• 한국진공학회지
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• 제15권4호
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• pp.347-353
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• 2006

국제도량형위원회의 질량 및 관련량 자문위원회 (CCM)가 주관하는 헬륨 투과형 표준리크(standard leak) 핵심측정표준 국제비교 (key comparison, KC)에 참여하기 위하여 기존의 정압형 리크표준기에 porous plug를 추가하여 측정범위를 $10^{-6}$ Pa L/s 까지 확장한 헬륨 미세리크 표준기를 개발하였다. 이를 위해 헬륨 기체에 대한 고진공 및 초고진공 표준기의 압력비와 porous plug의 콘덕턴스를 새롭게 측정하였으며, 개발된 장치를 이용하여 명목 값이 $5.6{\times}10^{-4}$ Pa L/s 인 투과형 표준리크를 직접 교정한 결과 표준기와 차이가 11.1 % 임을 알 수 있었다.

• 대한기계학회논문집A
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• 제30권6호
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• pp.670-677
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• 2006

Vacuum interrupters are used in various switch-gear components such as circuit breakers, distribution switches, contactors. The electrodes of a vacuum interrupter are manufactured of sinter-forged Cu-Cr material for good electrical and mechanical characteristics. Since the closing velocity is 1-2m/s and impact deformation of the electrode depends on the strain-rate at the given velocity, the dynamic material property of the sinter-forged Cu-Cr alloy is important to design the vacuum interrupter reliably and to identify the impact characteristics of a vacuum interrupter accurately. This paper is concerned with the dynamic material properties of sinter-forged Cu-Cr alloy for various strain rates. The amount of chrome is varied from 10 wt% to 30 wt% in order to investigate the influence of the chrome content on the dynamic material property. The high speed tensile test machine is utilized in order to identify the dynamic property of the Cu-Cr alloy at the intermediate strain-rate and the split Hopkinson pressure bar is used at the high strain-rate. Experimental results from both the quasi-static and the high strain-rate up to the 5000/sec are interpolated with respect to the amount of chrome in order to construct the Johnson-Cook and the modified Johnson-Cook model as the constitutive relation that should be applied to numerical simulation of the impact behavior of electrodes.

• Journal of Advanced Marine Engineering and Technology
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• 제18권4호
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• pp.13-24
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• 1994

The demand of clean energy, like liquefied gas(LNG), increase suddenly because it generates few polluting substances when burned and from the point of view with caloric value it generates ralatively less $CO_2$ gas than the other energy sources. LNG transpotion method of our country is marine transportion by ships because the LNG producing district is far away from Korea. Main engines for most LNG ships are steam turbines, and the efficiency of steam turbine is influenced by the degree of vacuum of main steam condenser. This paper introduce the design method of the vacuum system for high efficiency marine steam turbine. Especially, it is developed the CAD program for the large steam condenser and steam ejector. Also, it is designed the pilot plant including high pressure boiler for the performance test and maked a part of this plant.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.233-233
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• 2010

Magnetic random access memory (MRAM), based on magnetic tunnel junction (MTJ) and CMOS, is a prominent candidate among prospective semiconductor memories because it can provide nonvolatility, fast access time, unlimited read/write endurance, low operating voltage and high storage density. The etching of MTJ stack with good properties is one of a key process for the realization of high density MRAM. In order to achieve high quality MTJ stack, the use of CoFeB and IrMn magnetic films as free layers was proposed. In this study, inductively coupled plasma reactive ion etching of CoFeB and IrMn thin films masked with Ti hard mask was investigated in a $Cl_2$/Ar gas mix. The etch rate of CoFeB and IrMn films were examined on varying $Cl_2$ gas concentration. As the $Cl_2$ gas increased, the etch rate monotonously decreased. The effective of etch parameters including coil rf power, dc-bais voltage, and gas pressure on the etch profile of CoFeB and IrMn thin film was explored, At high coil rf power, high dc-bais voltage, low gas pressure, the etching of CoFeB and IrMn displayed better etch profiles. Finally, the clean and vertical etch sidewall of CoFeB and IrMn free layers can be achieved by means of thin Ti hard mask in a $Cl_2$/Ar plasma at the optimized condition.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.213-213
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• 2010

Magnetic random access memory (MRAM), based on magnetic tunnel junction (MTJ) and CMOS, is one of the best semiconductor memories because it can provide nonvolatility, fast access time, unlimited read/write endurance, low operating voltage and high storage density. For the realization of high density MRAM, the etching of MTJ stack with good properties is one of a key process. Recently, there has been great interest in the MTJ stack using MgO as barrier layer for its huge room temperature MR ratio. The use of MgO barrier layer will undoubtedly accelerate the development of MTJ stack for MRAM. In this study, high-density plasma reactive ion etching of MgO films was investigated in an inductively coupled plasma of $Cl_2$/Ar gas mixes. The etch rate, etch selectivity and etch profile of this magnetic film were examined on vary gas concentration. As the $Cl_2$ gas concentration increased, the etch rate of MgO monotonously decreased and etch slop was slanted. The effective of etch parameters including coil rf power, dc-bais voltage, and gas pressure on the etch profile of MgO thin film was explored, At high coil rf power, high dc-bais voltage, low gas pressure, the etching of MgO displayed better etch profiles. Finally, the clean and vertical etch sidewall of MgO films was achieved using $Cl_2$/Ar plasma at the optimized etch conditions.

