• 제목/요약/키워드: I/O devices

검색결과 424건 처리시간 0.028초

Effect of Self-Assembled Monolayer Treated ZnO on the Photovoltaic Properties of Inverted Polymer Solar Cells

  • Yoo, Seong Il;Do, Thu Trang;Ha, Ye Eun;Jo, Mi Young;Park, Juyun;Kang, Yong-Cheol;Kim, Joo Hyun
    • Bulletin of the Korean Chemical Society
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    • 제35권2호
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    • pp.569-574
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    • 2014
  • Inverted bulk hetero-junction polymer solar cells (iPSC) composed of P3HT/PC61BM blends on the ZnO modified with benzoic acid derivatives-based self-assembled monolayers (SAM) are fabricated. Compared with the device using the pristine ZnO, the devices with ZnO surface modified SAMs derived from benzoic acid such as 4-(diphenylamino)benzoic acid (DPA-BA) and 4-(9H-carbazol-9-yl)benzoic acid (Cz-BA) as an electron transporting layer show improved the performances. It is mainly attributed to the favorable interface dipole at the interface between ZnO and the active layer, the eective passivation of the ZnO surface traps, decrease of the work function and facilitating transport of electron from PCBM to ITO electrode. The power conversion eciency (PCE) of iPSCs based on DPA-BA and Cz-BA treated ZnO reaches 2.78 and 2.88%, respectively, while the PCE of the device based on untreated ZnO is 2.49%. The open circuit voltage values ($V_{oc}$) of the devices with bare ZnO and SAM treated ZnO are not much different. Whereas, higher the fill factor (FF) and lower the series resistance ($R_s$) are obtained in the devices with SAMs modification.

$LiMbO_3$ 강유전체 박막을 이용한 MFS 디바이스의 Retention 및 Fatigue 특성 (Retention and Fatigue Properties of MFS Devices using Ferroelectric $LiMbO_3$ Thin Films)

  • 정순원;김채규;김용성;김진규;이남열;김광호;유병곤;이원재
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.17-20
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    • 1999
  • The retention and fatigue properties of ferroelectric LiNbO$_3$ thin films were studied. Metal-ferroelectric-semiconductor(MFS) devices by using rapid thermal annealed LiNbO$_3$/Si structures were successfully fabricated and demonstrated nonvolatile memory operations of the MFS devices. The I$_{D}$-V$_{G}$ characteristics of MFSFET\`s showed a hysteresis loop due to the ferroelectric nature of the LiNbO$_3$ thin film. The ferroelectric capacitors showed practically no polarization degradation up to about 10$^{10}$ switching cycles when subjected to symmetric bipolar voltage pulse (peak-to-peak 6V, 50% duty cycle) in the 500kHz. The retention properties of the LiNbO$_3$ thin films were quite good up to about 10$^{3}$ s . s .

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Fabrication Process of Single CuO Nanowire Devices

  • Vu, Xuan Hien;Jo, Kwang-Min;Kim, Se-Yun;Lee, Joon-Hyung;Kim, Jeong-Joo;Heo, Young-Woo
    • Applied Science and Convergence Technology
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    • 제23권3호
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    • pp.134-138
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    • 2014
  • One-dimensional nanostructures such as nanowires have been extensively investigated as a promising type of material for applications of nanoscale technology. The fabrication of single-nanowire devices are consequently important and interesting. This study introduced a feasible method for growing CuO nanowires on Cu foils. The nanowires had diameters of 10~150 nm and lengths of more than $7{\mu}m$ and were grown by means of thermal oxidation in a vacuum. They were entirely and uniformly grown over the Cu foil surfaces and could be extracted and dispersed in an ethanol solution for further purposes. In addition, a simple fabrication method for realizing device functionality from a single CuO nanowire was reported. Fabricated devices were carefully checked by field-emission scanning electron microscopy (SEM). The probability of the realization of a single-CuO-nanowire device relative to that of all other types was estimated to be around 25%. Finally, the I-V characteristics of the devices were analyzed.

