• Title/Summary/Keyword: Injection barrier

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Numerical Study on the formation of an injectable barrier in the subsurface

  • 김미정;박주양
    • Proceedings of the Korean Society of Soil and Groundwater Environment Conference
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    • 2002.04a
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    • pp.98-101
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    • 2002
  • Numerical experiments were performed to investigate horizontal barrier formation in unsaturated soils by permeation grouting through multiple vertical injection pipes. The results were compared with the horizontal barrier formation achieved by using multiple horizontal injection pipes. It was observed that tile point injection of the vertical pipe system generates a gel barrier that has a less lateral area than the injection through the horizontal pipe.

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Current Density Equations Representing the Transition between the Injection- and Bulk-limited Currents for Organic Semiconductors

  • Lee, Sang-Gun;Hattori, Reiji
    • Journal of Information Display
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    • v.10 no.4
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    • pp.143-148
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    • 2009
  • The theoretical current density equations for organic semiconductors was derived according to the internal carrier emission equation based on the diffusion model at the Schottky barrier contact and the mobility equation based on the field dependence model, the so-called "Poole-Frenkel mobility model." The electric field becomes constant because of the absence of a space charge effect in the case of a higher injection barrier height and a lower sample thickness, but there is distribution in the electric field because of the space charge effect in the case of a lower injection barrier height and a higher sample thickness. The transition between the injection- and bulk-limited currents was presented according to the Schottky barrier height and the sample thickness change.

Stability of ITO/Buffer Layer/TPD/Alq3/Cathode Organic Light-emitting Diode

  • Chung, Dong-Hoe;Ahn, Joon-Ho;Oh, Hyun-Seok;Park, Jung-Kyu;Lee, Won-Jae;Choi, Sung-Jai;Jang, Kyung-Uk;Shin, Eun-Chul;Kim, Tae-Wan
    • Transactions on Electrical and Electronic Materials
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    • v.8 no.6
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    • pp.260-264
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    • 2007
  • We have studied stability in organic light-emitting diode depending on buffer layer and cathode. A transparent electrode of indium-tin-oxide(ITO) was used as an anode. An electron injection energy barrier into organic material is different depending on a work function of cathodes. Theoretically, the energy barriers for the electron injection are 1.2 eV, -0.1 eV, and 0.0 eV for Al, LiAl, and LiF/Al at 300 K, respectively. We considered the cases that holes are injected to organic light-emitting diode. The hole injection energy barrier is about 0.7 eV between ITO and TPD without buffer layer. For hole-injection buffer layers of CuPc and PEDOT:PSS, the hole injection energy barriers are 0.4 eV and 0.5 eV, respectively. When the buffer layer of CuPc and PEDOT:PSS is existed, we observed the effects of hole injection energy barrier, and a reduction of operating-voltage. However, in case of PVK buffer layer, the hole injection energy barrier becomes high(1.0 eV). Even though the operating voltage becomes high, the efficiency is improved. A device structure for optimal lifetime condition is ITO/PEDOT:PSS/TPD/$Alq_3$/LiAl at an initial luminance of $300cd/m^2$.

Manufacturing of Plastic Noise Barrier Structure Using Extrusion Molding (압출성형을 이용한 플라스틱 방음벽 구조물 제작 연구)

  • Kim, Hyung-Kook
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.20 no.6
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    • pp.76-81
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    • 2021
  • A plastic noise barrier is a structure installed to minimize noise, and it is composed of the main plate, sound-absorbing plate, and sound-absorbing material. Plastic noise barrier structures have several advantages compared to other products, such as light weight, anticorrosion, durability, easy assembly, rapid construction, and low costs. In this study, the main and sound-absorbing plates were manufactured through extrusion molding, and the sound-absorbing plate was finished with a press to improve the conventional injection molding. Extrusion molding dies and punch dies were designed, and a profile extrusion-molding system was developed. Thus, inexpensive and efficient sound-absorbing and main plates can be produced, and the noise barrier structure can be assembled rapidly. Additionally, a noise barrier structure with extended service life and excellent quality can be constructed by creating uniform free space to accommodate increased temperatures after assembly and installation.

Formation of barrier ribs for PDP by injection molding method

  • Choi, Hak-Nyun;Kim, Yong-Seog
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.388-390
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    • 2003
  • Paste micro-injection molding process was applied for fabrication of barrier ribs of PDP in an attempt to reduce processing steps and materials loss during the processing. For the paste, a thermally curable one was used and for the mold, a polymeric soft mold was used. It was demonstrated that the micro-molding process can be used successfully in producing barrier ribs of PDP.

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The Real Role of 4,4'-Bis[N-[4-{N,N-bis(3-methylphenyl)amino}phenyl]-N-phenylamino] biphenyl (DNTPD) Hole Injection Layer in OLED: Hole Retardation and Carrier Balancing

  • Oh, Hyoung-Yun;Yoo, Insun;Lee, Young Mi;Kim, Jeong Won;Yi, Yeonjin;Lee, Seonghoon
    • Bulletin of the Korean Chemical Society
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    • v.35 no.3
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    • pp.929-932
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    • 2014
  • We explored interfacial electronic structures in indium tin oxide (ITO)/DNTPD/N,N'-diphenyl-N,N'-bis(1-naphthyl)-1,1'-biphenyl-4,4'-diamine (NPB) layer stack in an OLED to clarify the real role of an aromatic amine-based hole injection layer, DNTPD. A hole injection barrier at the ITO/DNTPD interface is lowered by 0.20 eV but a new hole barrier of 0.36 eV at the DNTPD/NPB is created. The new barrier at the DNTPD/NPB interface and its higher bulk resistance serve as hole retardation, and thus those cause the operation voltage for the ITO/DNTPD/NPB to increase. However, it improves current efficiency through balancing holes and electrons in the emitting layer.

