• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.86.1-86.1
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• 2015

As the feature size of Si-based semiconductor shrinks to nanometer scale, we are facing to the problems such as short channel effect and leakage current. One of the solutions to cope with those issues is to bring III-V compound semiconductors to the semiconductor structures, because III-V compound semiconductors have much higher carrier mobility than Si. However, introduction of III-V semiconductors to the current Si-based manufacturing process requires great challenge in the development of process integration, since they exhibit totally different physical and chemical properties from Si. For example, epitaxial growth, surface preparation and wet etching of III-V semiconductors have to be optimized for production. In addition, oxidation mechanisms of III-V semiconductors should be elucidated and re-growth of native oxide should be controlled. In this study, surface preparation methods of various III-V compound semiconductors such as GaAs, InAs, and GaSb are introduced in terms of i) how their surfaces are modified after different chemical treatments, ii) how they will be re-oxidized after chemical treatments, and iii) is there any effect of surface orientation on the surface preparation and re-growth of oxide. Surface termination and behaviors on those semiconductors were observed by MIR-FTIR, XPS, ellipsometer, and contact angle measurements. In addition, photoresist stripping process on III-V semiconductor is also studied, because there is a chance that a conventional photoresist stripping process can attack III-V semiconductor surfaces. Based on the Hansen theory various organic solvents such as 1-methyl-2-pyrrolydone, dimethyl sulfoxide, benzyl alcohol, and propylene carbonate, were selected to remove photoresists with and without ion implantation. Although SPM and DIO3 caused etching and/or surface roughening of III-V semiconductor surface, organic solvents could remove I-line photoresist without attack of III-V semiconductor surface. The behavior of photoresist removal depends on the solvent temperature and ion implantation dose.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.198-198
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• 2013

Metal-Oxide-Semiconductor (MOS)에서 사용되는 다양한 channel materials로 high electron mobility을 가지는 III-V compound semiconductor가 대두되고 있다 [1,2]. 하지만 이러한 III-V compound semiconductor는 Si에 비해 안정적인 native oxide가 부족하기 때문에 Si, Ge, Al2O3과 BeO 등과 같은 다양한 물질들의 interface passivation layers (IPLs)에 대한 연구가 많이 되고 있다. 이러한 IPLs 물질은 0.5~1.0 nm의 매우 얇은 physical thickness를 가지고 있고 또한 chemical inert하기 때문에 플라즈마 식각에 대한 연구가 되고 있지만 IPLs 식각 후 기판인 III-V compound semiconductor에 physical damage과 substrate recess를 줄이기 위해서 높은 선택비가 필요하다. 이러한 식각의 대안으로 원자층 식각이 연구되고 있으며 이러한 원자층 식각은 반응성 있는 BCl3의 adsorption과 low energy의 Ar bombardment로 desorption으로 self-limited한 one monolayer 식각을 가능하게 한다. 그러므로 본 연구에서는, III-V compound semiconductor 위에 IPLs의 adsorption과 desorption의 cyclic process를 이용한 원자층식각으로 다양한 물질인 SiO2, Al2O3 (self-limited one monolayer etch rate=about 1 ${\AA}$/cycle), BeO (self-limited one monolayer etch rate=about 0.75 ${\AA}$/cycle)를 얻었으며 그 결과 precise한 etch depth control로 minimal substrate recess 식각을 할 수 있었다.

• 전기화학회지
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• 제8권3호
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• pp.135-138
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• 2005

본 연구에서는 구연산 수용액 전해질을 제조하여 전기도금 방식에 의해 III-V족 화합물 반도체 InSb를 전기화학적으로 합성하였다. 본 연구에서 제조된 InSb는 기존문헌에서 보고된 바와 달리 EPMA분석결과 In과 Sb의 조성비가 52:48로 화학양론을 정확하게 만족시키고 있고, XPS분석결과 전해질내의 구연산의 농도가 1.2M, pH가 4일 때 444.1 eV에서 InSb 화합물의 피크를 관찰하였으며 구연산의 농도가 1.2M보다 낮거나 pH가 4보다 낮을 때는 InSb화합물과 금속상태의 In이 혼재되어 있는 것을 확인하였다. 또한 XRD를 통하여 InSb(111)의 우선결정방위를 갖는다는 것을 확인하였고, I-V 특성 곡선 측정을 통해 rnSb가 고유한 반도체 특성을 보임을 확인하였다.

