• 제목/요약/키워드: Hall Diode

검색결과 20건 처리시간 0.022초

청색 Diode 개발을 위한 ZnSe 박막성장과 특성에 관한 연구 (Growth and Characterization of ZnSe Thin Film for Blue Diode)

  • 박창선;홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.533-538
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    • 2001
  • The ZnSe sample grown by chemical bath deposition (CBD) method were annealed in Ar gas at 450$^{\circ}C$ Using extrapolation method of X-ray diffraction pattern, it was found to have zinc blend structure whose lattice parameter a$\_$o/ was 5.6687 ${\AA}$. From Hall effect, the mobility was likely to be decreased by impurity scattering at temperature range from 10 K to 150 K and by lattice scattering at temperature range from 150 K to 29 3K. The band gap given by the transmission edge changed from 2.7005 eV at 293 K to 2.8739 eV at 10 K. Comparing photocurrent peak position with transmission edge, we could find that photocurrent peaks due to excition electrons from valence band, $\Gamma$$\_$8/ and $\Gamma$$\_$7/ to conduction band $\Gamma$$\_$6/ were observed at photocurrent spectrum. From the photocurrent spectra by illumination of polarized light on the ZnSe thin film, we have found that values of spin orbit coupling splitting Δso is 0.0981 eV. From the PL spectra at 10 K, the peaks corresponding to free bound excitons and D-A pair and a broad emission band due to SA is identified. The binding energy of the free excitons are determined to be 0.0612 eV and the dissipation energy of the donor -bound exciton and acceptor-bound exciton to be 0.0172 eV, 0.0310 eV, respectively.

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Si 기판위에 형성된 ZnO 박막의 도핑 농도에 따른 다이오드 특성 연구 (The study of diode characteristics on the doping concentration of ZnO films using the Si Substrate)

  • 이종훈;장보라;이주영;김준제;김홍승;장낙원;조형균;공보현;이호성
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.216-217
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    • 2008
  • Zinc-oxide films were deposited by pulsed laser deposition (PLD) technique using doped ZnO target (mixed $In_2O_3$ 0.1, 0.3, 0.6 at. % - atomic percentage) on the p-type Si(111) substrate. A little Indium has added at the n-ZnO films for the electron concentration control and enhanced the electrical properties. Also, post thermal annealed ZnO films are shown an enhanced structural and controled electron concentration by the annealing condition for the hetero junction diode of a better emitting characteristics. The electrical and the diode characteristics of the ZnO films were investigated by using Hall effect measurement and current-voltage measurement.

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잉여좌표계를 이용한 3-폴 하이브리드형 자기베어링 제어 (Control of a Three-pole Hybrid Active Magnetic Bearing using Redundant Coordinates)

  • 박상현;이종원
    • 한국소음진동공학회:학술대회논문집
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    • 한국소음진동공학회 2007년도 추계학술대회논문집
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    • pp.1375-1381
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    • 2007
  • In this paper, we propose a linear modeling and identical PD controller design scheme for the three-pole hybrid-type AMB recently developed in the laboratory, which consists of three permanent magnets, providing bias flux, three Hall diodes, measuring rotor displacements, and ring type permanent magnet bearing, stabilizing in axial and tilting directions. Along the three physical coordinates formed by three poles, we introduce the redundant coordinate system and three identical decoupled controllers to construct linear model. The experiments are also carried out in order to verify the effectiveness of proposed controller in stabilizing the transient and steady state response of rotor.

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Radio Frequency Plasma Power변화에 따른 ITO 특성 및 OLED의 광학적 특성 (Optical Properties of Organic Light Emitting Diode and Characteristics of ITO by Variation of Radio Frequency Plasma Power)

