• Proceedings of the IEEK Conference
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• 2006.06a
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• pp.981-982
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• 2006

In this study, the synthesis and semiconducting properties of cation and defect-doped KTaO3 film is reported. KTaO3is an important material for optoelectronic and tunable microwave applications. It is an incipient ferroelectric with a cubic structure that becomes ferroelectric when doped with Nb. the films were grown on (001) MgO single crystal substrates using pulsed-laser deposition. Semiconducting behavior is achieved by inducing oxygen vacancies in the KTaO3 lattice via growth in a hydrogen atmosphere. The resistivity of semiconducting KTaO3:Ca films was as low as 10cm, and n-type semiconducting behavior was indicated. Hall mobility and carrier concentration were 0.27 cm2/Vs and 3.21018cm-3.

• Bulletin of the Korean Chemical Society
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• v.26 no.6
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• pp.921-924
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• 2005

It is known that metallothionein (MT) plays a role in the scavenging of free radicals, which is produced under various stress conditions. MT may function as an antioxidant that protects against oxidative damage of DNA, protein, and lipid induced by superoxide anion, hydrogen peroxide, hydroxyl radical, nitric oxide, and peroxynitrite. This study was undertaken to test the hypothesis that MT also protects from RNA damage induced by peroxynitrite, an important reactive nitrogen species that causes a diversity of pathological processes. A cell-free system was used. RNA damage was detected by the mobility of $tRNA^{Phe}$ in electrophoresis. Cleavages on tRNA were not induced by 3-morpholinosydnomine, which produces peroxynitrite directly. MT induced tRNA damage which was site specific.

• Journal of the Korean institute of surface engineering
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• v.35 no.2
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• pp.113-121
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• 2002

We have investigated insulating properties of $SiO_2$ interlayer for the thin film strain gauge, which were prepared by RF magnetron sputtering method in various deposition conditions, such as Ar pressure, gas flow rates and sputtering gases. SEM, AFM and FT-IR techniques were used to analyze its structures and composition. As the Ar pressure and the flow rate increased, the insulating interlayer showed low insulating resistance due to its porous structure and defects. Oxygen deficiency in $SiO_2$ was decreased as fabricated by hydrogen reactive sputtering. We could enhance the surface mobility of sputtered adatoms by using Ar/$H_2$ sputtering gas and obtain a good surface roughness and insulating property. The optimum insulating resistance of 9.22 G$\Omega$ was obtained in Ar/30% $H_2$ mixed gas, flow rate 10sccm, and 1mTorr.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.05a
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• pp.145-146
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• 2012

Al이 2wt% 첨가된 AZO(Al-doped ZnO) 타겟을 기판을 가열한 대향 타겟 마그네트론 스퍼터링법을 이용하여 수소 유량에 따라 유리기판 위에 AZO 박막을 증착하였다. 수소 유량에 따른 AZO 박막내의 carrier concentration와 mobility의 변화를 확인하였으며 박막내 crystallinity와 grain size의 변화를 확인하였다. 증착된 AZO 박막 특성의 구조적, 전기적, 광학적 변화조사하고 비저항 및 광투과도 등을 분석하여 투명전극용으로 적합한지 연구하였다.

• Bulletin of the Korean Chemical Society
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• v.19 no.6
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• pp.625-628
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• 1998

The dynamic mechanical properties of the unclustered cesium neutralized poly(methyl methacrylate-co-methacrylic acid) ionomers plasticized with three different plasticizers of low molecular weight were investigated. It was found that the effectiveness of the plasticization followed the order: glycerol (Gly) 4-decylaniline (4DA) >dioctyl phthalate (DOP). For the ionomer plasticized with Gly, the only effect was a significant decrease in the Tg. Thus it is concluded that the polar plasticizer not only increases the mobility of the ionomer but also dissolves the ionic groups. In the case of the 4DA-plasticized ionomer, both a drastic decrease in the Tg and the appearance of a second glass transition were observed. Therefore, it is suggested that the nonpolar 4DA molecules partition evenly in the poly(methyl methacrylate) matrix and cluster phases via hydrogen bonding between the aniline group of the plasticizer and the carbonyl groups of the ionomer. As a result, the Tg is lowered, multiplets can form, and the material behaves like a clustered ionomer.

