• Journal of Sensor Science and Technology
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• v.18 no.2
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• pp.173-178
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• 2009

In this study, we have fabricated a fiber-optic dosimeter using an organic scintillator and a plastic optical fiber for measuring percentage depth dose with high energy X-ray beam. The scintillating light generated in organic sensor probe embedded in a solid water are guided by 20 m plastic optical fiber to the light-measuring device such as a photodiode- amplifier system. Using a fiber-optic dosimeter and an ion chamber, percentage depth dose curves are measured with 6 and 15 MV energies of X-ray beam whose field sizes are $2\;cm\;{\times}\;2\;cm$ and $10\;cm\;{\times}\;10\;cm$.

• Korean Chemical Engineering Research
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• v.55 no.4
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• pp.535-541
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• 2017

On the basis of 200 ppm of Ag and 120 l/h of feed flow rate, we built a pilot plant of an ion exchange fiber system having an double tube type ion exchange chamber with strong base ion exchange fiber (FIVAN A-6) which was designed to replace fibers easily and to eliminate the need for a fixture. The following results were obtained for the double tube type of ion exchange fiber system with an ion exchange capacity of 4.6 meq/g for Ag. The adsorption process was operated in the range of 40~90 l/h after confirming the effect of the flow rate and, pH did not affect formation of complex ion of Ag in the range of pH 7~12. In the case of backwash process, the recovery rate of Ag was tested in the range of 60~120 l/h and comparative experiments were carried out using NaOH, $NH_4Cl$, and NaCl as the chemicals for backwash. Although the desorption time was shortened at higher concentration, the desorption efficiency per mol was lowered. Therefore, it was confirmed that the desorption time and the concentration should be well balanced to operate economically. The desorption pattern of the backwash process is slower than the adsorption process and takes a lot of time. The results showed that the Ag adsorption ratio was 99.5% or more and the Ag recovery ratio was 96% or more, and commercialization was possible.

• Journal of Radiation Protection and Research
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• v.24 no.4
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• pp.195-203
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• 1999

It is difficult to determine dosimetric characteristics for small field photon beams since such small fields do not achieve complete lateral electronic equilibrium and have steep dose gradients. Dosimetric characteristics of small field 4, 6, and 10 MeV photon beams have been measured in water with a diamond detector and compared to measurements using small volume cylindrical and plane parallel ionization chambers. Percent depth dose (PDD) and beam profiles for 6 and 10 MeV photon beams were measured with diamond detector and cylindrical ion chamber for small fields ranging from $1{\times}1\;to\;4{\times}4cm^2$. Total scatter factors($S_{c,p}$) for 4, 6, and 10 MeV photon beams were measured with diamond detector, cylindrical and plane parallel ion chambers for small fields ranging from $1{\times}1\;to\;4{\times}4cm^2$. The $S_{c,p}$ factors obtained with three detectors for 4, 6, and 10 MeV photon beams agreed well ($\pm1.2%$) for field sizes greater than $2{\times}2,\;2.5{\times}2.5,\;and\;3{\times}3\;cm^2$, respectively. For smaller field sizes, the cylindrical and plane parallel ionization chambers measure a smaller $S_{c,p}$ factor, as a result of the steep dose gradients across their sensitive volumes. The PDD values obtained with diamond detector and cylindrical ionization chamber for 6 and 10MeV photon beams agreed well ($\pm1.5%$) for field sizes greater than $4{\times}4\;cm^2$. For smaller field sizes, diamond detector produced a depth-dose curve which had a significantly shallower falloff than that obtained from the measurements of relative depth-dose with a cylindrical ionization chamber. For the measurements of beam profiles, a distortion in terms of broadened penumbra was observed with a cylindrical ionization chamber since diamond detector exhibited higher spatial resolution. The diamond detector with small sensitive volume, near water equivalent, and high spatial resolution is suitable detector compared to ionization chambers for the measurements of small field photon beams.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.151-151
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• 2012

