• 제목/요약/키워드: High c-axis orientation

검색결과 113건 처리시간 0.028초

Orientation Control of $SrBi_2Ta_2O_9$ Thin Films on Pt (111) Substrates

  • Lee, Si-Hyung;Lee, Jeon-Kook;Choelhwyi Bae;Jung, Hyung-Jin;Yoon, Ki-Hyun
    • The Korean Journal of Ceramics
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    • 제6권2호
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    • pp.116-119
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    • 2000
  • The a-axis and c-axis prefer oriented SBT thin films could be deposited on Pt(111)/Ti/$SiO_2$$650^{\circ}C$). The c-axis preferred orientation of SBT film can be obtained by Sr deficiency and high compressive stress. However, the a-axis-oriented grains can be formed under stoichiometric Sr content and nearly stress-free state.

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대향타겟식스퍼터링으로 제작된 ZnO 박막의 C-축 배향성 (C-axis Orientation of ZnO Thin Films Prepared by FTS Method)

  • 금민종;손인환;최형욱;최동진;김경환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.685-687
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    • 1999
  • We prepared ZnO thin film with Facing Targets Sputtering system that can deposit thin film in plasma-free situation and change the deposition condition in wide range. And prepared thin films c-axis orientation and grain size were analyzed by XRD(x-ray dffractometer). In the results, we suggest that FTS system is very suitable to preparing high quality ZnO thin film with good c-axis orientation.

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직류 대향타겟스퍼터링법으로 제작된 ZnO 박막의 c-축 배향성 (C-axis Orientation of ZnO Thin Films Prepared by DC Facing Targets Sputtering Method)

  • 금민종;손인환;공석현;성하윤;김경환
    • 한국표면공학회지
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    • 제33권1호
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    • pp.34-37
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    • 2000
  • We prepared ZnO thin film with Facing Targets Sputtering system that can deposit thin film in plasma-free situation and change the deposition condition in wide range. And prepared thin film's c-axis orientation and grain size were analyzed by XRD (x-ray diffractometer). In the results, we suggest that FTS system is very suitable to preparing high quality ZnO thin film with good c-axis orientation.

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기판온도에 따른 ZnO박막의 결정구조 및 전기적 특성 (The effect of substrate temperature on crystallography and electrical properties of ZnO thin films)

  • 금민종;성하윤;손인환;장경욱;김경환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 추계학술대회 논문집
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    • pp.415-418
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    • 1999
  • In this paper we studied that the effect of substrate temperature on crystallography and electrical properties of ZnO thin films. Facing Targets Sputtering system can deposit thin films in plasma-free situation and change the deposition condition in wide range. And prepared thin film\`s c-axis orientation and grain size were analyzed by XRD(x-ray diffractometer). In the results, we suggest that FTS system is very suitable to preparing high quality ZnO thin film with good c-axis orientation.

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Fabrication and Characteristics of Li-doped ZnO Thin Films for SAW Filter Applications

  • Ha, Jae-Soo;Kim, Kwang-Ho
    • The Korean Journal of Ceramics
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    • 제3권2호
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    • pp.110-115
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    • 1997
  • Li-doped ZnO films were prepared on Corning 1737 glass substrate by an rf magnetron sputtering technique using ZnO targets with various $Li_2CO_3$ contents ranging from 0 to 10 mol%. The effects of Li doping on the crystallinity and electrical properties of ZnO films were studied for their SAW filter applications. The film resistivity largely increased without suppressing the c-axis orientation and crystallinity with a small addition of Li. Heat treatment of the film at 40$0^{\circ}C$ induced that the film resistivity, c-axis orientation and crystallinity slightly increased. However, heat treatment of the film at 50$0^{\circ}C$ resulted in much lower resistivity than that of as-deposited film due to the increase of electron concentration caused by the evaporationof Li atoms from the ZnO film. Large addition of Li into the ZnO film rather diminished the film resistivity and suppressed the c-axis growth. It was concluded that a small doping of Li into the ZnO film and heat treatment at 40$0^{\circ}C$ caused the film resistivity to be high enough for SAW filter applications without suppression of the c-axis orientation and crystallinity.

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고연신(高延伸)Polyethylene의 절연파괴특성(絶緣破壞特性) (Electrical Breakdown Properties of Highly Elongated Polyethylene)

  • 박대희;김동욱;강성화;임기조
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1993년도 하계학술대회 논문집 B
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    • pp.1209-1211
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    • 1993
  • In this paper, the relationship between electrical breakdown properties and the molecular orientation owing to elongation was investigation from electrical conductivity, electrical breakdown strength and X-ray diffraction wag investigated. The changes of the stretching direction, from an a-axis orientation(at high elongation) to a c-axis orientation(at high elongation), as the elongation increases, were determined from X-ray diffraction patterns. These results suggest that the tendency for a decrease in the trap density at a higher elongation is consistent with a continuous change of the reorientation from the a-axis to the c-axis as the elongation increases.

