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.34D no.3
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    • pp.1-8
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    • 1997
  • The surface properties after plasma etching of TiW alloy using the chemistries of BCl$_{3}$ and SF$_{6}$ gases with varying mixing ratio have been investigated using XPS(X-ray photoelectron spectrocopy). The elements existed on the etched sampled have been extracted with BCL$_{3}$/SF$_{6}$ ratio and their chemical binding states have also been analysed. It was confirmed that the thickness of native oxide formed on the TiW films is thinner than 10nm by using Ar sputtering. At the same time, the roughness of etched surface has been esamnied using AFM (atomic force microscopy). on the basis of the basis of this results, the relations between the caanges of oxygen contents detected by XPS and the rouhness of etched surface have been discussed. And the etch rate and etched profile of Tiw films have been examined and the changes of the etch rate and etched prfile have been discussed with XPS results. From XPS results, the role of passivation layer consisted of Ti-S compound with XPS results. From XPS results, the role of passivation layer consisted of Ti-S compound has been proposed. Ti-S compound seems to make a role of passivation layer that surpresses Ti-O formation.ion.

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Dry Etching Characteristics of TiN Thin Films in BCl3-Based Plasma

  • Woo, Jong-Chang;Park, Jung-Soo;Kim, Chang-Il
    • Transactions on Electrical and Electronic Materials
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    • v.12 no.3
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    • pp.106-109
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    • 2011
  • We investigated the etching characteristics of titanium nitride (TiN) thin film in $BCl_3$/Ar inductively coupled plasma. The etching parameters were the gas mixing ratio, radio frequency (RF) power, direct current (DC)-bias voltages and process pressures. The standard conditions were as follows: total flow rate = 20 sccm, RF power = 500 W, DC-bias voltage = -100 V, substrate temperature = $40^{\circ}C$, and process pressure = 15 mTorr. The maximum etch rate of TiN thin film and the selectivity of TiN to $Al_2O_3$ thin film were 54 nm/min and 0.79. The results of X-ray photoelectron spectroscopy showed no accumulation of etch byproducts from the etched surface of TiN thin film. The TiN film etch was dominated by the chemical etching with assistance by Ar sputtering in reactive ion etching mechanism, based on the experimental results.

A Study on Unsteady Flow Characteristics in a Industrial Mixer with Hydrofoil Types Impeller by PIV (PIV에 의한 산업용 교반기내 Hydrofoil 임펠러 형태에 따른 비정상 유동특성에 관한 연구)

  • Kim, Beom-Seok;Kim, Jeong-Hwan;Kang, Mun-Hu;Kim, Jin-Gu;Lee, Young-Ho
    • Proceedings of the KSME Conference
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    • 2003.11a
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    • pp.863-868
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    • 2003
  • Mixers are used in various industrial fields where it is necessary to intimately mix two reactants in a short period of time. However, despite their widespread use, complex unsteady flow characteristics of industrial mixers are not systematic investigated. The present study aimed to clarify unsteady flow characteristics induced by various impellers in a tank. Impellers arc hydrofoil turbine and neo-hydrofoil turbine types. A high speed CCD camera and an Ar-Ion laser for illumination were adopted to clarify the time-dependent flow characteristics of the mixers. The rotating speed of impellers increased from 6Hz to 60Hz by 6Hz, The maximum velocity around neo-hydrofoil impeller is higher than the hydrofoil type impeller. These two types of turbine shows that typical flow characteristics of axial turbine and suitable for mixing high-viscosity materials.

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The etching characteristics of PZT thin films in Ar/$Cl_2/BCl_3$ plasma using ICP (ICP를 이용한 Ar/$Cl_2/BCl_3$ 플라즈마에서 PZT 식각 특성)

  • An, Tae-Hyun;Kim, Kyoung-Tae;Lee, Young-Hie;Seo, Yong-Jin;Kim, Chang-Il;Chang, Eui-Goo
    • Proceedings of the KIEE Conference
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    • 1999.11d
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    • pp.848-850
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    • 1999
  • In this study, PZT etching was performed using planar inductively coupled Ar(20)/$Cl_2/BCl_3$ plasma, The etch rate of PZT film was 2450 $\AA/min$ at Ar(20)/$BCl_3$(80) gas mixing ratio and substrate temperature of $80^{\circ}C$. X-ray photoelectron spectroscopy (XPS) analysis for film composition was utilized. The chemical bond of PbO is broken by ion bombardment, and the peak of metal Pb in a Pb 4f peak begins to appear upon etching, decreasing Pb content faster than Zr and Ti. As increase content of additive $BCl_3$, the relative content of oxygen decreases rapidly. We thought that abundant Band BCl radicals made volatile oxy-compound such as $B_{x}O_{y}$ and/or $BClO_x$ bond. To understand etching mechanism, Langmuir probe and optical emission spectroscopy (OES) analysis were utilized for plasma diagnostic.

