• Title/Summary/Keyword: Interfacial reaction layer

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The Solderability and Mechanical Properties of In, Bi Added Sn-9Zn/Cu Joint (In, Bi가 첨가된 Sn-9wt.%Zn/Cu 접합부의 납땜성 및 기계적 성질)

  • Baek, Dae-Hwa;Lee, Kyung-Ku;Lee, Doh-Jae
    • Journal of Korea Foundry Society
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    • v.20 no.2
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    • pp.116-121
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    • 2000
  • Interfacial reaction and mechanical properties between Sn-Zn-X ternary alloys(X : 3wt.%In, 4wt.%Bi) and Cu-substrate were studied. Cu/solder joints were subjected to aging treatments for up to 50days to see interfacial reaction at $100^{\circ}C$ and then were examined changes of microstructure and interfacial compound by optical microscopy, SEM and EDS. Cu/solder joints were aged to 30days and then loaded to failure at cross head speed of 0.3 mm $min^{-1}$ to measure tensile strength. According to the results of the solderability test, additions of In and Bi in the Sn-9wt.%Zn solder improve the wetting characteristics of the alloy and lower the melting temperature. Through the EDS and XRD analysis of Cu/Sn-9wt.%Zn solder joint, it was concluded that the intermetallic compound was the ${\gamma}-Cu_5Zn_8$ phase. Cu-Zn intermetallics at Cu/solder interfaces played an important role in both the microstructure evolution and failure of solder joints. Cu/solder joint strength was decreased by aging treatment, and those phenomenon was closely related to the thickening of intermetallic layer at Cu/solder joints.

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Thermal Instability of La0.6Sr0.4MnO3 Thin Films on Fused Silica

  • Sun, Ho-Jung
    • Korean Journal of Materials Research
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    • v.21 no.9
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    • pp.482-485
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    • 2011
  • $La_{0.6}Sr_{0.4}MnO_3$ (LSMO) thin films, which are known as colossal magnetoresistance materials, were prepared on fused silica thin films by conventional RF magnetron sputtering, and the interfacial reactions between them were investigated by rapid thermal processing. Various analyses, namely, X-ray diffraction, transmission electron microscopy combined with energy adispersive X-ray spectrometry, and secondary ion mass spectrometry, were performed to explain the mechanism of the interfacial reactions. In the case of an LSMO film annealed at $800^{\circ}C$, the layer distinction against the underplayed $SiO_2$ was well preserved. However, when the annealing temperature was raised to $900^{\circ}C$, interdiffusion and interreaction occurred. Most of the $SiO_2$ and part of the LSMO became amorphous silicate that incorporated La, Sr, and Mn and contained a lot of bubbles. When the annealing temperature was raised to $950^{\circ}C$, the whole stack became an amorphous silicate layer with expanded bubbles. The thermal instability of LSMO on fused silica should be an important consideration when LSMO is integrated into Si-based solid-state devices.

Stabilizing Li2O-based Cathode/Electrolyte Interfaces through Succinonitrile Addition

  • Myeong Jun Joo;Yong Joon Park
    • Journal of Electrochemical Science and Technology
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    • v.14 no.3
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    • pp.231-242
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    • 2023
  • Li2O-based cathodes utilizing oxide-peroxide conversion are innovative next-generation cathodes that have the potential to surpass the capacity of current commercial cathodes. However, these cathodes are exposed to severe cathode-electrolyte side reactions owing to the formation of highly reactive superoxides (Ox-, 1 ≤ x < 2) from O2- ions in the Li2O structure during charging. Succinonitrile (SN) has been used as a stabilizer at the cathode/electrolyte interface to mitigate cathode-electrolyte side reactions. SN forms a protective layer through decomposition during cycling, potentially reducing unwanted side reactions at the interface. In this study, a composite of Li2O and Ni-embedded reduced graphene oxide (LNGO) was used as the Li2O-based cathode. The addition of SN effectively thinned the interfacial layer formed during cycling. The presence of a N-derived layer resulting from the decomposition of SN was observed after cycling, potentially suppressing the formation of undesirable reaction products and the growth of the interfacial layer. The cell with the SN additive exhibited an enhanced electrochemical performance, including increased usable capacity and improved cyclic performance. The results confirm that incorporating the SN additive effectively stabilizes the cathode-electrolyte interface in Li2O-based cathodes.

