• Title/Summary/Keyword: Indium oxide

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Plasma treatments of indium tin oxide(ITO) anodes in argon/oxygen to improve the performance and morphological property of organic light-emitting diodes(OLED) ($O_2$ : Ar 혼합가스 플라즈마로 ITO표면 처리한 OLED의 동작특성 향상과 표면개질에 관한 연구)

  • Seo, Yu-Suk;Moon, Dae-Gyu;Jo, Nam-Ihn
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.04a
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    • pp.67-68
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    • 2008
  • A simple bi-layer structure of organic light emitting diode (OLED) was used to study the characteristics of anode preparation. Indium tin oxide (ITO) anode surface treatment of OLEDs was performed to get the optimum condition for the ITO anode. The ITO surface was treated by $O_2$ or $O_2$ / Ar mixed gas plasma with different processing time. The electrical characteristics of OLED were improved by plasma treatment. The operating voltage of OLED with $O_2$ or $O_2$/Ar mixed gas plasma treated anodes decreases from 8.2 to 3.4 V and 3.2V, respectively. The $O_2$ /Ar mixed gas plasma treatment results in better electrical property.

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RF-enhanced DC-magnetron Sputtering of Indium Tin Oxide

  • Futagami, Toshiro;Kamei, Masayuki;Yasui, Itaru;Shigesato, Yuzo
    • The Korean Journal of Ceramics
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    • v.7 no.1
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    • pp.26-29
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    • 2001
  • Indium tin oxide (ITO) films were deposited on glass substrates at $300^{\circ}C$ in oxygen/argon mixtures by RF-enhanced DC-magnetron sputtering and were compared to those by conventional DC magnetron sputtering. The RF enhancement was performed using a coil above an ITO target. X-ray diffraction measurements revealed that RF-enhanced plasma affected the preferred orientation and the crystallinity of the films. The resistivity of the films prepared by RF-enhanced DC-magnetron sputtering was almost constant at oxygen content lower than 0.3% and then increased sharply with increasing oxygen content. However the resistivity of the films by conventional sputtering has little dependence on the oxygen content. Those results can be explained on the basis of the incorporation of oxygen into the ITO films due to the RF enhancement.

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Dynamic Response Behavior of Femtosecond Laser-Annealed Indium Zinc Oxide Thin-Film Transistors

  • Shan, Fei;Kim, Sung-Jin
    • Journal of Electrical Engineering and Technology
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    • v.12 no.6
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    • pp.2353-2358
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    • 2017
  • A femtosecond laser pre-annealing process based on indium zinc oxide (IZO) thin-film transistors (TFTs) is fabricated. We demonstrate a stable pre-annealing process to analyze surface structure change of thin films, and we maintain electrical stability and improve electrical performance. Furthermore, dynamic electrical characteristics of the IZO TFTs were investigated. Femtosecond laser pre-annealing process-based IZO TFTs exhibit a field-effect mobility of $3.75cm^2/Vs$, an $I_{on}/I_{off}$ ratio of $1.77{\times}10^5$, a threshold voltage of 1.13 V, and a subthreshold swing of 1.21 V/dec. And the IZO-based inverter shows a fast switching behavior response. From this study, IZO TFTs from using the femtosecond laser annealing technique were found to strongly affect the electrical performance and charge transport dynamics in electronic devices.

The Effects of SiO Gas Barrier Film on the Depositing IZO/Glass Thin Film (IZO/Glass 성막 시 SiO가스배리어막의 영향)

  • Kim, Do-Hyoung;Yoon, Han-Ki;Qiu, Zhiyong;Murakami, Ri-ichi
    • Proceedings of the KSME Conference
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    • 2007.05a
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    • pp.215-219
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    • 2007
  • In this work, the indium zinc oxide (IZO) films had been deposited on the glass substrate coated with the SiO film. Based on a comparative investigation of the IZO monolayer and IZO/SiO multilayer, it is shown that the thickness of SiO film has a great effect on the mechanical properties of the thin films. The AFM images of the IZO thin film included the SiO film were shown smoother surfaces than monolayer. Resistivity was in inverse proportion to Mobility. If it deposited the SiO film on the substrate, the layer of change was generated between two layer(SiO and substrate). The layer of change influenced resistance because of oxygen content was more than the IZO monolayer.

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Effects of Post-Annealing on Crystallization and Electrical Behaviors of ITO Thin Films Sputtered on PES Substrates (PES 필름상에 스퍼터링한 ITO 박막의 열처리에 따른 결정화 거동 및 전기적 특성 변화)

  • So, Byung-Soo;Kim, Young-Hwan
    • Journal of the Korean Ceramic Society
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    • v.43 no.3 s.286
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    • pp.185-192
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    • 2006
  • The effects of annealing on structural and electrical properties of ITO/PES (Indium Tin Oxide/Polyethersulfone) films was investigated. Amorphous ITO thin films were grown on plastic substrates, PES using low temperature DC magnetron sputtering. Various post annealing techniques were attempted to research variations of microstructure and electrical properties: i) conventional thermal annealing, ii) excimer laser annealing, iii) UV irradiation. The electrical properties were obtained using Hall effect measurements and DC 4-point resistance measurement. The microstructural features were characterized by FESEM, XRD, Raman spectroscopy in terms of morphology and crystallinity. Optimized UV treatment exhibits the enhanced conductivity and crystallinity, compared to those of conventional thermal annealing.

