• Bulletin of the Korean Chemical Society
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• v.31 no.2
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• pp.491-494
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• 2010

• Transactions on Electrical and Electronic Materials
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• v.10 no.1
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• pp.1-4
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• 2009

Dry etching characteristics of indium tin oxide films and etch selectivities over photoresist films were investigated using $Cl_2/HBr$ inductively coupled plasma. From a Langmuir probe diagnostic system, it was observed that while the plasma temperature was kept nearly constant in spite of the change of the HBr mixing ratio, the positive ion density decreases rapidly with increasing the mixing ratio. On the other hand, a quadrupole mass spectrometer showed that the neutral HBr and Br species increased. The etching mechanism in the $HBr/Cl_2$ plasma was analyzed.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.352.1-352.1
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• 2014

Indium Tin Oxide (ITO) films are the most extensively studied and commonly used as ones of TCO films. The ITO films having a high electric conductivity and high transparency are easily fabricated on glass substrate at a substrate temperature over $250^{\circ}C$. However, glass substrates are somewhat heavy and brittle, whereas plastic substrates are lightweight, unbreakable, and so on. For these reasons, it has been recently suggested to use plastic substrates for flexible display application instead of glass. Many reaearchers have tried to produce high quality thin films at rood temperatures by using several methods. Therefore, amorphous ITO films excluding thermal process exhibit a decrease in electrical conductivity and optical transparency with time and a very poor chemical stability. However the amorphous Indium Gallium Zinc Oxide (IGZO) offers several advantages. For typical instance, unlike either crystalline or amorphous ITO, same and higher than a-IGZO resistivity is found when no reactive oxygen is added to the sputter chamber, this greatly simplifies the deposition. We reported on the characteristics of a-IGZO thin films were fabricated by RF-magnetron sputtering method on the PEN substrate at room temperature using 3inch sputtering targets different rate of Zn. The homogeneous and stable targets were prepared by calcine and sintering process. Furthermore, two types of IGZO TFT design, a- IGZO source/drain material in TFT and the other a- ITO source/drain material, have been fabricated for comparison with each other. The experimental results reveal that the a- IGZO source/drain electrode in IGZO TFT is shown to be superior TFT performances, compared with a- ITO source/drain electrode in IGZO TFT.

• Journal of the Microelectronics and Packaging Society
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• v.12 no.3 s.36
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• pp.213-217
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• 2005

The polymer light emitting diodes (PLED) with ITO/PEDOT:PSS/MEH-PPV/Al structure were prepared on ITO(indium tin oxide)/Glass substrates using PEDOT:PSS[poly(3,4-ethylenedioxythiophene):poly(styrene sulfolnate)] as the hole transport material and MEH-PPV[poly(2-methoxy-5-(2-ethyhexoxy)-1,4phenylenvinylene)] as emission material layer. The dependences on the surface roughnees and friction coefficient between film layers were investigated as a function of the MEH-PPV concentrations$(0.1\;wt\%\~0.9\;wt\%)$. The RMS values decreased from 1.72 nm to 1.00 nm as the concentration of MEH-PPV increased from $0.1\;wt\%\;to\;0.9\;wt\%$, indicating improvement of surface roughness. In addition, friction coefficients decreased from 0.048 to 0.035, which means the deteriorating of the adhesion condition. The PLED sample with $0.5\;wt\%$ of MEH-PPV showed the maximum luminance of $409\;cd/m^2$.

• Journal of the Korean Chemical Society
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• v.43 no.3
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• pp.315-320
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• 1999

Novel electroluminescent materials, polymer material, PU-BCN and low molar mass material, D-BCN with the same chromophores were designed and synthesized. A molecular structure of chromophore was composed of bisstyrylbenzene derivative with cyano groups as electron injection and transport and phenylamine groups as hole injection and transport. Device structures with PU-BCN and D-BCN as an emission layer were fa-bricated, which were a single-layer device(SL), Indium-tin oxide(ITO)/emission layer/MgAg, and two kinds of double-layer devices which were composed of ITO/emission layer/oxadiazole derivative/MgAg as a DL-E device and ITO/triphenylamine derivative/emission layer/MgAg as a DL-H device. The two emission materials, PU-BCN and D-BCN with the same emission-chromophore were evaluated as having excellent performance of charge injection and transport and revealed almost the same emission characteristics in high current density. EL emission maximum peaks of two material were detected at about 640 nm wavelength of red emission region.

