• 제목/요약/키워드: Indium tin oxide (ITO)

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ITO(Indium Tin Oxide) 전극상의 전기화학적 Nickel 박막형성 (Growth of Electrochemical Nickel Thin Film on ITO(Indium Tin Oxide) Electrode)

  • 김우성;성정섭
    • 한국안광학회지
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    • 제7권2호
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    • pp.155-161
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    • 2002
  • 전도성 혹은 비전도성 지지체에서 전기변색이 가능한 수 nm에서 수액 nm 두께의 금속 니켈 박막 형성에 대한 연구를 수행하였다. 광학렌즈나 혹은 LCD에 사용되는 ITO, 실리콘 웨이퍼에 박막 형성에 대한 연구는 다양한 두께의 니켈 박막은 자체로서의 응용 가능성 뿐 아니라, 광전기화학 소자, 특히 선글라스로 대변되는 변색 소자에의 응용 가능성이 아주 크다. 이러한 소자들은 나노 기술 응용과 양자점의 응용 등으로 경박단소형의 렌즈나 전지, 유리 그리고 태양 선지 등에 응용이 가능하다. 전기화학적으로 니켈 금속을 ITO 유리위에 코팅한 후, AFM, XRD을 이용하여 미세구조를 확인하고, 순환전압전류법, 시간대전류법, 임피던스를 이용하여 이들의 전기화학적 박막 특성을 조사하였다.

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졸겔 연소법에 의한 nano crystalline ITO제작 및 특성 (Synthesis of nano porous indium tin oxide by sol-gel combustion hybrid method)

  • 정기영;곽동주;성열문;박차수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2009년도 제40회 하계학술대회
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    • pp.1328_1329
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    • 2009
  • Nano porous indium tin oxide (ITO) powder was synthesized employing a new route sol-gel combustion hybrid method using Ketjen Black as a fuel. The nano porous ITO powder was composed of $SnCl_4$-98.0% and $In(NO_3)_3{\cdot}XH_2O$-99.999%, produce with a $NH_4OH$ with sol-gel method as a catalyst [1,2]. Crystal structures were examined by powder X-ray diffraction (XRD), and those results show shaper intensity peak at $25.6^{\circ}(2{\Theta})$ of $SnO_2$ by increased sintering temperature. A particle morphology as well as crystal size was investigated by scanning electron microscopy(FE-SEM), and the size of the nano porous powder was found to be in the range of 20~30nm. ITO films could controlled by nano porous powder at various sintering temperature in this paper[3,4]. The sol-gel combustion method was offered simple and effective route for the synthesis of nano porous ITO powder[5].

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스퍼터링 증착 조건에 따른 금속 박막의 습식 식각율 (The Wet Etching Rate of Metal Thin Film by Sputtering Deposition Condition)

  • 허창우
    • 한국정보통신학회논문지
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    • 제14권6호
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    • pp.1465-1468
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    • 2010
  • 습식 식각은 식각용액으로서 화학용액을 사용하는 공정으로 반응물이 기판표면에서 화학반응을 일으켜 표면을 식각하는 과정이다. 습식 식각 시 수${\mu}m$의 해상도를 얻기 위해서는 그 부식액의 조성이나, 에칭시간, 부식액의 온도 등을 고려하여야 한다. 본 실험에서 사용한 금속은 Cr, Al, ITO 로 모두 DC sputter 방법을 사용해서 증착하여 사용하였다. Cr박막은 $1300{\AA}$ 정도의 두께를 사용하였고, ITO (Indium Tin Oxide) 박막은 가시광 영역에서 투명하고 (80% 이상의 transmittance), 저저항 (Sheet Resistance : $50\;{\Omega}/sq$ 이하) 인 박막을 사용하였으며, 신호선으로 주로 사용되는 Al등의 증착조건에 따른 wet etching 특성을 조사하였다.

