• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.287-287
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• 2010

We report a new direct patterning method, called liquid bridge-mediated nanotransfer molding (LB-nTM), for the formation of two- or three-dimensional structures with feature sizes between tens of nanometers and tens of micron over large areas. LB-nTM is based on the direct transfer of various materials from a mold to a substrate via a liquid bridge between them. This procedure can be adopted for automated direct printing machines that generate patterns of functional materials with a wide range of feature sizes on diverse substrates. Arrays of TIPS-PEN TFTs were fabricated on 4" polyethersulfone (PES) substrates by LB-nTM using PDMS molds. An inverted staggered structure was employed in the TFT device fabrication. A 150 nm-thick indium-tin oxide (ITO) gate electrode and a 200 nm-thick SiO2dielectric layer were formed on a PES substrate by sputter deposition. An array of TIPS-PEN patterns (thickness: 60 nm) as active channel layers was fabricated on the substrate by LB-nTM. The nominal channel length of the TIPS-PEN TFT was 10 mm, while the channel width was 135 mm. Finally, the source and drain electrodes of 200 nm-thick Ag were defined on the substrate by LB-nTM. The TIPS-PEN TFTs can endure strenuous bending and are also transparent in the visible range, and therefore potentially useful for flexible and invisible electronics.

• Journal of Korean Ophthalmic Optics Society
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• v.7 no.2
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• pp.163-167
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• 2002

Improved optical switching property of electrochromic nickel hydroxide/nickel glass thin film is reported. Nickel metal film was deposited on glass by e-beam evaporation before following electrochemical redox cycling to form nickel hydroxide for electrochromic activation. Without ITO (indium tin oxide) layer as electrical conductor, this electrode showed more rapid coloration rate than nickel hydroxide film on ITO substrate in the change of the electric voltage and optical transmittance. XPS analysis confirmed the existence of ultra-thin nickel metal layer (${\sim}10{\AA}$) between electrochemically grown nickel hydroxide and the glass substrate. It is concluded that the remained nickel metal nano-layer attribute to the conduction layer and the enhanced response time.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.158-161
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• 2004

We have studied a lifetime in organic light-emitting diodes depending on buffer layer. A transparent electrode of indium-tin-oxide(ITO) was used as an anode. And the cathode for electron injection was LiAl. Phthalocyanine Copper(CuPc), Poly(3,4-ethylenedioxythiophene):poly (PEDOT:PSS), or poly (9-vinylcarbazole)(PVK) material was used as a buffer layer. A thermal evaporation was performed to make a thickness of 40nm of TPD layer at a rate of $0.5{\sim}1\;{\AA}/s$ at a base pressure of $5{\times}10^{-6}\;torr$. A material of tris(8-hydroxyquinolinate) Aluminum($Alq_3$) was used as an electron transport and emissive layer. A thermal evaporation of $Alq_3$ was done at a deposition rate of $0.7{\sim}0.8[{\AA}/s]$ at a base pressure of $5{\times}10^{-6}\;torr$. By varying the buffer material, hole injection at the interface could be controlled because of the change in work function. Devices with CuPc and PEDOT:PSS buffer layer are superior to the other PVK buffer layer.

• Korean Journal of Optics and Photonics
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• v.28 no.6
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• pp.356-360
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• 2017

Indium tin oxide (ITO) provides high electrical conductivity and transparency at visible and near-IR wavelengths. ITO is widely used as a transparent electrode for the fabrication of LCDs, OLEDs, and many kinds of optical applications. It is widely employed for electrodes in various electric and display sectors because of its transparency in the visible range and high conductivity. Therefore, one issue is removing a specific area of a layer of material such as ITO or metallic film on a substrate, without affecting the properties of the substrate. ITO-on-glass removal using a laser is friendlier to the environment than traditional methods. In this study, ablation of ITO film on glass using a femtosecond-laser micromachining system (wavelength 1026 nm, pulse duration 150 fs) and a nanosecond-laser micromachining system (wavelength 1027 nm, pulse duration 5 ns) are described, compared, and analyzed.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.331-331
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• 2009

