• 제목/요약/키워드: Inductively Coupled Plasma Emission Spectrometry

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수소화물발생 유도결합플라즈마 원자방출분광법에 의한 머리카락 시료 중 미량의 Se와 Bi의 분석에 관한 연구 (A study on the Determination of Trace Se and Bi in the Scalp Hair by Hydride Generation- Inductively Coupled Plasma Atomic Emission Spectrometry)

  • 최범석;이동기
    • 분석과학
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    • 제9권1호
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    • pp.26-34
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    • 1996
  • 수소화물 발생장치를 사용한 유도결합플라즈마 원자방출분광법(ICP-AES)으로 머리카락 시료 중에 함유된 미량의 Se와 Bi의 분석에 관해 연구하였다. 기체상태의 수소화물 측정시 ICP의 최적 측정조건은 시료운반기체의 유속은 0.6~0.8L/min, 관측위치는 유도코일로부터 6mm 높이였다. 수소화물 생성효율이 최대를 나타내는 염산농도는 $NaBH_4$와 NaOH를 각각 2.5% 사용할 때 1.5M 이상일 때였으며, 2.5% $NaBH_4$와 0.1% $NaBH_4$를 사용할 때는 약 O.5M 이상일 때였다. 분석과정에서 Cu와 Ni 같은 전이금속으로부터의 심한 방해영향이 관찰되었고, lanthanum hydroxide로 Se와 Bi를 공침시켜 방해영향을 제거하였다.

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직독식 원자방출분광기를 이용한 철강중의 성분원소 분석 (A Direct Reading Atomic Emission Spectrometer for Chemical Analysis in the Iron and Steels)

  • 김영만;정찬이;김선태;최범석
    • 대한화학회지
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    • 제38권11호
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    • pp.800-807
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    • 1994
  • 직독식 원자방출분광기로 철강 재료중의 구성원소를 매트릭스 보정법으로 신속히 분석하는 방법에 대하여 연구하였다. 선형과 비선형법으로 매트릭스 보정계수를 구하였으며 이때 구한 매트릭스 계수는 서로 차이가 있지만 이들의 계수를 이용하여 구한 분석결과는 비교적 잘 일치하였다.

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Application of a Membrane Desolvator to the Analysis of Organic Solvents in Inductively Coupled Plasma Atomic Emission Spectrometry

  • Lee, J. S.;Lim, H. B.
    • Bulletin of the Korean Chemical Society
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    • 제20권9호
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    • pp.1040-1044
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    • 1999
  • A micro porous PTFE membrane desolvator (MMD) was built and evaluated for the on-line removal of organic solvents to facilitate the determination of trace metal contaminants in the solvents by ICP-AES. Three organic solvents, isopropyl alcohol (IPA), methanol, and dimethy sulfoxide (DMSO) were studied. The MMD reduced organic solvent concentration in the sample aerosol stream by 82% to 89%, as indicated by monitoring C(I) emission. Net signal intensity of Fe, Al, and Cu was increasing with higher organic solvent concentration, with the rate of increase being solvent dependent. The signal intensities for Mg and Pb followed the trend with the C(I) signal. Changing the sweep gas flow rate affected the optimum signal intensity. Wine samples were analyzed by the method of standard addition. The concentrations of B, Al, and Mg were determined with a relative precision of less than 2.3%.

Separation of Goid, Palladium and Platinum in Chromite by Anion Exchange Chromatography for Inductively Coupled Plasma Atomic Emission Spectrometric Analysis

  • 최광순;이창현;박영재;조기수;김원호
    • Bulletin of the Korean Chemical Society
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    • 제22권8호
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    • pp.801-806
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    • 2001
  • A study has been carried out on the separation of gold, iridium, palladium, rhodium, ruthenium and platinum in chromite samples and their quantitative determination using inductively coupled plasma atomic emission spectrometry (ICP-AES). The dissolution condition of the minerals by fusion with sodium peroxide was optimized and chromatographic elution behaviour of the rare metals was investigated by anion exchange chromatography. Spectral interference of chromium, a matrix of the minerals, was investigated on determination of gold. Chromium interfered on determination of gold at the concentration of 500 mg/L and higher. Gold plus trace amounts of iridium, palladium, rhodium and ruthenium, which must be preconcentrated before ICP-AES was separated by anion exchange chromatography after reducing Cr(Ⅵ) to Cr(III) by H2O2. AuCl4- retained on the resin column was selectively eluted with acetone- HNO3-H2O as an eluent. In addition, iridium, palladium, rhodium and ruthenium remaining on the resin column were eluted as a group with concentrated HCl. However, platinum was eluted with concentrated HNO3. The recovery yield of gold with acetone-HNO3-H2O was 100.7 ${\pm}2.0%$, and the yields of palladium and platinum with concentrated HCl and HNO3 were 96.1 ${\pm}1.8%$ and 96.6 ${\pm}1.3%$, respectively. The contents of gold and platinum in a Mongolian chromite sample were 32.6 ${\pm}$ 2.2 ${\mu}g$/g and 1.6 $\pm$ 0.14 ${\mu}g$/g, respectively. Palladium was not detected.

