References
- J.Appl.Phys. v.70 Y.Igasaki;H.Saito
- J.Appl.Phys. v.44 F.S.Hickernell
- Thin Solid Films v.137 M.D.Ambersley;C.W.Pitt
- Thin Solid Films v.137 W.H.G.Horsthuis
- KIEE v.9 no.2 Jong-Duk;Joon-Tae Song
- KIEE v.10 no.2 Seung-Hwan Yi;Jong-Kwan Kim
We prepared ZnO thin film with Facing Targets Sputtering system that can deposit thin film in plasma-free situation and change the deposition condition in wide range. And prepared thin film's c-axis orientation and grain size were analyzed by XRD (x-ray diffractometer). In the results, we suggest that FTS system is very suitable to preparing high quality ZnO thin film with good c-axis orientation.