• Rapid Communication in Photoscience
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• 제4권4호
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• pp.82-85
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• 2015

Photoelectrochemical cell (PEC) is one of the attractive ways to produce clean and renewable energy. However, solar to hydrogen production via PEC system generally requires high external bias, because of material's innate electronic band potential relative to hydrogen reduction potential and/or charge separation issue. For spontaneous photo-water splitting, here, we design dye-sensitized solar cell (DSSC) and their monolithic tandem cell incorporated with a $BiVO_4$ photoanode. $BiVO_4$ has high conduction band edge potential and suitable band gap (2.4eV) to absorb visible light. To achieve efficient $BiVO_4$ photoanode system, electron and hole mobility should be improved, and we demonstrate a tandem cell in which $BiVO_4/WO_3$ film is connected to cobalt complex based DSSC.

• 한국전기전자재료학회논문지
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• 제21권9호
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• pp.848-852
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• 2008

Characteristics of microcrystalline-silicon thin-films deposited by plasma-enhanced chemical-vapor deposition (PECVD) method were studied. There were optimum values of RF power density and $H_2$ dilution ratio $(H_2/(SiH_4+H_2))$; maximum grain size of about 35 nm was obtained at substrate temperature of 250 $^{\circ}C$ with RF power density of 1.1 W/$cm^2$ and $H_2$ dilution ratio of 0.91. Larger grain was obtained with higher substrate temperature up to 350 $^{\circ}C$. Grain size dependence on RF power density and $H_2$ dilution ratio could be explained by etching effects of hydrogen ions and changes of species of reactive precursors on growing surface. Surface-mobility activation of reactive precursors by temperature could be a reason of grain-size dependence on the substrate temperature. Microcrystalline-silicon thin-films that could be used for flat-panel electronics such as active-matrix organic-light-emitting-diodes are expected to be fabricated successfully using these results.

• 한국수소및신에너지학회논문집
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• 제34권1호
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• pp.77-82
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• 2023

The fuel cell in fuel cell electric vehicle utilizes oxygen in the atmosphere, which requires the use of an air cleaner system to minimize the intake of harmful pollutants. To estimate the performance of the air cleaner system, the pressure drop between the filter inlet and outlet is used under the rated air flow condition. In this study, the effect of sensor error in this air cleaner testing is experimentally carried out. It is found that the errors of the temperature sensor does not significantly affect the estimation of pressure drop. However, in the case of the pressure sensor, 5% sensor error results in the error of pressure drop estimation by 3%. Therefore, it is recommended that the measurement accuracy of the pressure sensor mounted in test system should be maintained at less than 5%.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.254-255
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• 2012

Interest in nano-crystalline silicon (nc-Si) thin films has been growing because of their favorable processing conditions for certain electronic devices. In particular, there has been an increase in the use of nc-Si thin films in photovoltaics for large solar cell panels and in thin film transistors for large flat panel displays. One of the most important material properties for these device applications is the macroscopic charge-carrier mobility. Hydrogenated amorphous silicon (a-Si:H) or nc-Si is a basic material in thin film transistors (TFTs). However, a-Si:H based devices have low carrier mobility and bias instability due to their metastable properties. The large number of trap sites and incomplete hydrogen passivation of a-Si:H film produce limited carrier transport. The basic electrical properties, including the carrier mobility and stability, of nc-Si TFTs might be superior to those of a-Si:H thin film. However, typical nc-Si thin films tend to have mobilities similar to a-Si films, although changes in the processing conditions can enhance the mobility. In polycrystalline silicon (poly-Si) thin films, the performance of the devices is strongly influenced by the boundaries between neighboring crystalline grains. These grain boundaries limit the conductance of macroscopic regions comprised of multiple grains. In much of the work on poly-Si thin films, it was shown that the performance of TFTs was largely determined by the number and location of the grain boundaries within the channel. Hence, efforts were made to reduce the total number of grain boundaries by increasing the average grain size. However, even a small number of grain boundaries can significantly reduce the macroscopic charge carrier mobility. The nano-crystalline or polymorphous-Si development for TFT and solar cells have been employed to compensate for disadvantage inherent to a-Si and micro-crystalline silicon (${\mu}$-Si). Recently, a novel process for deposition of nano-crystralline silicon (nc-Si) thin films at room temperature was developed using neutral beam assisted chemical vapor deposition (NBaCVD) with a neutral particle beam (NPB) source, which controls the energy of incident neutral particles in the range of 1~300 eV in order to enhance the atomic activation and crystalline of thin films at room temperature. In previous our experiments, we verified favorable properties of nc-Si thin films for certain electronic devices. During the formation of the nc-Si thin films by the NBaCVD with various process conditions, NPB energy directly controlled by the reflector bias and effectively increased crystal fraction (~80%) by uniformly distributed nc grains with 3~10 nm size. The more resent work on nc-Si thin film transistors (TFT) was done. We identified the performance of nc-Si TFT active channeal layers. The dependence of the performance of nc-Si TFT on the primary process parameters is explored. Raman, FT-IR and transmission electron microscope (TEM) were used to study the microstructures and the crystalline volume fraction of nc-Si films. The electric properties were investigated on Cr/SiO2/nc-Si metal-oxide-semiconductor (MOS) capacitors.

