• Title/Summary/Keyword: Ion Chamber

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Development of High Performance Massively Parallel Processing Simulator for Semiconductor Etching Process (건식 식각 공정을 위한 초고속 병렬 연산 시뮬레이터 개발)

  • Lee, Jae-Hee;Kwon, Oh-Seob;Ban, Yong-Chan;Won, Tae-Young
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.10
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    • pp.37-44
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    • 1999
  • This paper report the implementation results of Monte Carlo numerical calculation for ion distributions in plasma dry etching chamber and of the surface evolution simulator using cell removal method for topographical evolution of the surface exposed to etching ion. The energy and angular distributions of ion across the plasma sheath were calculated by MC(Monte Carlo) algorithm. High performance MPP(Massively Parallel Processing) algorithm developed in this paper enables efficient parallel and distributed simulation with an efficiency of more than 95% and speedup of 16 with 16 processors. Parallelization of surface evolution simulator based on cell removal method reduces simulation time dramatically to 15 minutes and increases capability of simulation required enormous memory size of 600Mb.

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Selective etching characteristics of ITO/semiconductor and ITO/BaTiO3 structures by reactive ion ethcing (Reactive Ion Etching에 의한 ITO/반도체 및 ITO/BaTiO3 구조의 선택적 에칭 특성)

  • Han, Il-Ki;Lee, Yun-Hi;Kim, Hwe-Jong;Lee, Seok;Oh, Myung-Hwan;Lee, Jung-Il;Kim, Sun-Ho;Kang, Kwang-Nham;Park, Hong-Lee
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.32A no.1
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    • pp.152-158
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    • 1995
  • Eteching characteristics of the Indium Tin Oxide (ITO), which is transparent conductor, was investigated with CH4/H2 and Ar as etching gases for the Reactive Ion Etching (RIE). With CH4/H2 for the etching gas, the highly selective etching characteristics for the ITO on GaAs was obtained. It was examined that the dominant etching parameter for the selective etchning of ITO on GaAs structure was the chamber pressure. But, the etching selectivity for ITO on InP was poor eventhough we tried systematic etching. RIE etching conditins using CH4/H2 gas was limited due to the formation of polymer on the substrates. In the case of Ar gas for the reactive gas, the selectivity of ITO on BaTiO3 was above 10. The etch rete of ITO was more sensitive to the etching parameters than that of BaTiO3, which was almost constant with different etching parameters.

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Serial Block-Face Imaging by Field Emission Scanning Electron Microscopy (전계방사형 주사전자현미경에 의한 연속블록면 이미징)

  • Kim, Ki-Woo
    • Applied Microscopy
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    • v.41 no.3
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    • pp.147-154
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    • 2011
  • Backscattered electrons (BSE) are generated at the impact of the primary electron beam on the specimen. BSE imaging provides the compositional contrast to resolve chemical features of sectioned block-face. A focused ion beam (FIB) column can be combined with a field emission scanning electron microscope (FESEM) to ensure a dual (or cross)-beam system (FIB-FESEM). Due to the milling of the specimen material by 10 to 100 nm with the gallium ion beam, FIB-FESEM allows the serial block-face (SBF) imaging of plastic-embedded specimens with high z-axis resolution. After contrast inversion, BSE images are similar to transmitted electron images by transmission electron microscopy. As another means of SBF imaging, a specialized ultramirotome has been incorporated into the specimen chamber of FESEM ($3View^{(R)}$). Internal structures of plastic-embedded specimens can be serially revealed and analyzed by $3View^{(R)}$ with a large field of view to facilitate three-dimensional reconstruction. These two SBF approaches by FESEM can be employed to unravel spatial association of (sub)cellular entities for a comprehensive understanding of complex biological systems.

A Study on the Electrical Characteristic of Organic Thin Film by Physical Vapor Deposition Method (진공증착법을 이용한 유기 박막의 전기적 특성에 관한 연구)

  • Park, Su-Hong
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.57 no.2
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    • pp.140-145
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    • 2008
  • The purpose of this paper is to discuss the fabrication of $\beta$-PVDF($\beta$-Polyvinylidene fluoride, ${\beta}-PVF_2$) organic thin films using the vapor deposition method. Vapor deposition was performed under the following conditions: the temperature of evaporator, the applied electric field, and the pressure of reaction chamber were $270^{\circ}C$, 142.4 kV/cm, and $2.0{\times}10^{-5}\;Torr$, respectively. The molecular structure of the evaporated organic thin films were evaluated by a FT-IR. The results showed that the characteristic absorption peaks of $\beta$-form crystal increase from 72% to 95.5% with an increase in the substrate temperature. In the analysis of the electric characteristics, the abnormal increases in the relative dielectric constant and the dielectric loss factor in the regions of low frequency and high temperature are known to be caused by inclusion of impurity carriers in the PVDF organic thin films. In order to analyze quantitatively the abnormalities in the conductivity mechanism caused by ionic impurities, the product of the ion density and the mobility that affect the electrical property in polymeric insulators is analyzed. In the case of a specimen produced by varying the substrate temperature from $30^{\circ}C$ to $105^{\circ}C$, the product of mobility and the ion density decreased from $4.626{\times}10^8$ to $8.47{\times}10^7/V{\cdot}cm{\cdot}s$. This result suggests that the higher the substrate temperature is maintained, the better excluded the impurities are, and the more electrically stable material can be obtained.

