• Journal of Institute of Control, Robotics and Systems
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• v.14 no.4
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• pp.332-335
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• 2008

PMMA light guiding plate with nano pattern was fabricated by nano imprint lithography method. A silicon mold for electroplating of nickel was fabricated by conventional photolithography process. A nickel stamp for nano imprint lithography was fabricated by electroplating process using silicon mold. The nano imprint lithography was performed on PMMA plate at $140^{\circ}C$ under pressure of 20kN. The nano pattern on PMMA plate was investigated using FE-SEM. It is shown that the patterns were well transferred for several steps and the nano imprint lithography method could be applied for fabricating patterns of light guiding plate.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1489-1492
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• 2005

Compared to other nano-patterning techniques, Nano imprint Lithography (NIL) has some advantages of high throughput and low process cost. To imprint low temperature and pressure, UV Nano imprint Lithography, which using the monomer based UV curable resin is suggested. Because fabrication of high fidelity pattern on topographical substrate is difficult, bi-layer Nano imprint lithography, which are consist of easily removable under-layer and imprinted pattern, is being used. If residual layer is not remained after imprinting, and under-layer is removed by oxygen RIE etching, we might be able to fabricate the bi-layer pattern for easy lift-off process.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2007.11a
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• pp.153-154
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• 2007

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2007.11a
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• pp.499-500
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• 2007

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.676-679
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• 2005

Nano imprint Lithography (NIL) is regarded as one of the next-generation lithography technologies with EUV lithography, immersion lithography, Laser interference lithography. Because a Si wafer stamp and a quartz stamp, used to imprinting usually are very expensive and easily broken, it is suggested that master stamp is duplicated by PDMS and the PDMS stamp uses to imprint .For using the PDMS stamp, a thermally curable monomer resin was used for the imprinting process to lower pressure and temperature. As a result, NIL patterns were successfully fabricated.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.359-360
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• 2009

• Journal of the Korean institute of surface engineering
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• v.42 no.2
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• pp.59-62
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• 2009

Antireflection pattern, moth-eye structure, was fabricated on lens using Ultra Violet nanoimprint lithography and flexible template. Ni template with conical shaped structure was used as a master template to molding. The flexible poly vinyl alcohol template was fabricated by molding. This poly vinyl alcohol template was used as an imprint template of imprint at lens. Using Ultra Violet nanoimprint lithography and poly vinyl alcohol template, polymer based moth-eye structure was formed on lens and its transmittance was increased up to 94% from 92% at 550 nm wavelength.

• Proceedings of the Materials Research Society of Korea Conference
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• 2008.11a
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• pp.18.1-18.1
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• 2008

• Journal of the Korean Society for Precision Engineering
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• v.26 no.6
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• pp.7-13
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• 2009

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.220-221
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• 2007

Recently, imprint lithography have received significant attention due to an alternative technology for photolithography on high performance microelectronic devices. In this work, we investigated thermal stabilities and dynamic mechanical properties of dielectric materials for thermal imprint lithography. Curing behaviours, thermal stabilities, and dynamic mechanical properties of the dielectric materials cured with various curing agent and spherical filler were studied using dynamic differential scanning calorimetry (DSC), thermogravimetric analysis (TGA), rheometer and universal test machine(UTM).