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N2와 NH3 반응성가스를 사용하여 마그네트론 스퍼터링법으로 제작한 AlN박막의 특성 (Characteristics of AlN Thin Films by Magnetron Sputtering System Using Reactive Gases of N2 and NH3)

  • 한창석
    • 한국재료학회지
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    • 제25권3호
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    • pp.138-143
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    • 2015
  • Aluminum nitride, a compound semiconductor, has a Wurtzite structure; good material properties such as high thermal conductivity, great electric conductivity, high dielectric breakdown strength, a wide energy band gap (6.2eV), a fast elastic wave speed; and excellent in thermal and chemical stability. Furthermore, the thermal expansion coefficient of the aluminum nitride is similar to those of Si and GaAs. Due to these characteristics, aluminum nitride can be applied to electric packaging components, dielectric materials, SAW (surface acoustic wave) devices, and photoelectric devices. In this study, we surveyed the crystallization and preferred orientation of AlN thin films with an X-ray diffractometer. To fabricate the AlN thin film, we used the magnetron sputtering method with $N_2$, NH3 and Ar. According to an increase in the partial pressures of $N_2$ and $NH_3$, Al was nitrified and deposited onto a substrate in a molecular form. When AlN was fabricated with $N_2$, it showed a c-axis orientation and tended toward a high orientation with an increase in the temperature. On the other hand, when AlN was fabricated with $NH_3$, it showed a-axis orientation. This result is coincident with the proposed mechanism. We fabricated AlN thin films with an a-axis orientation by controlling the sputtering electric power, $NH_3$ pressure, deposition speed, and substrate temperature. According to the proposed mechanism, we also fabricated AlN thin films which demonstrated high a-axis and c-axis orientations.

CoCr(-Ta)/Si 이층막의 c-축 우선 배향성에 관한 연구 (A Study on the c-axis preferred orientation of CoCr(-Ta)/Si doublelayer)

  • 김용진;박원효;신성권;손인환;최형욱;김경환
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2001년도 하계학술대회 논문집 C
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    • pp.1475-1477
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    • 2001
  • In odor to set high saturation magnetization and coercivity, it had need to orient axis of easy magnetization of CoCr-based thin film perpendicular direction(c-axis) to the substrate plane. It was known that crystalline orientation of CoCr-based thin film was improved by introducing underlayer like Ti, Ge. We prepared singlelayer and double layer with Si underlayer by Facing Targets Sputtering System. As a result, intensity and c-axis dispersion angle ${\Delta}{\theta}_{50}$ of singlelayer were improved with increasing film thickness. Also, it was found that CoCr/Si and CoCrTa/Si double layer showed good c-axis dispersion angle due to introducing Si.

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Polyethylene의 전자물성(電子物性)에 미치는 고차구조(高次構造)의 효과(效果) (Effects of Superstructure on Electronic Properties of Polyethylene)

  • 박대희;김용욱;강성화;임기조
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1993년도 춘계학술대회 논문집
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    • pp.55-58
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    • 1993
  • In this paper, the relationship between trap properties and the molecular orientation owing to elongation was investigation from TSC, electrical conductivity and X-ray diffraction was investgated. The changes of the stretching direction, from an a-axis orientation(at low elongation) to a c-axis orientation(at high elongation), as the elongation increases. were determined from X-my diffraction patterns. These results suggest that the tendency for a decrease in the trap density at a higher elongation is consistent with a continuous change of the reorientation from the a-axis to the c-axis as the elongation increases.

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유리기판에 제작한 ZnO 박막의 c축 배향성에 관한 연구 (A study on the c-axis orientation of ZnO thin film deposited on glass substrates)

  • 고상춘;이종덕;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1995년도 추계학술대회 논문집
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    • pp.9-13
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    • 1995
  • In this paper, Zinc Oxide films, with a high degree of c-axis orientation, have been grown on glass substrates by a rf magnetron sputtering. The maximum crystal orientation was found to occur with substrate temperature 150$^{\circ}C$, input power 190W, oxygen rate 50%, target-substrate distance 55mm. It is proposed to achieve high-resistivity ZnO films by increasing the annealing temperature. The piezoelectric layers, preferred oriented with (002) perpendicular to the layer with 4.9$^{\circ}$, could be obtained by the annealing temperature 300$^{\circ}C$ in oxygen atmosphere. It is indicated that the relative permittivity is range from 8.9 to 9.8 in the frequency ranging from 10KHz to 5MHz.

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