A comparison of the characteristics of External type UHF partial discharge sensor for metal covered barriers in GIS (GIS 스페이서의 에폭시 주입구 장착형 UHF PD 센서의 성능 비교)

  • Hwang, Chul-Min;Kim, Young-No;Lee, Young-Sang;Kwak, Joo-Sik;Park, Ki-Jun
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.2265-2267
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    • 2005
  • We present detailed studies of externally applicable UHF PD sensors for a metal covered epoxy barrier with a small opening of epoxy injection-hole. The sensors were attached at the surface of injection hole of a metal covered epoxy barrier. 3-Dimensional electro magnetic simulations were performed to analyze electric-field distribution of the GIS and epoxy barrier with injection hole. Sensor structures were designed and analyzed using the 3-D EM simulator then fabricated for experimental verification. Sensor performance was measured in terms of spectral response and detected peak power. Real scale GIS and epoxy barriers were used to test and measure various aspect of performance of the sensors.

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Study of the Carrier Injection Barrier by Tuning Graphene Electrode Work Function for Organic Light Emitting Diodes OLED (일함수 변화를 통한 그래핀 전극의 배리어 튜닝하기)

  • Kim, Ji-Hun;Maeng, Min-Jae;Hong, Jong-Am;Hwang, Ju-Hyeon;Choe, Hong-Gyu;Mun, Je-Hyeon;Lee, Jeong-Ik;Jeong, Dae-Yul;Choe, Seong-Yul;Park, Yong-Seop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.111.2-111.2
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    • 2015
  • Typical electrodes (metal or indium tin oxide (ITO)), which were used in conventional organic light emitting devices (OLEDs) structure, have transparency and conductivity, but, it is not suitable as the electrode of the flexible OLEDs (f-OLEDs) due to its brittle property. Although Graphene is the most well-known alternative material for conventional electrode because of present electrode properties as well as flexibility, its carrier injection barrier is comparatively high to use as electrode. In this work, we performed plasma treatment on the graphene surface and alkali metal doping in the organic materials to study for its possibility as anode and cathode, respectively. By using Ultraviolet Photoemission Spectroscopy (UPS), we investigated the interfaces of modified graphene. The plasma treatment is generated by various gas types such as O2 and Ar, to increase the work function of the graphene film. Also, for co-deposition of organic film to do alkali metal doping, we used three different organic materials which are BMPYPB (1,3-Bis(3,5-di-pyrid-3-yl-phenyl)benzene), TMPYPB (1,3,5-Tri[(3-pyridyl)-phen-3-yl]benzene), and 3TPYMB (Tris(2,4,6-trimethyl-3-(pyridin-3-yl)phenyl)borane)). They are well known for ETL materials in OLEDs. From these results, we found that graphene work function can be tuned to overcome the weakness of graphene induced carrier injection barrier, when the interface was treated with plasma (alkali metal) through the value of hole (electron) injection barrier is reduced about 1 eV.

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Interfacial Electronic Structures for Electron and Hole Injection in Organic Devices: Nanometer Layers of CsN3 and 1,4,5,8,-naphthalene-tetracarboxylic-dianhydride (NTCDA)

  • Yi, Yeon-Jin;Jeon, Pyeongeu;Lee, Jai-Hyun;Jeong, Kwang-Ho;Kim, Jeong-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.90-90
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    • 2012
  • The electron/hole injections in organic electronic devices have long been an issue due to the large energy level mismatches between electrode and organic layer. To utilize the organic materials in electronic devices, functional thin layers have been used, which reduce the electron/hole injection barrier from electrode to organic material. Typically, inorganic compounds and organic molecules are used as an electron and hole injection layer, respectively. Recently, CsN3 and 1,4,5,8,- naphthalene-tetracarboxylic-dianhydride (NTCDA) are reported as a potential electron and hole injection layers. CsN3 shows unique properties that it breaks into Cs and N and thus Cs can dope organic layer into n-type. On the other side, hole injection anode, NTCDA forms gap states with anode material. In this presentation, we show the electronic structure changes upon the insertion of CsN3 and NTCDA at proper interfaces to reduce the charge injection barriers. These barrier reductions are correlated with device characteristics.

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Capacitance-Voltage (C-V) Characteristics of Cu/n-type InP Schottky Diodes

  • Kim, Hogyoung
    • Transactions on Electrical and Electronic Materials
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    • v.17 no.5
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    • pp.293-296
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    • 2016
  • Using capacitance-voltage (C-V) and conductance-voltage (G/ω-V) measurements, the electrical properties of Cu/n-InP Schottky diodes were investigated. The values of C and G/ω were found to decrease with increasing frequency. The presence of interface states might cause excess capacitance, leading to frequency dispersion. The negative capacitance was observed under a forward bias voltage, which may be due to contact injection, interface states or minority-carrier injection. The barrier heights from C-V measurements were found to depend on the frequency. In particular, the barrier height at 200 kHz was found to be 0.65 eV, which was similar to the flat band barrier height of 0.66 eV.