• 제목/요약/키워드: HF etching

검색결과 214건 처리시간 0.025초

Atomic Layer Deposition of Nitrogen Doped ZnO and Application for Highly Sensitive Coreshell Nanowire Photo Detector

  • 정한얼;강혜민;천태훈;김수현;김도영;김형준
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 춘계학술발표대회
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    • pp.26.1-26.1
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    • 2011
  • We investigated the atomic layer deposition (ALD) process for nitrogen doped ZnO and the application for n-ZnO : N/p-Si (NW) coaxial hetero-junction photodetectors. ALD ZnO:N was deposited using diethylzinc (DEZ) and diluted $NH_4OH$ at $150^{\circ}C$ of substrate temperature. About 100~300 nm diameter and 5 um length of Si nanowires array were prepared using electroless etching technique in 0.108 g of $AgNO_3$ melted 20 ml HF liquid at $75^{\circ}C$. TEM images showed ZnO were deposited on densely packed SiNW structure achieving extraordinary conformality. When UV (360 nm) light was illuminated on n-ZnO:N/p-SiNW, I-V curve showed about three times larger photocurrent generation than film structure at 10 V reverse bias. Especially, at 660 nm wave length, the coaxial structure has 90.8% of external quantum efficiency (EQE) and 0.573 A/W of responsivity.

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플루오린화 수소산의 습식식각법을 이용한 광섬유형 방향성 결합기 (Fiber-Optic Directional Coupler Using HF Wet-Etching)

  • 손경호;정영호;유경식
    • 한국전자파학회논문지
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    • 제28권1호
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    • pp.25-32
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    • 2017
  • 본 논문에서는 플루오린화 수소산(hydrofluoric acid)과 표면 장력을 이용한 손실이 낮은 광섬유형 방향성 결합기 제작 방법을 제안한다. 제안한 방향성 결합기 제작 방법은 기존에 일반적으로 이용하던 열원을 이용한 제작 방법과는 다르게 다양한 장비들이 요구되지 않으며, 마멸을 이용한 방법보다 손실이 낮으며, 제작 과정이 매우 쉽다. 또한, 제작된 결과물은 테이퍼드(tapered) 형태의 아디아바틱(adiabatic)한 구조로 인해 광통신에서 널리 이용되는 C-band 영역에서 파장 의존성이 낮아 광통신에서 유망한 역할을 맡을 수 있다.

Synthesis of Nanoporous Carbon as a Gas Adsorbent by Reverse Replication Process of Silica Template

  • Cho, Churl-Hee;Kim, Joon-Soo;Kim, Hong-Soo;Ahn, Young-Soo;Han, Moon-Hee;Yoo, Jong-Sung
    • 한국세라믹학회지
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    • 제40권6호
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    • pp.519-524
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    • 2003
  • Porous carbon with high surface area and pore volume was prepared by a reverse replication process and its toluene equilibrium adsorption behavior was investigated. The preparation process of the porous carbon was composed of fellowing sub-processes in series: synthesis and template preparation of silica gel, impregnation and polymerization of DVB monomer in silica template, carbonization of DVB polymer in a silica-polymer composite, and HF-assisted selective etching of silica in carbon-silica composite. The prepared porous carbon was nano porous and had ultrahigh specific surface area (2007 ㎡/g) and large pore volume (3.07 ㎤/g). The nanoporous carbon showed rapid toluene adsorption rate and good toluene adsorption capacity, compared with a commercial Y-type zeolite. In the present study, a reverse replication process to prepare nanoporous carbons will be introduced and its application potential as a gas adsorbent will be discussed.

