• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.282-283
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• 2005

Ion beam assisted deposition(IBAD) technique was used to produce biaxially textured polycrystalline MgO thin films for high critical current YBCO coated conductor. Hastelloy tapes were continuous electropolished with very smooth surface for IBAD-MgO deposition, RMS roughness of Hastelloy tape values below 2 nm and local slope of less than $1^{\circ}$. After the polishing of the tape an amorphous $Y_2O_3$ and $Al_2O_3$ are deposited Biaxially textured MgO was deposited on amorphous layer bye-beam evaporation with a simultaneous bombardment of high energy ions. We had developed the RHEED to measure in-situ biaxial texture of film surface as thin as tens angstrom. And also ex-situ characterization of buffer layers was studied using XRD and SEM. The full-width at half maximum(FWHM) out of plane texture of IBAD-MgO template is $4^{\circ}$.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.66-66
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• 1999

최근 들어 다결정 SiGe은 MOS(Metal-Oxide-Semiconductor)에서 기존에 사용되던 다결정 Si 공정과의 호환성 및 여러 장점으로 인하여 다결정 Si 대안으로 많은 연구가 진행되고 있다. 고농도로 도핑된 P type의 다결정 SiGe은 Ge의 함량에 따른 일함수의 조절과 낮은 비저항으로 submicrometer CMOS 공정에서 게이트 전극으로 이용하려는 연구가 진행되고 있으며, 55$0^{\circ}C$ 이하의 낮은 온도에서도 증착이 가능하고, 도펀트의 활성화도가 높아서 TFT(Thin Film Transistor)에서도 유용한 재료로 검토되고 있다. 현재까지 다결정 SiGe의 증착은 MBE, APCVD, RECVD. HV/LPCVD 등 다양한 방법으로 이루어지고 있다. 이중 HV/LPCVD 방법을 이용한 증착은 반도체 공정에서 게이트 전극, 유전체, 금속화 공정 등 다양한 공정에서 사용되고 있는 방법으로 현재 사용되고 있는 반도체 공정과의 호환성의 장점으로 다결정 SiGe 게이트 전극의 증착 공정에 적합하다고 할 수 있다. 본 연구에서는 HV/LPCVD 방법을 이용하여 게이트 전극으로의 활용을 위한 다결정 SiGe의 증착 메카니즘을 분석하고 Ex-situ implantation 후 열처리에 따라 나타나는 활성화 정도를 분석하였다. 도펀트를 첨가하지 않은 다결정 SiGe을 주성엔지니어링의 EUREKA 2000 장비를 이용하여, 1000$\AA$의 열산화막이 덮혀있는 8 in 웨이퍼에 증착하였다. 증착 온도는 55$0^{\circ}C$에서 6$25^{\circ}C$까지 변화를 주었으며, 증착압력은 1mtorr-4mtorr로 유지하였다. 낮은 증착압력으로 인한 증착속도의 감소를 방지하기 위하여 Si source로서 Si2H6를 사용하였으며, Ge의 Source는 수소로 희석된 10% GeH4와 100% GeH4를 사용하였다. 증착된 다결정 SiGe의 Ge 함량은 RBS, XPS로 분석하였으며, 증착된 박막의 두께는 Nanospec과 SEM으로 관찰하였다. 또한 Ge 함량 변화에 따른 morphology 관찰과 변화 관찰을 위하여 AFM, SEM, XRD를 이용하였으며, 이온주입후 열처리 온도에 따른 활성화 정도의 관찰을 위하여 4-point probe와 Hall measurement를 이용하였다. 증착된 다결정 SiGe의 두게를 nanospec과 SEM으로 분석한 결과 Gem이 함량이 적을 때는 높은 온도에서의 증착이 더 빠른 증착속도를 나타내었지만, Ge의 함량이 30% 되었을 때는 온도에 관계없이 일정한 것으로 나타났다. XRD 분석을 한 결과 Peak의 위치가 순수한 Si과 순수한 Ge 사이에 존재하는 것으로 나타났으며, ge 함량이 많아짐에 따라 순수한 Ge쪽으로 옮겨가는 경향을 보였다. SEM, ASFM으로 증착한 다결정 SiGe의 morphology 관찰결과 Ge 함량이 높은 박막의 입계가 다결정 Si의 입계에 비해 훨씬 큰 것으로 나타났으며 근 값도 증가하는 것으로 나타났다.

