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http://dx.doi.org/10.4313/JKEM.2004.17.8.846

Characteristics of ITO/polymeric Films with Change of Oxygen Partial Pressure  

신성호 (기술표준원 에너지자원 표준과)
김현후 (두원공과대학 전자과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.17, no.8, 2004 , pp. 846-851 More about this Journal
Abstract
Transparent conducting indium tin oxide (TC-ITO) thin films on polymeric substrates have been deposited by a dc reactive magnetron sputtering without heat treatments. The polymeric substrates are acryl (AC), poly carbornate (PC), and polyethlene terephthalate (PET) as well as soda lime glass is also used to compare with the polymeric substrates. Sputtering parameters are an important factor for high quality of TC-ITO thin films prepared on polymeric substrates. Furthermore, the material, electrical and optical properties of as-deposited ITO films are dominated by the ratio of oxygen partial pressure. As the experimental results, the surface roughness of ITO films becomes rough as the oxygen partial pressure increases. The electrical resistivity of as-deposited ITO films decreases initially, and then increases with the increase of oxygen partial pressure. The optical transmittance at visible wavelength for all polymeric substrates is above 82 %.
Keywords
Indium tin oxide; Polymeric substrate; Oxygen partial pressure; Magnetron sputtering;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
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