  • 기현철;김회종;홍경진;김은미;구할본
    • 한국전기전자재료학회논문지
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    • 제22권1호
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    • pp.81-85
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    • 2009
  • We has been analysed optical properties of OLED(organic light emitting diode) and characteristics of ITO(Indium Tin Oxide) in terms of $O_2$ plasma treatment for manufacturing high efficiency OLED, RF power of $O_2$ plasma was changed 25, 50, 100, 200 W. $O_2$ gas flow, gas pressure and treatment time were fixed. Sheet resistance and surface roughness of ITO were measured by Hall-effect measurement system and AFM, respectively. The ranges of sheet resistance and surface roughness were $5.5{\sim}6,06\;{\Omega}$ and $2.438{\sim}3.506\;nm$ changing of RF power, respectively, PM(Passive Matrix)OLED was fabricated with the structure of ITO(plasm treatment)/TPD($400\;{\AA}$)/$Alq_3(600\;{\AA})$/LiF($5\;{\AA}$)/Al($1200\;{\AA}$). Turn-on voltage of PMOLED was 7 V and luminance was $7,371\;cd/m^2$ at the RF power of 25 W, $O_2$ plasma treatment of ITO surface was result in lowering the operating voltage and improving luminance of PMOLED.

후열처리 분위기에 따른 깊은 준위결함의 변화가 Ga2O3/SiC 이종접합 다이오드에 미치는 영향 분석 (Effects of Deep Level Defect Variations on Ga2O3/SiC Heterojunction Diodes Due to Post-Annealing Atmosphere)

  • 정승환;신명철;;구상모
    • 전기전자학회논문지
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    • 제28권1호
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    • pp.104-109
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    • 2024
  • 본 연구에서는 다양한 가스 분위기에서 후열처리를 진행한 후 Ga2O3/SiC 이종접합 다이오드의 깊은 준위 결함 변화를 Deep Level Transient Spectroscopy(DLTS) 기법으로 분석하여 깊은 준위 결함의 변화가 Ga2O3/SiC 이종접합 소자의 전기적 특성에 미치는 영향을 조사하였다. 또한, J-V 측정 및 Hall 측정을 통한 전기적 특성 분석을 실시하였고, N2 분위기에서 열처리된 소자에서 3.06 × 10-2 A/cm2로 가장 높은 on-state current가 측정되었으며, carrier concentration은 3.8 × 1014 cm-3로 증가하는 것이 관측되었다. 이는 후열처리 분위기에 따른 깊은 준위 결함의 변화가 전기적 특성에 영향을 미칠 수 있음을 시사한다.

PLD 법으로 증착된 n-ZnO:In/p-Si (111) 이종접합구조의 특성연구 (A Study on the Characteristic of n-ZnO:In/p-Si (111) Heterostructure by Pulsed Laser Deposition)

  • 장보라;이주영;이종훈;김준제;김홍승;이동욱;이원재;조형균;이호성
    • 한국전기전자재료학회논문지
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    • 제22권5호
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    • pp.419-424
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    • 2009
  • ZnO films doped with different contents of indium ($0.1{\sim}10$ at.%) were deposited on Si (111) substrate by Pulsed Laser Deposition (PLD). The structural, electrical and optical properties of the films were investigated using XRD, AFM, Hall and PL measurement. Results showed that un-doped ZnO film had (002) plane as the c-axis orientated growth, whereas indium doped ZnO films exhibited the peak of (002) and the weak (101) plane. In addition, in the indium doped ZnO films, the electron concentration is ten times higher than that of un-doped ZnO film, while the resistivity is ten times lower than that of un-doped ZnO film. The indium doped ZnO films have UV emission about 380 nm and show a red shift with increasing contents of indium. The I-V curve of the fabricated diode show the typical diode characteristics and have the turn on voltage of about 2 V.

상온 강자성 (Ga,Mn)N 박막을 이용한 질화물계 스핀 발광소자의 스핀편극된 빛의 발광 (Emission of Spin-polarized Light in Nitride-based Spin LEDs with Room-temperature Ferromagnetic (Ga,Mn)N Layer)

  • 함문호;명재민
    • 한국전기전자재료학회논문지
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    • 제18권11호
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    • pp.1056-1060
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    • 2005
  • We investigated the fabrication and characteristics of the nitride-based spin-polarized LEDs with room-temperature ferromagnetic (Ga,Mn)N layer as a spin injection source. The (Ga,Mn)N thin films having room-temperature ferromagnetic ordering were found to exhibit the negative MR and anomalous Hall resistance up to room temperature, revealing the existence of spin-polarized electrons in (Ga,Mn)N films at room temperature. The electrical characteristics in the spin LEDs did not degraded in spite of the insertion of the (Ga,Mn)N layer into the LED structure. In EL spectra of the spin LEDs, it is confirmed that the devices produce intense EL emission at 7 K as well as room temperature. These results are expected to open up new opportunities to realize room-temperature operating semiconductor spintronic devices.