• Journal of the Mineralogical Society of Korea
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• v.26 no.3
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• pp.175-187
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• 2013

In-situ Raman and X-ray diffraction experiments have been performed on mineral natrolite (Na-zeolite) to investigate the dehydration behavior under high temperature and high pressure-temperature conditions. XRD data show reversible dehydration up to $450^{\circ}C$ whereas Raman data show irreversible change when the material is heated up to $630^{\circ}C$. The existence of post-natrolite was newly identified to form from ${\beta}$-metanatrolite at $380^{\circ}C$ upon cooling. The formation of dehydrated metanatrolite under simultaneous high temperature-pressure (room temperature < T < $300^{\circ}C$, 0 GPa < P < 2.1 GPa) conditions was not observed.

• Electronic Materials Letters
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• v.14 no.6
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• pp.755-765
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• 2018

In situ nitrogen doped hard carbon nanotubes (NHCNT) were fabricated by pyrolyzing tubular nitrogen doped conjugated microporous polymer. KOH activated NHCNT (K-NHCNT) were also prepared to improve their porous structure. XRD, SEM, TEM, EDS, XPS, Raman spectra, $N_2$ adsorption-desorption, galvanostatic charging-discharge, cyclic voltammetry and EIS were used to characterize the structure and performance of NHCNT and K-NHCNT. XRD and Raman spectra reveal K-NHCNT own a more disorder carbon. SEM indicate that the diameters of K-NHCNT are smaller than that of NHCNT. TEM and EDS further indicate that K-NHCNT are hollow carbon nanotubes with nitrogen uniformly distributed. $N_2$ adsorption-desorption analysis reveals that K-NHCNT have an ultra high specific surface area of $1787.37m^2g^{-1}$, which is much larger than that of NHCNT ($531.98m^2g^{-1}$). K-NHCNT delivers a high reversible capacity of $918mAh\;g^{-1}$ at $0.6A\;g^{-1}$. Even after 350 times cycling, the capacity of K-NHCNT cycled after 350 cycles at $0.6A\;g^{-1}$ is still as high as $591.6mAh\;g^{-1}$. Such outstanding electrochemical performance of the K-NHCNT are clearly attributed by its superior characters, which have great advantages over those commercial available carbon nanotubes ($200-450mAh\;g^{-1}$) not only for its desired electrochemical performance but also for its easily and scaling-up preparation.

• Bulletin of the Korean Chemical Society
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• v.34 no.1
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• pp.99-106
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• 2013

Polyaniline-yttrium trioxide (PAni-$Y_2O_3$) composites were synthesized by the in-situ polymerization of aniline in the presence of $Y_2O_3$ The composite formation and structural changes in these composites were investigated by X-ray diffraction (XRD), Fourier transform infra red spectroscopy (FTIR), scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The direct current (DC) electrical conductivity of the order of $0.51{\times}10^{-2}\;S\;cm^{-1}-0.283\;S\;cm^{-1}$ in the temperature range 300 K-473 K indicates semiconducting behavior of the composites. Room temperature AC conductivity and dielectric response of the composites were studied in the frequency range of 10 Hz to 1 MHz. The variation of AC conductivity with frequency obeyed the power law, which decreased with increasing weight percentage (wt %) of $Y_2O_3$. Studies on dielectric properties shows the relaxation contribution coupled by electrode polarization effect. The dielectric constant and dielectric loss in these composites depend on the content of $Y_2O_3$ with a percolation threshold at 20 wt % of $Y_2O_3$ in PAni. Electromagnetic interference shielding effectiveness (EMI SE) of the composites in the frequency range 100 Hz to 2 GHz was in the practically useful range of -12.2 dB to -17.2 dB. The observed electrical and shielding properties were attributed to the interaction of $Y_2O_3$ particles with the PAni molecular chains.

• Bulletin of the Korean Chemical Society
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• v.33 no.1
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• pp.194-198
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• 2012

In this work, we studied the microstructural changes of ITO during the annealing process. ITO nanoparticles were prepared by the sol-gel method using indium tin hydroxide as the precursor. The prepared sample was investigated using TEM, powder XRD, XPS, DRIFT, and 2D correlation analysis. The O 1s XPS spectra suggested that the microstructural changes during the annealing process are closely correlated with the oxygen sites of the ITO nanoparticles. The temperature-dependent in situ DRIFT spectra suggested that In-OH in the terminal sites is firstly decomposed and, then, Sn-O-Sn is produced in the ITO nanoparticles during the thermal annealing process. Based on the 2D correlation analysis, we deduced the following sequence of events: 1483 (due to In-OH bending mode) ${\rightarrow}$ 2268, 2164 (due to In-OH stretching mode) ${\rightarrow}$ 1546 (due to overtones of Sn-O-Sn modes) ${\rightarrow}$ 1412 (due to overtones of Sn-O-Sn modes) $cm^{-1}$.

