• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.388-389
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• 2006

Electro-deposition of carbon film on silicon substrate in methanol solution was carried out with various current density, solution temperature and electrode spacing between anode and cathode. The carbon films with smooth surface morphology and high electrical resistance were formed when the distance between electrode was relatively wider. The electrical resistance of the carbon films were independent of both current density and solution temperature.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1158-1159
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• 2009

Tri-stimulus values of CIE-XYZ and RGB values obtained by photographic film, CCD camera or scanner depend on the spectral sensitivity of imaging devices and the spectral radiant distribution of the illumination. It is important to record and reproduce the reflectance spectra of the object for true device independent color reproduction and high accurate recording of the scene. In this paper, a method to record the reflection spectra of the object is introduced and its application to spectral endoscopes is presented.

• Electrical & Electronic Materials
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• v.9 no.10
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• pp.1033-1039
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• 1996

Electrical and mechanical properties of polymer sheet at cryogenic temperature have been investigated. Tensile stress(and strain at break) in liquid nitrogen(77K) of 79.7MPa(l.2%) and 117.4MPa(2.05%) are evaluated for films of Polypropylene (PP) and Kapton, respectively. Dielectric loss tangent(tan .delta.) of PP and Kapton films is almost independent of the frequency and tensile stress. Also, field strength of PP film at 77K decreases with increasing the tensile stress.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1265-1266
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• 2007

Electro-deposition of carbon film on silicon substrate in methanol solution was carried out with various current density, solution temperature and electrode spacing between anode and cathode. The carbon films with smooth surface morphology and high electrical resistance were formed when the distance between electrode was relatively wider. The electrical resistance of the carbon films were independent of both current density and solution temperature.

• Proceedings of the KAIS Fall Conference
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• 2011.12a
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• pp.93-96
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• 2011

본 논문은 저예산영화의 흥행을 위해 구전마케팅을 하기위한 마케팅툴의 개발이 목적이다. 무선인터넷과 모바일의 컨버전스로 천만 명의 사용자를 갖게 될 스마트폰의 저예산 독립영화의 애플리케이션을 개발을 통해 최적의 애프릴케이션 서비스, 기능, 환경 등을 알아낸다. 이로써 저예산 독립영화의 마케팅 기반을 구축하여 한국영화 산업의 발전에 기여하고자 한다. 이를 위해 컨조인트 설문과 일반 설문을 종합하여 컨조인트 분석을 실시하였다.

• Transactions on Electrical and Electronic Materials
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• v.12 no.2
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• pp.56-59
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• 2011

The characterization of the chemical mechanical polishing (CMP) process for undensified phophosilicate glass (PSG) film is reported using design of experiments (DOE). DOE has been used by experimenters to understand the relationship between the input variables and responses of interest in a simple and efficient way, and it typically is beneficial for determining the appropriatesize of experiments with multiple process variables and making statistical inferences for the responses of interest. The equipment controllable parameters used to operate the machine consist of the down force of the wafer carrier, pressure on the back side wafer, table and spindle speeds (SS), slurry flow (SF) rate, pad condition, etc. None of these are independent ofeach other and, thus, the interaction between the parameters also needs to be understoodfor improved process characterization in CMP. In this study, we selected the five controllable equipment parameters the most recommendedby process engineers, viz. the down force (DF), back pressure (BP), table speed (TS), SS, and SF, for the characterization of the CMP process with respect to the material removal rate and film uniformity in percentage terms. The polished material is undensified PSG which is widely used for the plananization of multi-layered metal interconnects. By statistical modeling and the analysis of the metrology data acquired from a series of $2^{5-1}$ fractional factorial designs with two center points, we showed that the DF, BP and TS have the greatest effect on both the removal rate and film uniformity, as expected. It is revealed that the film uniformity of the polished PSG film contains two and three-way interactions. Therefore, one can easily infer that process control based on a better understanding of the process is the key to success in current semiconductor manufacturing, in which the size of the wafer is approaching 300 mm and is scheduled to continuously increase up to 450 mm in or slightly after 2012.