DRY ETCHING CHARACTERISTICS OF INGAN USING INDUCTIVELY COUPLED $Cl_2/CHF_3,{\;}Cl_2/CH_4$ AND Cl_2/Ar PLASMAS.

  • Lee, D.H.;Kim, H.S.;G.Y. Yeom;Lee, J.W.;Kim, T.I.
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 1999년도 추계학술발표회 초록집
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    • pp.59-59
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    • 1999
  • In this study, planer inductively coupled $Cl_2$ based plasmas were used to etch InGaN and the effects of plasma conditions on the InGaN etch properties have been characterized using quadrupole mass spectrometry(QMS) and optical emission spectroscopy(OES). As process conditions used to study the effects of plasma characteristics on the InGaN etch properties, $Cl_2$ was used as the main etch gas and $CHF_3,{\;}CH_4$, and Ar were used as additive gases. Operational pressure was varied from SmTorr to 3OmTorr, inductive power and bias voltage were varied from 400W to 800W and -50V to -250V, respectively while the substrate temperature was fixed at 50 centigrade. For the $Cl_2$ plasmas, selective etching of GaN to InGaN was obtained regardless of plasma conditions. The small addition of $CHF_3$ or Ar to $Cl_2$ and the decrease of pressure generally increased InGaN etch rates. The selective etching of InGaN to GaN could be obtained by the reduction of pressure to l5mTorr in $CI_2/IO%CHF_3{\;}or{\;}CI_2/IO%Ar$ plasma. The enhancement of InGaN etch rates was related to the ion bombardment for $CI_2/Ar$ plasmas and the formation of $CH_x$ radicals for $CI_2/CHF_3(CH_4)$ plasmas.

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실리카광물의 산침출 정제와 불순물 분석법 연구 (Impurity analysis and acid leaching purification of silica minerals)

  • 이길용;윤윤열;조수영;채영배
    • 분석과학
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    • 제20권6호
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    • pp.516-523
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    • 2007
  • 2N급(99 %)의 실리카를 3N급(99.9 %)으로 향상시키기 위해서 널리 이용되고 있는 산 침출법(acid leaching)들의 정제효과와 실리카광물에 존재하는 불순물의 분석법에 대한 연구를 수행하였다. 산 침출법에 이용한 용액은 0.2M-oxalic acid (pH1.5, 2.5), conc-Aqua regia, 2.5 %-HCl/HF, 1 %-$HNO_3/HF$의 다섯 종류이었으며, 각 방법의 불순물 정제특성과 침출시간에 따른 침출효율을 조사하였다. 실리카광물과 침출용액중의 불순물 분석은 중성자방사화분석법(neutron activation analysis; NAA), 유도결합 플라즈마 원자방출 분석법(inductively coupled plasma atomic emission spectrometry; ICP-AES), 원자흡광 분광분석법(atomic absorption spectrometry; AAS), x-선 형광분석법(x-ray fluorescence; XRF), 그리고 습식분석법(wet analysis; WA)의 여섯 가지 방법을 이용하였으며, 불순물의 농도와 종류에 따른 분석법들의 장단점을 조사하였다. 실험에 사용한 실리카광물은 습식 비중선별 및 자력선별과 같은 물리적 정제를 거친 순도 99 %급의 실리카로서 $100-150{\mu}m$ 범위의 입도분포를 가지는 분말들이었다. 실리카중 주요 불순물은 Al, Fe, Na, Ca 및 Ti 이었으며 수백에서 수천 mg/kg의 농도로 존재하고 있었다. 산 침출방법과 불순물의 종류에 따른 정제효과를 비교한 결과 2.5 %-HCl/HF 침출방법이 가장 효과적이었으며 이 방법으로 99.1 % 실리카 분말을 99.8 %까지 순도를 향상시킬 수 있었다. 또한 실리카광물과 침출용액의 불순물의 종류와 함량에 따른 최적의 분석기술을 결정할 수 있었다.

