• Title/Summary/Keyword: InGaAs/InAlAs

Search Result 721, Processing Time 0.03 seconds

Electrics and Noise Performances of AlGaN/GaN HEMTs with/without In-situ SiN Cap Layer (In-situ SiN 패시베이션 층에 따른 AlGaN/GaN HEMTs의 전기적 및 저주파 잡음 특성)

  • Yeo Jin Choi;Seung Mun Baek;Yu Na Lee;Sung Jin An
    • Journal of Adhesion and Interface
    • /
    • v.24 no.2
    • /
    • pp.60-63
    • /
    • 2023
  • The AlGaN/GaN heterostructure has high electron mobility due to the two-dimensional electron gas (2-DEG) layer, and has the characteristic of high breakdown voltage at high temperature due to its wide bandgap, making it a promising candidate for high-power and high-frequency electronic devices. Despite these advantages, there are factors that affect the reliability of various device properties such as current collapse. To address this issue, this paper used metal-organic chemical vapor deposition to continuously deposit AlGaN/GaN heterostructure and SiN passivation layer. Material and electrical properties of GaN HEMTs with/without SiN cap layer were analyzed, and based on the results, low-frequency noise characteristics of GaN HEMTs were measured to analyze the conduction mechanism model and the cause of defects within the channel.

The Spectrum of Laser Instruments for Laser Acupuncture Application (레이저침 시술에 사용되는 레이저 기기의 적용 범위에 대한 고찰)

  • Hwang, Eui-Hyoung;Yang, Chang-Sop;Jang, In-Soo
    • Journal of Acupuncture Research
    • /
    • v.26 no.1
    • /
    • pp.49-57
    • /
    • 2009
  • Objectives : During the past three decades there has been a significant evolution of laser acupuncture application in the nature of the clinical approach and the research of traditional medicine and laser therapy field. However, there have been no standard and guideline of laser equipment can be applied as laser acupuncture. This study aims to investigate the condition of laser equipment required as a laser acupuncture method. Methods : First, we performed literature search using the Medline(from 1999 to Oct 2008) to confirm types and ranges of laser equipments that can be applied as laser acupuncture. In addition, we investigated the characters of acupoints such as sites and depths, and compared with penetrating depths of each laser. Results : A total of 37 articles for clinical studies using laser acupuncture were selected, and 41 lasers were used. GaAs laser was used three times, GaAlAs laser 14, InGaAlP 18, HeNe laser 4, and Argon laser and CO2 laser were used one time, respectively. From all 361 points of fourteen meridians, depths of 341 points(94.5%) were 1 cun(2.3-3.2cm) or less. The mean depth of all points was 0.48 cun(1.1-1.5cm). Hence, it appeared that the majority of therapeutic lasers satisfied with the condition. HeNe, InGaAlP, GaAlAs, GaAs lasers are recommended for laser acupuncture, however, it may plausible that other surgical lasers could be used as the laser acupuncture, because it have the biostimulation effect to some extent, too. Conclusions : It is suggested that to select appropriate laser type and give the adequate output power to reach the acupoints under the skin using laser acupuncture. Further evaluation and research for the condition of laser acupuncture are warranted.

  • PDF

InAs/GaAs 양자점 태양전지의 광학적 특성 평가: 접합계면전기장 및 AlGaAs 포텐셜 장벽효과

  • Kim, Jong-Su;Han, Im-Sik;Lee, Seung-Hyeon;Son, Chang-Won;Lee, Sang-Jo;Smith, Ryan P.;Ha, Jae-Du;Kim, Jin-Su;No, Sam-Gyu;Lee, Sang-Jun;Choe, Hyeon-Gwang;Im, Jae-Yeong
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2012.02a
    • /
    • pp.107-107
    • /
    • 2012
  • 본 연구에서는 GaAs p-i-n 태양전지구조에 InAs 양자점을 삽입하여 계면의 전기장 변화를 Photoreflectance (PR) 방법으로 연구하였다. InAs/GaAs 양자점 태양전지구조는 n-GaAs 기판위에 p-i-n 구조의 태양전지를 분자선박막성장 장치를 이용하여 제작하였다. GaAs p-i-n 태양전지와 p-QD(i)-n 양자점 태양전지를 제작하여 계면전기장의 변화를 PR 신호에 나타난 Franz-Keldysh oscillation (FKO)으로부터 측정하였다. 기본적인 p-i-n 구조에서 두 가지 전기장성분을 검출 하였고 양자점 태양전지구조에서는 39 kV/cm 이상의 내부전기장이 존재함을 관측하였다. 이러한 내부전기장은 양자점 주변에 형성된 국소전기장의 효과로 추측하였다. 아울러 양자점을 AlGaAs 양자우물 구조에 삽입하여 케리어의 구속에 의한 FKO의 변화를 관측하였으며 양자점 태양전지의 구조적 변화에 따른 효율을 측정하여 비교 분석하였다.