• CORROSION AND PROTECTION
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• v.12 no.1
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• pp.12-23
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• 2013

원자력 발전소 주요 부품에 사용되는 Alloy 600의 PWSCC 개시와 전파기구를 살펴보고 그 억제 기술을 소개하였다. ○ 균열은 경화된 표면 산화층이 깨질 경우, 입계부식, 공식(pitting), 열처리 또는 물속에 노출되었을 때 일어나는 선택부식(selective corrosion), MnS등 게재물의 용출등에 의해 시작된다. ○ 균열의 전파는 '느린 성장'과 '빠른 성장'으로 구별해 볼 수 있는데 빠른 균열성장은 균열 선단에서의 응력확대 계수(K_I)가 균열이 전파하는 임계값(K_Iscc)을 넘는 경우에 일어난다. ○ Slip Dissolution/Film Rupture Model, Enhanced surface mobility model, Hydrogen assisted creep rupture, Internal oxidation 등의 모델이 제시되어 있으며 Internal oxidation 모델이 여러 실험자료로 잘 뒷 받침되고 있다. ○ PWSCC 억제 방안으로는 부식환경과의 격리 및 보수용접이 대표적이며 부품의 교체를 통한 안전 확보의 방안도 있다. 수소량 조절을 통한 억제 방안도 제시되어 있다. ○ Alloy 600 PWSCC열화 관리 전략프로그램은 결함 발생 가능성이 높은 부위 선정, 우선 순위에 따른 계획적인 검사, 결함이 발견될 경우 완화조치를 취하거나 필요시 교체/보수를 실시하고 그 운영프로그램을 지속적으로 갱신관리하는 방안으로 유지되어야 한다.

• Bulletin of the Korean Chemical Society
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• v.34 no.11
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• pp.3399-3404
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• 2013

A new accepter unit, pyrrolo[3,2-b]pyrrole-2,5-dione, was prepared and utilized for the synthesis of the conjugated polymers containing electron donor-acceptor pair for OPVs. Pyrrolo[3,2-b]pyrrole-2,5-dione unit, regioisomer of the known pyrrolo[3,4-c]pyrrole-1,4-dione, is originated from the structure of stable synthetic pigment. The new conjugated polymers with 1,4-diphenylpyrrolo[3,2-b]pyrrole-2,5-dione, thiophene and carbazole were synthesized using Suzuki polymerization to generate P1 and P2. The solid films of P1 and P2 show absorption bands with maximum peaks at about 377, 554 and 374, 542 nm and the absorption onsets at 670 and 674 nm, corresponding to band gaps of 1.85 and 1.84 eV, respectively. To improve the hole mobility of the polymer with 1,4-bis(4-butylphenyl)-pyrrolo[3,2-b]-pyrrole-2,5-dione unit, which was previously reported by us, the butyl group at the 4-positions of the N-substituted phenyl group was substituted with hydrogen and methyl group. The field-effect hole mobility of P2 is $9.6{\times}10^{-5}cm^2/Vs$. The device with $P2:PC_{71}BM$ (1:2) showed $V_{OC}$ value of 0.84 V, $J_{SC}$ value of 5.10 $mA/cm^2$, and FF of 0.33, giving PCE of 1.42%.

• Electrical & Electronic Materials
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• v.9 no.1
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• pp.30-37
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• 1996

Previously, crystallization of a-Si:H films on glass substrates were limited to anneal temperature below 600.deg. C, over 10 hours to avoid glass shrinkage. Our study indicates that the crystallization is strongly influenced by anneal temperature and weakly affected by anneal duration time. Because of the high temperature process and nonconducting substrate requirements for poly-Si TFTs, the employed substrates were limited to quartz, sapphire, and oxidized Si wafer. We report on poly-Si TFT's using high temperature anneal on a Si:H/Mo structures. The metal Mo substrate was stable enough to allow 1000.deg. C anneal. A novel TFT fabrication was achieved by using part of the Mo substrate as drain and source ohmic contact electrode. The as-grown a-Si:H TFT was compared to anneal treated poly-Si TFT'S. Defect induced trap states of TFT's were examined using the thermally stimulated current (TSC) method. In some case, the poly-Si grain boundaries were passivated by hydrogen. A-SI:H and poly-Si TFT characteristics were investigated using an inverted staggered type TFT. The poly -Si films were achieved by various anneal techniques; isothermal, RTA, and excimer laser anneal. The TFT on as grown a-Si:H exhibited a low field effect mobility, transconductance, and high gate threshold voltage. Some films were annealed at temperatures from 200 to >$1000^{\circ}C$ The TFT on poly-Si showed an improved $I_on$$I_off$ ratio of $10_6$, reduced gate threshold voltage, and increased field effect mobility by three orders. Inverter operation was examined to verify logic circuit application using the poly Si TFTs.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.171-171
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• 2010