A new plasma process, i.e., the combination of PIII&D and HIPIMS, was developed to implant non-gaseous ions into materials surface. HIPIMS is a special mode of operation of pulsed-DC magnetron sputtering, in which high pulsed DC power exceeding ~1 kW/$cm^2$ of its peak power density is applied to the magnetron sputtering target while the average power density remains manageable to the cooling capacity of the equipment by using a very small duty ratio of operation. Due to the high peak power density applied to the sputtering target, a large fraction of sputtered atoms is ionized. If the negative high voltage pulse applied to the sample stage in PIII&D system is synchronized with the pulsed plasma of sputtered target material by HIPIMS operation, the implantation of non-gaseous ions can be successfully accomplished. The new process has great advantage that thin film deposition and non-gaseous ion implantation along with in-situ film modification can be achieved in a single plasma chamber. Even broader application areas of PIII&D technology are believed to be envisaged by this newly developed process. In one application of non-gaseous plasma immersion ion implantation, Ge ions were implanted into SiO2 thin film at 60 keV to form Ge quantum dots embedded in SiO2 dielectric material. The crystalline Ge quantum dots were shown to be 5~10 nm in size and well dispersed in SiO2 matrix. In another application, Ag ions were implanted into SS-304 substrate to endow the anti-microbial property of the surface. Yet another bio-application was Mg ion implantation into Ti to improve its osteointegration property for bone implants. Catalyst is another promising application field of nongaseous plasma immersion ion implantation because ion implantation results in atomically dispersed catalytic agents with high surface to volume ratio. Pt ions were implanted into the surface of Al2O3 catalytic supporter and its H2 generation property was measured for DME reforming catalyst. In this talk, a newly developed, non-gaseous plasma immersion ion implantation technique and its applications would be shown and discussed.

• Progress in Medical Physics
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• v.9 no.4
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• pp.267-276
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• 1998

Any detector inserted into a phantom should have such a geometry that it caused as small as possible perturbation of the electron fluence. Plane parallel chambers meet this requirement better than other chambers of configurations. IAEA protocol recommends the use of plane parallel chambers for this reason. However, the cylindrical chambers are widely used for convenient. The purpose of this study is to evaluate the absorbed dose due to the differences of four different dosimetry protocols such as IAEA protocol using cylindrical chamber, TG 21 protocol using cylindrical chamber, Markus protocol using plane parallel chamber, and TG 39 report for the calibration of plane parallel chamber in electron beams. Depth-ionization measurements for the electron beams of nominal energy 6, 9, 12, 15, and 18 MeV from Siemens accelerator with a 10$\times$10 cm$^2$ field size were made using a radiation field analyser with 0.125 cc ion chamber. Dosimetric measurements by IAEA and TG 21 protocol were made with a farmer type ionization chamber in solid water for each electron energy, respectively. Dosimetric measurements by Markus protocol were made with a plane parallel ionization chamber in solid water for each electron energy, respectively. The cavity-gas calibration factor for the plane parallel chamber was obtained with the use of 18 MeV electron beam as guided by TG 39 report. Dosimetric measurements by TG 39 were performed with a plane parallel ionization chamber in solid water for each electron energy, respectively. For all the energies and protocols, measurements were made along the central axis of the distance of 100 cm (SSD = 100 cm) with 10$\times$10 cm$^2$ field size at the depth of d$_{max}$ for each electron beam, respectively. In the case of 18 MeV, the discrepancy of 0.9 % between IAEA and TG 21 was found and the two protocols were agreed within 0.7 % for other energies. In the case of 18 MeV and 6 MeV, the discrepancies of $\pm$ 0.8 % between Markus and TG 39 was found, respectively and the two protocols were agreed within 0.5 % for other energies. Since the discrepancy of 1.6 % between cylindrical and plane parallel chamber was found for 18 MeV, it is suggested to get the calibration factor using other method as guided. by TG 39.9.

• Progress in Medical Physics
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• v.19 no.4
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• pp.305-312
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• 2008

The aim of this study is to introduce the accuracy of Ir-192 source's apparent activity using the well-type chamber and the Farmer-type ionization chamber in the high dose rate brachytherapy. We measured the apparent activity of Ir-192 that each medical center in the country has and the apparent activity of calibration certificate provided by manufacturer is compared with that by our experimental measurement. The number of sources used for the activity comparison was 5. The accuracy of the measured activity was in the range of -2.8% to -1.0% and -2.1% to 0.2% for the Farmer-type chamber system (Jig) and for the well-type, respectively. The maximum difference was within 1.0% for comparison with two calibration's tool. Our results demonstrate that well-type chamber as wall as Farmer-type chamber is a appropriate system as the routine source calibration procedures in HDR brachytherapy. Whenever a new source is installed to use in clinics, by periods, a source calibration should be carried out.