• 한국레이저가공학회지
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• 제16권1호
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• pp.1-4
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• 2013

The optical properties of III-V compound semiconductor structure was investgated by photoreflectance (PR). The results show two signals at 1.42 and 1.73eV. These are attributed to the bandgap energy of GaAs, AlGaAs, respectively. Also, AlGaAs region showed weak signal. This signal is attributed to carbon or si defect.

• 조명전기설비학회논문지
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• 제26권9호
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• pp.33-39
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• 2012

For photovoltaic power generation need certainly decreasing module's price and increasing promote efficiency technology. Almost of solar panel is on the decrease energy efficiency since 2,000. like silicone(Si) solar panel, thin film solar panel and etc. Silicone(Si) solar panel was best efficiency in 1999. It's 24%. But after that time, It didn't pass limit of energy efficiency. That's why, nowadays being issued that using III-V compound semiconductor to high efficiency of concentrating photovoltaic system for making an alternative proposal. In Korea, making researches in allied technology with III-V compound semiconductor solar panel, condenser technology, and solar tracker. but feasibility study for concentrating photovoltaic power generation hasn't progressed yet. This thesis made a plan about CPV(Concentrating Photovoltaic)system and CPV has a higher energy efficiency than PV(Photovoltaic)system in fine climate conditions from comparing CPV with using silicone(Si) solar panel to PV's efficiency test result.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 연구회
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• pp.143-147
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• 2001

Ferromagnetism in manganese compound semiconductors open prospects for tailoring magnetic and spin-related phenomena in semiconductors with a precision specific to III-V compounds. Also it addresses a question about the origin of the magnetic interactions that lead to a Curie temperature(Tc) as high as 110 K for a manganese concentration of just 5%. Zener's model of ferromagnetism, originally suggested for transition metals in 1950, can explain Tc of $Ga_{1-x}Mn_x$ As and that of its IT-VI counterpart $Zn_{1-x}Mn_x$ Te and is used to predict materials with Tc exceeding room temperature, an important step toward semiconductor electronics that use both charge and spin. In this article, we present not only the experimental result but calculated Curie temperature by RKKY interaction. The problem in making III-V semiconductor has been the low solubility of magnetic elements, such as manganese, in the compound, since the magnetic effects are roughly proportional to the concentration of the magnetic ions. Low solubility of magnetic elements was overcome by low-temperature nonequilibrium MBE{molecular beam epitaxy) growth, and ferromagnetic (Ga,Mn)As was realized. Magnetotransport measurements revealed that the magnetic transition temperature can be as high as 110 K for a small manganese concentration.

• 한국전기화학회:학술대회논문집
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• 한국전기화학회 2004년도 추계총회 및 학술발표회
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• pp.19-19
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• 2004

• 전자통신동향분석
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• 제36권3호
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• pp.23-33
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• 2021

Two main technologies of III-V/Si laser diode for optical communication, direct epitaxial growth, and wafer bonding were studied. Until now, the wafer bonding has been vigorously studied and seems promising for the ideal III-V/Si laser. However, the wafer bonding process is still complicated and has a limit of mass production. The development of a concise and innovative integration method for silicon photonics is urgent. In the future, the demand for high-speed data processing and energy saving, as well as ultra-high density integration, will increase. Therefore, the study for the hetero-junction, which is that the III-V compound semiconductor is directly grown on Si semiconductor can overcome the current limitations and may be the goal for the ideal III-V/Si laser diode.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2007년도 추계학술대회 논문집
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• pp.235-235
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• 2007

• 공업화학
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• 제26권5호
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• pp.526-532
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• 2015

신 기후변화대응(Post 2020)을 위한 대체에너지의 역할과 더불어 태양전지의 중요성이 높아져 가고 있다. 태양전지의 종류는 크게 재료관점에서 보면 유기물과 무기물 계열로 구분할 수 있지만 대규모 발전역할에서는 현재까지 실리콘과 같이 양산성과 안정성 기반의 무기물 태양전지가 주된 역할을 하고 있다. 특히 최근 몇 년간 화합물반도체 태양전지에 대한 연구는 급속도로 가속화되면서 3-5족 적층형 태양전지, chalcopyrite 계열 $CuInGa(S,Se)_2$ (CIGSSe) 태양전지와 kesterite 계열 $Cu_2ZnSn(S,Se)_4$ (CZTSSe) 태양전지 연구가 대표적으로 주류를 이루어 왔다. 따라서 화합물반도체 태양전지에서 주류를 이루고 있는 3-5족 적층형, CIGSSe 및 CZTSSe 태양전지들의 연구개발동향 및 기술적인 주요내용들에 대해 소개하고자 한다.