• Title/Summary/Keyword: High-pressure argon

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A Study of Process factors on the Recycling of Reactive Metal Scraps in Plasma Arc Remelting (Plasma Arc Remelting에서 활성 금속 Scrap 재활용에 미치는 공정인자의 연구)

  • Jung, Jae-Young;Sohn, Ho-Sang
    • Resources Recycling
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    • v.26 no.6
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    • pp.3-9
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    • 2017
  • In this study, plasma arc remelting behaviors according to arc current, arc voltage, and types of plasma gas were investigated using Kroll processed Ti sponges as anode. In the discharge pressure range of vacuum pump ($200{\sim}300kgf/cm^2$), the arc voltage did not vary greatly with the increase of discharge pressure at a given arc length. This means that the pressure in the vacuum chamber during operation hardly changes and the atmospheric pressure maintains. Under various conditions of arc currents (700~900A), the arc voltage slightly increased with arc current. The effects of anode materials and operational variables on the arc length-arc voltage relationship were compared with the results in previous studies. When the atmospheric gas changed from argon to helium, double effect of improvement on the output of the steady state was observed. The increase of output in the plasma arc device was accompanied by an increase in the melting rate of the Ti sponge and the quality of the ingot surface was also improved. The plasma arc remelting of the new scrap titanium and the old scrap zirconium alloy could result in the fabrication of an ingot with high surface quality.

Effect of Sintering Temperature on the Thermoelectric Properties of Bismuth Antimony Telluride Prepared by Spark Plasma Sintering (방전플라즈마 소결법으로 제조된 Bismuth Antimony Telluride의 소결온도에 따른 열전특성)

  • Lee, Kyoung-Seok;Seo, Sung-Ho;Jin, Sang-Hyun;Yoo, Bong-Young;Jeong, Young-Keun
    • Korean Journal of Materials Research
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    • v.22 no.6
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    • pp.280-284
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    • 2012
  • Bismuth antimony telluride (BiSbTe) thermoelectric materials were successfully prepared by a spark plasma sintering process. Crystalline BiSbTe ingots were crushed into small pieces and then attrition milled into fine powders of about 300 nm ~ 2${\mu}m$ size under argon gas. Spark plasma sintering was applied on the BiSbTe powders at 240, 320, and $380^{\circ}C$, respectively, under a pressure of 40 MPa in vacuum. The heating rate was $50^{\circ}C$/min and the holding time at the sintering temperature was 10 min. At all sintering temperatures, high density bulk BiSbTe was successfully obtained. The XRD patterns verify that all samples were well matched with the $Bi_{0.5}Sb_{1.5}Te_{3}$. Seebeck coefficient (S), electric conductivity (${\sigma}$) and thermal conductivity (k) were evaluated in a temperature range of $25{\sim}300^{\circ}C$. The thermoelectric properties of BiSbTe were evaluated by the thermoelectric figure of merit, ZT (ZT = $S^2{\sigma}T$/k). The grain size and electric conductivity of sintered BiSbTe increased as the sintering temperature increased but the thermal conductivity was similar at all sintering temperatures. Grain growth reduced the carrier concentration, because grain growth reduced the grain boundaries, which serve as acceptors. Meanwhile, the carrier mobility was greatly increased and the electric conductivity was also improved. Consequentially, the grains grew with increasing sintering temperature and the figure of merit was improved.

0.6 mAh All-Solid-State Thin Fim Battery Fabricated on Alumina Substrate (알루미나 기판상에 구현된 0.6mAh급 전고상 박막전지)

  • Park, H.Y.;Nam, S.C.;Lim, Y.C.;Choi, K.G.;Lee, K.C.;Park, G.B.;Cho, S.B.
    • Journal of the Korean Electrochemical Society
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    • v.8 no.4
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    • pp.181-185
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    • 2005
  • Lithium cobalt oxide thin film cathode, having thickness of $2.9{\mu}m$ with area of $4cm^2$, was deposited on platinum patterned alumina substrate by radio frequency magnetron sputtering. Li/Co molar ratio, which is an important factor for battery performance, was measured as a function of argon working pressure and applied R.F. power. Constant current charge and discharge performances were characterized with high rate discharge and cycling behavior. Using AC impedance analysis, internal resistance of the thin film battery was measured and simulated by proposed equivalent circuit model.

