• 제목/요약/키워드: Ion density

검색결과 1,219건 처리시간 0.032초

THE SURFACE CHARACTERISTICS OF NITROGEN ION IMPLANTED IRON ALUMINIDES

  • Choe, Han-Cheol
    • 한국표면공학회지
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    • 제32권3호
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    • pp.393-400
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    • 1999
  • The surface characteristics of nitrogen ion implanted iron aluminides were investigated using various electrochemical methods in $H_2$$SO_4$+KSCN and HCl solutions. Nitrogen ion implantation was performed with doses of $3.0$\times$10^{17}$ /ions/$\textrm{cm}^2$ at an energy of 150keV. Nitrogen ion implanted iron aluminides increased the corrosion potential and significantly decreased grain boundary activation, the active current density, and passive current density. Nitrogen implanted iron aluminides with Mo increased the corrosion, pitting potential, repassivation potential and │$E_{pit}$-$E_{corr}$│ value. Whereas, implanted iron aluminides containing boron reduced the pitting and repassivation potential in comparison with nitrogen implanted iron aluminides with Cr and Mo.o.

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Slurry법을 이용한 이온교환된 기판유리의 특성 (Properties of Ion-Exchanged Substrate Glass Using Slurry Method)

  • 김성일;최덕균
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.182-182
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    • 2010
  • The behavior of properties of ion exchanged substrate glasses was investigated in this study. In order to study the effects of ion exchange, ion exchange behavior with ion penetration depth, amount of ion exchange, density and thermal expansion was measured according to the time and temperature. The mechanical properties were evaluated by the three point bending test and curvature change, and then fracture patterns were investigated by optical microscope.

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고밀도 산소 플라즈마를 이용한 감광제 제거공정에 관한 연구 (A Study on Photoresist Stripping Using High Density Oxygen Plasma)

  • 정형섭;이종근;박세근;양재균
    • 한국전기전자재료학회논문지
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    • 제11권2호
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    • pp.95-100
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    • 1998
  • A helical inductively coupled plasma asher, which produces low energy and high density plasma, has been built and investigated for photoresist stripping process. Oxygen ion density in the order of $10^{11}/cm^3$ is measured by Langmuir probe, and higher oxygen radical density is observed by Optical Emission Spectrometer. As RF source power is increased, the plasma density and thus photoresist stripping rate are increased. Independent RF bias power to the wafer stage provides a dc bias to the wafer and an ability to add the ion assisted reaction. At 1 KW of the source power, the coupling mechanism of the RF power to the plasma is changed from the inductive mode to the capacitive one at about 1 Torr. This change causes the plasma density and ashing rate decreases abruptly. The critical pressure of the mode change becomes larger with larger RF power.

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이온유체방정식을 이용한 Plasma Sheath 시변 해석 (Analysis of Time-Dependent Behavior of Plasma Sheath using Ion Fluid Model)

  • 이호준;이해준
    • 전기학회논문지
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    • 제56권12호
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    • pp.2173-2178
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    • 2007
  • Dynamics of plasma sheath was analyzed using simple ion fluid model with poison equation. Incident ion current, energy, potential distribution and space charge density profile were calculated as a function of time. The effects of initial floating sheath on the evolution of biased sheath were compared with ideal matrix sheath. The effects of finite rising time of pulse bias voltage on the ion current and energy was studied. The influence of surface charging on the evolution of sheath was also investigated

Enhanced Corrosion Resistance of WC-Co with an Ion Beam Mixed Silicon Carbide Coating

  • 여순목;박재원
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.193-193
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    • 2011
  • Strong adhesion of a silicon carbide (SiC) coating to a WC-Co substrate was achieved through an ion beam mixing technique and the corrosion resistance of the SiC coated WC-Co was investigated by means of a potentiodynamic electrochemical test. In a 1 M NaOH solution, the corrosion current density of SiC-coated WC-Co after heat treatment at 500$^{\circ}C$ was about 50 times lower than that for the as-received WC-Co. In addition, the corrosion resistance systematically increases with increasing the SiC coating thickness. On the other hand, for a 0.5 M H2SO4 solution, the corrosion current density for SiC-coated WC-Co was about 3 times lower than that for the as-received WC-Co. We discuss the physical reasons for the changes in the corrosion current density with the different electrolytes.

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자장의 배열 및 형태가 유도결합형 플라즈마에 미치는 효과에 관한 연구 (A study on the effects of variously configured magnets on the characteristics of inductively coupled plasma)

  • 황순원;이영준;유지범;이재찬;염근영
    • 한국표면공학회지
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    • 제32권4호
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    • pp.513-520
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    • 1999
  • In this study, we investigated the effects of variously configured magnets on the characteristics of the plasmas to enhance plasma uniformity and density of an inductively coupled plasma source. As the magnets, Helmholtz type axial electromagnets and various multi-dipole magnets types around the chamber wall were used. To characterize the plasma as a function of the combination of the magnets and magnetic field strengths, ion density, electron temperature, and plasma potential were measured using an electrostatic probe along the chamber diameter for Ar plasmas. The measured maximum ion densities were $8$\times$10^{ 11}$$cm^{-3}$ with 600W inductive power and at 5mTorr of operational pressure and the uniformity of ion density was less than 5.9% at 2mTorr of operational pressure. The combination of an optimized multi-dipole magnet type and an axial electromagnet showed the lowest electron temperature (3eV) and plasma potential ($34V{p}$ )

