[KSCI] Korea Science Citation Index Service

http://dx.doi.org/10.3795/KSME-A.2004.28.11.1794

Fabrication of High Aspect Ratio 100nm-Scale Nickel Stamper Using E-Beam Writing based on Chrome/Quartz Mask Without Anti-Reflection Layer for Injection Molding of Optical Grating Patterns

Seo, Young-Ho (한국기계연구원 나노공정그룹)
Choi, Doo-Sun (한국기계연구원)
Lee, Joon-Hyoung (한국기계연구원)
Je, Tae-Jin (한국기계연구원)
Whang, Kyung-Hyun (한국기계연구원)

Publication Information

Transactions of the Korean Society of Mechanical Engineers A / v.28, no.11, 2004 , pp. 1794-1798 More about this Journal

Abstract

We present a fabrication method of high aspect ratio 100nm-scale nickel stamper using e-beam writing for the injection molding of optical grating patterns. Conventional nickel stamper is fabricated by nickel electroplating process which is followed by seed layer deposition. In this paper, we have used chrome coated blank mask without anti-reflection layer of CrON in order to simplified electroplating process. In experimental study, we have optimized electron-beam dosage for 100nm-scale optical grating patterns with 2.5-aspect ratio, and fabricated nickel stamper using above grating patterns as PR mold. Fabricated nickel stamper have showed height of 240 $\pm$ 20nm and width of 116 $\pm$ 6nm.

Keywords

E-Beam Lithography; Injection Molding; High Aspect Ratio;

Citations & Related Records

Reference

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