• 제목/요약/키워드: InAs/AlAs

검색결과 12,772건 처리시간 0.042초

AlGaAs/GaAs HBT의 열화분석과 InGaP ledge 에미터에 의한 신뢰도 개선 (Degradation analysis of AlGaAs/GaAs HBTs and improvement of reliability by using InGaP ledge emitter)

  • 최번재;김득영;송정근
    • 전자공학회논문지D
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    • 제35D권7호
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    • pp.88-93
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    • 1998
  • For the self-aligned AlGaAs/GaAs HBTs, the surface states at the interface between the extrinsic base surface and the passivation nitride is a major cause of degradation of dc characteristics. In this paper the degradation mechanisms of self-aligned AlGaAs/GaAs HBT were analyzed, and GaAs HBTs, which employed an InGaP ledge emitter structure formed by the nonself-aligned process to cover the surface of the extrinsic base and reduce the surface states, produced high reliability. Accoridng to the acceleration lifetime test, the nonself-aligned InGaP/GaAs HBTs produced very reliable dc characteristics comparing with the self-aligned AlGaAs/GaAs HBTs. The activation energy was 1.97eV and MTTF $4.8{\times}10^{8}$ hrs at $140^{\circ}C$ which satisfied the MIL standard.

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InGaAs/InAlAs Quantum Cascade Lasers Grown by using Metal-organic Vapor-phase Epitaxy

  • Kim, Dong Hak;Jeong, Hae Yong;Choi, Young Su;Park, Deoksoo;Jeon, Young-Jin;Jun, Dong-Hwan
    • Applied Science and Convergence Technology
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    • 제26권5호
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    • pp.139-142
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    • 2017
  • In this paper, InP-based InGaAs/InAlAs quantum cascade lasers(QCLs) providing nearly zero emission wavelength mismatch between the measured emission wavelength and the designed transition wavelength of QCLs is presented. The zero emission wavelength mismatch of QCLs influenced by both the accurate compositions and thicknesses of the low-pressure metal-organic vapor-phase epitaxy(MOVPE) grown InGaAs and InAlAs layers throughout the core and the abrupt composition transitions between InGaAs and InAlAs layers. The abrupt interfaces between InGaAs and InAlAs layers have been achieved throughout the core structure by means of controlling individually purged vent/run valves of a closed coupled showerhead reactor. In addition, maintaining substrate temperature constant during InGaAs/InAlAs core growth was a partial factor of uniformity improvement of QCLs. These approaches for reducing the possible discrepancies between the designed and MOVPE grown epitaxial structures could lead to improvement of QCL performance.

Al-Sec-Butoxide의 가수분해시에 있어서 $\alpha$-$Al_2O_3$종의 동시첨가에 의한 열적 전이거동 (The Thermal Behavior of Transformation by Simultaneous $\alpha$-$Al_2O_3$ Seed Addition on the Al-Sec-Butoxide Hydrolysis)

  • 김창은;이해욱;최진관;김배연
    • 한국세라믹학회지
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    • 제27권6호
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    • pp.808-816
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    • 1990
  • The thermal behavior of transformation and characteristics of seeded sample powders prepared by simultaneous $\alpha$-Al2O3 seed addition with water on the Al-sec-butoxide hydrolysis were studied. $\alpha$-Al2O3 seed particles are shown to act as nuclei for transformation of $\theta$-to $\alpha$-Al2O3 and to result in an increase in thetransformation kinetics and lowering of the transformation temperature by as much as 143$^{\circ}C$. Simultaneous seed addition on the hydrolysis resulted in uniform dispersin and creation of nucleation site on seed surface and only 0.1wt% seeding lowered the transformation temperature by as much as 115$^{\circ}C$. For 3wt% seed addition, $\alpha$-Al2O3 single phase was obtained at 95$0^{\circ}C$ for 100 minutes and the specific surface area of products were lowered to 11.9$m^2$/g as compared with that of $\alpha$-Al2O3 powder prepared without seed at 115$0^{\circ}C$ ; 15.1$m^2$/g due to depression of vermicular structure growth.

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The Formation and Phase Stability of Cobalt-aluminide(CoAl) Thin Films on GaAs

  • Ko, Dae-Hong;Robert Sinclair
    • The Korean Journal of Ceramics
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    • 제4권1호
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    • pp.43-46
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    • 1998
  • We have investigated the formation and thermal stability of cobalt aluminide(CoAl) thin films on GaAs. In order to obtain cobalt-aluminide thin films, we deposited a multilayer of Co/Al on GaAs, and subsequently annealed the samples at 80$0^{\circ}C$ for 30 min. After annealing, single-phase cobalt aluminide was produced showing a flat and uniform interface with GaAs. which indicates that cobalt aluminide (CoAl) is thermally stable with GaAs. In addition, the adherence and mechanical properties of the as-deposited, and annealed Co/Al multilayer structure on GaAs are compatible with those required for device fabrication processes. The electrical property of the CoAl/GaAs contact shows rectifying characteristics, indicating that the diodes were usable as rectifying gate electrodes.