Flexible 기판 위의 Bending 처리에 따른 ITO 필름의 Stress 분포 특성 (Stress Distribution of Indium-tin-oxide (ITO) Film on Flexible Substrate by Bending process)

  • 박준백;황정연;서대식;박성규;문대규;한정인
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.181-184
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    • 2003
  • In this paper, we investigated the position-dependent stress distribution of indium-tin-oxide (ITO) film on Polycarbonate (PC) substrate by external bending force. It was found that there are the maximum crack density at the center position and decreasing crack density as goes to the edge. In accordance with crack distribution, it was observed that the change of electrical resistivity of ITO islands is maximum at the center and decrease as goes to the edge. From the result that crack density is increasing at same island position as face-plate distance (L) decreases, it is evident that the more stress is imposed on same island position as L decreases.

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Study on IZTO and ITO Films Deposited on PI Substrate by Pulsed DC Magnetron Sputtering System

  • Ko, Yoon-Duk;Kim, Joo-Yeob;Joung, Hong-Chan;Lee, Chang-Hun;Bae, Jung-Ae;Choi, Byung-Hyun;Ji, Mi-Jung;Kim, Young-Sung
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.93-93
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    • 2011
  • The Indium Zinc Tin Oxide (IZTO) and Indium Tin Oxide (ITO) thin films are grown on PI substrate at different substrate temperature by pulsed DC magnetron sputtering with a sintered ceramic target of IZTO (In2O3 70 wt.%, ZnO 15 wt.%, SnO2 15 wt.%) and ITO (In2O3 90wt.%, SnO2 10wt.%). The structural, electrical, and optical properties are investigated. The IZTO thin films deposited at low temperature showed relatively low electrical resistivity compared to ITO thin films deposited at low temperature. As a result, we could prepare the IZTO thin films with the resistivity as low as $5.6{\times}10^{-4}({\Omega}{\cdot}m)$. Both of the films deposited on PI substrate showed an average transmittance over 80% in visible range (400.800nm). Overall, IZTO thin film is a promising candidate as an alternative TCO material to ITO in flexible and OLED devices.

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표면코팅을 통한 LiMn2O4 양극의 고온성능 개선 (Improvement of High-Temperature Performance of LiMn2O4 Cathode by Surface Coating)

  • 이길원;이종화;류지헌;오승모
    • 전기화학회지
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    • 제12권1호
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    • pp.81-87
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    • 2009
  • 리튬 이차전지의 양극 활물질인 스피넬 망간산화물(${LiMn_2}{O_4}$, LMO) 표면에 ITO(indium tin oxide)를 코팅하여, 고온($55^{\circ}C$)에서 사이클 수명과 속도특성을 조사하였다. 정전류 정전압 충방전 실험의 결과, ITO가 코팅되지 않은 LMO 전극의 표면에서 고온 고전압 조건에서 전해질이 분해하여 피막이 형성되고, 이 피막의 저항으로 인하여 분극현상(polarization)이 심하게 발생하였다. 그러나, ITO가 2 mol% 이상 코팅된 LMO의 경우 양극 활물질과 전해질과의 직접적인 접촉 면적이 줄어들어, 전해질의 분해가 감소하였고 내부저항에 의한 분극 현상 또한 현저히 감소하였다. 이러한 결과, ITO가 코팅된 전극의 충방전에 따른 가역성이 코팅되지 않은 LMO에 비해 크게 향상되었다. 적외선 분광기를 이용하여 ITO가 코팅된 LMO 표면에서 피막형성이 감소함을 확인하였다. ITO의 코팅으로 LMO 전극의 속도특성도 크게 향상되었는데, 이는 저항이 큰 피막형성이 억제된다는 점과 ITO의 전기전도도가 크다는 사실로 설명할 수 있다.