Electrochemical Properties of Cathode according to the Type of Sulfide Electrolyte and the Application of Surface Coating

  • Yoon, Da Hye;Park, Yong Joon
    • Journal of Electrochemical Science and Technology
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    • v.12 no.1
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    • pp.126-136
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    • 2021
  • The electrochemical performance of all-solid-state cells (ASSCs) based on sulfide electrolytes is critically affected by the undesirable interfacial reactions between oxide cathodes and sulfide electrolytes because of the high reactivity of sulfide electrolytes. Based on the concept that the interfacial reactions are highly dependent on the type of sulfide electrolyte, the electrochemical properties of the ASSCs prepared using three types of sulfide electrolytes were observed and compared. The Li2MoO4-LiI coating layer was also introduced to suppress the interfacial reactions. The cells using argyrodite electrolyte exhibited a higher capacity and Coulombic efficiency than the cells using 75Li2S-22P2S5-3Li2SO4 and Li7P3S11 electrolytes, indicating that the argyrodite electrolyte is less reactive with cathodes than other electrolytes. Moreover, the introduction of Li2MoO4-LiI coating on the cathode surface significantly enhanced the electrochemical performance of ASSCs because of the protection of coating layer. Pulverization of argyrodite electrolyte is also effective in increasing the capacity of cells because the smaller size of electrolyte particles improved the contact stability between the cathode and the sulfide electrolyte. The cyclic performance of cells was also enhanced by pulverized electrolyte, which is also associated with improved contact stability at the cathode/electrolyte. These results show that the introduction of Li2MoO4-LiI coating and the use of pulverized sulfide electrolyte can exhibit a synergic effect of suppressed interfacial reaction by the coating layer and improved contact stability owing to the small particle size of electrolyte.

Annealing for Improving adhesion between Metal layer and Oxide layer (산화막과 금속박막 계면에서의 adhesion 개선을 위한 열처리)

  • 김응수
    • Proceedings of the IEEK Conference
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    • 2002.06b
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    • pp.225-228
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    • 2002
  • The adhesion effect between the oxide layer and the metal layer has been studied by RTP anneal. Two types of oxides, BPSG and P-TEOS, were used as a bottom layer under multi-layered metal film. We observe the interface between oxide and metal layer using SEM (scanning electron microscopy), TEM (transmission electron microscopy), AES (auger electron spectroscopy). Adhesion failure was occurred by interfacial reaction between the BPSG oxide and the multi-layered metal film at 650"C RTP anneal. The phosphorus rich layer was observed at interface between BPSG oxide and metal layer by AES and TEM measurements. On the other hand adhesion was a)ways good in the sample used P-TEOS oxide as a bottom layer. We have known that adhesion between BPSG and multi-layered metal film was improved when the sample was annealed below $650^{\circ}C$.TEX>.

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Effect of the Alloying Elements in Ag-Cu-Zr-X Brazing Alloy on the Microstructure and the Bond Strength of $Al_2O_3$/Ni-Cr Steel Brazed Joint (알루미나/니켈크롬강 접합체의 미세조직 및 접합강도에 미치는 Ag-Cu-Zr-X 브레이징 합금성분의 영향)

  • Kim, Jong-Heon;Yoo, Yeon-Chul
    • Transactions of Materials Processing
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    • v.7 no.5
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    • pp.465-473
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    • 1998
  • The effect of alloying elements of Ag-Cu-Zr-X brazing alloy on the microstructure and the bond strength of $Al_2O_3/Ni-Cr$ brazed steel joint was investigated. The reaction layer, $ZrO_2$ (a=5.146 ${\AA}$ , b=5.213 ${\AA}$ , c=5.311 ${\AA}$ )was formed at the interface of $Al_2O_3/Ni-Cr$ steel joint by the redox reaction between alumina and Zr. The addition of An and Al to the Ag-Cu-Zr brazing alloy gave rise to changes in the thickness of the reaction product layer and the morphology of the brazement. Sn caused the segregation of Zr was decreased b Al the $ZrO_2$ layer formed at the Ag-Cu-Zr-Al alloy was thinner than that of $ZrO_2$ formed at the Ag-Cu-Zr-An alloy. The fracture shear strength was strongly dependent on the microstructure of the brazement. Brazing with Ag-Cu-Zr-Sn alloy resulted in a better bond strength than with Ag-Cu-Zr or Ag-Cu-Zr-Al alloy.

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Morphologies of Brazed NiO-YSZ/316 Stainless Steel Using B-Ni2 Brazing Filler Alloy in a Solid Oxide Fuel Cell System

  • Lee, Sung-Kyu;Kang, Kyoung-Hoon;Hong, Hyun-Seon;Woo, Sang-Kook
    • Journal of Powder Materials
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    • v.18 no.5
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    • pp.430-436
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    • 2011
  • Joining of NiO-YSZ to 316 stainless steel was carried out with B-Ni2 brazing alloy (3 wt% Fe, 4.5 wt% Si, 3.2 wt% B, 7 wt% Cr, Ni-balance, m.p. 971-$999^{\circ}C$) to seal the NiO-YSZ anode/316 stainless steel interconnect structure in a SOFC. In the present research, interfacial (chemical) reactions during brazing at the NiO-YSZ/316 stainless steel interconnect were enhanced by the two processing methods, a) addition of an electroless nickel plate to NiO-YSZ as a coating or b) deposition of titanium layer onto NiO-YSZ by magnetron plasma sputtering method, with process variables and procedures optimized during the pre-processing. Brazing was performed in a cold-wall vacuum furnace at $1080^{\circ}C$. Post-brazing interfacial morphologies between NiO-YSZ and 316 stainless steel were examined by SEM and EDS methods. The results indicate that B-Ni2 brazing filler alloy was fused fully during brazing and continuous interfacial layer formation depended on the method of pre-coating NiO-YSZ. The inter-diffusion of elements was promoted by titanium-deposition: the diffusion reaction thickness of the interfacial area was reduced to less than 5 ${\mu}m$ compared to 100 ${\mu}m$ for electroless nickel-deposited NiO-YSZ cermet.