• The Journal of the Korea Contents Association
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• v.14 no.12
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• pp.598-606
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• 2014

While the United States and Japan have non-government film rating system, Korea and France are still maintaining governmental control process. But the restrict showing rate in Korea does possibly violate the Constitution with no theatre for the movies of that rate right now. No other visual media including broadcasting have any outer classification process before their showing. So we need to improve our system by replacing it with non-governmental system. To establish independent non-government rating system, first of all, the major companies of film industry should get together to set up Korean Classification and Rating Association, to support the Film Rating Board. The most important thing is that the board operates independently. Government can support art cinemas financially with rating fee. Juvenile protection groups have to keep watch on the process of the board going fairly as well. The chief obstacle for non-governmental rating system is the fact that major companies don't want to get it. But continuing efforts to find any rational way is worthy enough.

• Progress in Medical Physics
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• v.30 no.4
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• pp.112-119
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• 2019

Purpose: The advantages of ocular proton therapy are that it spares the optic nerve and delivers the minimal dose to normal surrounding tissues. In this study, it developed a solid eye phantom that enabled us to perform quality assurance (QA) to verify the dose and beam range for passive single scattering proton therapy using a single phantom. For this purpose, a new solid eye phantom with a polymethyl-methacrylate (PMMA) wedge was developed using film dosimetry and an ionization chamber. Methods: The typical beam shape used for eye treatment is approximately 3 cm in diameter and the beam range is below 5 cm. Since proton therapy has a problem with beam range uncertainty due to differences in the stopping power of normal tissue, bone, air, etc, the beam range should be confirmed before treatment. A film can be placed on the slope of the phantom to evaluate the Spread-out Bragg Peak based on the water equivalent thickness value of PMMA on the film. In addition, an ionization chamber (Pin-point, PTW 31014) can be inserted into a hole in the phantom to measure the absolute dose. Results: The eye phantom was used for independent patient-specific QA. The differences in the output and beam range between the measurement and the planned treatment were less than 1.5% and 0.1 cm, respectively. Conclusions: An eye phantom was developed and the performance was successfully validated. The phantom can be employed to verify the output and beam range for ocular proton therapy.

• Transactions on Electrical and Electronic Materials
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• v.12 no.3
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• pp.115-118
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• 2011

Process characterization of the chemical mechanical polishing (CMP) process for undensified phosphosilicate glass (PSG) film is reported using design of experiments (DOE). DOE has been addressed to experimenters to understand the relationship between input variables and responses of interest in a simple and efficient way. It is typically beneficial for determining the adequate size of experiments with multiple process variables and making statistical inferences for the responses of interests. Equipment controllable parameters to operate the machine include the down force (DF) of the wafer carrier, pressure on the backside of the wafer, table and spindle speed (SS), slurry flow rate, and pad condition. None of them is independent; thus, the interaction between parameters also needs to be indicated to improve process characterization in CMP. In this paper, we have selected the five controllable equipment parameters, such as DF, back pressure (BP), table speed (TS), SS, and slurry flow (SF), most process engineers recommend to characterize the CMP process with respect to material removal rate (RR) and film uniformity as a percentage. The polished material is undensified PSG. PSG is widely used for the plananization in multi-layered metal interconnects. We identify the main effect of DF, BP, and TS on both RR and film uniformity, as expected, by the statistical modeling and analysis on the metrology data acquired from a series of $2^{5-1}$ fractional factorial design with two center points. This revealed the film uniformity of the polished PSG film contains two and three-way interactions. Therefore, one can easily infer that the process control based on better understanding of the process is the key to success in semiconductor manufacturing, typically when the wafer size reaches 300 mm and is continuously scheduled to expand up to 450 mm in or little after 2012.

• Korean Journal of Optics and Photonics
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• v.33 no.1
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• pp.22-27
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• 2022

We fabricate a polarization-independent dielectric multilayer thin-film diffraction grating for a spectral-beam-combining (SBC) system with a simple grating structure and low aspect ratio. Due to the refractive index and thickness error of the manufactured thin films, the diffraction efficiency of the fabricated diffraction grating was lower than that of the design. The causes of the errors were analyzed, and it was confirmed through simulation that diffraction efficiency could be compensated through an additional coating on the manufactured diffraction grating. As a result of sputtering an additional Ta₂O₅ layer on a fabricated diffraction grating, the diffraction efficiency was corrected and a maximum 91.7% of polarization-independent diffraction efficiency was obtained.