• 제목/요약/키워드: Glow plasma

검색결과 147건 처리시간 0.034초

글로우방전을 이용한 폴리에스테르 직물의 투습방수성 개질 (Water Repellent Finish of Polyester Fabric Using Glow Discharge Treatment)

  • 김태년
    • 한국의류학회지
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    • 제25권1호
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    • pp.154-161
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    • 2001
  • We have treated polyester fabric with $CF_4,\;C_2F_6,\;SF_6\;and\;C_3F_6$ glow discharge plasmas to develop functional fabrics which preserve moisture transportation and water proofing nature. Modified properties were evaluated by water vapor permeation rate and breakthrough water pressure. The change of surface morphology was observed by SEM. Fiber interstice of the plasma treated fabric was calculated as $0.32{\mu}{\textrm}{m}$, and this value was sufficiently ideal as water repellent material. The moisture transportation of ${CF_4}-treated$ fabric was good as much as untreated fabric, and those of $C_2$F(sub)6-treated, SF(sub)6-treated fabrics were reduced by 1~3%, and that of ${C_3F_6}-treated$ fabric was reduced by 15%. The best treatment condition were 0.06 torr 120 seconds in $CF_4$, 0.05 torr 30 seconds in $SF_6$, 0.08~0.15 torr 90 seconds in $SF_6$ and 0.1 torr 45 seconds in $C_3F_6$ respectively. The grade of moisture transportation effect was $CF_4>C_2F_6>SF_6>>C_3F_6$, and water proofing effect was $C_2F_6{\approx}CF_4>C_3F_6>SF_6$. It was observed by SEM that the thin film was formed on the surface of the treated substrate by the fluorocarbon plasma treatment.

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Molecular Emission Spectrometric Detection of Low Level Sulfur Using Hollow Cathode Glow Discharge

  • Koo, Il-Gyo;Lee, Woong-Moo
    • Bulletin of the Korean Chemical Society
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    • 제25권1호
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    • pp.73-78
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    • 2004
  • A highly sensitive detecting method has been developed for determining part per billion of sulfur in $H_2S$/Ar plasma. The method is based on the excitation of Ar/$H_2S\;or\;Ar/H_2S/O_2$ mixture in hollow cathode glow discharge sustained by radiofrequency (RF) or 60 Hz AC power and the spectroscopic measurement of the intensity of emission lines from electronically excited $S_2^*\;or\;SO_2^*$ species, respectively. The RF or AC power needed for the excitation did not exceed 30 W at a gas pressure maintained at several mbar. The emission intensity from the $SO_2^*$ species showed excellent linear response to the sulfur concentration ranging from 5 ppbv, which correspond to S/N = 5, to 500 ppbv. But the intensity from the $S_2^*$ species showed a linear response to the $H_2S$ only at low flow rate under 20 sccm (mL/min) of the sample gas. Separate experiments using $SO_2$ gas as the source of sulfur demonstrated that the presence of $O_2$ in the argon plasma is essential for obtaining prominent $SO_2^*$ emission lines.

상압 마이크로 글로우 방전 분사 소자 (Atmospheric Micro Glow Plasma-jet Device)

  • 김강일;홍용철;김근영;양상식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2009년도 제40회 하계학술대회
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    • pp.1533_1534
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    • 2009
  • This paper presents an atmospheric micro glow plasma-jet device. The device consists of four components; a thin Ni anode, a porous alumina insulater, a stainless steel cathode and an aluminum case. The Ni anode is fabricated using micromachining technology. The anode has 10 holes, of which the hole diameter and the depth are $250{\mu}m$ and $60{\mu}m$, respectively. The discharge test is performed in nitrogen gas at atmospheric pressure for 20 kHz AC bias. The breakdown voltage is 3.5 kV at gas flow rate of 4 L/min and the the plasma-jet is blown out to ambient at 5.5 kV. In order to verify the characteristics of plasma, the current and the voltage of device are measured. The maximum temperature of plasma is $37^{\circ}C$. The plasma is well generated and stable at high voltage.

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Decomposition of Odorous Gases in a Pilot-scale Nonthermal Plasma Reactor

  • Hwang, Yoon-Ho;Jo, Young-Min
    • Journal of Korean Society for Atmospheric Environment
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    • 제21권E2호
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    • pp.57-65
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    • 2005
  • An experimental study was performed on the decomposition of gaseous ammonia and two selected volatile organic compounds (VOCs: toluene and acetone) in a combined nonthermal plasma reactor with corona and glow discharges. A lab pilot scale reactor (206 liter) equipped with a high electric power pack was used to determine the decomposition efficiency in relation with the inlet concentration and applied voltage. Three different types of discharging electrode such as wired rack, wire strings for corona discharge, and thin plate for glow discharge were put in order in the reactor. While decomposition of ammonia decreased with an increase in the initial concentration, acetone showed an opposite result. In the case of toluene however no explicit tendency was found in toluene and aceton. Negative discharge resulted in high decomposition efficiency than the positive one for all gases. A better removal of gas phase element could be achieved when fume dust were present simultaneously.

글로우 방전 플라즈마에 의한 탄산가스 전환특성 (Conversion Characteristics of $CO_2$ by Glow Discharge Plasm)

  • 곽동주;하양진;신용섭;최연석
    • 한국전기전자재료학회논문지
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    • 제11권3호
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    • pp.248-254
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    • 1998
  • In the present study the glow discharge characteristics of $CO_2$ in a parallel plate electrode system were investigated, and the decomposition properties of $CO_2$ concerned with the discharge characteristics were discussed. The results show that $CO_2$ concentration decreases with increase in discharge power and decrease in gas pressure. The maximum conversion of $CO_2$ by glow discharge was 52% under the conditions of gas pressure, 10m Torr and 290W of discharge power.