Etching characteristics of ArF and EUV resists in dual-frequency superimposed capacitively coupled $CF_{4}/O_{2}/Ar$ and $CF_{4}/CHF_{3}/O_{2}$/Ar plasmas

  • 권봉수;김진성;박영록;안정호;문학기;정창룡;허욱;박지수;이내응;이성권
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2009년도 춘계학술대회 논문집
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    • pp.252-253
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    • 2009
  • In this study, the deformation and etch characteristics of ArF and EUV photoresists were compared in a dual frequency superimposed capacitively coupled plasma (DFS-CCP) etcher systems using $CF_{4}/O_{2}/Ar$ and $CF_{4}/CHF_{3}/O_{2}/Ar$ mixture gas chemistry which are typically used for BARC open and $Si_{3}N_{4}$ teching chemistry, respectively. Etch rate of the resists tend to increase with low-frequency source power ($P_{LF}$) and high-frequency source ($f_{HF}$). The etch rate of ArF resist was hgither than that of EUV resist.

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미소접촉인쇄 공정용 철형 PDMS 스템프 제작을 위한 Pyrex 7740 glass 표면의 연성영역 나노패터닝 (Ductile-Regime Nanopatterning on Pyrex 7740 Glass Surface and Its Application to the Fabrication of Positive-tone PDMS Stamp for Microcontact Printing (${\mu}CP$))

  • 김현일;윤성원;강충길
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2004년도 추계학술대회논문집
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    • pp.40-43
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    • 2004
  • Stamps for microcontact processing are fabricated by casting elastomer such as PDMS on a master with a negative of the desired pattern. After curing, the PDMS stamp is peeled away from the master and exposed to a solution of ink and then dried. Transfer of the ink from the PDMS stamp to the substrate occurs during a brief contact between stamp and substrate. Generally, negative-tone masters, which are used for making positive-tone PDMS stamps, are fabricated by using photolithographic technique. The shortcomings of photolithography are a relative high-cost process and require extensive processing time and heavy capital investment to build and maintain the fabrication facilities. The goal of this study is to fabricate a negative-tone master by using Nano-indenter based patterning technique. Various sizes of V-grooves and U-groove were fabricated by using the combination of nanoscratch and HF isotropic etching technique. An achieved negative-tone structure was used as a master in the PDMS replica molding process to fabricate a positive-tone PDMS stamp.

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광전류 향상을 위한 유기 전해질 활용 양극산화 된 $TiO_2$ 전극의 광활성 연구 (Study on photoactivity of anodized $TiO_2$ photoanode used of organic electrolyte for development of photocurrent)

  • 심은정;허아영;박민성;윤재경;주현규
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2009년도 추계학술대회 논문집
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    • pp.222-225
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    • 2009
  • In this paper, $TiO_2$ nanotube is prepared and the preparation is influenced by electrochemical etching rate and chemical dissolution rate. Especially, the chemical dissolution rate is lowered as the length $TiO_2$ nanotube increases. Titanium foil were anodized at various bias or current such as 20V, 55V and 0.1A (bath temperature $25^{\circ}C$) in organic electrolytes (ethylene glycol, glycerol) and then annealed at $450^{\circ}C$ and $650^{\circ}C$ to obtain the crystallized tubular $TiO_2$ on the Ti foil. Higher efficiency (89.1%) for the Cr(VI) reduction was obtained with the prepared sample compared to that (20.9%) with the sample in 0.5% HF electrolyte earlier studied.

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Preparation of Micro-/Macroporous Carbons and Their Gas Sorption Properties

  • Hwang, Yong-Kyung;Shin, Hye-Seon;Hong, Jin-Yeon;Huh, Seong
    • Bulletin of the Korean Chemical Society
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    • 제35권2호
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    • pp.377-382
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    • 2014
  • Micro-/macroporous carbons (MMCs) were prepared using a hollow mesoporous silica capsule (HMSC) as a sacrificial hard template. The carbonization process after the infiltration of furfuryl alcohol into the template-free HMSC material afforded MMC materials in high yield. The hard template HMSC could be removed by HF etching without deteriorating the structure of MMC. The MMC materials were fully characterized by SEM, TEM, PXRD, XPS, and Raman spectroscopy. The replication processes were so successful that MMCs exhibited a hollow capsular structure with multimodal microporosity. Detailed textural properties of MMC materials were investigated by volumetric $N_2$ adsorption-desorption analysis at 77 K. To explore the gas sorption abilities of MMCs for other gases, $H_2$ and $CO_2$ sorption analyses were also performed at various temperatures. The multimodal MMC materials were found to be good sorbents for both $H_2$ and $CO_2$ at low pressure.

