• 제목/요약/키워드: ICP(Inductively Coupled Plasma)

검색결과 972건 처리시간 0.025초

Accurate Analysis of Chromium in Foodstuffs by Using Inductively Coupled Plasma Mass Spectrometry with a Collision-Reaction Interface

  • Lee, Seung Ha;Kim, Ji Ae;Choi, Seung Hyeon;Kim, Young Soon;Choi, Dal Woong
    • Bulletin of the Korean Chemical Society
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    • 제34권6호
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    • pp.1689-1692
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    • 2013
  • Food is a common source of chromium (Cr) exposure. However, it is difficult to analyze Cr in complex food matrices by using inductively coupled plasma mass spectrometry (ICP-MS) because the major isotope, $^{52}Cr$, is masked by interference generated by the sample matrix and the plasma gas. Among the systems available to minimize interference, the recently developed collision-reaction interface (CRI) has a different structure relative to that of other systems (e.g., collision cell technology, octopole reaction system, and dynamic reaction cell) that were designed as a chamber between the skimmer cone and quadrupole. The CRI system introduces collision or reaction gas directly into the plasma region through a modified hole of skimmer cone. We evaluated the use of an CRI ICP-MS system to minimize polyatomic interference of $^{52}Cr$ and $^{53}Cr$ in various foodstuffs. The $^{52}Cr$ concentrations measured in the standard mode were 2-3 times higher than the certified values. This analytical method based on an ICP-MS system equipped with a CRI of helium gas was effective for Cr analysis in complex food matrices.

Direct Analysis of Aerosol Particles by Atomic Emission and Mass Spectrometry

  • Kawaguchi, Hiroshi;Nomizu, Tsutomu;Tanaka, Tomokazu;Kaneco, Satoshi
    • 분석과학
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    • 제8권4호
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    • pp.411-418
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    • 1995
  • A method for the direct determination of elemental content in each of aerosol particles by inductively coupled plasma atomic emission (ICP-AES) or mass spectrometry (ICP-MS) is described. This method is based upon the introduction of diluted aerosol into an ICP and the measurement of either the flash emission intensities of an atomic spectral line or ion intensities. A pulse-height analyzer is used for the measurement of the distribution of the elemental content. In order to calibrate the measuring system, monodisperse aerosols are used. The potentials of the method are shown by demonstrating the copper emission signals from the aerosols generated at a small electric switch, a study of the relation between the decreasing rate of particle number density and particle size, and measurements of calcium contents in the individual biological cells.

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유도결합형 제논 플라즈마의 전자온도, 전자밀도 특성 (Properties of Electron Temperature and Electron Density in Inductively Coupled Xenon Plasma)

  • 허인성;최기승;이종찬;박대희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
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    • pp.2418-2420
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    • 2005
  • In this paper, parameters of electron temperature and density for the mercury-free lighting-source were measured to diagnosis and analyze in Xe based inductively coupled plasma(ICP). In results at several dependences of $20{\sim}100mTorr$ Xenon pressure, $50{\sim}200W$ RF power and horizontal distribution were especially mentioned. When Xe pressure was 20mTorr and RF power was 200W, the electron temperature and density were respectively 3.58eV and $3.56{\times}10^{12}cm^{-3}$. The key parameters of Xe based ICP depended on Xe pressure more than RF power that could be verified. A high electron temperature and low electron density with a suitable Xe pressure are indispensible parameters for Xe based ICP lighting-source.

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Tandem laser-induced breakdown spectroscopy laser-ablation inductively-coupled plasma mass spectrometry analysis of high-purity alumina powder

  • Lee, Yonghoon;Kim, Hyang
    • 분석과학
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    • 제32권4호
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    • pp.121-130
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    • 2019
  • Alumina is one of the most important ceramic materials because of its useful physical and chemical properties. Recently, high-purity alumina has been used in various industrial fields. This leads to increasing demand for reliable elemental analysis of impurities in alumina samples. However, the chemical inertness of alumina makes the sample preparation for conventional elemental analysis a tremendously difficult task. Herein, we demonstrated the feasibility of laser ablation for effective sampling of alumina powder. Laser ablation performs sampling rapidly without any chemical reagents and also allows simultaneous optical emission spectroscopy and mass spectrometry analyses. For six alumina samples including certified reference materials and commercial products, laser-induced breakdown spectroscopy (LIBS) and laser-ablation inductively-coupled plasma mass spectrometry (LA-ICP-MS) analyses were performed simultaneously based on a common laser ablation sampling. LIBS was found to be useful to quantify alkali and alkaline earth metals with limits-of-detection (LODs) around 1 ppm. LA-ICP-MS could quantify transition metals such as Ti, Cu, Zn, and Zr with LODs in the range from a few tens to hundreds ppb.

