• 전자공학회논문지A
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• 제29A권3호
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• pp.59-65
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• 1992

In this paper, the Numerov method is applied to solve the Schroedinger equation for $Al_{0.3}Ga_{0.7}AS/GaAs/Al_{0.3}Ga_{0.7}As$ double-heterojunction HEMT structures. The 3 subband energy levels, corresponding wave functions, 2-dimensional electron gas density, and conduction band edge profile are calculated from a self-consistent iterative solution of the Schroedinger equation and the Poisson equation. In addition, 2-dimensional electron gas densities in a quantum well of double heterostructure are calculated as a function of applied gate voltage. The density in the double heterojunction quantum well is increased to about more than 90%, however, the transconductance of the double heterostructure HEMT is not improved compared to that of the single heterostructure HEMT. Thus, double-heterojunction structures are expected to be suitable to increase the current capability in a HEMT device or a power HEMT structure.

• 한국재료학회지
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• 제18권8호
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• pp.444-449
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• 2008

Samples of GaMnAs, GaMnAs codoped with Be, and GaMnAs simultaneously codoped with Be and Mg were grown via low-temperature molecular beam epitaxy (LT-MBE). Be codoping is shown to take the Ga sites into the lattice efficiently and to increase the conductivity of GaMnAs. Additionally, it shifts the semiconducting behavior of GaMnAs to metallic while the Mn concentration in the GaMnAs solid solution is reduced. However, with simultaneous codoping of GaMnAs with Be and Mg, the Mn concentration increases dramatically several times over that in a GaMnAs sample alone. Mg and Be are shown to eject Mn from the Ga sites to form MnAs and MnGa precipitates.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1994년도 추계학술대회 논문집
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• pp.221-225
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• 1994

We described the impact ionization rates of electron in GaAs/AlGaAs MQH(multi- quantum well) using EMC(ensenble Monte Carlo) simulation. Hot electron energy of injected into quantum well is increasing nearly liearly due to the applied electric field to the barrier of MQM inspite of various Al mole fraction in AlGaAs or barrier width. Impact ionization rates are decreasing exponentially by increasing Al mole fraction, and they have peak vague due to the barrier width.

• 한국재료학회지
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• 제12권4호
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• pp.296-303
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• 2002

For potential application to quantum mechanical devices, nano-composite thin films, consisting of GaAs quantum dots dispersed in SiO$_2$ glass matrix, were fabricated and studied in terms of structural, chemical, and optical properties. In order to form crystalline GaAs quantum dots at room temperature, uniformly dispersed in $SiO_2$matrix, the composite films were made to consist of alternating layers of GaAs and $SiO_2$in the manner of a superlattice using RF magnetron sputter deposition. Among different film samples, nominal thickness of an individual GaAs layer was varied with a total GaAs volume fraction fixed. From images of High Resolution Transmission Electron Microscopy (HRTEM), the formation of GaAs quantum dots on SiO$_2$was shown to depend on GaAs nominal thickness. GaAs deposits were crystalline and GaAs compound-like chemically according to HRTEM and XPS analysis, respectively. From measurement of optical absorbance using a spectrophotometer, absorption edges were determined and compared among composite films of varying GaAs nominal thicknesses. A progressively larger shift of absorption edge was noticed toward a blue wavelength with decreasing GaAs nominal thickness, i.e. quantum dots size. Band gaps of the composite films were also determined from Tauc plots as well as from PL measurements, displaying a linear decrease with increasing GaAs nominal thickness.

• ETRI Journal
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• 제20권2호
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• pp.231-240
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• 1998

We report, for the first time, the fabrication of vertically stacked InGaAs/GaAs quantum wires (QWRs) on V-grooved substrates by chemical beam epitaxy (CBE). To fabricate the vertically stacked QWRs structure, we have grown the GaAs resharpening barrier layers on V-grooves with (100)-(322) facet configuration instead of (100)-(111) base at 450 $^{\circ}C$. Under the conditions of low growth temperature, the growth rate of GaAs on the (322) sidewall is higher than that at the (100) bottom. Transmission electron microscopy verifies that the vertically stacked InGaAs QWRs were formed in sizes of about $200{\AA} {\times} 500{\sim}600 {\AA}$. Three distinct photoluminescence peaks related with side-quantum wells (QWLs), top-QWLs and QWRs were observed even at 200 K due to sufficient carrier and optical confinement. These results strongly suggest the existence of the quantized state in the vertically stacked InGaAs/GaAs QWRs grown by CBE.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 춘계학술대회 논문집
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• pp.1-7
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• 1997

The goals of the present study lie in presenting the direction of researches and developments for GaAs based solar cells, as well as in taking a step toward the establishment of GaAs MOCVD technologies. On the other hand, the GaAs on Si substrates has been recognized as a lightweight alternative to pure GaAs substrate for space application, because its density is less than the 7alf of GaAs or Ge. So, GaAs/Si has twofold weight advantage to GaAs monolithic cell. It was concluded that the development the development of MOCVD technologies should be ahead of GaAs solar cells.