Energy Saving Properties of Sol Gel Dip Coated Indium Tin Oxide Films on a Glass Pane (창유리 위에 졸겔 담금 방법으로 코팅된 인듐 주석 산화막의 에너지 절약 특성)

  • 정형진;이희형;이동헌;이전국
    • Journal of the Korean Ceramic Society
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    • v.29 no.1
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    • pp.48-52
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    • 1992
  • Indium tin oxide (ITO) layers are of considerable interest on account of the combination of properties they provide high electrical conductivity, high infrared reflection with high solar energy transmission, high transmission in the visible range. We are concerned about the variation of the spectral transmittances and sheet resistances as the thickness of SiO2-ZrO2 barrier layer and ITO layers and heat treating conditions are changed. Transmittances and reflectivities were studied by measuring UV-VIS-NIR-, FT-IR spectroscopy. ITO films are crack free, homogeneous and of polycrystalline cubic structure. The microstructure of good ITO films shows a narrow grain size distribution and mean value of 100 nm. The selectivity of absorbing properties is improved by increasing the thickness of ITO films. The increase of sheet resistance of ITO films are due to the increase in the reaction between films and glass substrate.

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Characteristics of the indium tin oxide film grown on PES and PET substrates by a low-frequency magnetron sputtering method

  • Jung, Sang-Kooun;Lee, Sung-Ho;Kim, Myung-Chan;Lee, Do-Kyung;Cho, Yong;Park, Duck-Kyu;Sohn, Sang-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1560-1563
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    • 2005
  • In this study, we introduce indium tin oxide (ITO) thin films grown by using a low-frequency magnetron sputtering method (LFMSM). Characteristics of the ITO thin films deposited on polyethersulfone (PES) and polyethylene terephthalate (PET) substrates are investigated. Experiments were carried out as a function of deposition time. ITO thin films on polymer substrates revealed amorphous structure. The optical, the electrical and structural properties of the films on PES substrate are better than those on PET substrates.

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Characteristics of ITO/polymeric Films with Change of Oxygen Partial Pressure (산소분압의 변화에 따른 ITO/polymeric 박막의 특성)

  • 신성호;김현후
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.8
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    • pp.846-851
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    • 2004
  • Transparent conducting indium tin oxide (TC-ITO) thin films on polymeric substrates have been deposited by a dc reactive magnetron sputtering without heat treatments. The polymeric substrates are acryl (AC), poly carbornate (PC), and polyethlene terephthalate (PET) as well as soda lime glass is also used to compare with the polymeric substrates. Sputtering parameters are an important factor for high quality of TC-ITO thin films prepared on polymeric substrates. Furthermore, the material, electrical and optical properties of as-deposited ITO films are dominated by the ratio of oxygen partial pressure. As the experimental results, the surface roughness of ITO films becomes rough as the oxygen partial pressure increases. The electrical resistivity of as-deposited ITO films decreases initially, and then increases with the increase of oxygen partial pressure. The optical transmittance at visible wavelength for all polymeric substrates is above 82 %.

The Stress Distribution of Indium-tin-oxide (ITO) film on flexible Display Substrate by Bending (Flexible Display 기판 위의 Bending에 따른 ITO 필름의 Stress 분포)

  • 박준백;황정연;서대식;박성규;문대규;한정인
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.12
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    • pp.1115-1120
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    • 2003
  • In this paper, we investigated the position dependent stress distribution of indium-tin-oxide (ITO) film on Polycarbonate (PC) substrate by external bending force. It was found that there are the maximum crack density at the center position and decreasing crack density as goes to the edge, In accordance with crack distribution, it was observed that the change of electrical resistivity of ITO islands is maximum at the center and decrease as goes to the edge. From the result that crack density is increasing at same island position as face plate distance (L) decreases, it is evident that the more stress is imposed on same island position as L decreases.

Nondestructive measurement of sheet resistance of indium tin oxide(ITO) thin films by using a near-field scanning microwave microscope (근접장 마이크로파 현미경을 이용한 ITO 박막 면저항의 비파괴 관측 특성 연구)

  • Yun, Soon-Il;Na, Sung-Wuk;Yun, Young-Wun;You, Hyun-Jun;Lee, Yeong-Joo;Kim, Hyun-Jung;Lee, Kie-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.522-525
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    • 2004
  • ITO thin films $({\sim}150\;nm)$ are deposited on glass substrates by different deposition condition. The sheet resistance of ITO thin films measured by using a four probe station. The microstructure of these films is determined using a X-ray diffractometer (XRD) and a scanning electron microscope (SEM) and a atomic force microscope (AFM). The sheet resistance of ITO thin films compared $s_{11}$ values by using a near field scanning microwave microscope.

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