• Radiation Oncology Journal
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• v.15 no.1
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• pp.65-69
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• 1997

Purpose : To obtain the actual dose distribution from measured data by doconvolution method using the measured ion chamber response function. Materials and Methods : The chamber response functions for 2 ionization chambers (diameter 5mm, 6.4mm) were measured. and dose Profiles were measured for $10{\times}20cm^2$ field size using two different detectors. The deconvolution of chamber response function from the measured data were performed for these Profiles. The same procedures were repeated for 4MV, 6MV and 1 SMV photon energies. Results : Different dose Profiles were obtained for the same field with the chambers which have the different response functions. Nearly the same results could be obtained with deconvolution for the profiles from various detectors. Conclusion : The effect of the chamber response function can be extracted by deconvolution method. Deconvolved dose profile using various ionization chambers gave better dose distributions. Technical improvements are needed for practical application.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.523-523
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• 2012

As the wafer geometric requirements continuously complicated and minutes in tens of nanometers, the expectation of real-time add-on sensors for in-situ plasma process monitoring is rapidly increasing. Various industry applications, utilizing plasma impedance monitor (PIM) and optical emission spectroscopy (OES), on etch end point detection, etch chemistry investigation, health monitoring, fault detection and classification, and advanced process control are good examples. However, process monitoring in semiconductor manufacturing industry requires non-invasiveness. The hypothesis behind the optical monitoring of plasma induced ion current is for the monitoring of plasma induced charging damage in non-invasive optical way. In plasma dielectric via etching, the bombardment of reactive ions on exposed conductor patterns may induce electrical current. Induced electrical charge can further flow down to device level, and accumulated charges in the consecutive plasma processes during back-end metallization can create plasma induced charging damage to shift the threshold voltage of device. As a preliminary research for the hypothesis, we performed two phases experiment to measure the plasma induced current in etch environmental condition. We fabricated electrical test circuits to convert induced current to flickering frequency of LED output, and the flickering frequency was measured by high speed optical plasma monitoring system (OPMS) in 10 kHz. Current-frequency calibration was done in offline by applying stepwise current increase while LED flickering was measured. Once the performance of the test circuits was evaluated, a metal pad for collecting ion bombardment during plasma etch condition was placed inside etch chamber, and the LED output frequency was measured in real-time. It was successful to acquire high speed optical emission data acquisition in 10 kHz. Offline measurement with the test circuitry was satisfactory, and we are continuously investigating the potential of real-time in-situ plasma induce current measurement via OPMS.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.397-397
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• 2007

Diamondlike carbon (DLC) coatings were deposited on alumina ceramic seals using a plasma immersion ion deposition technique (PIID). Then they were subjected to tribological tests using a pin-on-disc tribometer under a high load (1.3 GPa) and under elevated temperatures up to 400C. Coefficients of friction (COFs) were recorded and compared with that of the untreated alumina while the wear tracks were analyzed using SEM with EDS to characterize the DLC films. To enhance the DLC adhesion to the substrate, various interlayers including Si and Cr were deposited using the PIID process or an ion beam assisted deposition (IBAD) method. It was observed that the DLC coating, if adhering well to the substrate, reduced the COFs significantly, from 0.4-0.8 for the uncoated alumina to about 0.05-0.1, within the tested temperature range. The adhesion was determined by the interlayer type and possibly by the application method. Cr interlayer did not perform as well as the Si interlayer. This could also be due to the fact that the Cr interlayer and the subsequent DLC coating had to be done in two different processing systems, while both the Si interlayer and the subsequent DLC film were deposited in one system without breaking the chamber. The coating failure mode was found to be delamination between the Cr and the alumina substrate. In contrast, the Si interlayer with proper DLC deposition procedures resulted in very good adhesion and hence excellent tribological performance. Further study may lead to future DLC applications of ceramic seals.

• Proceedings of the Korean Society of Medical Physics Conference
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• 2004.11a
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• pp.36-38
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• 2004

The detector size effect due to the spatial response of defectors is one critical source of inaccuracy in clinical dosimetry and has been a subject of numerous studies. Conventionally, the detector response kernel contains all of the influence that the detector size has on the measured beam profile. Various analytic models for this kernel have been proposed and studied in theoretical and experimental works. Here, we use a method to determine detector response kernel simply by using Monte Carlo simulation and convolution theory. Based on this numerical method and DOSIMETER, an EGS4 Monte Carlo code, the detector response for a Farmer type ion chamber embedded in water phantom is obtained. There exists characteristic difference in the simulated chamber readings between one with carbon graphite wall and the other with Acrylic wail. Using the obtained response and the convolution theory, we are planning to derive the detector response kernel numerically and remove detector size effect from measurements for 6MV, 10${\times}$l0cm2 and 0.5${\times}$10 cm2 photon beam.