• 제목/요약/키워드: Hybrid dielectrics

검색결과 18건 처리시간 0.025초

Effect of the Hydrophobicity of Hybrid Gate Dielectrics on a ZnO Thin Film Transistor

  • Choi, Woon-Seop;Kim, Se-Hyun
    • Transactions on Electrical and Electronic Materials
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    • 제11권6호
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    • pp.257-260
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    • 2010
  • Zinc oxide (ZnO) bottom-contact thin-film transistors (TFTs) were prepared by the use of injector type atomic layer deposition. Two hybrid gate oxide systems of different polarity polymers with silicon oxide were examined with the aim of improving the properties of the transistors. The mobility and threshold voltage of a ZnO TFT with a poly(4-dimethylsilyl styrene) (Si-PS)/silicon oxide hybrid gate dielectric had values of 0.41 $cm^2/Vs$ and 24.4 V, and for polyimide/silicon oxide these values were 0.41 $cm^2/Vs$ and 24.4 V, respectively. The good hysteresis property was obtained with the dielectric of hydrophobicity. The solid output saturation behavior of ZnO TFTs was demonstrated with a $10^6$ on-off ratio.

후막 및 박막 하이브리드 마이크로 회로 기술

  • 이준
    • 한국세라믹학회:학술대회논문집
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    • 한국세라믹학회 1986년도 Priceedings Of The Third Korea-Japan Seminar On New Ceramics
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    • pp.237-255
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    • 1986
  • The thick and thin film hybrid microcircuit technologies are reviewed. The materials, te processing conditions and the final properties of thick and thin film conductors, resistors dielectrics are discussed.

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Fabrication of Flexible Inorganic/Organic Hybrid Thin-Film Transistors by All Ink-Jet Printed Components on Plastic Substrate

  • Kim, Dong-Jo;Lee, Seong-Hui;Moon, Joo-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.1463-1465
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    • 2008
  • We report all-ink-jet printed inorganic/organic hybrid TFTs on plastic substrates. We have investigated the optimal printing conditions to make uniform patterned layers of gate electrode, dielectrics, source/drain electrodes, and semiconductor as a coplanar type TFT in a successive manner. All ink-jet printed devices have good mechanical flexibility and current modulation characteristic even when bent.

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Development of Organic-Inorganic Hybrid Dielectric for Organic Thin Film Transistors

  • Jeong, Sun-Ho;Kim, Dong-Jo;Lee, Sul;Park, Bong-Kyun;Moon, Joo-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1115-1118
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    • 2006
  • Using a thermally-crosslinkable organosiloxane-based organic-inorganic hybrid material, solution processable gate dielectric layer for organic thin-film transistors (OTFTs) have been fabricated. The hybrid dielectrics are synthesized by the sol-gel process, followed by the heat-treatment at $190{\bullet}\;.{\bullet}$ To investigate the electrical property of hybrid dielectric, leakage current behavior and capacitance were measured. To fabricate coplanar-type OTFTs, Au/Cr electrode was deposited onto the heavily doped silicon substrate with the organic-inorganic hybrid dielectric layer and then ${\alpha},{\omega}-dihexylquaterthiophene$ was drop-cast between source and drain electrical performance of the fabricated transistor.

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Flexibility Improvement of InGaZnO Thin Film Transistors Using Organic/inorganic Hybrid Gate Dielectrics

  • Hwang, B.U.;Kim, D.I.;Jeon, H.S.;Lee, H.J.;Lee, N.E.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.341-341
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    • 2012
  • Recently, oxide semi-conductor materials have been investigated as promising candidates replacing a-Si:H and poly-Si semiconductor because they have some advantages of a room-temperature process, low-cost, high performance and various applications in flexible and transparent electronics. Particularly, amorphous indium-gallium-zinc-oxide (a-IGZO) is an interesting semiconductor material for use in flexible thin film transistor (TFT) fabrication due to the high carrier mobility and low deposition temperatures. In this work, we demonstrated improvement of flexibility in IGZO TFTs, which were fabricated on polyimide (PI) substrate. At first, a thin poly-4vinyl phenol (PVP) layer was spin coated on PI substrate for making a smooth surface up to 0.3 nm, which was required to form high quality active layer. Then, Ni gate electrode of 100 nm was deposited on the bare PVP layer by e-beam evaporator using a shadow mask. The PVP and $Al_2O_3$ layers with different thicknesses were used for organic/inorganic multi gate dielectric, which were formed by spin coater and atomic layer deposition (ALD), respectively, at $200^{\circ}C$. 70 nm IGZO semiconductor layer and 70 nm Al source/drain electrodes were respectively deposited by RF magnetron sputter and thermal evaporator using shadow masks. Then, IGZO layer was annealed on a hotplate at $200^{\circ}C$ for 1 hour. Standard electrical characteristics of transistors were measured by a semiconductor parameter analyzer at room temperature in the dark and performance of devices then was also evaluated under static and dynamic mechanical deformation. The IGZO TFTs incorporating hybrid gate dielectrics showed a high flexibility compared to the device with single structural gate dielectrics. The effects of mechanical deformation on the TFT characteristics will be discussed in detail.