• Journal of Applied Reliability
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• v.17 no.1
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• pp.72-77
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• 2017

Purpose: The electrochemical corrosion behavior of tin oxide film coated on PET substrates has been studied under varying concentrations of acrylic acid to investigate possible corrosion in contact with the acidic environment. Method: Potentiodynamic test was performed for a commercial ITO/PET film in 0.1, 0.3, and 0.5 M of acrylic acid. The surface morphology was analyzed by scanning electron microscope (SEM) and energy dispersive spectroscopy (EDS). Results: Potentiodynamic test results showed an increase in Icorr and decrease in Ecorr value with increasing concentration of acid. Microscopic evaluation suggested the presence of certain deep cracks on the surface of the film in addition with a severe acidic attack. Conclusion: Exposure of ITO to acrylic acid resulted in the stress corrosion cracking of ITO film due to the mechanical mismatch between brittle inorganic ITO fim and a compliant organic PET substrate leading to the subsequent failure of the film.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.31 no.2
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• pp.85-89
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• 2018

In this study, functional transparent conducting layers were investigated for Si-based photoelectric applications. Double transparent conductive oxide (TCO) films were deposited on a Si substrate in the sequence of indium tin oxide (ITO) followed by aluminum-doped zinc oxide (AZO). First, we observed that the conductivity and transparency of AZO dominate the overall performance of the double TCO layers. Secondly, the double layered TCO film (consisting of AZO/ITO) deposited by sputtering was compared to a AZO-only film in terms of their optical and electrical properties. We prepared three different AZO films: ITO:3min/AZO:10min, ITO:5min/AZO:7min, and ITO:7min/AZO:4min. The results show that the optical properties (transmittance, absorbance, and reflection) can be controlled by the film composition. This may provide a significant pathway for the manipulation of the optical and electrical properties of photoelectric devices.

• Journal of Sensor Science and Technology
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• v.4 no.4
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• pp.10-15
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• 1995

Organic thin film electroluminescent(EL) cells were fabricated. Their output characteristics and luminance versus voltage characteristics were measured with different work function metal electrodes. The EL structure was Indium-Tin-Oxide(ITO)/hole transport layer/emission layer(electron transport layer)/metal electrode. PMMA+TPD(0.5 wt%), MC homopolymer+TPD(0.005 wt%) and (MC/MMA) copolymer+TPD(0.005 wt%) were used as hole transport layer. Ca, Mg, Mg:Ag(10:l) and Al were used as metal electrode. I-V output showed exponential feature, and the threshold voltage of 5 volts and the luminance of over 700 $Cd/m^{2}$ at 10 volts were observed.

• Journal of the Korean Applied Science and Technology
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• v.26 no.4
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• pp.400-406
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• 2009

We investigated the electrochemical properties for Langmuir-Blodgett (LB) films of functionalized polyimide. LB films of polyimide monolayer were deposited by the Langmuir-Blodgett method on the indium tin oxide(ITO) glass. The electrochemical properties measured by cyclic voltammetry with a three-electrode system(an Ag/AgCl reference electrode, a platinum wire counter electrode and LB film-coated ITO working electrode) at various concentrations(0.5, 1.0, and 1.5 N) of $NaClO_4$ solution. The current of reduction and oxidation range was measured from 1650 mV to -1350 mV, continuously. The scan rates were 50, 100 and 150 mV/s, respectively. As a result, monolayer and multilayer LB films of polyimide are appeared on irreversible process caused by the oxidation current from the cyclic voltammogram.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.439-440
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• 2008

Indium Zinc Tin Oxide (IZTO) thin films for transparent thin film transistor (TTFT) were deposited on glass substrate at room temperature by facing targets sputtering (FTS). The FTS system was designed to array two targets facing each other and forms the high- density plasma between. Two different kinds of targets were installed on FTS system. One is ITO ($In_2O_3$ 90wt.%, $SnO_2$ 10wt.%), the other is IZO($In_2O_3$ 90wt%, ZnO 10wt%). The conductive and optical properties of IZTO thin film is determined depending on variation of DC power and working pressure. Therefore, IZTO thin films were prepared with different DC power and working pressure. As-deposited IZTO thin films were investigated by a UV/VIS spectrometer, an X-ray diffractometer (XRD), a scanning electron microscopy (SEM), a Hall Effect measurement system. As a result, all IZTO thin films deposited on glass substrate showed over 80% of transmittance in visible range (400~800 nm) at $O_2$ gas flow rate. We could obtain IZTO thin films with the lowest resistivity $5.67\times10^{-4}$ [$\Omega{\cdot}cm$] at $O_2$ gas flow rate 0.4 [sccm).