• International Journal of Precision Engineering and Manufacturing
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• v.7 no.3
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• pp.35-38
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• 2006

A study of electrowetting using an Octadecyltrichlorosilane (OTS) self-assembled monolayer (SAM) and Z- Tetraol 2000 perfluoropolyether lubricant as hydrophobic layers on Si and $SiO_2$ wafer was performed. The $SiO_2$ layer used as insulating layer was thermally grown on the silicon wafer to a thickness of 220-230 nm. The results demonstrated that the contact angle decreased from $100^{\circ}$ to $80^{\circ}$ at 28 V applied potential on $SiO_2$ wafer coated with OTS and the contact angle appeared to be reversible. However, the contact angle on the $SiO_2$ wafer coated with Z- Tetraol 2000 was not observable at 28 V applied potential. Furthermore, the contact angle on the Si wafer coated with OTS or Z- Tetraol 2000 appeared to be irreversible due to the generation of electrolysis in the droplet. It is concluded that it is feasible to use SAM as a hydrophobic layer in electrowetting applications.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.58 no.12
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• pp.2420-2424
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• 2009

We have successfully demonstrated of metal-insulator-semiconductor (MIS) capacitors with $Al_2O_3/p-Si$ structures. The $Al_2O_3$ film was grown at $200^{\circ}C$ on H-terminated Si wafer by atomic layer deposition (ALD) system. Trimethylaluminum [$Al(CH_3)_3$, TMA] and $H_2O$ were used as the aluminum and oxygen sources. A cycle of the deposition process consisted of 0.1 s of TMA pulse, 10 s of $N_2$ purge, 0.1 s of $H_2O$ pulse, and 60 s of $N_2$ purge. The 5 nm thick $Al_2O_3$ layer prepared on Si substrate by ALD exhibited excellent electrical properties, including low leakage currents, no mobile charges, and a good interface with Si.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.198.1-198.1
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• 2014

Many efforts have been devoted on chemical modification of graphene layer to modulate its electrical properties. In the previous report, laser irradiation on the CYTOP(perfluoropolymer) doped graphene layer induces chemical modification of it, resulting in the insulating I-V characteristics. While the results strongly denoted C-F bond formation after irradiation, the detailed process of photo-induced chemical change is not known yet. To probe this, we utilized synchrotron based SPEM (scanning photoelectron emission spectroscopy) in NSRRC, Taiwan. We irradiate the sample by photon of 614 eV in a stepwise manner as a function of time. As photon irradiation increased, difluoride moieties in the CYTOP was broken, and then formed mono-fluoride with carbon atoms consisting graphene layer.

• Applied Science and Convergence Technology
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• v.26 no.5
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• pp.129-132
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• 2017

We report a chemical vapor deposition approach and optimized growth condition to the synthesis of single layer molybdenum disulfide ($MoS_2$). Obtaining large grain size with continuous $MoS_2$ atomically thin films is highly responsible to the growth distance between molybdenum trioxide source and receiving silicon substrate. Experimental results indicate that triangular shape $MoS_2$ grain size could be enlarged up to > 80um with the precisely controlled the source-to-substrate distance under 7.5 mm. Furthermore, we demonstrate fabrication of a memory device by employing poly(methyl methacrylate) (PMMA) as insulating layer. The fabricated devices have a PMMA-$MoS_2$/metal configuration and exhibit a bistable resistance switching behavior with high/low-current ratio around $10^3$.

• Journal of Magnetics
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• v.10 no.2
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• pp.44-47
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• 2005

The oscillatory interlayer exchange coupling (IEC) has been shown in pinned $[CoFe/Pt(t_{pt})/CoFe]/IrMn$ multi-layers with perpendicular anisotropy. The period of oscillation corresponds to about 2 monolayers of Pt. The oscillatory behavior of IEC depending on the nonmagnetic metallic Pt thickness is thought to be related the antiferromagnetic ordering induced by IrMn layer. Oscillatory IEC as function of insulating NiO thickness has been observed in $[Pt/CoFe]_4/NiO(t_{NiO})/[CoFe/Pt]_4$ multilayers. The effect of N (number of bilayer repeats) upon the magnetic property of [Pt/CoFe]N/IrMn is also studied.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1998.06a
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• pp.121-124
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• 1998