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Assessment of total is ocyanates by OSHA and NIOSH analytical methods : accuracy and precision and airborne concentrations by process (NIOSH와 OSHA 측정 방법을 이용한 이소시아네이트류 발생 공정별 농도 분포 평가)

  • Kang, Hyoung Kyoung;Kim, Hyunwook
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.9 no.2
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    • pp.1-18
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    • 1999
  • The purpose of this study was to compare performances of two analytical methods, the OSHA 42 and the NIOSH 5522, of quantifying total isocyanates in air. These methods were compared in terms of accuracy and precision and the detection limits using four(4) spiked samples in each of four(4) concentration levels which ranged from 0.25 to 2.0 times of the ACGIH TLV-TWA. In addition, two methods were used to as sess airborne concentrations of total isocyanates at the following processes including autobody spray painting, furniture spray painting, polyurethane foaming, urethane adhesion, UV coating, and pigment mixing. The results of this study showed that the NIOSH 5522 method was better than the OSHA 42 method in terms of accuracy, precis ion, and detection limit for quantifying airborne total isocyanates. It was also clear that the NIOSH method was capable of detecting not only monomeric but also non-monomeric isocyanates. The results of air concentrations of total isocyanates among processes studied indicate that some processes may exceed the recommended level of isocyanates. In addition, to evaluate toxicological effects of total isocyanates, it is recommended to consider additive effects of isocyanates present in mixtures.

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Fluoride Removal from Aqueous Solutions using Industrial Waste Red Mud (산업폐기물인 적니를 이용한 불소 제거)

  • Um, Byung-Hwan;Jo, Sung-Wook;Kang, Ku;Park, Seong-Jik
    • Journal of The Korean Society of Agricultural Engineers
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    • v.55 no.3
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    • pp.35-40
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    • 2013
  • The present study was conducted to investigate the adsorption potential of red mud for fluoride removal. Different operation parameters such as the effect of contact time, initial concentration, pH, competing anions, seawater, adsorbent dose amount, and adsorbent mixture were studied. Nearly 3 hr was required to reach sorption equilibrium. Equilibrium sorption data were described well by Langmuir model and the maximum adsorption capacity of red mud was 5.28 mg/g. The fluoride adsorption at pH 3 was higher than in the pH range 5-9. The presence of anions such as sulfate, nitrate, phosphate, and bicarbonate had no significant effect on fluoride adsorption onto red mud. The fluoride removal by red mud was greater in seawater than deionized water, resulting from the presence of calcium and magnesium ion in seawater. The use of red mud alone was more effective for the removal of fluoride than mixing red mud with other industrial waste such as oyster shells, lime stone, and steel slag. This study showed that red mud has a potential application in the remediation of fluoride contaminated soil and groundwater.

Effects of Plasticizer to Polyvinylchloride on Radio-resistance of Organic Stabilizer,Dielectric and Mechanical Characteristics under the Influence of Radiation (Polyvinylchloride에 있어 가소제의 첨가가 유기안정제의 내 방사성 및 유전, 기계적 특성에 미치는 영향)

  • 김봉흡;강도열;이재인
    • 전기의세계
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    • v.26 no.2
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    • pp.89-94
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    • 1977
  • In order to investigate the properties of radiation resistance together with dielectric, and mechanical relaxation behaviors of polyvinylcholoride exposed to several different doses under the .gamma.-ray of Co$^{60}$ source, several observations were carried out on the exposed specimens propared by mixing dibutyl-tin-dilaulate and dibutyl-tin-dimaleate as stabilizer with or without adding dioctyl-phthalate as plasticizer. Conclusions obtained from the study are as follows: The origin of the absorption band at 1,540-1,640$cm^{-1}$ / on I.R. spectrum seems to be RCOO- ion originated from ionization of the stabilizer, and this peak can be useful as a measure of radiation resistance on polyvinylchloride. Addition of increasing plasticizer to polyvinylchloride exhibits increasing radiation resistance and the reason for this result may be attributed to aromatic resonance absorption of radiation energy by diotylphthalate. On dose dependent dielectric characteristics, nonplastized specimen shows a peak at about 10 Mrad and that this peak disappears on the plastification of specimens. Those phenomena may be explainable in considering the statistical distribution of scissored chain molecular segments as well as the plastification process of plasticizer to polyvinylchloride chain molecules.

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