POLYMER SURFACE MODIFICATION WITH PLASMA SOURCE ION IMPLANTATION TECHNIQUE

  • Han, Seung-Hee;Lee, Yeon-Hee;Lee, Jung-Hye;Yoon, Jung-Hyeon;Kim, Hai-Dong;Kim, Gon-ho;Kim, GunWoo
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.345-349
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    • 1996
  • The wetting property of polymer surfaces is very important for practical applications. Plasma source ion implantation technique was used to improve the wetting properties of polymer surfaces. Poly(ethylene terephtalate) and other polymer sheets were mounted on the target stage and an RF plasma was generated by means of an antenna located inside the vacuum chamber. High voltage pulses of up to -10kV, 10 $\mu$sec, and up to 1 kHz were applied to the stage. The samples were implanted for 5 minutes with using Ar, $N_2,O_2,CH_4,CF_4$ and their mixture as source gases. A contact angle meter was used to measure the water contact angles of the implanted samples and of the samples stored in ambient conditions after implantation. The modified surfaces were analysed with Time-Of-Flight Mass Spectrometer (TOF-SIMS) and Auger Electron Spectroscopy (AES). The oxygen-implanted samples showed extremely low water contact angles of $3^{\circ}C$ compared to $79^{\circ}C$ of unimplanted ones. Furthermore, the modified surfaces were relatively stable with respect to aging in ambient conditions, which is one of the major concerns of the other surface treatment techniques. From TOF-SIMS analysis it was found that oxygen-containing functional groups had been formed on the implanted surfaces. On the other hand, the $CF_4$-implanted samples turned out to be more hydro-phobic than unimplanted ones, giving water contact angles exceeding $100^{\circ}C$ . The experiment showed that plasma source ion implantation is a very promising technique for polymer surface modification especially for large area treatment.

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The Effect of Contamination of Ion Source on Ionic Current of Quadrupole Mass Spectrometer (사중극 질량 분석기의 이온소스 오염이 이온전류에 미치는 영향)

  • Lee, K.C.;Park, C.J.;Kim, J.T.;Oh, E.S.;Hong, K.S.;Hong, S.S.;Lim, I.T.;Yun, J.Y.;Kang, S.W.;Shin, Y.H.
    • Journal of the Korean Vacuum Society
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    • v.18 no.3
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    • pp.197-202
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    • 2009
  • The long term stability of ion current of QMS has been one of key parameters for monitoring gas process in vacuum. The time dependence of ionic current was monitored while the pressure of nitrogen gas was kept at a fixed pressure by introducing the gas into vacuum chamber. The chamber was evacuated to ${\sim}3{\times}10^{-9}\;Torr$ to reduce background signals before the measurement. Two ion sources were tested; one had brownish or black color due to gas contamination and the other one was new, i.e. cleaner. At a nitrogen pressure of $1{\times}10^{-5}\;Torr$, the ionic currents measured by the contaminated ion source decreased faster with time. The decrease rate was respectively ${\sim}46%$ for cleaner one and ${\sim}84%$ for contaminated one after ${\sim}5.5%$ hours. In order to test the effect of filament material on the ion current decrease, we fabricated a tungsten(W) filament which consisted of two parts; one half was made of W and the other was coated with yttria. The similar decrease of ionic currents were shown for the two types of filaments, indicating that slight change of temperature of filament due to material difference i.e. baking effect could not improve the origin of ionic current decrease. Overall the decreasing rate of ionic current is more closely associated with contaminated ion source of QMS rather than its filament materials.

