• Journal of the korean academy of Pediatric Dentistry
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• v.30 no.4
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• pp.707-714
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• 2003

Plasma Arc Curing(PAC) units operate at relatively high intensity and claimed to result in optimum properties of composite resin in a short curing time, so the interest of pediatric dentists about PAC units have been increased recently. But PAC units used for polymerizing restorative resins produce heat during operation. The purpose of this study was to evaluate temperature transmission through dentin of various depths using two types of PAC units(Flipo, Q-Lux plasma 100). The results from the present study can be summarized as follows : 1. When PAC be used continuously, temperature on tip was increased as curing times, and Q-Lux showed greater temperature rising(p<0.001). 2. Compared temperature transmission as dentin depth, temperature rising rate was decreased as dentin thickened(0.5, 1.0, 1.5, 2.0mm)(p<0.05). 3. Compared temperature transmission as resin depth, temperature rising rate was also decreased as resin thickened(1.0, 2.0mm)(p<0.05).

• Journal of Korea Foundry Society
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• v.6 no.4
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• pp.284-289
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• 1986

Decarburization phenomena have been studied by plasma in stainless steel, plain carbon steel and cast iron. It was also investigated the movement of impurity element P,S in the plasma jet metal pool. The plasma jet was obtained by $Ar\;-\;CO_2$ gas mixture with 5 kVA DC power source. It produced enough temperature to dissociate into activated oxygen atom by reaction of $CO_2{\leftrightarrows}CO+O^+$ and it reacted with ${\underline{C}}$ in metal pool. Decarburization rate was increased about 5 times in comparing with the conventional induction melted metal pool by $CO_2$ gas decarburization. Even under the Ar plasma jet, decarburization was obtained by agitation of metal bath by $Ar^+$ bombardment and dilution phenomena of carbon atom under the very high plasma temperature. But heavy element P and S are not much removed because they are too heavy in mass to be activated by $Ar^+$ion bombardment. Desulphurization was achieved by $Ar\;-\;CO_2$ plasma in plain carbon steel and cast iron by the reaction of $SO_2({\underline{S}}+O^+)$. But dephosphorization could not be obtained by $Ar\;-\;CO_2$ plasma, because gaseous reaction of phosphorous oxide (${\underline{P}}+O^+$) was not existed.

• Journal of the Korean Ceramic Society
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• v.39 no.4
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• pp.409-412
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• 2002

Under atmospheric pressure, apparently homogeneous and stable plasma can be generated from insulator barrier rf plasma generators each of which has an rf powered cathode and a grounded anode covered with a dielectric insulating material. In order to characterize the generating plasma under atmospheric pressure, some basic characteristic have been evaluated by the Langmuire probe method as well as by optical emission spectroscopy. From the result of plasma characteristics, the generated plasma was verified to be nonequilibrium; T(electron)>T(excitation)>T(gas). High rate Si(100) etching (($1.5{\mu}m$/min) were achieved by using He plasma containing a small amount of $CF_4$.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.5
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• pp.401-409
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• 2013

Numerical analysis on RF (Radio-Frequency) thermal plasma treatment of micro-sized Ni metal was carried out to understand the synthesis mechanism of nano-sized Ni powder by RF thermal plasma. For this purpose, the behaviors of Ni metal particles injected into RF plasma torch were investigated according to their diameters ($1{\sim}100{\mu}m$), RF input power (6 ~ 12 kW) and the flow rates of carrier gases (2 and 5 slpm). From the numerical results, it is predicted firstly that the velocities of carrier gases need to be minimized because the strong injection of carrier gas can cool down the central column of RF thermal plasma significantly, which is used as a main path for RF thermal plasma treatment of micro-sized Ni metal. In addition, the residence time of the injected particles in the high temperature region of RF thermal plasma is found to be also reduced in proportion to the flow rate of the carrier gas In spite of these effects of carrier gas velocities, however, calculation results show that a Ni metal particle even with the diameter of $100{\mu}m$ can be completely evaporated at relatively low power level of 10 kW during its flight of RF thermal plasma torch (< 10 ms) due to the relatively low melting point and high thermal conductivity. Based on these observations, nano-sized Ni metal powders are expected to be produced efficiently by a simple treatment of micro-sized Ni metal using RF thermal plasmas.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.176.2-176.2
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• 2013

Property of optical diagnostics for pulse-discharged plasma in liquid and its biological applications to proteins are investigated by making use of high voltage Marx generator. The Marx generator has been consisted of 5 stages, where each charging capacitor is 0.5 ${\mu}F$, to generate a high voltage pulse with rising time of $1{\mu}s$. We have applied an input voltage of 6 kV to the each capacitor of 0.5 ${\mu}F$. High voltage pulsed plasma has been generated inside a polycarbonate tube by a single-shot operation, where the breakdown voltage is measured to be 7 kV, current of 1.2 kA, and pulse width of ~ 1 ${\mu}s$ between the two electrodes of anode-cathode whose material is made of tungsten pin, which are immersed into the liquids. We have investigated the emitted hydrogen lines for optical diagnostics of high voltage pulsed plasma. The emission line of 656.3 nm from $H-{\alpha}$ and 486.1 nm from $H-{\beta}$ have been measured by a monochromator. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium conditions, the electron temperature and density of the high voltage pulsed plasma in liquid could be obtained by the Stark broadening of optical emission spectroscopy. For the investigation of the influence of pulsed plasma on biological proteins, we have exposed it onto the proteins such as hemoglobin and myoglobin. The structural changes in these proteins and their analysis have also been obtained by circular dichroism (CD) and ultraviolet (UV) visible spectroscopy.

