• Proceedings of the Korea Association of Crystal Growth Conference
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• 1999.06a
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• pp.337-350
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• 1999

Thick diamond film having ~700${\mu}{\textrm}{m}$ thickness was deposited on polycrystalline molybdenum (Mo) substrate using high power (4kW) microwave plasma enhanced chemical vapor deposition (MPECVD) system. We could achieve free-standing diamond film via detaching as-deposited diamond film from the substrate by rapid cooling them under vacuum. We investigated the variation of photoconductivity after exposing the film surface to either oxygen or hydrogen plasma. At as-grown state, the growth side (the as-grown surface of the film) showed noticeable photoconductivity. The oxygen plasma treatment of this side led to the insulator. After exposing the film surface to hydrogen plasma, on the other hand, we could observe the reappearing of photoconductivity at the growth side. Based on these results, we suggest that the hydrogen plasma treatment may enhance the photoconductivity of free-standing diamond film.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.4
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• pp.441-445
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• 1999

Thick diamond film having $~700\mu\textrm{m}$ thickness was deposited on polycrystalline molybdenum(Mo) substrate using high power (4 kW) microwave plasma-enhanced chemical vapor depostion (MPECVD) system. We could achieve free-standing diamond film via detaching as-deposited diamond film from the substrate by rapid cooling them under vacuum. We investigated the variation of photoconductivity after exposing the film surface to either oxygen or hydrogen plasma. At as-grown state, the growth side (the as-grown surface of the film) showed noticeable photoconcuctivity. The oxygen plasma treatment of this side led to the insulator. After exposing the film surface to hydrogen plasma, on the other hand, we could observe the reappearing of photoconductivity at the growth side. Based on these results, we suggest that the hydrogen plasma treatment may enhance the photoconductivity of free-standing diamond film.

• Transactions on Electrical and Electronic Materials
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• v.10 no.2
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• pp.58-61
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• 2009

The electrical stability of ZnO: Al thin films deposited on glass substrate by the RF magnetron sputtering method have been modified by a hydrogen annealing treatment and $SiO_2$ protection layer. AZO thin films were deposited at room temperature and different RF powers of 50, 100, 150, and 200 W to optimize the AZO film growth condition. The lowest value of resistivity of $9.44{\times}10^{-4}{\Omega}cm$ was obtained at 2 mtorr, room temperature, and a power level of 150 W. Then, the AZO thin films were annealed at $250-400^{\circ}C$ for 1 h in hydrogen ambient. The minimum resistivity obtained was $8.32{\times}10^{-4}{\Omega}cm$ as-annealed at $300^{\circ}C$. The electrical properties were enhanced by the hydrogen annealing treatment. After a 72 h damp-heat treatment in harsh conditions of a water steam at $110^{\circ}C$ for four representative samples, a degradation of electrical properties was observed. The sample of hydrogen-annealed AZO thin films with $SiO_2$ protection layer showed a slight degradation ratio(17%) of electrical properties and a preferable transmittance of 90%. The electrical stability of AZO thin films had been modified by hydrogen annealing treatment and $SiO_2$ protection layer.

• Journal of Korean Society of Environmental Engineers
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• v.35 no.1
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• pp.10-16
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• 2013

Characteristics of biological hydrogen production rate and organic acid under anaerobic fermentation process were investigated with sugar wastewater. Hydrogen production rate was higher with alkaline pre-treatment than acidic pre-treatment, resulting in 70% increment. An adequate supply of the nutrients (N or P) into raw sugar wastewater could increase hydrogen production rate. Carbohydrate degradation of the anaerobic fermentation process was not directly related with hydrogen production. Sugar wastewater with the addition of the nutrients shows 3 times higher B/A ratio than the raw sugar wastewater. B/A ratio of the wastewater with alkaline pre-treatment and nutrients addition was most higher than other samples, showing 4.02 of B/A ratio. Higher B/A ratio shows higher hydrogen production rate at each sample.

• Journal of Bio-Environment Control
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• v.18 no.3
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• pp.297-301
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• 2009

Hydrogen peroxide, which is used in various crops as an oxidizer to improve high temperature adaptation, was evaluated on the effects on productivity and disease incidence in paprika (Capsicum annuum L.) by periodic leaf spray at summer. Hydrogen peroxide treatment not only increased the leaf thickness and SPAD (chlorophyll content) but also the fruit set numbers per plant by 2. Hydrogen peroxide content increase in leaf resulted in increase of catalase and peroxidase activities, and the powdery mildew disease (Leveillula taurica) was also suppressed by the treatment. Transpiration was improved by the reduced leaf stomata resistance in the hydrogen peroxide treatment. Therefore, hydrogen peroxide leaf spray is recommended for improvement of summer productivity in paprika.