GaN 기반 Light emitting diodes(LEDs)의 p-type doping layer는 일반적으로 hole을 발생시키는 acceptor로 Mg이 사용하되고 있다. 보통 Mg이 도핑된 p-type GaN은 >$1\;{\Omega}{\cdot}cm$의 저항이 존재하는데 그 이유는 Mg의 열적 이온화를 위한 activation 에너지가 높아서 상온에서 valence band의 hole concentration는 전체 억셉터 농도의 1%가 되지 않기 ��문이다. 본 논문에서는 높은 hole 농도를 얻기 위해서 metalorganic chemical-vapor deposition (MOCVD)를 장비를 사용하여 사파이어 기판의 misorientation-angle에 따른 p-type a-plane(11-20) GaN 특성을 분석하였다. misorientation-angle은 c축 방향으로 $+0.15^{\circ}$, $-0.15^{\circ}$, $-0.2^{\circ}$, $-0.4^{\circ}$ off된 r-plane(1-102) 사파이어 기판 을 사용하였다. p-type 도핑물질로 bis-magnesium (Cp2Mg) 소스를 사용하였고 성장 과정중 발생하는 hydrogen passivation으로 인한 Mg-H complexes현상을 해결하기위해 conventional furnace annealing (CFA)와 rapid thermal annealing (RTA)를 이용하여 열처리 공정을 진행하였다. 열처리 공정은 Air와 N2 분위기에서 $650^{\circ}C$에서 $900^{\circ}C$ 사이의 다양한 온도에서 수행하였고 Hall 측정을 위해 Ni을 전극 물질로 사용하였다. 상온에서 Accent HL5500IU Hall system을 사용하여 hole concentration, mobility, specific resistance을 측정하였다. 열처리 공정 후 Hall측정 결과 $+0.15^{\circ}$, $-0.15^{\circ}$, $-0.2^{\circ}$, $-0.4^{\circ}$ off된 각 샘플들은 온도, 시간, 분위기에 따라 hole concentration ($7.4{\times}10^{16}cm^{-3}{\sim}6{\times}10^{17}cm^{-3}$), mobility(${\mu}h=\;1.72\;cm^2/V-s\;{\sim}15.2\;cm^2/V-s$), specific resistance(4.971 ohm-cm ~8.924 ohm-cm) 가 변화됨을 확인 할 수 있었다. 또한 광학적 특성을 분석하기 위해 Photoluminescence (PL)을 측정하였다.

• Journal of Hydrogen and New Energy
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• v.28 no.4
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• pp.419-425
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• 2017

In this study, an efficient dye-sensitive solar cells (DSSC) was developed after post-treatment of ZnO on $TiO_2$ photoelectrode. The $TiO_2$ electrode with ZnO post treatment was prepared with Titanium isoporopoxide in Zinc Nitrate Hexahydrate aqueous solution by incineration for 30 min at $450^{\circ}C$. The ZnO-post treated $TiO_2$ electrode showed strong dispersion force between particles in relation to the control $TiO_2$, referring high specific surface area and dye-adsorption rate. Proper addition of ZnO enhanced electron mobility and reduced internal resistance and electron recombination. Light conversion efficiency of DSSCs containing the ZnO-posttreated $TiO_2$ electrode increased 35.4% when compared to the DSSCs using $TiO_2$ electrode. It is similar to the DSSCs with $TiCl_4$ post treatment $TiO_2$ electrode. Increasing of light conversion efficiency was due to high specific surface area and dispersion force, and low dye-adsorption rate and electron recombination. Taken together, ZnO may be used as posttreatment of photoelectrode and replaced $TiCl_4$ that has high toxicity and causticity.