DOPING EFFICIENCIES OF OXYGEN VACANCY AND SN DONOR FOR ITO AND InO THIN FILMS

  • Chihara, Koji;Honda, Shin-ichi;Watamori, Michio;Oura, Kenjiro
    • 한국표면공학회지
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    • 제29권6호
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    • pp.876-879
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    • 1996
  • The effect of oxygen vacancy and Sn donor on carrier density for Indium Tin oxide (ITO) and Indium oxide (InO) films has been investigated. Hot-cathode Penning discharge sputtering (HC-PDS) in the mixed gasses of argon and oxygen was applied to fabricate the ITO and InO films. Density of oxygen vacancy was estimated using a high-energy ion beam technique. The electrical properties of the films such as resistivity, carrier density and mobility were estimated by Van der Pauw method. The doping efficiency of oxygen vacancy could be obtained from the relationship between oxygen vacancy and carrier density. The doping efficiency of oxygen vacancy for ITO films resulted in a quite small value. Comparing the doping efficiencies of ITO and InO films, the effect of Sn donor on carrier density was also discussed.

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Indium tin oxide films grown on polymer substrate by a low-frequency magnetron sputtering method

  • Jung, Sang-Kooun;Kim, Hong-Tak;Lee, Do-Kyung;Cho, Yong;Park, Lee-Soon;Park, Duck-Kyu;Sohn, Sang-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.992-995
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    • 2004
  • In this study, we have grown indium tin oxide (ITO) thin films by using a low-frequency (60${\sim}$300 Hz) magnetron sputtering method and investigated characteristics of ITO thin films deposited on polyethersulfone substrates. The experimental results show that the films have good qualities in surface morphology, transmittance, and electrical conduction.

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플렉서블 디스플레이용 투명전극 제조를 위한 ITO 대체소재 연구동향

  • 김선옥;최수빈;김종웅
    • 세라미스트
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    • 제21권1호
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    • pp.12-23
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    • 2018
  • As the flexible displays have been considered as a breakthrough to make a new electronics category, transparent electrodes have also confronted with an emerging issue, i.e., they also need to be mechanically flexible. For this to be made possible, a transparent electrode capable of withstanding large amounts of strain must be developed. Indium tin oxide (ITO) has been one of the most widely adopted transparent electrodes for displays and other transparent electronics, mainly supported by its high electrical conductivity and optical transparency. However, its brittle nature has forced the display industry to search for other alternatives. Recently, advances in nano-material researches have opened the door for various transparent conductive materials, which include carbon nanotube, graphene, Ag and Cu nanowire, and printable metal grids. Here we reviewed recently-published research works introducing flexible displays, all of which are employing the novel candidates for a conducting material.

Characteristics of ITO/Ag/ITO Hybrid Layers Prepared by Magnetron Sputtering for Transparent Film Heaters

  • Kim, Jaeyeon;Kim, Seohan;Yoon, Seonghwan;Song, Pungkeun
    • Journal of the Optical Society of Korea
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    • 제20권6호
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    • pp.807-812
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    • 2016
  • Transparent film heaters (TFHs) based on Joule heating are currently an active research area. However, TFHs based on an indium tin oxide (ITO) monolayer have a number of problems. For example, heating is concentrated in only part of the device. Also, heating efficiency is low because it has high sheet resistance ($R_s$). To address these problems, this study introduced hybrid layers of ITO/Ag/ITO deposited by magnetron sputtering, and the electrical, optical, and thermal properties were estimated for various thicknesses of the metal interlayer. The $R_s$ of ITO(40)/Ag/ITO(40 nm) hybrid TFHs were 5.33, 3.29 and $2.15{\Omega}/{\Box}$ for Ag thicknesses of 10, 15, and 20 nm, respectively, while the $R_s$ of an ITO monolayer (95 nm) was $59.58{\Omega}/{\Box}$. The maximum temperatures of these hybrid TFHs were 92, 131, and $145^{\circ}C$, respectively, under a voltage of 3 V. And that of the ITO monolayer was only $32^{\circ}C$. For the same total thickness of 95 nm, the heat generation rate (HGR) of the hybrid produced a temperature approximately $100^{\circ}C$ higher than the ITO monolayer. It was confirmed that the film with the lowest $R_s$ of the samples had the highest HGR for the same applied voltage. Overall, hybrid layers of ITO/Ag/ITO showed excellent performance for HGR, uniformity of heat distribution, and thermal response time.