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해송의 생육을 저해하는 Ca/Al 및 Mg/Al의 한계 비율 (Critical Ratios of Ca/Al and Mg/Al in Nutrent Solution Limiting Growth of Pinus thunbergii)

  • 이위영;양재의;박창진;장용선;옥용식
    • 한국토양비료학회지
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    • 제37권5호
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    • pp.329-335
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    • 2004
  • Acid deposition in forest adjacent to the industrial complexes causes soil acidification resulting in the leaching of cations, decreases of buffering capacity and increases of toxic metal concentrations such as Al, Fe, Mn and Cu in soil solution. Changes of nutrient availability equilibria by acid deposition have been known to retard the growth of pine trees. Objective of this research was to assess the critical ratios of Ca/Al and Mg/Al limiting the growth of Pinus thunbergii in the hydroponic culture. The Ca concentration and Ca/Al ratio in stalks of pine tree were increased as increasing Ca/Al molar ratio in the nutrient solution, but were not changed when the Ca/Al molar ratio was adjusted to greater than 1. Growth of Pinus thunbergii was inhibited at the Ca/Al molar ratio lower than l due to the Ca deficiency. The molar ratios of Ca/Al in the needles of Pinus thunbergii showed the similar tendency with the stalks. This indicated that Ca/Al molar ratio of 1 in the growth media was the critical level limiting the growth of Pinus thunbergii. Concentration of Mg and Mg/Al molar ratios in the stalks of pine tree were increased as increasing Mg/Al molar ratio in nutrient solution. Molar ratios of Mg/Al in the needles were increased as increasing Mg/Al ratios in nutrient solution up to 0.83, which was the critical level limiting the growth of Pinus thunbergii.

GaAs/AlGaAs와 GaAs/InGaP의 건식 식각 시 Flourine 이온의 효과 (F Ion-Assisted Effect on Dry Etching of GaAs over AlGaAs and InGaP)

  • 장수욱;박민영;최충기;유승열;이제원;승한정;전민현
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.164-165
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    • 2005
  • The dry etch characteristics of GaAs over both AlGaAs and InGaP in planar inductively coupled $BCl_3$-based plasmas(ICP) with additions of $SF_6$ or $CF_4$ were studied. The additions of flourine gases provided enhanced etch selectivities of GaAs/AlGaAs and GaAs/InGaP. The etch stop reaction involving formation of involatile $AlF_3$ and $InF_3$ (boiling points of etch products: $AlF_3\sim1300^{\circ}C$, $InF_3$ > $1200^{\circ}C$ at atmosphere) were found to be effective under high density inductively coupled plasma condition. Decrease of etch rates of all materials was probably due to strong increase of flourine atoms in the discharge, which blocked the surface of the material against chlorine neutral adsorption. The process parameters were ICP source power (0 - 500 W), RF chuck power (0 - 30 W) and variable gas composition. The process results were characterized in terms of etch rate, selectivities of GaAs over AlGaAs and InGaP, surface morphology, surface roughness and residues after etching.

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선박용 Al-황동세관의 SCC에 미치는 부식환경의 영향 (Effect of corrosion environment on the SCC of Al-brass tube for vessel)

  • 임우조;정해규
    • 수산해양기술연구
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    • 제39권4호
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    • pp.291-297
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    • 2003
  • Al-brass is usually used as the tube material of vessel's heat exchanger for seawater cooling system because it has high thermal conductivity and good mechanical properties and high corrosion resistance due to cuprous oxide (Cu20) layer against seawater. However, Al-brass tubes of heat exchanger for vessel at the actual environment is reported that local corrosion such as stress corrosion cracking occurred by synergism effect between mechanical factor and corrosion environment In this paper, the effect of corrosion environment on the stress corrosion cracking of Al-brass in various NH4OH of 3.5% NaCl solution, under flow by constant displacement tester. Based on the test results, the behavior of polarization, stress corrosion crack propagation and dezincification phenomenon of Al-brass are investigated. The main results are as follows:(1) Increasing range of potential from open circuit potential to repassivation gets lower, as the contain rate of NH4OH gets higher. (2) As contain rate of NH4OH gets higher, SCC of Al-brass is become activation but the protection film(Cu20) of Al-brass is created in 3.5% NaCl solution. (3) According as content of NH4OH increases in 3.5% NaCl solution, the dezincifiction area is spread. It is concluded that dezincification occurred by localized preferential anodic dissolution at stress focusing region.