화학기상증착으로 Si(111) 위에 성장된 N-SiC(3C) 에피층의 특성 (Characterization of N-doped SiC(3C) epilayer by CVD on Si(111))

  • 박국상;김광철;남기석;나훈균
    • 한국결정성장학회지
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    • 제9권1호
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    • pp.39-42
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    • 1999
  • N-도핑된 3C-SiC (N-SiC(3C))을 화학기상증착(CVD)으로 $1250^{\circ}C$에서 Si(111) 기판 위에 tetramethylsilane(TMS)를 열분해하여 성장하였다. 수송가스는 $H_{2}$이었고, N-SiC(3C) 에피층은 CVD로 성장되는 동안 $NH_{3}$에 의하여 n-형으로 도핑되었다. N-SiC(3C)의 물리적 특성은 적외선 분광(FTIR), X-선 회절(XRD), 라만 스펙트럼(Raman spectrum), 단면 투과전자영상(XTEM), Hall 측정 및 p/n 다이오드의 전압-진압(I-V) 특성에 의하여 조사되었다. N-도핑된 SiC(3C) 에피층의 전도형은 n-형이었고, 전도형은 $NH_{3}$를 사용한 N-dopant에 의하여 저온에서 잘 조절될 수 있다.

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ALD로 성장된 ZnO박막에 대한 질소이온 조사효과 (Study of the Nitrogen-Beam Irradiation Effects on ALD-ZnO Films)

  • 김희수
    • 한국진공학회지
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    • 제18권5호
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    • pp.384-389
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    • 2009
  • ZnO는 육방정계결정구조의 물질로서 3.37 eV의 넓은 띠 간격과 60 meV의 큰 exciton 결합에너지에 따른 높은 효율의 자외선발광으로 짧은 파장의 빛 (녹, 청, 자외선)을 내는 LED (Light Emitting Diode) 분야에서 관심을 기울이고 있는 물질이다. LED제작을 위해서는 n형의 ZnO와 p형의 ZnO가 필요하지만 기본적으로 ZnO은 n형이므로 신뢰성 있는 p형 ZnO박막을 제작하기 위한 노력이 기울여지고 있다. 본 연구에서는 ALD (Atomic Layer Deposition)로 제작된 ZnO박막에 20 keV의 에너지를 갖는 질소이온을 $10^{13}{\sim}10^{15}ions/cm^2$로 조사한 후 Hall 효과 측정장치를 이용하여 질소이온 조사에 따른 전기적 특성변화를 조사하였다.

깊은 준위 결함에 의한 SiC SBD 전기적 특성에 대한 영향 분석 (The effect of deep level defects in SiC on the electrical characteristics of Schottky barrier diode structures)

  • 이건희;변동욱;신명철;구상모
    • 전기전자학회논문지
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    • 제26권1호
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    • pp.50-55
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    • 2022
  • SiC는 차세대 전력반도체의 핵심 재료로 넓은 밴드갭과 높은 절연파괴강도, 열전도율을 가지고 있지만 deep level defect와 같은 다양한 문제를 야기하는 결함이 존재한다. SiC에서 나타나는 defect는 물성에서 나타나는 defect와 계면에서 나타나는 interface trap 2가지로 나뉜다. 본 논문은 상온 (300 K)에서 보고되는 Z1/2 trap concentration 0 ~ 9×1014 cm-3을 SiC substrate와 epi layer에 적용하여 turn-on 특성을 알아보고자 한다. 전류밀도와 SRH(Shockley-Read-Hall), Auger recombination을 통해 구조 내 재 결합률을 확인하였다. trap concentration이 증가할수록 turn-on시 전류밀도와 재 결합률은 감소하며 Ron은 0.004에서 0.022 mΩ으로 약 550% 증가하였다.