리튬 이차전지용 금속이 담지된 다공성 실리콘 음극물질의 전기화학적 특성 (Electrochemical Characteristics of Porous Modified Silicon Impregnated with Metal as Anode Materials for Lithium Secondary Batteries)

  • 장은정;전법주
    • 한국수소및신에너지학회논문집
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    • 제23권4호
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    • pp.353-363
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    • 2012
  • The relationship between the diffusivity and electrochemical characteristics of lithium secondary battery with the modified Si anode material prepared in HF/$AgNO_3$ solution was investigated. The crystallographic structure and images of the modified porous Si and modified Si/Cu was examined using the X-ray diffraction, BET and SEM. To examine the effect of metal composite and pore size distribution according to chemical etching on the electrochemical characterization, the electrodes for half cells were prepared with the modified Si, modified Si/Cu, and modified Si/Cu annealed with $600^{\circ}C$. Our results showed that the chemical diffusivity of lithium ions was related to structure and resistance of Si/Cu composite anode material. The lithium diffusivity in modified silicon compound calculated from the CV was at the range of $1{\times}10^{-12}$ to $9{\times}10^{-16}cm^2/s$. The effects of modified silicon structure and resistance on the cycling efficiency were significant.

$CH_4$/Ar 플라즈마를 이용한 TiN 박막의 식각특성 연구 (The etch characteristics of TiN thin films using in $CH_4$/Ar plasma)

  • 우종창;엄두승;김관하;김동표;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.247-248
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    • 2008
  • The etching characteristics of Titanium Nitride (TiN) and etch selectivity of TiN to $SiO_2$ and $HfO_2$ in $CH_4$/Ar plasma were investigated. It was found that TiN etch rate shows a non-monotonic behavior with increasing both Ar fraction in $CH_4$ plasma, RF power, and gas pressure. The maximum TiN etch rate of nm/min was obtained for $CH_4$ (80%)/Ar(20%) gas mixture. The plasmas were characterized using optical emission spectroscopy (OES) analysis measurements. From these data, the suggestions on the TiN etch characteristics were made.

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고효율 실리콘 태양전지를 위한 lotus surface 구조의 형성 (Formation of lotus surface structure for high efficiency silicon solar cell)

  • 정현철;백용균;김효한;음정현;최균;김형태;장효식
    • 한국결정성장학회지
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    • 제20권1호
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    • pp.7-11
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    • 2010
  • 단결정 실리콘 태양전지의 광학적 손실을 감소시키는 표면 텍스쳐링은 최종 셀의 효율을 향상시키기 위하여 매우 중요하다. 본 연구에서는 2-step texturing의 공정으로 기존의 텍스쳐링에서 이루어진 피라미드에 수 많은 sub-micrometer 사이즈의 구조를 형성시켰다. $AgNO_3$ 용액으로 웨이퍼 표면에 Ag코팅을 한 후, 그 웨이퍼를 다시 HF/$H_2O_2$ 용액으로 수십초 동안 식각을 거치게 된다. 결과적으로, 피라미드 위에 생성된 수 nm사이즈의 구조물들은 $AgNO_3$의 농도 및 식각 시간의 변화에 의해 그 크기와 굵기가 변화하는 것을 알 수 있었다. 웨이퍼의 표면이 2-step texturing에 의해 식각이 이루어지면 연잎의 거친 표면과 비슷해지고, 그 결과 평균 10% 이상의 반사율을 보이던 기존 웨이퍼에서 3% 이하의 낮은 반사율을 얻을 수 있었다. 이는 일반적인 텍스쳐링과 anti-reflection coating을 거친 웨이퍼의 반사율보다 낮은 결과이다.