• 반도체디스플레이기술학회지
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• 제15권3호
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• pp.72-77
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• 2016

As the semiconductor production technology has gradually developed and intra-market competition has grown fiercer, the caliber of Si Wafer for semiconductor production has increased as well. And semiconductors have become integrated with higher density. Presently the Si Wafer caliber has reached up to 450 mm and relevant production technology has been advanced together. Electrostatic chuck is an important device utilized not only for the Wafer transport and fixation but also for the heat treatment process based on plasma. To effectively control the high calories generated by plasma, it employs a refrigerant-based cooling method. Amid the enlarging Si Wafers and semiconductor device integration, effective temperature control is essential. Therefore, uniformed temperature distribution in the electrostatic chuck is a key factor determining its performance. In this study, the form of refrigerant flow channel will be investigated for uniformed temperature distribution in electrostatic chuck.

• The Korean Journal of Ceramics
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• 제5권1호
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• pp.87-90
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• 1999

It was suggested that tape casting method can be used to fabricate high-temperature electrostatic chucks(HTESC) based on a metal substrate coated with a glass-ceramic insulating layer. The adhesion of the coating was excellent such that it was able to withstand temperature cycling to over $300^{\circ}C$ without spalling. The electrostatic clamping pressure reached a very high value of about 9 torr at 600V and generally followed the theoretical voltage-squared curve. Based on these results, we believe that we successfully developed a viable technique for manufacturing low cost HTESC.

• 반도체디스플레이기술학회지
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• 제20권2호
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• pp.19-24
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• 2021

As the size of semiconductor devices decreases, the etching pattern becomes very narrow and a deep high aspect ratio process becomes important. The cryogenic etching process enables high aspect ratio etching by suppressing the chemical reaction of reactive ions on the sidewall while maintaining the process temperature of -100℃. ESC is an important part for temperature control in cryogenic etching equipment. Through the cooling path inside the ESC, liquid nitrogen is used as cooling water to create a cryogenic environment. And since the ESC directly contacts the wafer, it affects the temperature uniformity of the wafer. The temperature uniformity of the wafer is closely related to the yield. In this study, the cooling path was designed and analyzed so that the wafer could have a uniform temperature distribution. The optimal cooling path conditions were obtained through the analysis of the shape of the cooling path and the change in the speed of the coolant. Through this study, by designing ESC with optimal temperature uniformity, it can be expected to maximize wafer yield in mass production and further contribute to miniaturization and high performance of semiconductor devices.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2002년도 춘계 기술심포지움 논문집
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• pp.169-172
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• 2002

This study demonstrated the feasibility of using tape-casting followed by sintering as a low-cost alternative for coating glass-ceramic or glass film on a metal substrate. The process has been successfully used to fabricate a glass-on-stainless steel and a glass-ceramic-on-molybdenum electrostatic chuck(ESC) with the insulating layer thickness about $150{\mu}{\textrm}{m}$. Electrical resistivity data of the coaling were obtained between room temperature and 55$0^{\circ}C$; although the resistivity values dropped rapidly with increasing temperature in both coatings, the glass-ceramic still retained a high value of $10^{10}$ ohm-cm at $500^{\circ}C$. Clamping pressure measurements were done using a mechanical apparatus equipped with a load-cell at temperatures up to $350^{\circ}C$ and applied voltages up to 600V; the clamping behavior of all ESCs generally followed the voltage-squared curve as predicted by theory. Based on these results, we believe that we have a viable technology for manufacturing ESCs for use in reactive-ion etch systems.

• 마이크로전자및패키징학회지
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• 제8권3호
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• pp.31-36
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• 2001

고온용 정전기척(high-temperature electrostatic chuck, HTESC)에 적합한 특성의 유전재료를 개발하였다. 유전층의 전기비저항과 유전상수 값은 HTESC가 적합하게 작동하기에 필요한 요구조건을 만족하였으며, 하부절연층재료와 열팽창계수가 유사하여 구조적인 안정성이 확보되었다. 유전층과 절연 층간의 접합층 재료로는 입자오염 문제의 최소화를 위해 붕규산염 유리재료를 선택하였고, 전극재료로는 은을 사용하였다. 상부유전 층과 하부절연층 사이에서 붕규산염 유리는 안정되게 접합되었으며, 우려 되었던 은전극의 유전층이나 유리층과의 확산 및 반응이 관찰되지 않았다. 제조된 HTESC의 척킹(chucking)특성은 상용 HTESC에 비하여 우수하게 나타났다.

• 마이크로전자및패키징학회지
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• 제9권1호
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• pp.49-52
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• 2002

본 연구를 통하여 저온 반도체 공정용 정전퍽(ESC)을 테이프캐스팅 공정에 의하여 스테인레스스틸에 소다붕규산염유리가 도포된 형태로 제작할 수 있음을 입증하였다. 스테인레스스틸 기판위의 유리 도포층은 125 $\mu\textrm{m}$의 두께로 제작되었다. 유리 도포층의 접합력은 매우 우수하여 $300^{\circ}C$이상의 온도변화에서도 균열이나 층간갈라짐 현상이 발생하지 않았다. 정전 고착압력은 전반적으로 이론적 관계인 전압의 제곱에 비례하는 경향을 보였으나, 고온과 고인가전압에서는 이 관계에서 벗어나는 것으로 나타났다. 이러한 이탈현상은 고온과 고인가전압에서 전기비저항의 감소에 따른 누설전류의 증가에 기인한다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.71-72
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• 2006

We report on plasma damage free chemical vapor deposition technique for the thin film passivation of organic light emitting diodes (OLEDs), organic thin film transistor (OTFT) and flexible displays using catalyzer enhanced chemical vapor deposition (CECVD). Specially designed CECVD system has a ladder-shaped tungsten catalyzer and movable electrostatic chuck for low temperature deposition process. The top emitting OLED with thin film $SiN_x$ passivation layer shows electrical and optical characteristics comparable to those of the OLED with glass encapsulation. This indicates that the CECVD technique is a promising candidate to grow high-quality thin film passivation layer on OLED, OTFT, and flexible displays.

• 한국결정성장학회지
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• 제28권6호
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• pp.235-242
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• 2018

$Y_2O_3$를 소결조제로 사용한 질화알루미나(AlN)에 다양한 소결조건과 MgO의 도핑이 고온전기전도도의 특성에 대해 미치는 영향에 대해 연구하였다. MgO를 도핑 하였을 때, 2차상으로 스피넬과 페로브스카이트 상이 생성되었고, 이는 전기적 특성에 영향을 끼쳤다. 고온 임피던스를 분석한 결과 MgO의 도핑은 AlN 입내의 활성화 에너지와 전기전도도의 감소를 보이는 반면에, 입계의 경우에는 활성화 에너지와 전기전도도의 증가를 보였다. 이는 저항이 높은 비정질의 액상이 입계에 형성되거나, Mg의 석출에 의하여 쇼트키 장벽이 높아졌기 때문으로 예상된다. MgO가 도핑된 AlN을 어닐링 한 경우에는 어닐링 하지 않은 경우에 비하여, 활성화 에너지와 전기전도도가 더욱 증가하는 것을 볼 수 있었다. 이러한 결과는 $1500^{\circ}C$에서 어닐링을 통하여 미세구조분석에서 보이는 바와 같이 Mg 이온이 입계에서 입내로 확산된 때문으로 예상된다.