Interaction of Co/Nb Bilayer with $SiO_2$ Substrate ($SiO_2$와 Co/Nb 이중층 구조의 상호반응)

  • Gwon, Yeong-Jae;Lee, Jong-Mu;Bae, Dae-Rok;Gang, Ho-Gyu
    • Korean Journal of Materials Research
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    • v.8 no.10
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    • pp.956-960
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    • 1998
  • The interfacial reaction between the CoINb bilayer and the $SiO_2$ substrate in the temperature range of $330^{\circ}C$-$800^{\circ}C$ in a vacuum has been investigated by X-ray photoelectron spectroscopy, glancing angle XRD, Auger Electron Spectroscopy and Atomic force microscopy. The Co and Nb were actively interdiffused at $600^{\circ}C$, and the layer inversion completed at $700^{\circ}C$. NbO was formed by interfacial reaction between the Nb interlayer and the $SiO_2$ substrate, while $Nb_20_5$ was formed on the surface by reaction of Nb with oxygen in the ambients. Free Si atoms obtained by the reaction between Nb and $SiO_2$ formed silicides like CoSi and $Nb_5Si_3$ by reacting with Co and Nb remnants. The sheet resistance of the Co/Nb bilayer increased substantially after annealing at $800^{\circ}C$. which is due to the agglomeration of the Co layer to reduce its surface energy.

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A Study on the Metal to Zirconia Joining by Applying Direct Current (직류전원부하에 의한 지르코니아와 금속의 접합)

  • Kim Sung Jin;Kim Moon Hyop;Park Sung Bum;Gwon Won Il
    • 한국전기화학회:학술대회논문집
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    • 2005.07a
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    • pp.383-390
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    • 2005
  • Effect of applying a DC voltage on the interfacial reaction at the metal to zirconia interface was investigated utilizing an oxygen ionic conductivity of partially stabilized zirconia. The joining of copper rod and zirconia tube was carried out in Ar gas atmosphere at $1000^{\circ}C$. There are two type of the joining. The one is the reaction bond consisting of copper and zirconia was dominated by surface reaction with a undetectable very thin layer. It was found that copper elements were diffused to zirconia side, but that Zr ions were not diffused to copper side. These results mean application of a DC voltage to migrate oxygen to the copper-zirconia interface can oxidize metal at the copper-zirconia interface and the bonding reaction between zirconia and copper oxide may occur. The other is the reaction bonding was dominated by interdiffusion with a very thick interface layer. This result mean application of a DC voltage can reduce zirconia at the interface. The bonding reaction is to be an alloying between Zr and Cu.

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Effect of Low Temperature Annealing on the Magnetoresistance in Co/Cu Artificial Superlattice (Co/Cu인공초격자에서 저온 열처리가 자기저항에 미치는 영향)

  • 민경익;송용진;이후산;주승기
    • Journal of the Korean Magnetics Society
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    • v.3 no.4
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    • pp.305-309
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    • 1993
  • Thermal stability of Co/Cu artificial superlattice (AS) prepared by RF-magnetron sputtering and the effect of low temperature annealing on the magnetoresistance of the AS have been investigated in this work. Dependence of annealing behavior on the Cu spacer thickness, Fe underlayer thickness, and kind of the underlayer was examined and the relationship between the interfacial reaction and magnetoresistance was studied. It turned out that when Co/Cu AS was annealed at low temperature ($<450^{\circ}C$), the magnetoresistance could increase in the case of AS with thick spacer Cu ($20~25\AA$) layer, whereas it decreased in the case of AS with thin spacer Cu ($7\AA$) layer, which of the former is in contrast with previous reports and the latter in consistent with them. The increase of magnetoresistance is due to increase of interfacial atomic sharpness, which is supported by low angle X-ray diffraction analysis. The thermal stability of Co/Cu AS was better in the case of thick Fe underlayered AS. Interfacial reaction (separation of intermixed Co and Cu) could be observed at lower temperature for (200)-textured samples than for (111)-textured samples, which can be interpreted in terms of interdiffusion kinetics depending on the crystallographic orientation.

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