  • PDF

Fabrication and Characteristics of Reflection Type InGaAs MQW SEED (반사형 InGaAs MQW SEED 소자의 제작 및 특성)

  • Kim, Sung-Woo;Park, Sung-Soo;Park, Jong-Cheol;Kim, Taek-Seung;Kwon, O-Dae;Kang, Bong-Koo
    • Proceedings of the KIEE Conference
    • /
    • 1994.07b
    • /
    • pp.1216-1219
    • /
    • 1994
  • A reflection type SEED from LP-MOCVD grown InGaAs/GaAs ESQW structures, with 5% In fraction, has been fabricated and its basic characteristics were investigated. Its intrinsic region consists of 50 pairs of alternating $100{\AA}$ $In_{0.05}Ga_{0.95}As$ barrier and $100{\AA}$ GaAs layers. And a multilayer reflector stack of $Al_{0.12}Ga_{0.88}As(641{\AA})-/AlAs(774{\AA})$ was vertically integrated below the p-i-n structures. The device processing includes the mesa etching, insulator deposition, indium metallization, and thermal alloy for Ohmic contact. Photocurrent spectrum measurement showed the exciton absorption peak at 905nm and availability as a optical switching device. This device showed a contrast ratio of 2:1 by the reflectance spectrum measurement.

  • PDF

Study on the Characteristics of GaInP/AlGaInP Heterojunction Photovoltaic Cells under Concentrated Illumination (집광 조건에서의 GaInP/AlGaInP 이종접합 구조 태양전지 특성 연구)

  • Kim, Junghwan
    • Applied Chemistry for Engineering
    • /
    • v.30 no.4
    • /
    • pp.504-508
    • /
    • 2019
  • The feasibility of replacing the tope cell of pn GaInP homojunction with our GaInP/AlGaInP heterojunction structure in III-V semiconductor multijunction photovoltaic (MJPV) cells having the highest current conversion efficiency was investigated. The performance of photovoltaic (PV) cells grown on $2^{\circ}$ and $10^{\circ}$ off-oriented GaAs substrates were compared to each other. The PV cells on the $10^{\circ}$ off-cut substrate showed higher short-circuit current density ($J_{sc}$) and conversion efficiency values than that of using the $2^{\circ}$ one. For $2{\times}2mm^2$ area PV cell on $10^{\circ}$ off substrate, the $J_{sc}$ of $9.21mA/cm^2$ and the open-circuit voltage of 1.38 V were measured under 1 sun illumination. For $5{\times}5mm^2$ cell on $10^{\circ}$ off substrate, the conversion efficiency was decreased from 6.03% (1 sun) to 5.28% (20 sun) due to a decrease in fiill factor (FF).

Fabrication and High Temperature Characteristics of 1.3um Uncooled AlGaInAs BH FP Laser Diodes (1.3um 비냉각형 AlGaInAs BH FP-LD 제작 및 고온특성)

  • 김현수;황선령;김준연;강중구;방영철;박성수;이은화;김태진;유준상
    • Proceedings of the Optical Society of Korea Conference
    • /
    • 2003.07a
    • /
    • pp.94-95
    • /
    • 2003
  • 최근 들어 저가용 광통신 소자를 제조하기 위한 방법으로 TEC를 사용하지 않는 비냉각형(uncooled) 레이저에 관한 연구가 활발히 진행되고 있다. 이를 위해 반도체 레이저를 형성하는 화합물 반도체 재료 적인 측면에서는 기존에 널리 사용되는 InGaAsP계 물질에 비해 AlGaInAs계 물질구조는 큰 conduction band offset ($\Delta$Ec=$\Delta$O.72Eg) 등으로 인해 고온에서 전자의 overflow를 억제하고 균일한 hole injection으로 인해 우수한 고온특성과 높은 이득(gain)을 보이는 장점을 지니고 있다. (중략)

  • PDF

A Study on the Immunohistology in Injury Cure of Rat by using InGaAlP Laser Diode (InGaAlP 레이저다이오드를 적용한 Rat의 착상 치유에서 면역조직화학적 연구)

  • Yu, Seong-Mi;Park, Yong-Pil;Cheon, Min-Woo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.22 no.5
    • /
    • pp.431-435
    • /
    • 2009
  • The apparatus has been fabricated using the laser diode and microprocessor unit. The apparatus used a InGaAlP laser diode for laser medical therapy and was designed for a pulse width modulation type to increase stimulation effects. To raise the stimulus effect of the human body, the optical irradiation frequency could be set up. The study has executed in-vivo experiment by employing our own developed laser diode irradiation system to investigate the effects of the InGaAlP laser diode irradiation on the wound healing as a preliminary study aimed at the application of InGaAlP laser diode to wound healing of human skin injury. The study cut out whole skin layers of Sprague-Dawley rat on the back part in 1 cm circle and observed developing effects after executing light irradiation for 9 days, and in result it is found that the light irradiation rat showed earlier wound healing than non-irradiation rat during the experimental period. In addition, there are some differences found regarding the healing process between laser diode irradiated rats and non-irradiated ones.