Evaluation of Absorbed Dose and Skin Dose with MDCT Using Ionization Chamber and TLD (이온 전리함 및 TLD 법을 이용한 Multi-Detector Computed Tomography의 흡수선량 및 체표면 선량 평가)

  • Jeon, Kyung Soo;Oh, Young Kee;Baek, Jong Geun;Kim, Ok Bae;Kim, Jin Hee;Choi, Tae Jin;Jeong, Dong Hyeok;Kim, Jeong Kee
    • Progress in Medical Physics
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    • v.24 no.1
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    • pp.35-40
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    • 2013
  • Recently, the uses of Multi-Detector Computed Tomography (MDCT) for radiation treatment simulation and planning which is used for intensity modulated radiation therapy with high technique are increasing. Because of the increasing uses of MDCT, additional doses are also increasing. The objective of this study is to evaluate the absorbed dose of body and skin undergoing in MDCT scans. In this study, the exposed dose at the surface and the center of the cylindrical water phantom was measured using an pencil ionization chamber, 30 cc ionization chamber and TL Powder. The results of MDCT were 31.84 mGy, 33.58 mGy and 32.73 mGy respectively. The absorbed dose at the surface showed that the TL reading value was 33.92 mGy from MDCT. These results showed that the surface dose was about 3.5% from the MDCT exposure higher than a dose which is located at the center of the phantom. These results mean that the total exposed dose undergoing MDCT 4 times (diagnostic, radiation therapy planning, follow-up et al.), is about 14 cGy, and have to be considered significantly to reduce the exposed dose from CT scan.

Continuous Decomposition of Ammonia by a Multi Cell-Stacked Electrolyzer with a Self-pH Adjustment Function (자체 pH 조정 기능을 갖는 다단 전해조에 의한 암모니아의 연속식 분해)

  • Kim, Kwang-Wook;Kim, Young-Jun;Kim, In-Tae;Park, Geun-Il;Lee, Eil-Hee
    • Korean Chemical Engineering Research
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    • v.43 no.3
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    • pp.352-359
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    • 2005
  • This work has studied the changes of pH in both of anodic and cathodic chambers of a divided cell due to the electrolytic split of water during the ammonia decomposition to nitrogen, and has studied the continuous decomposition characteristics of ammonia in a multi-cell stacked electrolyzer. The electrolytic decomposition of ammonia was much affected by the change of pH of ammonia solution which was caused by the water split reactions. The water split reaction occurred at pH of less than 8 in the anodic chamber with producing proton ions, and occurred at pH of more than 11 in the cathodic chamber with producing hydroxyl ions. The pH of the anodic chamber using an anion exchange membrane was sustained to be higher than that using a cation exchange membrane, which resulted in the higher decomposition of ammonia in the anodic chamber. By using the electrolytic characteristics of the divided cell, a continuous electrolyzer with a self-pH adjustment function was newly devised, where a portion of the ammonia solution from a pHadjustment tank was circulated through the cathodic chambers of the electrolyzer. It enhanced the pH of the ammonia solution fed from the pH-adjustment tank into the anodic chambers of the electrolyzer, which caused a higher decomposition yield of ammonia. And then, based on the electrolyzer, a salt-free ammonia decomposition process was suggested. In that process, ammonia solution could be continuously decomposed into the environmentally-harmless nitrogen gas up to 83%, when chloride ion was added into the ammonia solution.

The Etching Mechanism of $(Ba, Sr)TiO_3$Thin Films in $Ar/CF_4$ High Density Plasma ($Ar/CF_4$ 고밀도 플라즈마에서 $(Ba, Sr)TiO_3$ 박막의 식각 메카니즘)

  • Kim, Seung-Beom;Kim, Chang-Il
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.5
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    • pp.265-269
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    • 2000
  • $(Ba, Sr)TiO_3$thin films were etched with a magnetically enhanced inductively coupled plasma (MEICP) at different CF4/Ar gas mixing ratios. Experimental was done by varying the etching parameters such as rf power, dc bias and chamber pressure. The maximum etch rate of the BST films was $1800{AA}/min$ under $CF_4/(CF_4+Ar)$ of 0.1, 600 W/350 V and 5 mTorr. The selectivity of BST to Pt and PR was 0.6, 0.7, respectively. X-ray photoelectron spectroscopy (XPS) results show that surface reaction between Ba, Sr, Ti and C, F radicals occurs during the (Ba, Sr)TiO3 etching. To analyze the composition of surface residue after the etching, films etched with different CF_4/Ar$ gas mixing ratio were investigated using XPS and secondary ion mass spectroscopy (SIMS).

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Hydroxide diffusion rates in amorphous solid water

  • Lee, Du Hyeong;Bang, Jaehyeock;Kang, Heon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.142.1-142.1
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    • 2016
  • We present bulk diffusion rates of hydroxide ions in amorphous solid water (ASW) at 135 ~ 160 K. Previous researches showed that the diffusion mechanism of hydroxide is different from one of hydronium ions, and this implies that they have different diffusion rates. In ultra-high vacuum (UHV) chamber, low-energy scattering (LES) was used to measure ion population and temperature-programmed desorption (TPD) was conducted for measuring ASW thicknesses. To determine the diffusion rates, a simple model for $H_2O/NaOH/H_2O$ sandwich films was developed using Fick's second law. The measured surface population of hydroxide ions as a function of time was well fitted to the model, and the rates were well agreed to an Arrhenius equation.

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