• Progress in Superconductivity
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• v.14 no.1
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• pp.34-38
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• 2012

The effect of graphene inclusion in the ex-situ $MgB_2$ was analyzed with the help of resistivity behavior and critical current density studies. Amount of graphene was systematically varied from 0% for pristine sample to 3% by the weight of $MgB_2$. Graphene that is considered as a good source of carbon was found to be intact without any significant carbon doping in $MgB_2$ structure as reveled by XRD measurements. There was no signature of graphene inclusion as far as the superconducting transition is concerned which remained same at 39 K for all the samples. The transition width being sensitive to defect doping remained more or less about 2 K for all the samples showing no variation due to doping. Although there was no change in the superconducting transition or transition width, the graphene doped sample showed noticeable decrease in the overall resistivity behavior with respect to decrease in temperature. The graphene inclusion acted as effective pinning centers which have enhanced the upper critical field of these samples.

• Advances in nano research
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• v.14 no.4
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• pp.355-362
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• 2023

Physical exercise, especially intense exercise and high intensity interval training (HIIT) by trampoline, can lead to muscle injuries. These effects can be reduced with intelligent products made of nanocomposite materials. Most of these nanocomposites are polymers reinforced with silicon dioxide, alumina, and titanium dioxide nanoparticles. This study presents a polymer nanocomposite reinforced with silica. As a result of the rapid reaction between tetraethyl orthosilicate and ammonia in the presence of citric acid and other agents, silica nanostructures were synthesized. By substituting bis (4-amino phenoxy) phenyl-triptycene in N, N-dimethylformamide with potassium carbonate, followed by catalytic reduction with hydrazine and Pd/C, the diamine monomer bis (4-amino phenoxy) phenyl-triptycene is prepared. We synthesized a new polyaromatic (imide) with triptycene unit by sol-gel method from aromatic diamines and dianhydride using pyridine as a condensation reagent in NMP. PI readily dissolves in solvents and forms robust and tough polymer films in situ. The FTIR and NMR techniques were used to determine the effects of SiO₂ on the sol-gel process and the structure of the synthesized nanocomposites. By using a simultaneous thermal analysis (DTA-TG) method, the appropriate thermal operation temperature was also determined. Through SEM analysis, the structure, shape, size, and specific surface area of pores were determined. Analysis of XRD results is used to determine how SiO₂ affects the crystallization of phases and the activation energy of crystallization.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.122-122
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• 2000

Magnesium oxide is thermodynamically very stable, has a low dielectric constant and a low refractive index, and has been widely used as substrate for growing various thin film materials, particulary oxides of the perovskite structure. There has been a considerable interest in integrating the physical properties of these oxides with semiconductor materials such as GaAs and Si. In this regard, it is considered very important to be able to grow MgO buffer layers epitaxially on the semiconductors. Various oxide films can then be grown on such buffer layers eliminating the need for using MgO single crystal substrates. Vapor phase epitaxy of magnesium oxide has been accomplished on Si(001) substrates in a high vacuum chamber using the single precursor methylmagnesium tert-butoxide in the temperature range 750-80$0^{\circ}C$. For the epitaxy of the MgO films, SiC buffer layers had to be grown on Si(001). The films were characterized by reflection high energy electron diffraction (RHEED) in situ in the growth chamber, and x-ray diffraction (XRD), x-ray pole figure analysis, scanning electron microscopy (SEM), and x-ray photoelectron spectroscopy (XPS) after the growth.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.783-786
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• 2003

Thin films of vanadium oxide(VOx) have been deposited by r.f. magnetron sputtering from $V_2O_5$ target in gas mixture of argon and oxygen. The oxygen/(oxygen+argon) partial pressure ratio of 0% and 8% is adopted. Crystal structure and optical properties of films sputter-deposited under different oxygen gas pressures and in situ annealed in vacuum at $400^{\circ}C$ for 1h and 4h are characterized through XRD and optical absorption measurements. The films as-deposited are amorphous, but $0%O_2$ films annealed for time longer than 4h and $8%O_2$ films annealed for time longer than 1h are polycrystalline. The optical transmission of the films annealed in vacuum decreases considerably than the as-deposited films and the optical absorption of all the films increases rapidly at wavelength shorter than about 550nm. Indirect and direct optical band gaps were decreased with increasing the annealing time.