Hafnium oxide ($HfO_2$) attracted by one of the potential candidates for the replacement of si-based oxides. For applications of the high-k gate dielectric material, high thermodynamic stability and low interface-trap density are required. Furthermore, the amorphous film structure would be more effective to reduce the leakage current. To search the gate oxide materials, metal-insulator-metal (MIM) capacitors was fabricated by pulsed laser deposition (PLD) on indium tin oxide (ITO) coated glass with different oxygen pressures (30 and 50 mTorr) at room temperature, and they were deposited by Au/Ti metal as the top electrode patterned by conventional photolithography with an area of $3.14\times10^{-4}\;cm^2$. The results of XRD patterns indicate that all films have amorphous phase. Field emission scanning electron microscopy (FE-SEM) images show that the thickness of the $HfO_2$ films is typical 50 nm, and the grain size of the $HfO_2$ films increases as the oxygen pressure increases. The capacitance and leakage current of films were measured by a Agilent 4284A LCR meter and Keithley 4200 semiconductor parameter analyzer, respectively. Capacitance-voltage characteristics show that the capacitance at 1 MHz are 150 and 58 nF, and leakage current density of films indicate $7.8\times10^{-4}$ and $1.6\times10^{-3}\;A/cm^2$ grown at 30 and 50 mTorr, respectively. The optical properties of the $HfO_2$ films were demonstrated by UV-VIS spectrophotometer (Scinco, S-3100) having the wavelength from 190 to 900 nm. Because films show high transmittance (around 85 %), they are suitable as transparent devices.

• Journal of Digital Convergence
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• v.12 no.7
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• pp.291-296
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• 2014

Inserting a $SiO_2$ layer underneath the p-pad electrode as the current blocking layer (CBL) structure and extending p-metal finger patterns, the GaN LEDs using an indium-tin-oxide (ITO) layer show the improved light output intensity, resulting from better current spreading and reduced light loss on the surface of p-pad metal. The LEDs with an oxide layer of $100{\mu}m$-pad-width and $6{\mu}m$-finger-width have better light output intensities than those with an oxide layer of $105{\mu}m$-pad-width and $12{\mu}m$-finger-width. Using the ATLAS device simulator from Silvaco Corporation, the current density distributions on the active layer in CBL LEDs have been investigated.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.162.2-162.2
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• 2015

플렉서블 디스플레이에 사용되는 투명전극은 벤딩에 의한 인장(tensile) 및 압축(compressive) 스트레스 하에서도 전극의 특성이 지속적으로 유지되어야 한다. 기존 OLED소자의 투명전극으로 사용되던 인듐산화물(ITO, Indium Tin Oxide)는 인듐(Indium)의 희소성 문제뿐만 아니라 벤딩에 대한 복원력이 나쁜 것으로 알려져 플렉서블 디스플레이에는 적합하지 않은 것으로 알려져 있다. 벤딩에 강하고 복원력이 우수한 투명전극 재료가 필요하게 되었다. 본 연구에서는 PEN (Polyethylene Naphthalate) 유연기판 상에 그래핀(Graphene)전극을 구현하여 벤딩에 대한 저항특성을 관찰하였고 일반적으로 많이 사용하는 Aluminum 전극과의 비교를 통해 광효율을 지속적으로 유지할 수 있는 플렉서블 OLED용 전극구현 가능성을 연구하였다. 일반적으로 Al금속은 인장 스트레스를 받음에 따라 저항이 증가하고 다시 복원되면 저항이 감소하는 특성을 갖고 있는데 인장 스트레스에 따라 저항과 늘어난 길이와의 관계는 다음과 같다. $R/R0=(L/L0)^2$ ----------------------------------------- (1) 그러나 반복된 스트레스가 가해질 경우 Al 금속 전극은 복원력을 잃고 저항이 원래대로 돌아가지 않는 문제가 발생하는데 반해 그래핀은 벌집모양의 구조를 갖고 있어 벤딩에 대한 강도가 셀 뿐만 아니라 고탄력으로 인해 복원력이 우수하여 여러 싸이클(cycle)의 벤딩 실험에 의해서도 복원력이 지속적으로 유지되었다. Al 금속 전극의 경우 벤딩 각도 또는 정도에 따라 복원력이 유지되는 구간이 있으나 반복적인 벤딩 싸이클에 의해 복원력이 감소하여 인장 스트레스에 의한 저항 증가 후 스트레스 제거 시 저항 감소가 되지 않는데 24시간 동안 전기 저항 변화를 관찰하면 수시간 후에나 저항이 어느 수준까지만 복원되는 것을 확인할 수 있었으나 복원에 오랜 시간이 소요된다는 점에서 그래핀과 비교가 된다. SEM(Scanning electron microscopy) 분석을 통해 인장 스트레스 인가/제거를 반복함에 따라 Al 금속표면이 표면에 열화되는 것을 확인하였으나 그래핀에서는 나타나지 않았다. 본 연구에서는 높은 투과도와 우수한 전기적 특성을 가지는 그래핀 투명 전도성 전극이 다양한벤딩 조건에서도 뛰어난 복원 특성을 보이는 것을 밝혀내어 차세대 투명 전극 물질로 개발하고자 하였다.