• Journal of the Korean institute of surface engineering
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• v.45 no.6
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• pp.248-256
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• 2012

A Pd-based hydrogen membranes for hydrogen purification and separation need high hydrogen perm-selectivity. The surface roughness of the support is important to coat the pinholes free and thin-film membrane over it. Also, The pinholes drastically decreased the hydrogen perm-selectivity of the Pd-based composite membrane. In order to remove the pinholes, we introduced various surface pre-treatment such as alumina powder packing, nickel electro-plating and micro-polishing pre-treatment. Especially, the micro-polishing pretreatment was very effective in roughness leveling off the surface of the porous nickel support, and it almost completely plugged the pores. Fine Ni particles filled surface pinholes with could form open structure at the interface of Pd alloy coating and Ni support by their diffusion to the membrane and resintering. In this study, a $4{\mu}m$ surface pore-free Pd-Cu-Ni ternary alloy membrane on a porous nickel substrate was successfully prepared by micro-polishing, high temperature sputtering and Cu-reflow process. And $H_2$ permeation and $N_2$ leak tests showed that the Pd-Cu-Ni ternary alloy hydrogen membrane achieved both high permeability of $13.2ml{\cdot}cm^{-2}{\cdot}min^{-1}{\cdot}atm^{-1}$ permation flux and infinite selectivity.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.867-869
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• 2008

We have investigated the effects of hydrogen plasma treatment by PECVD (Plasma Enhanced Chemical Vapor Deposition) in the back channel region, the method for reducing the off state leakage current which increases with the short channel length of a-Si:H TFTs. To improve the off current characteristics, we analyzed the hydrogen plasma treatment with various RF power and plasma treatment times of PECVD. As the result of hydrogen plasma treatment in the back channel region it was remarkably reduced the off current level of 2um channel length TFT.

• Proceedings of the Korean Environmental Sciences Society Conference
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• 1998.10a
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• pp.1-1
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• 1998

Advanced (Chemical) oxidation processes (AOP) differ from most conventional ones in that hydroxyl radical(OH.) is considered to be the primary oxidant. Hydroxyl radicalcan react non-selectively with a great number of organic and inorganic chemicals. The typical rate constants of true hydroxyl radical reactions are in the range of between 109 to 1012 sec-1. Many processes are possible to generate hydroxyl radical. These include physical and chemical methods and their combinations. Physical means involves the use of high energy radiation such as gamma ray, electron beam, and acoustic wave. Under an applied high energy radiation, water molecules can be decomposed to yield hydroxyl radicals or aqueous electrons. Chemical means include the use of conventional oxidants such as hydrogen peroxide and ozone, two of the most efficient oxidants in the presence of promoter or catalyst. Hydrogen peroxide in the presence of a catalyst such as divalent iron ions can readily produce hydroxyl radicals. Ozone in the presence of specific chemical species such as OH- or hydrogen peroxide, can also generate hydroxyl radicals. Finally the combination of chemical and physical means can also yield hydroxyl radicals. Hydrogen peroxide in the presence of acoustic wave or ultra violet beam can generate hydroxyl radicals. The principles for hydroxyl radical generation will be discussed. Recent case studied of AOP for water treatment and other environmental of applications will be presented. These include the treatment of contaminated soils using electro-Fenton, lechate treatment with conventional Ponton, treatment of coal for sulfur removal using sonochemical and the treatment of groundwater with enhanced sonochemical processes.

• Journal of Wetlands Research
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• v.23 no.1
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• pp.54-59
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• 2021

DIWS system was introduced to remove hydrogen sulfide from the biogas of wastewater treatment plant. In the case of using water into the DIWS system more than 5,000mg/L of hydrogen sulfide, 25% of H2S removal efficiency was shown and required such further treatment process as incineration which was obtained more than 98%. When the inflow of hydrogen sulfide was 5,000mg/L, CH4 and CO2 were effectively discharged and the reduction was 8.7% and 28.6%, respectively. When such neutralization chemicals as Na2CO3 and NaOH were introduced into the DIWS system, H2S was removed more than 97.2% keeping pH in the range of 11.2 to 11.5.

• Journal of Bio-Environment Control
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• v.15 no.1
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• pp.47-52
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• 2006

This studies were carried out in summer season to increase high temperature tolerance using hydrogen peroxide treatments on cucumber in greenhouse. The water stress of cucumber in greenhouse by the hydrogen peroxide treatments showed as control>250 mM>500 mM treatments in order. The photosynthesis rate of cucumber at $30^{\circ}C$ did not show difference with each hydrogen peroxide treatment in temperature controlled greenhouse. However, the photosynthesis rate of cucumber in the control and hydrogen peroxide treatments at $40^{\circ}C$ was significantly different. The photosynthesis rate of cucumber in combined treatment with 1,000 $mg{\cdot}L^{-1}\;CO_2$ supply and hydrogen peroxide was also higher than control, however, there was no different of photosynthesis in 250 mM and 500 mM treatment. The value of $F_v/F_m$ and $F_m/F_o$ of chlorophyll fluorescent in 500 mM hydrogen peroxide treatment at $40^{\circ}C$ was highest. Also the activity of POD, the antioxidant enzyme, was higher with high hydrogen peroxide concentration than the other treatments. The high temperature limits for growth were $43^{\circ}C$ in the control, $44^{\circ}C$ in the 250 mM and $46^{\circ}C$ in the 500 mM according to analyze chlorophyll fluorescent $F_o$. The high temperature tolerance in cucumber increased approximately $3^{\circ}C$ by the hydrogen peroxide treatments under this experiment conditions.