Effects of post-annealing temperature of CeO$_2$ buffer layers on the surface morphology, structures and microwave properties of YBa$_2$Cu$_3$O$_{7-{\delta}}$ films on sapphire

  • Yang, W.I.;Lee, J.H.;Ryu, J.S.;Ko, Y.B.;Chung, Y.S.;Hur, Jung;Lee, Sang-Young
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 2000년도 High Temperature Superconductivity Vol.X
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    • pp.201-206
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    • 2000
  • Effects of the post-annealing temperature of CeO$_2$ buffer layers on the properties of YBCO films on CeO$_2$-buffered sapphire were investigated. 45 nm-thick CeO$_2$ buffer layer was prepared in-situ on r-cut sapphire using an on-axis rf magnetron sputtering method, which was later post-annealed at temperatures between 950$^{\circ}$C and 1100$^{\circ}$C in an oxygen-flowing environment. YBCO films were prepared on CeO$_2$-buffered sapphire (CbS), for which the surface morphology, crystal structures and electrical properties of the YBCO films were studied. YBCO films on post-annealed CbS appeared to have better properties than those on as-grown CbS with regard to the morphological, structural and electrical properties when the YBCO films were prepared on CeO$_2$ buffer layer post-annealed at temperatures of 1000 - 1050$^{\circ}$C. A TE$_{011}$ mode rutileloaded cylindrical cavity resonators was fabricated with the YBCO films placed as the endplates, for which the unloaded Q of the resonator was measured. It turned out that the resonator with the endplates prepared from the YBCO films on postannealed CbS at 1000 $^{\circ}$C showed the highest unloaded Q with the value more than 8 ${\times}$ 10$^5$ at 30 K and 8.6 CHz, revealing that the YBCO films on post-annealed CbS at 1000$^{\circ}$C the temperature could be the lowest among the YBCO films on post-annealed CbS.

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ZnO:As/ZnO:Al homo-junction LED의 V-I 특성 분석 (Analysis on the V-I Curve of ZnO:As/ZnO:Al homo-junction LED)

  • 오상현;정윤환;유연연;박춘배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.410-411
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    • 2007
  • To investigate the ZnO LED which are interested in the next generation of short wavelength LEDs and Lasers, the ZnO thin films were deposited by RF magnetron sputtering system. The p-type ZnO thin film, fabricated by means of the ampoule-tube method, was used to make the ZnO p-n junction, and its characteristics was analyzed. The ampoule-tube method was used to make the p-type ZnO based on the As diffusion, and the hall measurement was used to confirm that the p-type is formed. the current-voltage characteristics of the ZnO p-n junction were measured to confirm the rectification characteristics of a typical p-n junction and the low leakage voltage characteristics. Analysis of ZnO LED V-I curve will provide a very useful technology for producing the UV ZnO LED and ZnO-based devices.

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RF스퍼터링법으로 성장시킨 n-ZnO 박막과 n-ZnO/p-GaN 이종접합 LED의 특성 (Properties of the RF Sputter Deposited n-ZnO Thin-Film and the n-ZnO/p-GaN heterojunction LED)

  • 신동휘;변창섭;김선태
    • 한국재료학회지
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    • 제23권3호
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    • pp.161-167
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    • 2013
  • The ZnO thin films were grown on GaN template substrates by RF magnetron sputtering at different RF powers and n-ZnO/p-GaN heterojunction LEDs were fabricated to investigate the effect of the RF power on the characteristics of the n-ZnO/p-GaN LEDs. For the growth of the ZnO thin films, the substrate temperature was kept constant at $200^{\circ}C$ and the RF power was varied within the range of 200 to 500W at different growth times to deposit films of 100 nm thick. The electrical, optical and structural properties of ZnO thin films were investigated by ellipsometry, X-ray diffraction (XRD), atomic force microscopy (AFM), photoluminescence (PL) and by assessing the Hall effect. The characteristics of the n-ZnO/p-GaN LEDs were evaluated by current-voltage (I-V) and electroluminescence (EL) measurements. ZnO thin films were grown with a preferred c-axis orientation along the (0002) plane. The XRD peaks shifted to low angles and the surface roughness became non-uniform with an increase in the RF power. Also, the PL emission peak was red-shifted. The carrier density and the mobility decreased with the RF power. For the n-ZnO/p-GaN LED, the forward current at 20 V decreased and the threshold voltage increased with the RF power. The EL emission peak was observed at approximately 435 nm and the luminescence intensity decreased. Consequently, the crystallinity of the ZnO thin films grown with RF sputtering powers were improved. However, excess Zn affected the structural, electrical and optical properties of the ZnO thin films when the optimal RF power was exceeded. This excess RF power will degrade the characteristics of light emitting devices.