Generally the structure of powder electroluminescent devices (PELDs) on ITO-film was makeup of the ZnS:Cu phosphor layer and BaTiO$_3$ insulating layer. The active layer, which consists of a suitably doped ZnS powder mixed in a dielectric, is sandwiched between two electrodes; one of which are ITO film and the other is aluminum. In this paper, three kinds of powder eleotroluminescent devices (PELDs) : WK-A(ITO/BaTiO$_3$/ZnS:Cu/Silver paste). WK-B(ITO/BaTiO$_3$+ZnS:Cu/Silver paste) and WK-C(ITO/BaTiO$_3$/ZnS:Cu/BaTiO$_3$/Silver paste), fabricated by spin coating method, were investigated. To evaluate the luminescence properties of three kinds of PELDs, EL emission spectroscopy, transferred charge density and time response of EL emission intensity under square wave voltage driving were measured.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.4
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• pp.332-337
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• 2002

The applicability of models based on fractal geometry to characterize the surface of the EL devices was investigated. Insulating layer and phosphor layer of EL devices were deposited on ITO glass using e-beam method. The images of phosphor layer by scanning electron microscope(SEM) were transformed to binary coded data. The relations between fractal geometry and electrical characteristics of EL devices were investigated. When the fractal dimension of $Cas:EuF_3$ EL device was 1.82 and its grain boundary area was 19%, the brightness of $Cas:EuF_3$ EL device was 261 cd/$\textrm{m}^2$.

• Journal of the Korean Ceramic Society
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• v.24 no.1
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• pp.63-69
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• 1987

Effect of MoO3 additiion on the semiconductive BaTiO3 ceramics doped with 0.2 mole% Nb2O5 and their frequency characteristics have been investigated on the view of intergranular barrier layer model through the observation of changes in their electrical properties. The resistivity increases with the increase of MoO3 addition, but the capacitance, the frequency dependence of capacitance and the effect of positive temperature coefficient of resistivity (PTCR) decrease. It is explained by the possible increase in the thickness of potential barrier due to the formation of insulating layer and thus decrease in the degree of energy band bending. Both the PTCR effect and resistivity decrease with the increase of frequency due to the possible elimination of barrier layer at the grain boundary.

• Journal of the Semiconductor & Display Technology
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• v.19 no.4
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• pp.116-120
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• 2020

In this paper, we developed an electrochemical glucose sensor strip using a paper substrate. The paper glucose sensor strip is eco-friendly because it uses paper as a substrate, and it has the advantage that it can be manufactured only with four printing, drying and cutting processes. The paper glucose sensor is significantly simplified by the production process than the conventional glucose sensors because the production of only four printing on the paper substrate. In this paper, eco-friendly tracing paper was used to develop a paper glucose sensor strip, and screen-printing technology was used to form a carbon/silver electrode, insulating layer and glucose oxidase(GOD) layer. The developed paper glucose sensor strip has a flat structure with a size of 30 × 4.6 ㎟, and blood injection is a type of direct contact with the exposed enzyme layer above the strip. In this paper, the performance of paper glucose sensor strips was evaluated by analyzing the cyclic voltammetry(CV) and chronoamperometry(CA) characteristics.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.34 no.2
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• pp.85-89
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• 2021

High reliability thin film transistors are important factors for next-generation displays. The reliability of transparent a-IGZO semiconductors is being actively studied for display applications. A plasma treatment can fill the oxygen vacancies in the channel layer and the channel layer/insulating layer interface so that the device can work stably under a bias voltage. This paper studies the effect of plasma treatment on the performance of a-IGZO TFT devices. The influence of different plasma gases on the electrical parameters of device and its working reliability are reviewed. The article mentions argon, fluorine, hydrogen and several ways of processing in the atmosphere. Among these methods, F (fluorine) plasma treatment can maximize equipment reliability. It is expected that the presented results will form a basis for further research to improve the reliability of a-IGZO TFT.