• Clean Technology
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• v.22 no.4
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• pp.232-240
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• 2016

Recently, various research studies have been conducted and many are in progress for the suitable alternative materials for ITO based touch screen panel (TSP) due to limitations in size and flexibility. Various researches from all over the world have been attempted to fabricate the fine electrode less than $5{\mu}m$ for the rapid developing of display technology. Research is also being carried out in metal mesh methods using the existing technologies and alternative materials at commercial level. However, by using the existing technologies certain discrepancies are observed like low transparency and low yield which also results in the distortion of patterns. For repairing the damaged pattern, the conventional laser CVD technique has also been used but there are some challenges observed in CVD technique like achieving a stable fine electrode of $10{\mu}m$ or less and avoiding the formation of satellite drops. To overcome these issues, a new printing process named Electrohydrodynamic (EHD) printing, has been introduced by which $5{\mu}m$ fine patterns can be printed in one step. This EHDA printing technique has been applied to print very fine electrodes of $5{\mu}m$ or less by using conductive inks of various viscosities. This study also presents the optimized process parameters for printing $5{\mu}m$ fine electrode patterns during experiments by controlling the applied voltage and supply flow rate. The $5{\mu}m$ repair electrodes were fabricated for repairing $50{\mu}m$ shorted electrode samples.

• Journal of the Korean Applied Science and Technology
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• v.34 no.2
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• pp.376-381
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• 2017

We were investigated by cyclic voltammetry to the stability through the electrochemical characteristics of Langmuir-Blodgett films mixed with myristic acid and stearic acid. Fatty acid mixture monolayer LB films was deposited by the LB method on the indium tin oxide(ITO) glass. The electrochemical properties was measured by cyclic voltammetry with a three-electrode system in 0.01 N $NaClO_4$ solution. The measuring range is continuously oxidized to 1650 mV, with an initial potential of -1350 mV was reduced. Scanning rates of 50, 100, 150, 200, and 250 mV/s was set. As a result, LB monolayer films of fatty acid mixture was appeared on irreversible processes by the oxidation current from the cyclic voltammogram. Diffusion coefficient (D) of fatty acid mixture was calculated $7.9{\times}10^{-2}cm^2s^{-1}$ at 0.01 N $NaClO_4$ solution.

• Journal of the Korean Applied Science and Technology
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• v.30 no.4
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• pp.754-760
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• 2013

We investigated an electrochemical properties for Langmuir-Blodgett (LB) monolayer films of sphingomyelin(SP) and polyamic acid(PAA) mixture(1:1, 2:1 and 3:1 molar ratio). LB monolayer films of mixture was deposited by the LB method on the indium tin oxide(ITO) glass. The electrochemical properties measured by cyclic voltammetry with three-electrode system in 0.1N $KClO_4$ solution. As a result, LB monolayer films of SP and PAA mixture was appeared on irreversible process caused by the reduction current from the cyclic voltammogram. Diffusion coefficient(D) in the SP and PAA mixture was calculated $2.670{\times}10^{-5}$, $3.562{\times}10^{-5}$ and $1.005{\times}10^{-5}cm^2s^{-1}$ at 1:1, 2:1 and 3:1 molar ratio, respectively.