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Direct Patterning Technology of Indium Tin Oxide Layer using Nd:$YVO_4$ Laser Beam  

Kim, Kwang-Ho (Department of Electronic Engineering, Kyungwon University)
Kwon, Sang-Jik (Department of Electronic Engineering, Kyungwon University)
Publication Information
Journal of the Institute of Electronics Engineers of Korea SD / v.45, no.11, 2008 , pp. 8-12 More about this Journal
Abstract
For the reduction of fabrication cost and process time of AC plasma display panel (PDP), indium tin oxide (ITO) layer was patterned as bus electrode using Nd:$YVO_4$ laser. In comparison with the chemically wet etched ITO patterns, laser ablated ITO patterns showed the formation of shoulders and ripple-like structures at the edge of the ITO lines. For the reduction of shoulders and ripple-like structures, pulse repetition rate and scan velocity of laser was changed. In addition, we analyzed a discharge characteristic of PDP test panel to observe how the shoulders and ripple-like structures influence on the PDP. Based on experimental results, the pattern etched at the 500 mm/s and 40 kHz was better than any other condition. From this experiment we could see the possibility of the laser direct patterning for the application to the patterning of ITO in AC-PDP.
Keywords
PDP; Indium Tin Oxide;
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