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프라즈마 이용기술 (1)

  • 황기웅
    • 전기의세계
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    • 제34권8호
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    • pp.470-475
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    • 1985
  • 우주물질의 대부분이 플라즈마 상태에 있지마는 지구상에서는 천둥이 칠 때 생기는 방전이나 극지방에서 볼 수 있는 오로라와 같이 극히 일부분이 자연상태의 프라즈마로 존재한다. 지금까지 플라즈마의 이용은 그것이 내는 밝은 빛을 이용한 조명이나, 높은 열을 이용한 용접이나 절단이 고작이었으나, 최근에 들어 초고온, 고밀도 플라즈마를 이용한 핵융합 에너지 연구나 Free Electron Laser나 Gyrotron과 같이 새로운 Radiation Source로써 종래의 Source가 만들지 못하던 주파수 영역이나 Glow Discharge에서 생기는 저온 Plasma를 이용한 Plasma Etching PECVD(Plasma Enhanced CHemical Vapor Deposition), Plasma Ashing, Sputtering등은 VLSI의 제조에 필요불가결한 공정의 일부분이 되고 있다. 앞으로 수회에 걸쳐 본 기술해설란을 통하여 이들 Plasma의 이용 기술을 소개하고자 하며 본회에서는 그중에서 Plasma Etching에 대해서 그 원리와 기술상의 특징을 살펴보고자 한다.

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섬유의 Plasma 가공(I) -plasma 처리화학-

  • 광진민박;조환
    • 한국염색가공학회지
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    • 제3권3호
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    • pp.44-56
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    • 1991
  • 진공하에서 일어나는 glow 방전을 이용해서 행하는 plasma 반응은, 표면 특이적(Surface specific)인, 또는 비파괴적인 처리공정(Non-destructive process) 으로서 주목되고 있는 기술이다. 전반은 plasma chemistry로서, 섬유가공의 기초가 되는 plasma를 이용한 반응에 대하여 정리한다. 또 다음 후반에는 섬유가공에 관한 응용예에 대해서, 특히, 최근 실용화를 이룩하고 있는 일본에 있어서의 plasma 응용의 연구개발들, polyester 섬유염색물의 농색화가공, 양모직물의 방축가공 등의 기술동향 및 실용화를 위한 장치개발 등을 소개코자 한다.

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On-line monitoring system 개발에 관한 음극 액상 글로우 방전의 기초 연구 (Fundamental study of electrolyte cathode atomic discharge for development of on-line monitoring system)

  • 김경미;우영아;조원보;김효진
    • 분석과학
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    • 제15권6호
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    • pp.496-501
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    • 2002
  • Electrolyte cathode atomic discharge (ELCAD)는 용액 중에 포함된 미량 중금속을 연속 자동적으로 측정하기 위한 새로운 광학 측정기로서 플라스마에 의한 중금속들의 방출 강도를 측정하는 원자방출 분광법의 하나이다. 특히 이 방법은 검액을 전처리하지 않고 직접 분석할 수 있기 때문에 온라인 (on-line) 현장분석이 가능하다. ELCAD에서는 분위기 가스로 공기를 이용하고, 양극부분에 백금 전극을 사용하며, 음극에서는 연속적으로 전해질 시료를 주입하면서 플라스마를 형성하면서 미량의 중금속을 분석할 수 있다. 액상 글로우 방전의 기초 특성 연구로는 철의 원자 방출선 세기를 구한 다음 Einstein-Boltzmann식을 사용하여 플라스마 온도를 구한 다음 구리, 납, 철 및 니켈의 미량 분석 및 간섭 현상에 대해서 연구하였고, 검출 한계를 구하였다.

Perspective of industrial application of high pressure and low temperature plasma

  • Kogoma, Masuhiro;Tanaka, Kunihito
    • 한국표면공학회지
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    • 제34권5호
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    • pp.378-383
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    • 2001
  • An out line of the material process with using the atmospheric pressure glow plasma is described as follows : (1) TiO powder coating with SiO$_2$ (2) Surface treatment of Fluorinated polymers and (3) Surface cleaning of electronic circuit board with using splay type.

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Comparison Study of Sensitivity Factors of Elements in Glow Discharge- & Inductively Coupled Plasma- Mass Spectrometry

  • Kim, Young-Sang;Plotnikov, M.;Hoffmann, Volker
    • Bulletin of the Korean Chemical Society
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    • 제26권12호
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    • pp.1991-1995
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    • 2005
  • Sensitivity factors of elements by a glow discharge mass spectrometry (GD-MS) were intensively investigated and compared with a laser ablation inductively coupled plasma-mass spectrometry (ICP-MS). In case of copper matrix, the sensitivity factor by GD-MS generally decreases with the increase of the mass number of element. The details are a little different between each data measured by Faraday and multiplier detectors. The factor by a multiplier detector drastically decreases with the mass increase in the region of low mass as in Faraday detector’s case, but slowly in the high mass region. On the contrast, the sensitivity factor of solution standard by a conventional ICP-MS slowly increases with the increase of elemental mass number even though there are some exceptions such as gold and also the sensitivity factor by a laser ablation ICP MS generally increases with mass number of element in the specimen of glass type. In case of steel matrix, any definite trends could not be shown in the relationship between the GD-MS’s sensitivity factor and elemental mass.