A study of neutron activation analysis compared to inductively coupled plasma atomic emission spectrometry for geological samples in Iran

  • Mohammadzadeh, Mohammad;Ajami, Mona;shadeghipanah, Arash;Rezvanifard, Mehdi
    • Nuclear Engineering and Technology
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    • 제50권8호
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    • pp.1349-1354
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    • 2018
  • Inductively Coupled Plasma Atomic Emission Spectroscopy (ICP-AES) is widely used for the determination of trace elements in geological samples in Iran. In this paper, we have calculated the detection limits of neutron activation analysis (NAA) for some of the common elements in such samples utilizing the ORIGEN and MCNP codes and verified the simulations using the experimental results of three soil standard reference materials, namely, G02.SRM, G18.SRM, and G28.SRM. The results show that while the detection limit of ICP-AES method is usually in the mg/kg range, it is represented to the ${\mu}g/kg$ range for most of the elements of interest using the NAA method, and the simulations can be verified in a tolerance range of 20%.

Molecular Emission of CF4 Gas in Low-pressure Inductively Coupled Plasma

  • Jung, T.Y.;Kim, D.H.;Lim, H.B.
    • Bulletin of the Korean Chemical Society
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    • 제27권3호
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    • pp.373-375
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    • 2006
  • $CF_4$ gas is one of the most common chemicals used for dry etching in semiconductor manufacturing processes. For application to the etching process and environmental control, the low-pressure inductively coupled plasma (LP-ICP) was employed to obtain the spectrum of $CF_4$ gas. In terms of the analysis of the spectra, trace CF radical by A-X and B-X transitions was detected. The other $CF_x$ radicals, such as $CF_2$ and $CF_3$, were not seen in this experiment whereas strong C and $C_2$ emissions, dissociation products of $CF_4$ gas, were observed.

Ar 가스 압력과 RF 전력변화에 따른 유도결합형ㆍ플라즈마 E-H모드 변환의 광학적 특성 (Optical E-H Transition Properties of Inductively Coupled Plasma with Ar Gas Pressure and RF Pourer)

  • 허인성;조주웅;이영환;김광수;최용성;박대희
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제53권1호
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    • pp.20-23
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    • 2004
  • In this paper, the emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma. To transmit the electromagnetic energy into the chamber, a RF power of 13.56 [MHz] was applied to the antenna and considering the Ar gas pressure and the RF electric power change, the emission spectrum, Ar I line, luminance were investigated. At this time, the input parameter for ICP RF plasma, Ar gas pressure and RF power were applied in the range of 10∼60 [mTorr], 10∼300 [W], respectively. From emission intensity and lumnance intensity results, the mode transition from E-mode to H-mode was observed. This implies that this method can be used to find an optimal RF power for efficient light illumination in an electrodeless fluorescent lamp.

무전극 형광램프의 페라이트 특성변화에 따른 전자계 분포 (The Study on Electromagnetic Distribution of Electrodeless Fluorescent Lamp)

  • 김광수;조주웅;허인성;최용성;박대희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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    • pp.1147-1150
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    • 2003
  • The RF inductive discharge or inductively coupled plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technology Although most practical ICPs operate at 13.56 (MHz) and 2.65 (MHz), the trend to reduce the operating frequency is clearly recognizable from recent ICP developments. In an electrodeless fluorescent lamp, the use of a lower operating frequency simplifies and reduces cost of rf matching systems and rf generators and can eliminate capacitive coupling between the inductor coil and plasma, which could be a strong factor in wall erosion and plasma contamination. In this study, the configuration of ferrite and fixture which operates at the frequency of 2.65 (MHz) will be discussed, by using the electromagnetic simulation (Maxwell 2D).

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