• Title/Summary/Keyword: Indium oxide

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Direct Patterning Technology of Indium Tin Oxide Layer using Nd:$YVO_4$ Laser Beam (Nd:$YVO_4$ 레이저 빔을 이용한 인듐 주석 산화물 직접 묘화 기술)

  • Kim, Kwang-Ho;Kwon, Sang-Jik
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.11
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    • pp.8-12
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    • 2008

  • For the reduction of fabrication cost and process time of AC plasma display panel (PDP), indium tin oxide (ITO) layer was patterned as bus electrode using Nd:$YVO_4$ laser. In comparison with the chemically wet etched ITO patterns, laser ablated ITO patterns showed the formation of shoulders and ripple-like structures at the edge of the ITO lines. For the reduction of shoulders and ripple-like structures, pulse repetition rate and scan velocity of laser was changed. In addition, we analyzed a discharge characteristic of PDP test panel to observe how the shoulders and ripple-like structures influence on the PDP. Based on experimental results, the pattern etched at the 500 mm/s and 40 kHz was better than any other condition. From this experiment we could see the possibility of the laser direct patterning for the application to the patterning of ITO in AC-PDP.

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