고밀도 $CF_{4}/Ar$ 플라즈마에서 $YMnO_3$ 박막의 식각 매카니즘 (Etching Mechanism of $YMnO_3$ Thin Films in High Density $CF_{4}/Ar$ Plasma)

  • 이철인;김동표;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 춘계학술대회 논문집 반도체재료
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    • pp.12-16
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    • 2001
  • We investigated the etching characteristics of $YMnO_3$ thin films in high-density plasma etching system. In this study. $YMnO_3$ thin films were etched with $CF_{4}/Ar$ gas chemistries in inductively coupled plasma (ICP). Etch rates of $YMnO_3$ were measured according to gas mixing ratios. The maximum etch rate of $YMnO_3$ is 18 nm/min at $CF_{4}/(CF_{4}+Ar)$ of 20%. In optical emission spectroscopy (OES) analysis, F radical and Ar* ions in plasma at various gas chemistries decreased with increasing $CF_4$ content. Chemical states of $YMnO_3$ films exposed in plasma were investigated with x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). There is a chemical reaction between metal (Y, Mn) and F and metal-fluorides were removed effectively by Ar ion sputtering. $YF_x$, $MnF_x$ such as YF, $YF_2$, $YF_3$ and $MnF_3$ Were detected using SIMS analysis. The etch slope is about $65^{\circ}C$ and free of residues.

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펨토초 및 나노초 레이저를 이용한 박막태양전지의 레이저 플라즈마 분광 분석 (Application of a LIBS technique using femtosecond and nanosecond pulses for the CIGS films analysis)

  • 이석희;최장희;;;;;정성호
    • 한국레이저가공학회지
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    • 제17권4호
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    • pp.7-13
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    • 2014
  • In this work, the application of laser induced breakdown spectroscopy (LIBS) for the composition analysis of thin $Cu(In,Ga)Se_2$ (CIGS) solar cell films ($1-2{\mu}m$ thickness) is reported. For the ablation of CIGS films, femtosecond (fs) laser (wavelength = 343nm, pulse width = 500fs) and nanosecond (ns) laser (wavelength = 266nm, pulse width = 5ns) were used under atmospheric environment. The emission spectra were detected with an intensified charge coupled device (ICCD) spectrometer and multichannel CCD spectrometer for fs-LIBS and ns-LIBS, respectively. The calibration curves for fs-LIBS and ns-LIBS intensity ratios of Ga/Cu, In/Cu, and Ga/In were generated with respect to the concentration ratios measured by inductively coupled plasma optical emission spectrometry (ICP-OES).

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ICP/AES에 의한 지질시료 중의 희토류원소 분석 (Determination of Rare Earth Elements in USGS Geological Materials by ICP/AES)

  • 김정석;최광순;박용준;지광용
    • 대한화학회지
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    • 제39권2호
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    • pp.28-81
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    • 1995
  • 지질시료 중의 전 회토류원소들을 유도결합플라즈마 원자방출분광법을 이용하여 동시 및 개별정량하였다. 시료는 산처리 및 알칼리 용융으로 분해하고 TOPO(triocylphosphine oxide)를 이용하여 용매추출한 다음 HCl 용액으로 역추출하여 군분리하였다. 표준암석 AGV-1에 대한 분석결과는 US Geological Survey 및 다른 문헌상의 결과와 비교하여 양호하였다.

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VOCs 연소를 위한 자동차 폐촉매의 전처리 효과 (Pretreatment Effect of Waste Automotive Catalysts for VOCs Combustion)

  • 문정선
    • 한국대기환경학회지
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    • 제16권2호
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    • pp.191-198
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    • 2000
  • For a characterization of the pretreated waste automotive catalyst the following analysis techniques were applied : EA(Elemental Analysis) BET(Brunaure-Emmett-Teller) and ICP-AES(Inductively Coupled Plasma-Atomic Emission Spectrometry). The combustion activity of waste automotive catalyst was investigated for methanol acetaldehyde and toluene as model VOCs in a fixed bed reactor. carbon deposit amount was decreased with increasing catalyst showed a good catalytic activity for VOCs combustion at 40$0^{\circ}C$. Catalytic activity for methanol acetaldehyde and toluence combustion was very excellent and decreased with mileage. The catalytic activity of a waste automotive catalyst for methanol combustion increased after acid treatment. The acid effect of catalytic activity was summarized as follows: HNO3>HCI>H2SO4>CH3COOH. The waste automotive catalyst regenerated by the pretreatment method might have a excellent catalytic activity for VOCs combustion.

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