저수축 반응소결 알루미나 세라믹스의 제조 (Fabrication of Low-Shrinkage Reaction-Bonded Alumina Ceramics)

  • 박정현;이현권;정경원;염강섭
    • 한국세라믹학회지
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    • 제29권6호
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    • pp.419-430
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    • 1992
  • Fabrication possibility of low-shrinkage alumina without oxidation and wetting agent was presented on the basis of observation about oxidation behavior, microstructure and physical characteristics of such reaction agents free Al2O3-Al system. The composition less than Al 10w/o where Al can act as a sintering agent for Al2O3 was excluded. Under the condition of present experiments oxidation of Al2O3-Al system was dependent not on holding time but mainly on oxidation temperature. In thes case of Al powder not comminuted effectively during powder mixing of Al2O3-Al, columnar structure which would act as a hindrance to the densification during sintering developed more during oxidation with higher Al contents, and which made the fabrication of low-shrinkage Al2O3 ceramics impossible. If Al powder was comminuted effectively due to co-mixed Al2O3 characteristics, densification was improved because of no columnar structure and made the fabrication of sintered body with -2.7% dimensional change and 81% relative density possible. As a result, it is possible to fabricate dense low-shrinkage Al2O3 ceramics without oxidation and wetting agent under conditions such as smaller particle size of Al, Al contents below 50v/o, higher green density of Al2O3-Al compact and the use of Al2O3 powder used for high-density ceramics.

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디지털 합금 InGaAlAs 다중 양자 우물의 열처리 온도에 따른 발광 특성 (Effect of Annealing Temperature on the Luminescence Properties of Digital-Alloy InGaAlAs Multiple Quantum Wells)

  • 조일욱;변혜령;류미이;송진동
    • 한국진공학회지
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    • 제22권6호
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    • pp.321-326
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    • 2013
  • 디지털 합금(digital alloy) InGaAlAs 다중 양자 우물(multiple quantum wells: MQWs) 구조의 열처리(rapid thermal annealing: RTA) 온도에 따른 발광 특성을 PL (photoluminescence)와 TRPL (time-resolved PL)를 이용하여 분석하였다. $700^{\circ}C$에서 $850^{\circ}C$까지 온도를 변화시켜 RTA한 디지털 합금 MQWs의 PL 결과는 $750^{\circ}C$에서 RTA한 시료가 가장 강한 PL 세기와 가장 좁은 반치폭을 나타내었다. 이것은 $750^{\circ}C$에서 30초 동안 RTA하였을 때 비발광 재결합 센터가 감소하고 가장 매끄러운 경계면이 형성되는 것을 나타낸다. RTA 온도를 $800^{\circ}C$$850^{\circ}C$로 증가하였을 때 PL 피크는 청색편이 하였으며 PL 세기는 감소하였다. PL 피크의 청색편이는 RTA 온도가 증가함에 따라 InGaAs/InAlAs SPS (short-period superlattice)의 경계면에서의 Ga과 Al의 혼합(intermixing)으로 Al 함량이 증가한 것으로 설명되며, PL 세기의 감소는 경계면의 거칠기의 증가와 인듐의 상분리(phase separation)로 인한 비균일 조성(compositional fluctuation)으로 설명된다. RTA 온도를 증가하였을 때 PL 소멸시간은 증가하였으며, 이것은 비발광 재결합 센터(결정 결함)가 감소한 것을 나타낸다. 디지털 합금 InGaAlAs MQWs 시료의 PL 특성은 적절한 RTA 조건에서 현저히 향상되는 것을 확인하였다.

AlAs 에피층 위에 성장된 InAs 양자점의 Photoluminescence 특성연구 (Photoluminescence Characteristics of InAs Quantum Dots Grown on AlAs Epitaxial Layer)

  • 김기홍;심준형;배인호
    • 한국재료학회지
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    • 제19권7호
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    • pp.356-361
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    • 2009
  • The optical characterization of self-assembled InAs/AlAs Quantum Dots(QD) grown by MBE(Molecular Beam Epitaxy) was investigated by using Photoluminescence(PL) spectroscopy. The influence of thin AlAs barrier on QDs were carried out by utilizing a pumping beam that has lower energy than that of the AlAs barrier. This provides the evidence for the tunneling of carriers from the GaAs layer, which results in a strong QD intensity compared to the GaAs at the 16 K PL spectrum. The presence of two QDs signals were found to be associated with the ground-states transitions from QDs with a bimodal size distribution made by the excitation power-dependent PL. From the temperature-dependent PL, the rapid red shift of the peak emission that was related to the QD2 from the increasing temperature was attributed to the coherence between the QDs of bimodal size distribution. A red shift of the PL peak of QDs emission and the reduction of the FWHM(Full Width at Half Maximum) were observed when the annealing temperatures ranged from 500 $^{\circ}C$ to 750 $^{\circ}C$, which indicates that the interdiffusion between the dots and the capping layer was caused by an improvement in the uniformity size of the QDs.