• 한국광학회지
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• 제8권3호
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• pp.213-217
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• 1997

n형과 p형 GaAs의 도핑에 따른 형광과 시간 분해 형광특성을 조사하였다. 도핑의 농도가 증가할수록 형광의 피크 위치는 p형은 낮은 에너지 쪽으로, n형은 높은 에너지 쪽으로 이동함을 관찰하였다. 이것은 p형은 띠간격 좁아짐 효과가 우세하게 작용하며, n형은 Burstein-Moss효과가 지배적으로 작용하기 때문인 것으로 해석된다. 또한, 도핑의 농도가 증가하면 형광의 소멸시간과 상승시간이 감소하며, p형의 형광소멸시간과 상승시간이 n형보다 더 빠르게 나타났다. 따라서 도핑된 GaAs에서 형광소멸시간과 상승시간은 다수 운반자의 종류와 농도에 의존함을 알 수 있으며, 운반자-운반자 상호작용이 에너지 이완 과정에 중요한 역할을 함을 알 수 있었다.

• Journal of Electrical Engineering and Technology
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• 제1권4호
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• pp.543-545
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• 2006

Surface photovoltage (SPV) measurements were performed to investigate the optic-electrical properties in the electron beam irradiation semi-insulating GaAs (e-beam irradiation SI-GaAs) and semi-insulating GaAs (SI-GaAs). The signal intensity showed stronge. dependency on the frequency in the SI-GaAs than it did in the e-beam irradiation SI-GaAs. This result indicates that the number of the generated photo-carriers depends on the surface state. Also, the B region of the e-beam irradiation SI-GaAs found a weak signal. This result was explained by the surface and internal damage with e-beam irradiation.

• 한국결정성장학회지
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• 제1권1호
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• pp.51-59
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• 1991

GaAs를 Si 웨이퍼에 성장시킬 때 초기단계의 핵생성에 대하여 computer simulation을 통해 이론적으로 고찰하였다. 기존의 핵생성이론과는 달리 초기의 미세한 핵의 경우 핵을 구성하는 ledge와 ledge간의 상호작용은 핵의 크기 및 모양에 의하여 결정되는 ledge간의 거리에 따라 변화함을 알 수 있었다. 따라서 여러 형태의 핵에 대하여 분석하여 본 결과 다층의 피라미드 형태로 GaAs 핵이 생성될 때 가장 낮은 excess에너지가 요구되었고 이와 같은 결과는 이러한 형태가 필연적으로 포함하게 되는 에너지가 낮은 Ga(111) facet 때문인 것으로 밝혀졌다. 그러므로 GaAs/Si에서 가장 문제가 되고 있는 전위결함도 초기의 핵생성에 크게 기인함을 알 수 있다.

• 한국진공학회지
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• 제9권4호
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• pp.400-405
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• 2000

유기금속 소스의 농도를 연속적으로 in-situ 측정이 가능한 EPISON ultrasonic monitor를 이용하여 TMIn(trimethly-indium)의 소스 고갈이 InGaAs, InGaAsP bulk 에피층과 1.55 $mu extrm{m}$ InGaAs/InGaAsP SMQW (strained multi-quantum well)에 미치는 영향을 조사하였다. TMIn 소스는 사용량이 80%에서 급격하게 소스 고갈 현상을 보였다. TMIn 소스는 사용량이 80%에서 급격하게 소스 고갈 현상을 보였다. TMIn 소스 고갈에 의한 에피층의 특성 변화를 조사한 결과, bulk 에피층의 경우에는 소스가 고갈 되기 전에 성장한 에피층과 비교하여 DCXRD(double crystal X-ray diffractometry) spectrum에서 피크 분리가 약 300 arcsec정도 Ga-rich 방향으로 이동하였으며 relative FWHM은 약 2배 가량 증가하는 것을 보였다. SMQW 구조에서는 bulk 에피층과는 달리, PL 중심파장에서도 약 40 nm 정도 단파장쪽으로 이동하였으며, 피크 분리는 약 300 arcsec정도 Ga-rich 방향으로 이동하였다. 하지만, EPISON의 closed loop 기능을 사용할 경우에는 TMIn 소스 사용량이 95%에서도 피크 분리가 $\pm$100 arcsec이내의 재현성 있는 에피층 성장이 가능하다는 것을 알 수 있었다.