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진공증착법으로 제조된 $\beta$-PVDF 박막의 유전 특성에 미치는 이온의 영향 (The Effect of Ion Contribution to the Dielectric Properties of $\beta$-PVDF Thin Film Fabricated by Vapor Deposition Method)

  • 박수홍;김종택;이덕출
    • 한국전기전자재료학회논문지
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    • 제11권11호
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    • pp.1007-1013
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    • 1998
  • In this paper, the dielectric properties of fabricated Polyvinylidene fluoride(PVDF, $PVF_2$) thin film with substrate temperature from 30 to at vapor deposition. The dielectric properties of PVDF thin film had been studied in the frequency range from 10Hz to 4MHz at measuring temperature between 20 and $100^{/circ}C$. The anomalous increasing in dielectric constant and dielectric loss at low frequencies and high temperature was described for PVDF thin film containing ion impurities. In particularly, ion mobility of fabricated PVDF thin film at substrate temperature at $30^{/circ}C$ decrease from $2\times10^{-5}\;to\;3.07$\times10^{-7}cm^2/V.s$ On the other hand, ion density increase abruptly from 1.49\times$$10^{13}$ to $1.5\times$10^{16}$cm^{-3}$ In spite of decreasing of ion mobility, dielectric constants and dielectric loss for PVDF thin film increase rapidly with decreasing frequency and high temperature. It was concluded that the dielectric constants and dielectric loss was related to ion density than to ion mobility at low frequency and high temperatures.

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초고압 직류 가공 송전선로에서 발생되는 이온 계측시스템 개발 (The Development of System for Measuring Ion Generated from HVDC Overhead Transmission Line)

  • 주문노;양광호;이동일;신구용;임재섭
    • 전기학회논문지
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    • 제57권11호
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    • pp.2035-2040
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    • 2008
  • The electrical discharge of high voltage direct current(HVDC) overhead transmission line generate audible noise, radio noise, electric field, ion current and induced voltage on the ground. These items are major factors to design environmentally friendly configuration of DC transmission line. Therefore, HVDC transmission lines must be designed to keep all these corona effects within acceptable levels. Several techniques have been used to assess interference caused by ions on HVDC overhead transmission line. In this study, to assess the ion characteristic of DC line, the ion current density and induced voltage caused by ion flow were measured by plate electrodes manufactured from a metal flat board and charged bodies, respectively. The charged body has two types of cylinder and cylindrical plate. From the results of calibration experiments, the sensitivity of flat electrode and charged body can be obtained. At present, the developed system is used to investigate the ion generation characteristics of Kochang DC ${\pm}500kV$ test line.

이온빔 에너지 밀도 조절에 따른 액정 배향 효과 (Effects of LC Alignment by Controlling Ion-beam Energy Density)

  • 박홍규;이강민;오병윤;김병용;강동훈;한진우;김영환;옥철호;한정민;이상극;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.399-399
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    • 2007
  • Recently, it is widely studied to liquid crystal (LC) alignment using ion-beam exposure. Because conventional rubbing method has some problems such as defects from dust and electrostatic charges during rubbing process. Therefore rubbing-free techniques like ion-beam method are strongly required. We studied LC alignment by controlling ion-beam energy density and electro-optical (EO) characteristics of twisted nematic LC on the polyimide surface. In this experiment, a good uniform alignment of the nematic liquid crystal (NLC) with the ion-beam exposure on the polyimide (PI) surface was observed. In addition, it can be achieved the good EO properties of the ion-beam-aligned twisted nematic liquid crystal display (TN-LCD) on PI surface.

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The investigation of the carbon on irradiation hardening and defect clustering in RPV model alloy using ion irradiation and OKMC simulation

  • Yitao Yang;Jianyang Li;Chonghong Zhang
    • Nuclear Engineering and Technology
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    • 제56권6호
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    • pp.2071-2078
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    • 2024
  • The precipitation of solutes is a major cause of irradiation hardening and embrittlement limiting the service life of reactor pressure vessel (RPV) steels. Impurities play a significant role in the formation of precipitation in RPV materials. In this study, the effects of carbon on cluster formation and irradiation hardening were investigated in an RPV alloy Fe-1.35Mn-0.75Ni using C and Fe ions irradiation at 290 ℃. Nanoindentation results showed that C ion irradiation led to less hardening below 1.0 dpa, with hardening continuing to increase gradually at higher doses, while it was saturated under Fe ion irradiation. Atom probe tomography revealed a broad size distribution of Ni-Mn clusters under Fe ion irradiation, contrasting a narrower size distribution of small Ni-Mn clusters under C ion irradiation. Further analysis indicated the influence of carbon on the cluster formation, with solute-precipitated defects dominating under C ion irradiation but interstitial clusters dominating under Fe ion irradiation. Simulations suggested that carbon significantly affected solute nucleation, with defect clusters displaying smaller size and higher density as carbon concentration increased. The higher hardening at doses above 1.0 dpa was attributed to a substantial increase in the number density of defect clusters when carbon was present in the matrix.