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팬 아웃 웨이퍼 레벨 패키징 재배선 적용을 위한 유무기 하이브리드 유전체 연구 (Study of Organic-inorganic Hybrid Dielectric for the use of Redistribution Layers in Fan-out Wafer Level Packaging)

  • 송창민;김사라은경
    • 마이크로전자및패키징학회지
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    • 제25권4호
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    • pp.53-58
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    • 2018
  • 집적회로 소자의 축소가 물리적 한계에 도달 한 이후 3D 패키징, 임베디드 패키징 및 팬 아웃 웨이퍼 레벨 패키징(FOWLP, fan-out wafer level packaging)과 같은 혁신적인 패키징 기술들이 활발히 연구되고 있다. 본 연구에서는 FOWLP의 다층 재배선(redistribution layer)에 사용하기 위한 유무기 하이브리드 유전체 소재의 공정을 평가하였다. 폴리이미드(PI) 또는 폴리파라페닐렌벤조비스옥사졸(PBO)과 같은 현 유기 유전체와 비교하여 폴리실세스키옥산(polysilsesquioxane, PSSQ)라고 불리는 유무기 하이브리드 유전체는 기계적, 열적 및 전기적 안정성을 향상시킬 수 있고, UV 노광을 통하여 경화 공정과 패턴 공정을 동시에 할 수 있는 장점이 있다. 폴리실세스키옥산 용액을 6 인치 Si 웨이퍼에 스핀 코팅한 후 pre-baking과 UV 노광 공정을 이용하여 패턴 및 경화를 진행하였다. 10분의 UV 노광 시간으로 경화와 $2{\mu}m$ 라인 패턴 형성이 동시에 진행됨을 확인하였고, 경화된 폴리실세스키옥산 유전체의 유전상수는 2.0에서 2.4 로 측정되었다. 폴리실세스키옥산 소재를 이용하여 고온 경화 공정없이 UV 노광 공정만으로 경화와 패턴을 할 수 있는 공정 가능성을 보였다.

유기물과 유무기 혼합 폴리머 게이트 절연체를 사용한 유기 박막 트랜지스터의 특성 (Characteristics of Organic Thin Film Transistors with Organic and Organic-inorganic Hybrid Polymer Gate Dielectric)

  • 배인섭;임하영;조수헌;문송희;최원석
    • 한국전기전자재료학회논문지
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    • 제22권12호
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    • pp.1009-1013
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    • 2009
  • In this study, we have been synthesized the dielectric layer using pure organic and organic-inorganic hybrid precursor on flexible substrate for improving of the organic thin film transistors (OTFTs) and, design and fabrication of organic thin-film transistors (OTFTs) using small-molecule organic semiconductors with pentacene as the active layer with record device performance. In this work OTFT test structures fabricated on polymerized substrates were utilized to provide a convenient substrate, gate contact, and gate insulator for the processing and characterization of organic materials and their transistors. By an adhesion development between gate metal and PI substrate, a PI film was treated using $O_2$ and $N_2$ gas. The best peel strength of PI film is 109.07 gf/mm. Also, we have studied the electric characteristics of pentacene field-effect transistors with the polymer gate-dielectrics such as cyclohexane and hybrid (cyclohexane+TEOS). The transistors with cyclohexane gate-dielectric has higher field-effect mobility, $\mu_{FET}=0.84\;cm^2/v_s$, and smaller threshold voltage, $V_T=-6.8\;V$, compared with the transistor with hybrid gate-dielectric.

금속파티클-$Al_2O_3$ hybrid 반응기의 NOx 제거에 미치는 유전체 영향 (Effect of dielectrics on NOx removal of Metal particle-$Al_2O_3$ hybrid type reactor)

  • 김종석;박재윤;정장근;김태용;고희석;김형만
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.917-921
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    • 2002
  • In this paper, we made different types of non-thermal plasma reactors such as Metal-particle reactor with $Al_2O_3$ to measure NOx removal characteristic and the dielectric effect for NOx removal. NOx removal rate is not so good when we use just dielectric of $Al_2O_3$ at the Metal-particle reactor, also we just put sludge pellets(100%) without Metal-particle reactor with $Al_2O_3$ and dielectric such as $TiO_2$, $BaTiO_3$ to measure the effect of sludge for NOx removal so that NOx removal rate is almost the same. However NOx removal rate is more than 90% in case of the reactor of composition shape used both dielectric of $Al_2O_3$ and sludge pellets at the same time. In case of the shape of plasma reactor with dielectric, the Metal-particle reactor with $Al_2O_3$, and the metal-particle reactor with both $Al_2O_3$ and dielectric such as $TiO_2$, $BaTiO_3$ at the same time, they are almost the same effect for NOx removal, so we made MNPR(Metal-particle Non-thermal Plasma Reactor with $Al_2O_3$) to reduce these kinds of demerits. Finally, we think MNPR should be much better than other reactors for NOx removal.

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NEW OPTICALLY TRANSPARENT MATERIALS FOR TRANSPARENT ELECTRONICS AND DISPLAYS

  • Ju, Sang-Hyun;Liu, Jun;Li, Jianfeng;Chen, Po-Chiang;Zhou, Chongwu;Facchetti, Antonio;Janes, David B.;Marks, Tobin J.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.973-974
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    • 2008
  • Optically transparent and flexible electronic circuits and displays are attractive for next-generation visual technologies, including windshield displays, head-mounted displays, and transparent screen monitors. Here we report on the fabrication of transparent transistors and circuits based on the combination of nanoscopic dielectrics and organic, inorganic, or hybrid semiconductors. Furthermore, the first demonstration of a transparent and flexible AMOLED display driven solely by $In_2O_3$ nanowire transistors (NWTs) is reported. The display region exhibits an optical transmittance of ~35% and a green peak luminance of ${\sim}300\;cd/m^2$. These results indicate that NWT-based drive circuits are attractive for fully transparent display technologies.

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