• Journal of the Korean Ceramic Society
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• v.45 no.12
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• pp.777-781
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• 2008

Experiments were conducted using SUS430 and Crofer 22 APU steels coated by LSM using plasma spray and slurry spray methods, respectively. High-temperature conductivity and oxidation resistance were investigated. For comparison, SUS430 and Crofer 22 APU without LSM coating were also investigated and coefficient of thermal expansion (CTE) was measured. The results show that the materials without LSM coating exhibit almost the same CTE as YSZ electrolyte in a range of temperatures of $550{\sim}850^{\circ}C$. When coated with LSM, the oxidation rate of the steels decreases by $30{\sim}40%$ using slurry spray and by $10{\sim}30%$ using plasma spray whereas the steels using plasma spray have a better high-temperature conductivity than the steels using slurry spray. It is thus concluded that the LSM coating has a limited effect on increasing high-temperature conductivity while it can effectively reduce the oxidation of the steels.

• Applied Chemistry for Engineering
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• v.16 no.3
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• pp.305-311
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• 2005

The thermal plasma process has excellent characteristics such as high temperature, high chemical activity and rapid quench, and has been applied to various fields. In this review, we briefly describe the characteristics for the process and the system components for producing ultra-fine powders including metal, ceramic, and composites. The key technology for the process will be discussed. We aimed to demonstrate the feasibility of the process for producing high quality ultra-fine powders using thermal plasma.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.68-68
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• 2001

Thin films of polycrystalline silicon (poly-Si) is a promising material for use in large-area electronic devices. Especially, the poly-Si can be used in high resolution and integrated active-matrix liquid-crystal displays (AMLCDs) and active matrix organic light-emitting diodes (AMOLEDs) because of its high mobility compared to hydrogenated _amorphous silicon (a-Si:H). A number of techniques have been proposed during the past several years to achieve poly-Si on large-area glass substrate. However, the conventional method for fabrication of poly-Si could not apply for glass instead of wafer or quartz substrate. Because the conventional method, low pressure chemical vapor deposition (LPCVD) has a high deposition temperature ($600^{\circ}C-1000^{\circ}C$) and solid phase crystallization (SPC) has a high annealing temperature ($600^{\circ}C-700^{\circ}C$). And also these are required time-consuming processes, which are too long to prevent the thermal damage of corning glass such as bending and fracture. The deposition of silicon thin films on low-cost foreign substrates has recently become a major objective in the search for processes having energy consumption and reaching a better cost evaluation. Hence, combining inexpensive deposition techniques with the growth of crystalline silicon seems to be a straightforward way of ensuring reduced production costs of large-area electronic devices. We have deposited crystalline poly-Si thin films on soda -lime glass and SiOz glass substrate as deposited by PVD at low substrate temperature using high power, magnetron sputtering method. The epitaxial orientation, microstructual characteristics and surface properties of the films were analyzed by TEM, XRD, and AFM. For the electrical characterization of these films, its properties were obtained from the Hall effect measurement by the Van der Pauw measurement.

• Journal of Korean Society for Atmospheric Environment
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• v.14 no.4
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• pp.333-342
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• 1998

Plasma process has great possibilities to remove SOx, NOx simultaneously with high treatment efficiency and is expected to be suitable for small or middle plants. It was accomplished to evaluate SO2, NOx control possibility and achieve basic data to control pollutants by use of Surface Discharge Induced Plasma Chemical Process (SPCP) in this study. O3 generation characteristics by discharge of a plate was proportional to O2 concentration and power consumption and inversely proportional to temperature and humidity, In case of dry air, NOx was highly generated by N2 and O2 in air during the plasma discharge process but it was decreased considerably as H2O was added. SO2 removal efficiency was very high, and removal rate was 170,350 mEA at 30,50 watt respectively in flue gas which is usually contain HIO. NOx removal efficiency was about 57% at 40 watt power consumption with 7.5% humidity. It is estimated that H2O has an important role in reaction mechanism with pollutants according to plasma discharge.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.5
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• pp.309-314
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• 1999

The magnetized helical resonator plasma etcher has been built. Electron density and temperature were measured as functions of rf source power, axial magnetic field, and pressure. The results show electron density increases as the magnetic field increases and reached $2\times1012cm^{-3}$,/TEX>. The oxide etch rate and selectivity to polysilicon were investigated as the above mentioned conditions and self-bias voltage. We can obtain the much improved oxide etch selectivity to polysilicon (60 : 1) by applying the external axial weak magnetic field in magnetized helical resonator plasma etcher.