Dry Etching Characteristics of Zinc Oxide Thin Films in Cl2-Based Plasma

  • Woo, Jong-Chang;Ha, Tae-Kyung;Li, Chen;Kim, Seung-Han;Park, Jung-Soo;Heo, Kyung-Mu;Kim, Chang-Il
    • Transactions on Electrical and Electronic Materials
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    • v.12 no.2
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    • pp.60-63
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    • 2011
  • We investigated the etching characteristics of zinc oxide (ZnO) and the effect of additive gases in a $Cl_2$-based inductively coupled plasma. The inert gases were argon, nitrogen, and helium. The maximum etch rates were 44.3, 39.9, and 37.9 nm/min for $Cl_2$(75%)/Ar(25%), $Cl_2$(50%)/$N_2$(50%), and $Cl_2$(75%)/He(25%) gas mixtures, 600 W radiofrequency power, 150 W bias power, and 2 Pa process pressure. We obtained the maximum etch rate by a combination of chemical reaction and physical bombardment. A volatile compound of Zn-Cl. achieved the chemical reaction on the surface of the ZnO thin films. The physical etching was performed by inert gas ion bombardment that broke the Zn-O bonds. The highly oriented (002) peak was determined on samples, and the (013) peak of $Zn_2SiO_4$ was observed in the ZnO thin film sample based on x-ray diffraction spectroscopy patterns. In addition, the sample of $Cl_2$/He chemistry showed a high full-width at half-maximum value. The root-mean-square roughness of ZnO thin films decreased to 1.33 nm from 5.88 nm at $Cl_2$(50%)/$N_2$(50%) plasma chemistry.

Effect of Sn Addition on Microstructure of Al Alloy Powder for Brazing Process (브레이징용 Al 합금 분말의 미세조직에 미치는 Sn 함량의 영향)

  • Kim, Yong-Ho;Yoo, Hyo-Sang;Na, Sang-Su;Son, Hyeon-Taek
    • Journal of Powder Materials
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    • v.27 no.2
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    • pp.139-145
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    • 2020
  • The powder manufacturing process using the gas atomizer process is easy for mass production, has a fine powder particle size, and has excellent mechanical properties compared to the existing casting process, so it can be applied to various industries such as automobiles, electronic devices, aviation, and 3D printers. In this study, a modified A4032-xSn (x = 0, 1, 3, 5, and 10 wt.%) alloy with low melting point properties is investigated. After maintaining an argon (Ar) gas atmosphere, the main crucible is tilted; containing molten metal at 1,000℃ by melting the master alloy at a high frequency, and Ar gas is sprayed at 10 bar gas pressure after the molten metal inflow to the tundish crucible, which is maintained at 800℃. The manufactured powder is measured using a particle size analyzer, and FESEM is used to observe the shape and surface of the alloy powder. DSC is performed to investigate the change in shape, according to the melting point and temperature change. The microstructure of added tin (Sn) was observed by heat treatment at 575℃ for 10 min. As the content of Sn increased, the volume fraction increased to 1.1, 3.1, 6.4, and 10.9%.

Analytical Performance Evaluation of Pneumatic Nebulizers and Comparison of Their Characteristics (가압분무기의 성능 평가와 특성 비교)

  • Park, Chang Joon;Han, Myung Sub;Song, Sun Jin;Lee, Dong Soo
    • Analytical Science and Technology
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    • v.15 no.2
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    • pp.120-126
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    • 2002
  • The analytical performance of four commercially-available pneumatic nebulizers(Meinhard, Cross-flow, Babington, ESI PFA) was evaluated using inductively coupled plasma-atomic emission spectrometry (ICP-AES) and ICP-mass spectrometry (ICP-MS) instruments. The performance of an inert concentric nebulizer and a modified conespray nebulizer, made in Korea Research Institute of Standards and Science (KRISS), is compared with that of the four commercial nebulizers. Variation of sample introduction efficiency was investigated as carrier argon pressure and sample uptake rate were changed. Variation of sensitivity, signal stability, blank intensity and oxide/hydride ratios were also studied when the nebulizers were connected to the ICP-MS and ICP-AES instruments. It was found that good analytical result such as high sensitivity, low blank, stable signal and so on can be obtained with judicious selection of the nebulizer depending on the type of sample, sample amount, type of analytical instrument and analyte.

Fabrication of Indium Tin Oxide (ITO) Transparent Thin Films and Their Microwave Shielding Properties (Indium Tin Oxide (ITO) 투광성 박막의 제조 및 전자파 차폐특성)

  • Kim, Yeong-Sik;Jeon, Yong-Su;Kim, Seong-Su
    • Korean Journal of Materials Research
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    • v.9 no.11
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    • pp.1055-1061
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    • 1999
  • Indium Tin Oxide (ITO) films were fabricated by vacuum deposition technique and their microwave shielding properties were investigated for the application to the transparent shield material. The vacuum coating was conducted in a RF co-sputtering machine. The film composition and structure associated with the sputtering conditions (argon and oxygen pressure. substrate temperature. RF input power) were investigated for the attainment of high electrical conductivity and good transparency. The electrical conductivity of IT0 films fabricated under the optimum deposition conditions (substrate temperature : $300^{\circ}C$. Ar flow rate : 20 sccm, Oxygen flow rate : 10 sccm, In/Sn input power : 50/30 W) showed 5.6$\times10^4$mho/m. The optical transparency is also considerably good. The microwave shielding properties including the dominant shielding mechanism are investigated from the electrical conductivity, thickness and skin depth of the ITO films. The total shielding effectiveness is then estimated to be 26 dB, which provides a suggestion that the IT0 films can be effectively used as the transparent shield material.

