• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2009.05a
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• pp.84-87
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• 2009

This paper describes a novel method for fabricating large area metallic stamp with high aspect ratio micro intaglio features. Micro machined brass master with pillar and larger width groove patterns were electroformed to form inverse structures on the large area metallic stamp. This enabled large area metallic stamp with fine micro high aspect ratio micro intaglio features which were small width groove patterns and quadrilateral hole patterns that cannot be fabricated by direct micro machining process. Fabricated large area metallic stamp with high aspect ratio micro intaglio features was measured and analyzed.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.3 s.180
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• pp.156-162
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• 2006

Direct fabrication of nano patterns has been studied employing a nano-stereolithography (NSL) process. The needs of nano patterning techniques have been intensively increased for diverse applications for nano/micro-devices; micro-fluidic channels, micro-molds. and other novel micro-objects. For fabrication of high-aspect-ratio (HAR) patterns, a thick spin coating of SU-8 process is generally used in the conventional photolithography, however, additional processes such as pre- and post-baking processes and expansive precise photomasks are inevitably required. In this work, direct fabrication of HAR patterns with a high spatial resolution is tried employing two-photon polymerization in the NSL process. The precision and aspect ratio of patterns can be controlled using process parameters of laser power, exposure time, and numerical aperture of objective lens. It is also feasible to control the aspect ratio of patterns by truncation amounts of patterns, and a layer-by-layer piling up technique is attempted to achieve HAR patterns. Through the fabrication of several patterns using the NSL process, the possibility of effective patterning technique fer various N/MEMS applications has been demonstrated.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.335-335
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• 2011

Instability of a thin film attached to a compliant substrate often leads to emergence of exquisite wrinkle patterns with length scales that depend on the system geometry and applied stresses. However, the patterns that are created using the current techniques in polymer surface engineering, generally have low aspect ratio of undulation amplitude to wavelength, thus, limiting their application. Here, we present a novel and effective method that enables us to create wrinkles with a desired wavelength and high aspect ratio of amplitude over wavelength as large as to 2.5:1. First, we create buckle patterns with high aspect ratio of amplitude to wavelength by deposition of an amorphous carbon film on a surface of a soft polymer poly(dimethylsiloxane) (PDMS). Amorphous carbon films are used as a protective layer in structural systems and biomedical components, due to their low friction coefficient, strong wear resistance against, and high elastic modulus and hardness. The deposited carbon layer is generally under high residual compressive stresses (~1 GPa), making it susceptible to buckle delamination on a hard substrate (e.g. silicon or glass) and to wrinkle on a flexible or soft substrate. Then, we employ glancing angle deposition (GLAD) for deposition of a high aspect ratio patterns with amorphous carbon coating on a PDMS surface. Using this method, pattern amplitudes of several nm to submicron size can be achieved by varying the carbon deposition time, allowing us to harness patterned polymers substrates for variety of application. Specifically, we demonstrate a potential application of the high aspect wrinkles for changing the surface structures with low surface energy materials of amorphous carbon coatings, increasing the water wettability.

• Journal of information and communication convergence engineering
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• v.13 no.1
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• pp.56-61
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• 2015

The demand for high-aspect-ratio structures has been increasing in the field of semiconductors and other applications. Here, we present the commercially available negative-tone SU-8 as a potential resist that can be used for direct patterning of high-aspect-ratio structures at the submicron scale and the nanoscale. Such resist patterns can be used as polymeric molds to create high-aspect-ratio metallic submicron and nanoscale structures by using electroplating. Compared with poly (methyl methacrylate) (PMMA), we found that the negative tone resist required an exposure dose that was less than that of PMMA of equal thickness by a factor of 100-150. Patterning of up to 4:1 aspect ratio SU-8 structures with a minimum feature size of 500 nm was demonstrated. In addition, nanoimprint lithography was studied to further extend the aspect ratio to realize a minimum feature size of less than 10 nm with an extremely high aspect ratio in the negative resist.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.28 no.11
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• pp.1794-1798
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• 2004

We present a fabrication method of high aspect ratio 100nm-scale nickel stamper using e-beam writing for the injection molding of optical grating patterns. Conventional nickel stamper is fabricated by nickel electroplating process which is followed by seed layer deposition. In this paper, we have used chrome coated blank mask without anti-reflection layer of CrON in order to simplified electroplating process. In experimental study, we have optimized electron-beam dosage for 100nm-scale optical grating patterns with 2.5-aspect ratio, and fabricated nickel stamper using above grating patterns as PR mold. Fabricated nickel stamper have showed height of 240$\pm$20nm and width of 116$\pm$6nm.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.11 no.5
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• pp.76-81
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• 2012

The continuing demand for increasingly slimmer and brighter liquid crystal display(LCD) panels has led to an increased focus on the role of the light guide panels(LGPs) or optical films that are used to obtain diffuse, uniform light from the backlight unit(BLU). And the most basic process in the production of such BLU components is the micromachining. LCD BLUs comprise various optical elements such as a LGP, diffuser sheet, prism sheet, and protector sheet with micro patterns. High aspect ratio patterns are required to reduce the number of sheets and enhance light efficiency, but there is a limit to the aspect ratio achievable for a given material and cutting tool. Therefore, this study comprised a series of experimental evaluations conducted to determine the machining feasibility in microcutting various aspect ratio patterns on electroless nickel plated die materials when using single-crystal diamond tools. Cutting performance was evaluated at various cutting speeds and depths of cut using different machining methods and machine tools.

• Journal of the Korean Society of Marine Environment & Safety
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• v.5 no.2
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• pp.35-44
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• 1999

High negative pressure coefficient is formed in the corner of the bluff body structures. For many curtain wall designers this phenomena is of interest because this high negative pressure coefficient is adopted in structural calculation. The present study is aimed to investigate shedding vortex characteristics of two-dimensional rectangular prism flow. Unsteady calculation by finite difference method based upon SOLA is carried out for three aspect ratios(1:1, 1:2, 1:3) of Re=10$^4$ in viscous incompressible flow within infinite domain. Fluctuation of velocity components at various pick-up points and time variation of drag and lift coefficients are analysed by FFT method to reveal shedding vortex frequency patterns. At aspect ratio 1:1, one primary Strouhal number appears for about all pick-up points. At aspect ratio 1:2, two representative Strouhal numbers are classified by pick-up positions and their flows show two different reattachment patterns. For aspect ratio 1:3, frequency spectrum maintains multiple peaks.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.8
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• pp.598-604
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• 1999

This paper describes the research to minimize the film stress and maximize the aspect ratio of photoresist structure, especially about SU-8 for electroplating mold. UV LIGA process using SU-8 allows fabricating high aspect ratio polymer structures. However, it is hard to get fine patterns in the high aspect ratio structures because of high internal stress and difficulty of removing SU-8. The purpose of this paper is to setup the process condition for the obtainment of both low film stress and high aspect ratio and to find design rules that make the pattern be less dependent on stress problem. Firstly, the process of heat treatment and exposure of SU-8 are proposed. These two conditions control the amount of cross-linkage in polymer structure, which is the most important parameter of both pattern generation and remaining stress. Heat treatment is dealed with soft bake and post-exposure-bake. Temperature and time duration of each step are varied with heat treatment condition. Some test patterns are fabricated to evaluate the proposed process. Nickel electroplating is performed with the mold fabricated through the proposed process to confirm the SU-8 as a good electroplating mold.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.10a
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• pp.671-672
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• 2009

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.635-636
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• 2010