• 대한화학회지
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• 제48권3호
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• pp.254-260
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• 2004

아세토니트릴 용매내에서 파라치환 염화벤조일류($p-CH_3$, p-H, $p-NO_2$)와 피리딘의 반응속도를 온도와 압력변화에 따라 전기전도도법으로 측정하여 유사 1차반응속도상수와 2차반응속도상수를 구하였다. 이들 반응속도상수로부터 활성화파라미터들(${\Delta}V{\ddagger},\;{\Delta}{\beta}{\ddagger},\;{\Delta}H{\ddagger},\;{\Delta}S{\ddagger},\;{\Delta}G{\ddagger}$ 과 Hammett ${\rho}$를 구하였다. 이때 ${\Delta}V{\ddagger},\;{\Delta}{\beta}{\ddagger}$ 및 ${\Delta}S{\ddagger}$는 모두 음의 값을 나타내었으며, 모든 압력 조건에서 기질의 치환기효과 ${\rho}_Y$는 양의 값을 나타내었다. 압력과 치환기 변화에 따른 속도론적 연구를 종합하면, 전체적인 반응은 전형적인 $SN_2$ 반응메카니즘을 따르며, 압력 증가에 따라 결합 형성이 더욱 촉진된 반응메카니즘으로 진행됨을 알 수 있다.

• 한국정밀공학회지
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• 제22권3호
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• pp.46-51
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• 2005

The vacuum cleaner motor runs at very high speed for suction power. Specially, motor power is provided by the impeller being rotated at very high speed. The centrifugal fan consists of the impeller, the diffuser, and the circular casing. Due to the high rotating speed of the impeller and small gap distance between the impeller and the diffuser, the level of noise in the centrifugal fan is at BPF(Blade Passage Frequency) and its harmonic frequencies. In order to calculate the sound pressure of centrifugal fan, unsteady flow data are needed. The cause of noise is obtained by dividing the fluid noise by exhaust flow of fan and vibration noise by rotational vibration of vacuum cleaner fan motor. Until now, an accelerometer has been used to measure vibration. However, it can not measure vibration in some parts of brush and commutator because of motor construction and 3-D vibrating mode. This study was conducted to perform accurate analysis of vibration and aerodynamic sound for fan motor in a vacuum cleaner using a laser vibration analyzer. A silent fan motor can be designed using the data measured in this study.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.703-706
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• 2004

This paper deals with the various sealing conditions in a vacuum and the discharge characteristics. The MgO thin film is prepared by e-beam evaporation method. Sealing process was performed in a vacuum at panel temperature of 430 $^{\circ}C$. We find the cracks on the MgO film surface, which results in higher discharge voltage and lower luminous efficiency. The vacuum in-line sealing technology does not require additional annealing process but induces the MgO cracks because of the high temperature sealing cycle in a vacuum. Therefore we modify the vacuum in-line sealing cycle which the MgO cracks are not found and the good characteristics of plasma displays are found in higher sealing pressure at sealing temperature of 430 $^{\circ}C$.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2009년도 제40회 하계학술대회
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• pp.1471_1472
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• 2009

In a wide variety of high-voltage applications surface flashover plays major role in the system's performance and yet has not been studied in great detail for vacuum conditions with modern diagnostic tools. surface flashover for both direct current and pulsed voltages in considered. within the setup, parameters such as geometry, material characteristics of the applied voltage can be altered. This paper review surface flashover of insulator, primarily in vacuum. It discusses theories and models relating to surface flashover and experimental results. surface flashover of insulators in vacuum generally is initiated by the emission of electrons from the cathode triple junction point (the region where the electrode, insulator, vacuum). the electrode material was copper, and a AC voltage was applied between the electrodes. these results were compared with the surface flashover characteristic of insulator at results, surface flashover influenced only insulator surface condition. and increasing vacuum pressure was risen breakdown voltage.

• 진공이야기
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• 제2권4호
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• pp.39-46
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• 2015

After stepping into a new field of vacuum 30 years ago, our company has grown up steadily as a specialized vacuum industry, and now we can provide vacuum devices covering most of the pressure range. We are planning to put out high level dry pump like a multistage Roots pump on the market in the near future. Procedures of technology development for designing, fabricating, and testing the multistage Roots pump of 600 L/min class will be briefly reported. Core items of the technical development on the multistage Roots pump are as follows; elaborated profile design of 3-lobe rotors using an involute curve, optimization of rotor dimensions, especially for clearances and rotor width, considering the pumping speed, compression ratio and heat load, and establishment of a standardized test system. At present, the multistage Roots pump is about to come into commercialization.