In(1-x)Al(x)Sb Grading Buffer 기술을 사용한 InSb 박막의 최적화

  • Sin, Sang-Hun;Song, Jin-Dong;Kim, Tae-Geun
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2011.08a
    • /
    • pp.308-308
    • /
    • 2011
  • 6.48 ${\AA}$의 격자 상수를 갖는 InSb 물질은 0.17 eV의 낮은 에너지 밴드갭과 78,000 cm2/Vs의 전자 이동도를 갖는 물질로서 고속의 자성 센서소자, 장파장의 광 검출기 그리고 고속 전자소자 등의 분야에서 많은 주목을 받고 있다. 그러나, 전기적 특성이 우수한 InSb 물질을 소자로 구현하는데 있어서 큰 어려움이 있다. InSb와 격자 크기가 잘 맞으면서 절연이 우수한 기판의 부재가 가장 큰 문제가 되는 부분이다. 즉, 격자 부정합을 최소화하며 동시에 절연기판을 사용함으로써 소자의 특성을 잘 살려야 하는 것이다. 이러한 이유로 인하여 InSb 기반의 소자가 널리 사용되지 못하고 있는 것이다. 현재 범용으로 사용하고 있는 기판은 격자 부정합이 14%인 GaAs, 11%의 InP 그리고 18%의 Si 등이 있다. 이번 발표에서는 GaAs 기판 위에 격자 부정합을 최소화하여 InSb 박막을 최적화 시켜 성장하는 방법에 대해서 소개하고자 한다. InSb 박막 성장하는데 있어 논문으로 보고된 여러 가지 방법들이 있다. 기판과의 격자 부정합을 줄이기 위하여 저온-고온 (L-T)의 의한 메타몰픽(metamorphic) buffer 층을 성장 후 InSb 박막을 성장하는 방법[1] 그리고 단계별 buffer를 성장하는 방법[2] 등을 통해서 많은 진보가 있었다. 하지만, 우리는 GaAs 기판 위에 AlSb 박막을 성장 하면서 동시에 In과 Al의 양을 서서히 변화시키는 grading 기술을 사용하였다. 즉, 물질 각각의 격자상수를 고려하여 GaAs (기판)-AlSb-InAlSb-InSb로 변화를 주어 격자 부정합이 최소가 되도록 하여 만들어진 buffer 위에 InSb 층이 만들어 지도록 하여 GaAs 기판 위에 InSb 박막을 성장 할 수 있었다. grading 기술을 이용하여 만들어진 buffer 위에 성장된 0.3 um의 InSb 박막 층은 상온에서 전자 이동도가 약 38,000 cm2/Vs에 이르는 것을 확인하였다. InSb 박막의 두께가 약 1 um 되어야 30,000 cm2/Vs 이상의 전자 이동도를 얻을 수 있다고 많은 논문을 통해서 보고 되고 있으나 우리는 단지 0.3 um의 InSb 박막두께에서 이와 같은 전기적인 특성을 확인하였기에 이상과 같이 보고 하고자 한다.

  • PDF

Study on the Breakdown Simulation for InAlAs/InGaAs/GaAs MHEMTs with an InP-etchstop Layer (InP 식각정지층을 갖는 InAlAs/InGaAs/GaAs MHEMT 소자의 항복 특성 시뮬레이션에 관한 연구)

  • Son, Myung Sik
    • Journal of the Semiconductor & Display Technology
    • /
    • v.11 no.2
    • /
    • pp.53-57
    • /
    • 2012
  • This paper is for accurately simulating the breakdown of MHEMTs with an InP-etchstop layer. 2D-Hydrodynamic simulation parameters are investigated and calibrated for the InP-epitaxy layer. With these calibrated parameters, simulations are performed and analyzed for the breakdown of devices with an InP-etchstop layer. In the paper, the impact-ionization coefficients, the mobility degradation due to doping concentration, and the saturation velocity for InP-epitaxy layer are newly calibrated for more accurate breakdown simulation.

Comparison of growth and properties of GaN with various AlN buffer layers on Si (111) substrate (Si (111) 기판 위에 다양한 AIN 완충층을 이용한 GaN 성장과 특성 비교)

  • 신희연;이정욱;정성훈;유지범;양철웅
    • Journal of the Korean Vacuum Society
    • /
    • v.11 no.1
    • /
    • pp.50-58
    • /
    • 2002
  • The growth of GaN films on Si substrate has many advantages in that Si is less expensive than sapphire substrate and that integration of GaN-based devices with Si substrate is easier The difference of lattice constant and thermal expansion coefficient between GaN and Si is larger than those between GaN and sapphire. However, which results in many defects into the grown GaN. In order to obtain high duality GaN films on Si substrate, we need to reduce defects using the buffer layer such as AlN. In this study, we prepared three types of AlN buffer layer with various crystallinity on Si (111) substrate using MOCVD, Sputtering and MOMBE methods. GaN was grown by MOCVD on three types of AlN/Si substrate. Using TEM and XRD, we carried out comparative investigation of growth and properties of GaN deposited on the various AlN buffers by characterizing lattice coherency, crystallinity, growth orientation and defects formed (voids, stacking faults, dislocations, etc). It is found that the crystallinity of AlN buffer layer has strong effects on growth of GaN. The AlN buffer layers grown by MOCVD and MOMBE showed the reduction of out-of-plane misorientation of GaN at the initial growth stage.