• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.05a
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• pp.299-303
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• 1996

In this Study, the capacitance-voltage properties of the (Sr$\_$1-x/$.$Ca$\_$x/)$\_$m/TiO$_3$(0.05$\leq$x$\leq$0.2, m=0.996, 1, 1.004) ceramics were investigated. The results of the capacitance-voltage measurements indicated that the grain boundary was composed of the continuous insulating layers. The capacitance is almost unchanged below about 20[V] but it decreases slowly about 20[V]. The thick of the effective depleation layer was calculated by using the average grain size, it was in the range of 760∼3400[${\AA}$].

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.78-79
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• 2005

We report on optically excited terahertz (THz) omission from low-temperature (LT) grown GaAs. We have used 70 fs titanium-sapphire laser pulses with wavelengths at 800 nm to generate THz radiation pulses. The LT-GaAs layers are grown on semi-insulating GaAs substrates with GaAs buffer layer by molecular beam epitaxy (MBE). The THz emission from the LT-GaAs surface is strong and does not show any significant variation in the strength of the THz emission over several different angles between the polarization of the excitation laser pulse and the crystallographic orientation of the LT-GaAs.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.489-489
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• 2011

The effect of Si quantum dots for solar cell appications was investigated. The 5 ~ 10 nm Si nanoparticle was fabricated on p-type single and poly crystalline wafer by magnetron sputtering and laser irradiation process. Scanning electron microscopy (SEM), atomic force measurement (AFM) and transmission electron microscopy (TEM) images showed that the Si QDs array were clearly embedded in insulating layer ($SiO_2$). Photoluminesence (PL) measurements reliably exhibited bandgap transitions with every size of Si QDs. The photo-current measurements were showed different result with size of QD and number of superlattice.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.192-192
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• 2012

The next generation electronics need to not only be smaller but also be more flexible. To meet such demands, electronic devices using two dimensional (2D) atomic crystals like graphene, hexagonal boron nitride (h-BN), molybdenum disulfate ($MoS_2$) and organic thin film have been studied intensely. In this talk, I will demonstrate the $MoS_2$ field effect transistor (FET) toward performance enhancement by insulating h-BN substrate.

• Journal of Sensor Science and Technology
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• v.15 no.1
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• pp.13-19
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• 2006

The micro-gas sensor based on carbon nanotubes (CNTs) was fabricated and its gas sensing characteristics on nitrogen dioxide ($NO_{2}$) have been investigated. The sensor consists of a heater, an insulating layer, a pair of contact electrodes, and CNT-sensing film on a micromachined diaphragm. The heater plays a role in the temperature change to modify sensor operation. Gas sensor responses of CNT-film to $NO_{2}$ at room temperature are reported. The sensor exhibits a reversible response with a time constant of a few minutes at thermal treatment temperature of $130^{\circ}C$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.11a
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• pp.18-21
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• 1996

SiO 7f the SiO/TiN film is used as the insulating layer and TiN film is chosen as the barrier against the diffusion of Al which is the terminal connected by ohmic contact because TiN has the advantageous properties such as good thermal stability and very low diffusion rate in spite of it\`s relatively low specific resistance. In this study we investigated it\`s electrical and optical characteristics to determine refractive index, absorption coefficient and Permittivity. The films are differently fabricated in thickness method for this experiment.

• Electrical & Electronic Materials
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• v.8 no.2
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• pp.129-135
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• 1995

SiO thin films are deposited by evaporator the refractive index of wave length, photon energy and the absorptive rate of these films are measured by spectroscopic ellipsometer. It is derived the absorptive rate and permitivity of SiO thin films from the equations that calculating the refractive index. And the result show good agreement with the calculated values and experimental values. As a result, the wave length of light is increased in the condition that the angle of incidence is fixed on SiO thin film, the basic absorption and the absorption impurities are found in the low wave length (below 450 nm in this study) and the reflective absorption and conductive absorption is increased by the form of exponential function over the low wavelength. The absorptive rate is increased by increased the angle of incidence and thickness of SiO film for the insulating layer. As the thickness of SiO film is increased, the value of complex permitivity is decreasing and as wave length of incidence is increased., the value of dielectric is linearly increasing.

• Journal of the Korean Institute of Telematics and Electronics
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• v.27 no.4
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• pp.527-533
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• 1990

Zone-melting recrystallization (ZMR) system using two graphite heaters(a stationary sheet and a narrow movable bar) was constructed and implemented in recrystallization op Si films on insulating layers. The recystallized Si films were examined by Nomarski contrast optical microscopy after Dash etching, transmission electron diffraction pattern, and x-ray diffraction. With optimum conditions of process parameters(input powers of the bottom and upper heater, scanning speed of the upper heater, and the gap between sample and upper heater), the recrystallized Si layer has a (100) texture, but contains many subboundaries. The subgrains are misoriented by < 0.5\ulcorner and the average spacing between subboundaries is about 25\ulcorner.

• Proceedings of the Korean Magnestics Society Conference
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• 2013.12a
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• pp.32-32
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• 2013

Using the Vienna ab initio simulation package (VASP) incorporating van der Waals interaction, we have explored structural, adsorption, and magnetic properties of Ni(111)/BN/Co(111) systems. We have found that both Ni(111) and Co(111) layers shows half metallic state, while the spacer BN layer becomes weak metal for one monolayer (ML) thickness and an insulating barrier for two ML thickness. The half metallic states in both Ni(111) and Co(111) layers are robust because it is unchanged independently on the magnetic coupling of Ni(111) and Co(111). This finding suggests that the Ni(111)/BN/Co(111) systems can be utilized for perfect tunneling magnetoresistance system. Moreover, it can be applied for potential spin injecting into semiconductor in FM/semiconductor system due to the fact that the half metallic state in FM layers at the interface will be unchanged.

• Journal of the Korean Society for Precision Engineering
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• v.25 no.7
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• pp.139-144
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• 2008

Micro electrochemical machining was investigated to machine micro internal features. This method uses a micro disk tool electrode and can easily machine micro features inside of a micro hole, which are very difficult to make by the conventional processes. In order to limit the machining area and localize the electrochemical dissolution, ultra short pulses were used as power source and a micro disk electrode with insulating layer on its surface was used as a tool electrode. By electrochemical process, internal features, such as groove array, were fabricated on the stainless steel plate.