Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2009.06a
- /
- Pages.331-331
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- 2009
Structural, Electrical and Optical Properties of $HfO_2$ Films for Gate Dielectric Material of TTFTs
- Lee, Won-Yong (Korea University) ;
-
Kim, Ji-Hong
(Korea University) ;
-
Roh, Ji-Hyoung
(Korea University) ;
- Moon, Byung-Moo (Korea University) ;
-
Koo, Sang-Mo
(Kwangwoon University)
- 이원용 (고려대학교 전자전기공학과) ;
-
김지홍
(고려대학교 전자전기공학과) ;
-
노지형
(고려대학교 전자전기공학과) ;
- 문병무 (고려대학교 전자전기공학과) ;
-
구상모
(광운대학교 전자재료공학과)
- Published : 2009.06.18
Abstract
Hafnium oxide (