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Study on CO2 Decomposition using Ar/CO2 Inductively Coupled Plasma (아르곤/이산화탄소 혼합가스의 유도 결합 플라즈마를 이용한 이산화탄소 분해 연구)

  • Kim, Kyung-Hyun;Kim, Kwan-Yong;Lee, Hyo-Chang;Chung, Chin-Wook
    • KEPCO Journal on Electric Power and Energy
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    • v.1 no.1
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    • pp.135-140
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    • 2015
  • Decomposition of carbon dioxide is studied using $Ar/CO_2$ mixture inductively coupled plasmas (ICP). Argon gas was added to generate plasma which has high electron density. To measure decomposition rate of $CO_2$, optical emission actinometry is used. Changing input power, pressure and mixture ratio, the plasma parameters and the spectrum intensity were measured using single Langmuir probe and spectroscope. The source characteristic of Carbon dioxide ICP observed from the obtained plasma parameters. The decomposition rate is evolved depending on the reaction and discharge mode. This result is analyzed with both the measurement of the plasma parameters and the dissociation mechanism of $CO_2$.

MD simulation of structural change of polyethylene induced by high energy ion bombardment

  • Kim, Chan-Soo;Ahmed, Sk. Faruque;Moon, Myoung-Woon;Lee, Kwang-Ryeol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.358-358
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    • 2010
  • Ion beam bombardment at low energy forms nanosize patterns such as ripples, dots or wrinkles on the surface of polymers in ambient temperature and pressure. It has been known that the ion beam can alter the polymer surface that induces skins stiffer or the density higher by higher compressive stress or strain energies associated with chain scissions and crosslinks of the polymer. Atomic scale structure evolution in polymers is essential to understand a stress generation mechanism during the ion beam bombardment, which governs the nanoscale surface structure evolution. In this work, Molecular Dynamics (MD) simulations are employed to characterize the phenomenon occurred in bombardment between the ion beam and polymers that forms nanosize patterns. We investigate the structure evolution of Low Density Polyethylene (LDPE) at 300 K as the polymer is bombarded with Argon ions having various kinetic energies ranging from 100 eV to 1 KeV with 50 eV intervals having the fluence of $1.45\;{\times}\;1014 #/cm2$. These simulations use the Reactive Force Field (ReaxFF), which can mimic chemical covalent bonds and includes van der Waals potentials for describing the intermolecular interactions. The results show the details of the structural evolution of LDPE by the low energy Ar ion bombardment. Analyses through kinetic and potential energy, number of crosslinks and chain scissions, level of local densification and motions of atoms support that the residual strain energies on the surface is strongly associated with the number of crosslinks or scissored chains. Also, we could find an optimal Ar ion beam energy to make crosslinks well.

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The quality investigation of 6H-SiC crystals grown by conventional PVT method with various SiC powders

  • Yeo, Im-Gyu;Lee, Won-Jae;Shin, Byoung-Chul
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.113-114
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    • 2009
  • Silicon carbide is one of the most attractive and promising wide band-gap semiconductor material with excellent physical properties and huge potential for electronic applications. Up to now, the most successful method for growth of large SiC crystals with high quality is the physical vapor transport (PVT) method [1, 2]. Since further reduction of defect densities in larger crystal are needed for the true implementation of SiC devices, many researchers are focusing to improve the quality of SiC single crystal through the process modifications for SiC bulk growth or new material implementations [3, 4]. It is well known that for getting high quality SiC crystal, source materials with high purity must be used in PVT method. Among various source materials in PVT method, a SiC powder is considered to take an important role because it would influence on crystal quality of SiC crystal as well as optimum temperature of single crystal growth, the growth rate and doping characteristics. In reality, the effect of powder on SiC crystal could definitely exhibit the complicated correlation. Therefore, the present research was focused to investigate the quality difference of SiC crystal grown by conventional PVT method with using various SiC powders. As shown in Fig. 1, we used three SiC powders with different particles size. The 6H-SiC crystals were grown by conventional PVT process and the SiC seeds and the high purity SiC source materials are placed on opposite side in a sealed graphite crucible which is surrounded by graphite insulation[5, 6]. The bulk SiC crystal was grown at $2300^{\circ}C$ of the growth temperature and 50mbar of an argon pressure. The axial thermal gradient across the SiC crystal during the growth is estimated in the range of $15\sim20^{\circ}C/cm$. The chemical etch in molten KOH maintained at $450^{\circ}C$ for 10 min was used for defect observation with a polarizing microscope in Nomarski mode. Electrical properties of bulk SiC materials were measured by Hall effect using van der Pauw geometry and a UV/VIS spectrophotometer. Fig. 2 shows optical photographs of SiC crystal ingot grown by PVT method and Table 1 shows electrical properties of SiC crystals. The electrical properties as well as crystal quality of SiC crystals were systematically investigated.

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