• 한국표면공학회지
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• 제42권6호
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• pp.267-271
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• 2009

Multicomponent transparent conducting oxide films were deposited on glass substrates at 150 by dual magnetron sputtering of AZO and ITO targets. In the case of mixing a limited amount of ITO (10W), resistivity of TCO films was significantly increased compared to the AZO film; from $3.5{\times}10^{-3}$ to $9.7{\times}10^{-3}{\Omega}{\cdot}cm$. Deterioration of the electrical conductivity is attributed to the decreases in carrier concentration and Hall mobility. Improvement of the conductivity could be obtained for the films prepared with ITO powers larger than 40 W. The lowest resistivity ($\rho$) of $7.3{\times}10^{-4}{\Omega}{\cdot}cm$ was achieved when ITO power was 100 W. Effects of $H_2$ incorporation on the electrical and optical properties of AZO-ITO films were investigated in this work. Addition of small amount of hydrogen resulted in the increase of carrier concentration and the improvement of electrical conductivity. It is apparent that the roughness of AZO-ITO films decreases dramatically after the transition of microstructure from polycrystalline to amorphous phase, which gives practical advantages such as an excellent uniformity of surface and a high etching rate. AZO-ITO films grown at sputtering ambient with hydrogen gas are expected to be applicable to optoelectronic devices such as organic light emitting diodes and flexible displays due to their sufficient electrical and structural properties.

• 한국주조공학회지
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• 제39권2호
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• pp.21-25
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• 2019

Microstructural and corresponding hardness changes of TiFe compounds with Zr (0~6 at%) or Ce (0~3 at%) were studied using samples prepared at different solidification rates. In arc-melted (TiFe)-Zr samples, the $Fe_{23}$ $Zr_6$ and $(Ti,\;Zr)_2Fe$ phases formed in the TiFe matrix, while in the (TiFe)-Ce sample, the $CeO_2$ phase formed along the grain boundary of the TiFe matrix. As the Zr content was increased, the volume fractions of the $Fe_{23}$ $Zr_6$ and $(Ti,\;Zr)_2Fe$ phases increased, forming a network structure. Accordingly, the hardness values of the samples also increased. With a small addition of Ce of approximately 0.1 at%, the as-cast microstructure could be effectively refined, reducing the average grain boundary diameter from ${\sim}100{\mu}m$ to ${\sim}14{\mu}m$. In the rapidly solidified sample prepared through a melt-spinning method, the constituent phases were identical to those of the arc-melted samples while the grains were refined. The microstructural changes of TiFe alloys can affect the hydrogen storage ability as well as the mobility of the hydrogen atoms in the alloys.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.56-60
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• 2006

We review our studies on the growth of microcrystalline silicon films by the standard PECVD technique. In situ spectroscopic ellipsometry studies allow the optimization of the complex film structure with respect to competing aspects of the growth process. Fine tuning the hydrogen flux, the ion energy, and the nature of the species contributing to deposition produces unique films with a fully crystallized interface with silicon nitride. These materials have been successfully incorporated in bottom gate TFTs which present mobility values in the range of 1 to 3 $cm^2/V.s$, and stable characteristics when submitted to a bias stress. The stability of these TFTs makes them suitable for driver applications in AMLCDs as well as pixel elements in OLED displays.

• 전자공학회논문지A
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• 제33A권5호
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• pp.117-124
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• 1996

The .mu.c-Si:H films have been deposited by PeCVD at the various conditions such as hydrogen dilution ratio, substrate temperature and RF power density. Then, we studied their electrical and optical properties. Top gate hydrogenated micro-crystalline silicon thin film transistors($\mu$c-Si:H TFTs) using $\mu$-Si:H and a-SiN:H films have been fabricated by FECVD. The electrical characteristics of the devices have been investigated by semiconductor parameter analyzer and compared with amorphous silicon thin film transistors (a-Si:H TFTs). In this study, on/off current ratio, threshold voltage and the field effect mobility of the $\mu$c-Si:H TFT were $3{\times}10^{4}$, 5.06V and 0.94cm$^{2}$Vs, respectively.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2010년도 춘계학술발표대회
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• pp.56.1-56.1
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• 2010

A novel electrochemical potentiostatic method has been examined in order to enhance the hole concentration of p-type GaN thin films using KOH and HCl electrolyte. The hole concentration was increased more than 2 times by the electric voltge apply with the mobility of $10{\sim}12cm^2/V.s$. At optimum condition of 3V apply, hole concentration was enhanced more than reference sample from $1.7{\times}10^{-17}cm^{-3}$ to $4.1{\times}10^{-17}cm^{-3}$. Application of this activation method to blue-LED fabrication improved optical output from 18.4mW to 20.6mW, that is ~12% increase. SIMS analysis indicates that nearly 70% of hydrogen atoms could be removed by this method.

• Biotechnology and Bioprocess Engineering:BBE
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• 제5권5호
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• pp.366-371
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• 2000

The aim of this study was to investigate the efficiency of the pentagalloic acid compound in inhibiting the metal ions and cell lines that mediate in low density lipoprotein (LDL) oxidation. Pentagalloic acid prolonged the lag time preceeding the onset of conjugated diene formation. In chemically induced LDL oxidation by Cu$^2$(sup)+ plus hydrogen peroxide or peroxyl radical generated by 2, 2-azo-vis (2-amidino propane) hydrochloride (AAPH), pentagalloic acid inhibited LDL oxidation as monitored by measuring the thiobarbituric acid reactive substances(TBARS), malondialdehyde(MDA), and gel electrophoretic mobility. The physiological relevance of the antioxidative activity was validated at the cellular level where pentagalloic acid inhibited mouse macrophage J774 and endothelial cell-mediated LDL oxidation. When compared with several other antioxidants, pentagalloic acid showed a much higher ability than naturally occuring antioxidants, ${\alpha}$-tocopherol and ascorbic acid, and the synthetic antioxidant, probucol.