전기화학형 발광소자 개발 (Development of an electrochemi-Iuminescenece device)

  • 권혁문;성열문;지종국;이명희
    • 한국조명전기설비학회:학술대회논문집
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    • 한국조명전기설비학회 2009년도 추계학술대회 논문집
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    • pp.141-144
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    • 2009
  • In this study, used simplest sandwich cells containing $Ru2^+$ liquid electrolytes in order to clarify the role of nanoporous $TiO_2$ electrodes. And, the cell structure is as follow: $F:SnO_2$ glass/ nanoporous $TiO_2$/ tris(2,2'-bipyridy)ruthenium(ll) colplex [$Ru(bpy)_3(PF_6)_2$] in acetonitrile/ $F:SnO_2$ glass. The result, we found that ECL intensities increased rapidly by use of cathodes with nanoporous $TiO_2$ layers. And, porous $TiO_2$ electrodes were confirmed to be efficient for ECL devices as well as solar cell devices. It is thought that the increases in the ECL intensities may be associated with both formation of $Ru^+$ in porous $TiO_2$ electrodes and the process taking place after reduction of $Ru^+$ which occurs in the nanoporous electrodes.

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ZnO Power FET 모델링에 관한 연구 (Study on Modeling of ZnO Power FET)

  • 강이구;정헌석
    • 전기전자학회논문지
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    • 제14권4호
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    • pp.277-282
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    • 2010
  • 본 논문에서는 차세대 전력반도체인 화합물 반도체 소자중 ZnO 전력소자에 대하여 모델링을 수행하였다. 화합물 전력 반도체 소자는 와이드 밴드 갭 소자로서 열 특성이 우수해 자동차 및 계통연계형 인버터의 차세대 핵심소자로 인정받고 있다. 모델링 결과 에피 두께가 3um, 도핑농도는 $1e17cm^{-3}$일때 내압 340V 정도 얻을 수 있었으며, 관련 I-V특성 등을 평가하였다. 실제 소자로 제작된다면 300V이내의 산업 응용에 충분히 활용할 수 있을 것으로 판단된다

PCI 방식의 HSIO(High Speed I/O) 시스템의 개발 (Development of HSIO(High Speed I/O) System with PCI Interface)

  • 조규상;이종운
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2004년도 하계학술대회 논문집 D
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    • pp.2628-2630
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    • 2004
  • In this study, a system that has a high speed digital data I/O and distributive structure is developed and the hardware and software of the system are described in detail. PCI master card to PC slot has maximum 63 slaves which are connected by Ethernet cables and can handle 16 I/O points. The system has some features : easy expansion by adding slaves as needed, space and wiring advantage with distributed characteristics, and select from a range of slave devices that fits best for the use.

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산화물 박막 커패시터의 RTA 처리와 유전 특성에 관한 연구 (The Study on Dielectric and RTA Property of Oxide Thin-films)

  • 김인성;이동윤;조영란;송재성
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2001년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.23-25
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    • 2001
  • In this work, the $Ta_2O_5$ thin films were deposited on Pt/n-Si substrate by reactive magnetron sputtering and the RTA treatment at temperatures range from 650 to $750^{\circ}C$ in $O_2$ and vacuum. X-ray diffraction analysis, FE SEM, dielectric properties and leakage current density have been used to study the structural and electrical properties of the $Ta_2O_5$ thin films. XRD result showed that as- deposited films were amorphous and the annealed films crystallized (<$700^{\circ}C$) into ${\beta}-Ta_2O_5$. The crystallinity increased with temperature in terms of an increase in the intensity of the diffracted peaks(${\beta}-Ta_2O_5$) and annealing in oxygen reduced defect dang1ing Ta-O bonds. As deposited $Ta_2O_5$ films show the leakage current density $10^{-7}$ to $10^{-8}$ (A/$cm^2)$ at low electric fields (<200 kV/cm) However, it was found leakage current density of $Ta_2O_5$ thin films decreased with $O_2$ ambient annealing. The dielectric constant of the as deposited $Ta_2O_5$ thin films was ${\varepsilon}_r$ $9{\sim}11$ but the dielectric constant was increased after RTA treatment in $O_2$ ambient more then in vacuum.

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